Abstract: This connector (100) is provided with a locking member (200), a receiving part (192), an additional elastic part (420) and a pressing member (440). The locking member (200) comprises a supporting part (220) and a locking part (250). A mating-side connector (600) is provided with a mating-side locking part (660) and an abutting part (632). In the fitted state, the locking part (250) applies backwards force on the mating-side locking part (660) with the elasticity of the supporting part (220). The abutting part (632) is positioned in front of the receiving part (192), is pressed against the receiving part (192), and is restricted from moving backwards by the receiving part (192). When the pressing member (440) is in a first position, the additional elastic part (420) is interposed between the supporting part (220) and the pressing member (440), presses down the supporting part (220), and maintains pressing of the locking part (250) against the mating-side locking part (660).

Abstract: A plug connector is attachable with an optical fiber cable and is connectable with a receptacle connector. The receptacle connector comprises a receptacle shell. The plug connector comprises a front holder, a cable holding portion, a rear holder and a coupling member. The front holder is made of metal. The front holder is mated with the receptacle shell when the plug connector is connected with the receptacle connector. The cable holding portion is made of metal. The cable holding portion is configured to hold the optical fiber cable. The rear holder guards the cable holding portion. The rear holder comprises, at least in part, a thermal insulating portion made of non-metal material. The coupling member couples the front holder and the rear holder with each other. Each of the coupling member and the front holder is in contact with the rear holder only on the thermal insulating portion.

Abstract: A sample releasing method for releasing a sample subjected to plasma processing from a sample stage on which the sample is electrostatically attracted by applying DC voltage to an electrostatic chuck electrode, and the method includes: moving the sample subjected to the plasma processing upward above the sample stage; and after moving the sample, controlling the DC voltage such that an electric potential of the sample is to be smaller.

Abstract: A data processing apparatus in which a trade-off between over-learning prevention and calculation load prevention is eliminated when creating a model formula is provided.

Abstract: Provided is a plasma processing apparatus capable of obtaining desired etch profiles and preventing the degradation of yield rates due to the adhesion of particles, and equipped with a processing chamber in which a sample is plasma-treated; a radio-frequency power source for supplying radio-frequency power used to generate plasma; a sample stage which is provided with electrodes for electrostatically adsorbing the sample and on which the sample is mounted; and a DC power supply for applying DC voltages to the electrodes, the apparatus being further equipped with a control apparatus for controlling the DC power supply so as to apply such DC voltages as to decrease the absolute value of the potential of the sample in the absence of the plasma.

Abstract: There is provided an optical connector-incorporating plug properly assembled such that an optical fiber taken out from an end portion of an optical cable can have a fixed length. The optical connector-incorporating plug of the invention includes: a cable insertion component having an insertion hole in which an optical cable is inserted with an optical fiber being taken out from a cable end portion of the optical cable; a tubular member in which the cable end portion and the optical fiber are placed and in which the cable insertion component is fitted; a hole formed at a peripheral wall of the tubular member to check at least one of the cable end portion and the optical fiber in the tubular member; and a surrounding member mounted to the tubular member to surround the portion of the tubular member where the cable insertion component is fitted, thereby covering the hole.

Abstract: Provided is a plasma processing apparatus capable of obtaining desired etch profiles and preventing the degradation of yield rates due to the adhesion of particles, and equipped with a processing chamber in which a sample is plasma-treated; a radio-frequency power source for supplying radio-frequency power used to generate plasma; a sample stage which is provided with electrodes for electrostatically adsorbing the sample and on which the sample is mounted; and a DC power supply for applying DC voltages to the electrodes, the apparatus being further equipped with a control apparatus for controlling the DC power supply so as to apply such DC voltages as to decrease the absolute value of the potential of the sample in the absence of the plasma.

Abstract: A plug connector is attachable with an optical fiber cable and is connectable with a receptacle connector. The receptacle connector comprises a receptacle shell. The plug connector comprises a front holder, a cable holding portion, a rear holder and a coupling member. The front holder is made of metal. The front holder is mated with the receptacle shell when the plug connector is connected with the receptacle connector. The cable holding portion is made of metal. The cable holding portion is configured to hold the optical fiber cable. The rear holder guards the cable holding portion. The rear holder comprises, at least in part, a thermal insulating portion made of non-metal material. The coupling member couples the front holder and the rear holder with each other. Each of the coupling member and the front holder is in contact with the rear holder only on the thermal insulating portion.

Abstract: In a diagnosis apparatus for diagnosing a state of a plasma processing apparatus, prior distribution information including a probability distribution function is previously obtained for each of first sensors by using first sensor values obtained by the first sensors in a first plasma processing apparatus, a probability distribution in each of second sensors corresponding to each of the first sensors is estimated based on the previously obtained prior distribution information and second sensor values obtained by the second sensors in a second plasma processing apparatus different from the first plasma processing apparatus, and a state of the second plasma processing apparatus is diagnosed by using the estimated probability distribution.

Abstract: A connector device comprises a connector and a mating connector. Under a mated state where the connector and the mating connector are mated with each other, the mating connector is positioned forward of the connector in a front-rear direction. The connector comprises at least one supporting portion, at least one lock portion and a receiving portion. The mating connector has at least one mating lock portion and an abutment portion. At least one of the lock portion and the mating lock portion has an intersecting surface which intersects with both the front-rear direction and a perpendicular direction. Under the mated state, the abutment portion is positioned forward beyond the receiving portion in the front-rear direction and is brought into abutment against the receiving portion by a rearward force so that a rearward movement of the abutment portion beyond the receiving portion is regulated by the receiving portion.

Abstract: A plasma processing apparatus includes: a plasma processing chamber; a radio frequency power source; a sample stage on which a sample is mounted; an electrode which is arranged inside the sample stage and electrostatically chucks the sample; a DC power source which applies a DC voltage to the electrode; and a control device which controls an output voltage of the DC power source so that an electric potential difference between an electric potential of the sample and an electric potential of an inner wall of the plasma processing chamber is reduced to an electric potential difference within a predetermined range during interruption of plasma discharge.

Abstract: A plasma processing apparatus includes a plasma processing chamber processing a sample using plasma, a radio frequency power supply supplying radio frequency power for generating the plasma, a sample stage including an electrode electrostatically chucking the sample, mounting the sample thereon, a DC power supply applying DC voltage to the electrode, and a control device shifting the DC voltage previously set, in a negative direction by a first shift amount during discharge of the plasma, shifting the DC voltage having been shifted in the negative direction by the first shift amount, in a positive direction by a second shift amount after the discharge of the plasma. The first shift amount has a value changing potential over a surface of the sample to 0 V, upon shifting the DC voltage in the positive direction. The second shift amount has a value obtained based on a floating potential of the plasma.

Abstract: A plasma processing apparatus includes: a plasma processing chamber; a radio frequency power source; a sample stage on which a sample is mounted; an electrode which is arranged inside the sample stage and electrostatically chucks the sample; a DC power source which applies a DC voltage to the electrode; and a control device which controls an output voltage of the DC power source so that an electric potential difference between an electric potential of the sample and an electric potential of an inner wall of the plasma processing chamber is reduced to an electric potential difference within a predetermined range during interruption of plasma discharge.

Abstract: A connector includes a cable holding portion, a first holding member having a first male screw portion and a first guide portion, an optical connector, an optical module, a second holding member having a second male screw portion and a second guide portion, and a coupling nut having a female screw portion. In cooperation with each other, the first and second guide portions allow a relative movement of the first holding member with respect to the second holding member in the front-rear direction while regulating a relative movement of the first holding member with respect to the second holding member in a circumferential direction about an axis parallel to the front-rear direction. Relative positions of the first holding member and the second holding member in the front-rear direction are maintained by the female screw portion being meshed with both of the first and the second male screw portions.

Abstract: This connector (100) is provided with a locking member (200), a receiving part (192), an additional elastic part (420) and a pressing member (440). The locking member (200) comprises a supporting part (220) and a locking part (250). A mating-side connector (600) is provided with a mating-side locking part (660) and an abutting part (632). In the fitted state, the locking part (250) applies backwards force on the mating-side locking part (660) with the elasticity of the supporting part (220). The abutting part (632) is positioned in front of the receiving part (192), is pressed against the receiving part (192), and is restricted from moving backwards by the receiving part (192). When the pressing member (440) is in a first position, the additional elastic part (420) is interposed between the supporting part (220) and the pressing member (440), presses down the supporting part (220), and maintains pressing of the locking part (250) against the mating-side locking part (660).

Abstract: A sample releasing method for releasing a sample subjected to plasma processing from a sample stage on which the sample is electrostatically attracted by applying DC voltage to an electrostatic chuck electrode, and the method includes: moving the sample subjected to the plasma processing upward above the sample stage; and after moving the sample, controlling the DC voltage such that an electric potential of the sample is to be smaller.

Abstract: There is provided an optical connector-incorporating plug properly assembled such that an optical fiber taken out from an end portion of an optical cable can have a fixed length. The optical connector-incorporating plug of the invention includes: a cable insertion component having an insertion hole in which an optical cable is inserted with an optical fiber being taken out from a cable end portion of the optical cable; a tubular member in which the cable end portion and the optical fiber are placed and in which the cable insertion component is fitted; a hole formed at a peripheral wall of the tubular member to check at least one of the cable end portion and the optical fiber in the tubular member; and a surrounding member mounted to the tubular member to surround the portion of the tubular member where the cable insertion component is fitted, thereby covering the hole.

Abstract: A sample releasing method for releasing a sample subjected to plasma processing from a sample stage on which the sample is electrostatically attracted by applying DC voltage to an electrostatic chuck electrode, and the method includes: moving the sample subjected to the plasma processing upward above the sample stage; and after moving the sample, controlling the DC voltage such that an electric potential of the sample is to be smaller.

Abstract: A connector device comprises a connector and a mating connector. Under a mated state where the connector and the mating connector are mated with each other, the mating connector is positioned forward of the connector in a front-rear direction. The connector comprises at least one supporting portion, at least one lock portion and a receiving portion. The mating connector has at least one mating lock portion and an abutment portion. At least one of the lock portion and the mating lock portion has an intersecting surface which intersects with both the front-rear direction and a perpendicular direction. Under the mated state, the abutment portion is positioned forward beyond the receiving portion in the front-rear direction and is brought into abutment against the receiving portion by a rearward force so that a rearward movement of the abutment portion beyond the receiving portion is regulated by the receiving portion.