Patents by Inventor Masakatsu Takeuchi
Masakatsu Takeuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220290084Abstract: A multilayer culture vessel, comprising a culture vessel part and a reservoir part attached to the culture vessel part, wherein the culture vessel part comprises at least two culture trays that are stacked; the reservoir part comprises a surrounding wall defining an internal space and a port communicating with the internal space; the surrounding wall comprises a first surrounding wall part provided with the port and a second surrounding wall part facing the first surrounding wall part; the culture vessel part has openings communicating individual culture trays of the at least two culture trays with the internal space of the reservoir part; and the openings of the culture vessel part extend toward a first abutting portion that the first surrounding wall part abuts on the culture vessel part from a second abutting portion that the second surrounding wall part abuts on the culture vessel part.Type: ApplicationFiled: July 7, 2020Publication date: September 15, 2022Applicant: NIPRO CORPORATIONInventors: Yoshihiro Yoshikawa, Masakatsu Takeuchi, Masafumi Yao, Hideaki Yamamoto, Yusuke Wagatsuma, Ryosuke Nakamura
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Publication number: 20220028739Abstract: A semiconductor device according to an embodiment includes: a barrier metal layer provided on a surface of an insulating layer; and a conductive layer having a first metal layer provided on a surface of the barrier metal layer, and a second metal layer provided on a surface of the first metal layer. The second metal layer includes an identical metal to metal of the first metal layer, and an impurity configured to remove fluorine bonded to the metal.Type: ApplicationFiled: October 6, 2021Publication date: January 27, 2022Applicant: Kioxia CorporationInventors: Satoshi WAKATSUKI, Tomohisa IINO, Naomi FUKUMAKI, Misuzu SATO, Masakatsu TAKEUCHI
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Patent number: 10975345Abstract: A compact culture device capable of performing large-scale culture in an aseptic state. A culture device has a culture bag which has ports through which a liquid flows and enables cell culture, a bag holding portion having holding plates holding the culture bag and rotating shafts, a rotation mechanism supporting and rotating the rotating shaft, a liquid supply/discharge mechanism supplying and discharging a liquid to/from the culture bag, and a rotation control portion controlling the rotation of the rotation mechanism.Type: GrantFiled: May 24, 2016Date of Patent: April 13, 2021Inventors: Masakatsu Takeuchi, Atsushi Taguchi
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Publication number: 20210082753Abstract: A semiconductor device according to an embodiment includes: a barrier metal layer provided on a surface of an insulating layer; and a conductive layer having a first metal layer provided on a surface of the barrier metal layer, and a second metal layer provided on a surface of the first metal layer. The second metal layer includes an identical metal to metal of the first metal layer, and an impurity configured to remove fluorine bonded to the metal.Type: ApplicationFiled: March 10, 2020Publication date: March 18, 2021Applicant: Kioxia CorporationInventors: Satoshi WAKATSUKI, Tomohisa IINO, Naomi FUKUMAKI, Misuzu SATO, Masakatsu TAKEUCHI
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Patent number: 10883078Abstract: A culture device supplying an accurate amount of liquid into a culture bag has a culture bag having ports, a first bag holding portion having supporting surfaces supporting the culture bag, a rotation mechanism rotating the first bag holding portion, a liquid supplying mechanism supplying a liquid through a tube communicating with the ports a weight detector detecting the weight of the culture bag and the first bag holding portion, and a control portion, in which the control portion sets a first reference value according to a first detection information output from the weight detector in a first state and carries out a liquid supplying step of stopping the liquid supplying mechanism under the condition where a second detection information output from the weight detector when a liquid is supplied to the culturing bag reaches a first target value obtained by adding the weight of the liquid to be supplied to the first reference value.Type: GrantFiled: May 24, 2016Date of Patent: January 5, 2021Inventors: Norihisa Sasayama, Masakatsu Takeuchi, Atsushi Taguchi
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Patent number: 10870913Abstract: A processing device according to one embodiment includes an object placement unit, a source placement unit, a collimator, and a temperature adjusting unit. The object placement unit is configured to have an object arranged. The object placement unit is configured to have an object placed thereon. The source placement unit is arranged apart from the object placement unit and configured to have a particle source placed thereon, the particle source being capable of ejecting a particle toward the object. The collimator configured to be arranged between the object placement unit and the source placement unit, includes walls, and is provided with through holes formed by the walls and extending a direction from the object placement unit to the source placement unit. The temperature adjusting unit is configured to adjust a temperature of the collimator.Type: GrantFiled: December 19, 2016Date of Patent: December 22, 2020Assignee: Kabushiki Kaisha ToshibaInventors: Masakatsu Takeuchi, Shiguma Kato, Yasuhiro Aoyama, Takahiro Terada, Yoshinori Tokuda
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Patent number: 10793822Abstract: A means capable of simply and efficiently concentrating a cell suspension. A concentrator has a culture vessel having a first port and a second port, a server bag having a port, a case having a hollow fiber bundle in the internal space, a filtering device having an inlet port, a first outlet port, and a second outlet port, a collection vessel having a port, a liquid supply circuit connected to the first port, the inlet port, and the server bag's port so that flow passages are switchable, a liquid discharge circuit connected to the second port, the first outlet port, the second outlet port, and the collection vessel's port so that flow passages are switchable, a liquid supply mechanism having a switching mechanism, a supply pump, and a discharge pump, and a rotation mechanism rotating the filtering device.Type: GrantFiled: May 24, 2016Date of Patent: October 6, 2020Assignee: NIPRO CORPORATIONInventors: Norihisa Sasayama, Masakatsu Takeuchi, Atsushi Taguchi
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Patent number: 10777395Abstract: A processing apparatus according to an embodiment includes an object placement unit, a source placement unit, a flow rectifying member, and a power supply. The object placement unit is configured to have an object placed thereon. The source placement unit is disposed apart from the object placement unit and configured to have a particle source capable of ejecting a particle toward the object placed thereon. The flow rectifying member is disposed between the object placement unit and the source placement unit in a first direction from the source placement unit to the object placement unit. The power supply is configured to apply, to the flow rectifying member, a voltage having the same polarity as that of an electric charge in the particle.Type: GrantFiled: December 19, 2016Date of Patent: September 15, 2020Assignee: Kabushiki Kaisha ToshibaInventors: Masakatsu Takeuchi, Shiguma Kato, Yasuhiro Aoyama, Takahiro Terada, Yoshinori Tokuda
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Publication number: 20190085450Abstract: According to one embodiment, in a semiconductor manufacturing apparatus, a first gas supply pipe is disposed between a gas supply source and a processing chamber. A first valve is disposed in the first gas supply pipe. The first valve includes a first valve seat forming a first opening, a first diaphragm, and a first pressing member capable of pressing the first diaphragm against the first valve seat. A second gas supply pipe is disposed between the gas supply source and the processing chamber. The second gas supply pipe is connected to the first gas supply pipe in parallel. A second valve is disposed in the second gas supply pipe. The second valve includes a second valve seat forming a second opening, a second diaphragm, and a second pressing member capable of pressing the second diaphragm against the second valve seat.Type: ApplicationFiled: March 7, 2018Publication date: March 21, 2019Applicant: Toshiba Memory CorporationInventors: Masakatsu Takeuchi, Makoto Usuki
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Publication number: 20190027346Abstract: A processing apparatus according to an embodiment includes an object placement unit, a source placement unit, a flow rectifying member, and a power supply. The object placement unit is configured to have an object placed thereon. The source placement unit is disposed apart from the object placement unit and configured to have a particle source capable of ejecting a particle toward the object placed thereon. The flow rectifying member is disposed between the object placement unit and the source placement unit in a first direction from the source placement unit to the object placement unit. The power supply is configured to apply, to the flow rectifying member, a voltage having the same polarity as that of an electric charge in the particle.Type: ApplicationFiled: December 19, 2016Publication date: January 24, 2019Applicant: Kabushiki Kaisha ToshibaInventors: Masakatsu TAKEUCHI, Shiguma KATO, Yasuhiro AOYAMA, Takahiro TERADA, Yoshinori TOKUDA
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Publication number: 20180265964Abstract: According to one embodiment, a collimator includes peripheral openings that extend between a grid region and a peripheral frame, are larger in size than unit through-holes, and penetrate through the collimator in a first direction. The peripheral openings include first peripheral openings located between first end walls and the peripheral frame.Type: ApplicationFiled: March 7, 2018Publication date: September 20, 2018Applicant: Kabushiki Kaisha ToshibaInventors: Shiguma KATO, Takahiro Terada, Masakatsu Takeuchi, Keita Koizumi, Yoshinori Tokuda
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Publication number: 20180237903Abstract: A processing device according to one embodiment includes an object placement unit, a source placement unit, a collimator, and a temperature adjusting unit. The object placement unit is configured to have an object arranged. The object placement unit is configured to have an object placed thereon. The source placement unit is arranged apart from the object placement unit and configured to have a particle source placed thereon, the particle source being capable of ejecting a particle toward the object. The collimator configured to be arranged between the object placement unit and the source placement unit, includes walls, and is provided with through holes formed by the walls and extending a direction from the object placement unit to the source placement unit. The temperature adjusting unit is configured to adjust a temperature of the collimator.Type: ApplicationFiled: December 19, 2016Publication date: August 23, 2018Applicant: Kabushiki Kaisha ToshibaInventors: Masakatsu TAKEUCHI, Shiguma KATO, Yasuhiro AOYAMA, Takahiro TERADA, Yoshinori TOKUDA
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Publication number: 20180233335Abstract: A processing device according to one embodiment includes an object placement unit, a source placement unit, and a collimator. An object is placed on the object placement unit. The source placement unit is arranged apart from the object placement unit, and has a particle source placed thereon, the particle source being capable of ejecting particle toward the object. The collimator is arranged between the object placement unit and the source placement unit, includes walls, and is provided with through holes formed by the walls. The walls include a first inner surface facing the through hole. The first inner surface includes a first portion made of a first material capable of ejecting the particle, and a second portion made of a second material, and arranged with the first portion in the first direction and closer to the object placement unit than the first portion.Type: ApplicationFiled: December 19, 2016Publication date: August 16, 2018Applicant: Kabushiki Kaisha ToshibaInventors: Shiguma KATO, Takahiro TERADA, Yoshinori TOKUDA, Masakatsu TAKEUCHI, Yasuhiro AOYAMA
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Publication number: 20180233336Abstract: A processing apparatus according to an embodiment includes a container, a workpiece placement unit, a collimator, and a magnetic field generation unit. The workpiece placement unit on which a workpiece is to be placed so that particles are stacked on the workpiece is provided inside the container. The collimator is provided inside the container, and includes a first surface, a second surface opposite to the first surface, and a through hole penetrating the first surface and the second surface. The magnetic field generation unit is provided inside the container and generates a magnetic field between the first surface and the second surface inside the through hole.Type: ApplicationFiled: December 19, 2016Publication date: August 16, 2018Applicant: Kabushiki Kaisha ToshibaInventors: Yoshinori TOKUDA, Yasuhiro NOJIRI, Shiguma KATO, Takahiro TERADA, Masakatsu TAKEUCHI, Yasuhiro AOYAMA
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Publication number: 20180148680Abstract: A means capable of simply and efficiently concentrating a cell suspension. A concentrator has a culture vessel having a first port and a second port, a server bag having a port, a case having a hollow fiber bundle in the internal space, a filtering device having an inlet port, a first outlet port, and a second outlet port, a collection vessel having a port, a liquid supply circuit connected to the first port, the inlet port, and the server bag's port so that flow passages are switchable, a liquid discharge circuit connected to the second port, the first outlet port, the second outlet port, and the collection vessel's port so that flow passages are switchable, a liquid supply mechanism having a switching mechanism, a supply pump, and a discharge pump, and a rotation mechanism rotating the filtering device.Type: ApplicationFiled: May 24, 2016Publication date: May 31, 2018Inventors: Norihisa Sasayama, Masakatsu Takeuchi, Atsushi Taguchi
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Publication number: 20180127696Abstract: A compact culture device capable of performing large-scale culture in an aseptic state. A culture device has a culture bag which has ports through which a liquid flows and enables cell culture, a bag holding portion having holding plates holding the culture bag and rotating shafts, a rotation mechanism supporting and rotating the rotating shaft, a liquid supply/discharge mechanism supplying and discharging a liquid to/from the culture bag, and a rotation control portion controlling the rotation of the rotation mechanism.Type: ApplicationFiled: May 24, 2016Publication date: May 10, 2018Inventors: Masakatsu TAKEUCHI, Atsushi TAGUCHI
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Patent number: D952896Type: GrantFiled: April 27, 2020Date of Patent: May 24, 2022Assignee: NIPRO CORPORATIONInventors: Yusuke Wagatsuma, Ryosuke Nakamura, Hideaki Yamamoto, Masafumi Yao, Masakatsu Takeuchi, Yoshihiro Yoshikawa, Shinya Asaka, Naoki Nakagawa
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Patent number: D952898Type: GrantFiled: January 12, 2022Date of Patent: May 24, 2022Assignee: NIPRO CORPORATIONInventors: Yusuke Wagatsuma, Ryosuke Nakamura, Hideaki Yamamoto, Masafumi Yao, Masakatsu Takeuchi, Yoshihiro Yoshikawa, Shinya Asaka, Naoki Nakagawa
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Patent number: D961113Type: GrantFiled: January 12, 2022Date of Patent: August 16, 2022Assignee: NIPRO CORPORATIONInventors: Yusuke Wagatsuma, Ryosuke Nakamura, Hideaki Yamamoto, Masafumi Yao, Masakatsu Takeuchi, Yoshihiro Yoshikawa, Shinya Asaka, Naoki Nakagawa
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Patent number: D963887Type: GrantFiled: January 12, 2022Date of Patent: September 13, 2022Assignee: NIPRO CORPORATIONInventors: Yusuke Wagatsuma, Ryosuke Nakamura, Hideaki Yamamoto, Masafumi Yao, Masakatsu Takeuchi, Yoshihiro Yoshikawa, Shinya Asaka, Naoki Nakagawa