Patents by Inventor Masaki Shima
Masaki Shima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190221680Abstract: A second protective member has a slit for exposing a lead wiring member from a solar cell panel. A terminal box is connected to the lead wiring member from the slit in the second protective member. A bonding member bonds the terminal box and the second protective member. A peripheral portion around the slit in the second protective member projects farther than a non-peripheral portion other than the peripheral portion. The bonding member is provided in the non-peripheral portion in the second protective member.Type: ApplicationFiled: March 28, 2019Publication date: July 18, 2019Inventors: Toshiyuki SAKUMA, Ryoji NAITO, Kengo MATSUNE, Masaki SHIMA, Hiroyuki KANNOU
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Patent number: 10269992Abstract: A solar cell has multiple busbar electrodes formed at intervals and multiple finger electrodes formed between the busbar electrodes. The finger electrodes comprise multiple finger parts connected only to one busbar electrode and multiple finger parts connected to only another busbar electrode. The adjacent multiple finger parts are connected to one another, and the adjacent multiple finger parts are connected to one another.Type: GrantFiled: May 29, 2015Date of Patent: April 23, 2019Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Hironobu Tsujimoto, Naohiro Hitachi, Masaki Shima, Toshie Kunii, Shingo Okamoto
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Patent number: 10014432Abstract: Provided is a method for manufacturing a solar cell with improved output characteristics. A hydrogen radical treatment, in which ions are not used, is performed on at least one of the first and second semiconductor layers (11, 13).Type: GrantFiled: February 25, 2016Date of Patent: July 3, 2018Assignee: Panasonic Intellectual Property Management Co., Ltd.Inventors: Tomonori Ueyama, Motohide Kai, Masaki Shima
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Patent number: 9818904Abstract: In a processing of immersing substrates in a chemical solution, and agitating the chemical solution by as bubbles or liquid, the gas bubbles or liquid is supplied so as to bring about alternate occurrence of a first state and a second state. The first state is a state in which an amount of the gas bubbles or the liquid supplied to first side in one direction of each substrate is greater than an amount of the gas bubbles or the liquid supplied to a second side in the one direction of the substrate. The second state is a state in which the amount of the gas bubbles or the liquid supplied to the first side in the one direction of the substrate is smaller than the amount of the gas bubbles or the liquid supplied to the second side in the one direction of the substrate.Type: GrantFiled: January 7, 2015Date of Patent: November 14, 2017Assignee: Panasonic Intellectual Property Management Co., Ltd.Inventors: Masaki Shima, Shinji Kobayashi
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Publication number: 20160181461Abstract: Provided is a method for manufacturing a solar cell with improved output characteristics. A hydrogen radical treatment, in which ions are not used, is performed on at least one of the first and second semiconductor layers (11, 13).Type: ApplicationFiled: February 25, 2016Publication date: June 23, 2016Applicant: Panasonic Intellectual Property Management Co., Ltd.Inventors: Tomonori UEYAMA, Motohide KAI, Masaki SHIMA
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Publication number: 20150263194Abstract: A solar cell has multiple busbar electrodes formed at intervals and multiple finger electrodes formed between the busbar electrodes. The finger electrodes comprise multiple finger parts connected only to one busbar electrode and multiple finger parts connected to only another busbar electrode. The adjacent multiple finger parts are connected to one another, and the adjacent multiple finger parts are connected to one another.Type: ApplicationFiled: May 29, 2015Publication date: September 17, 2015Inventors: Hironobu TSUJIMOTO, Naohiro HITACHI, Masaki SHIMA, Toshie KUNII, Shingo OKAMOTO
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Publication number: 20150125986Abstract: In a processing of immersing substrates in a chemical solution, and agitating the chemical solution by as bubbles or liquid, the gas bubbles or liquid is supplied so as to bring about alternate occurrence of a first state and a second state. The first state is a state in which an amount of the gas bubbles or the liquid supplied to first side in one direction of each substrate is greater than an amount of the gas bubbles or the liquid supplied to a second side in the one direction of the substrate. The second state is a state in which the amount of the gas bubbles or the liquid supplied to the first side in the one direction of the substrate is smaller than the amount of the gas bubbles or the liquid supplied to the second side in the one direction of the substrate.Type: ApplicationFiled: January 7, 2015Publication date: May 7, 2015Inventors: Masaki SHIMA, Shinji KOBAYASHI
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Patent number: 8957351Abstract: In a catalytic CVD equipment, a holder includes an antireflective structure for preventing reflection of a radiant ray that is ejected from the catalytic wire toward the side of the substrate.Type: GrantFiled: March 30, 2012Date of Patent: February 17, 2015Assignees: SANYO Electric Co., Ltd., ULVAC, Inc.Inventors: Masaki Shima, Yoshinori Wakamiya, Shuji Osono, Satohiro Okayama, Hideyuki Ogata
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Patent number: 8835196Abstract: The purpose of the present invention is to favorably modify a transparent conductive film and provide a transparent conductive film with few grain boundaries. In the manufacturing method for the transparent conductive film of the present invention, a transparent conductive film 3 is formed on a substrate 2 inside a vacuum chamber 10, after which radiant heat is imparted from a surface modifying device 4 arranged near the substrate 2 to modify the transparent conductive film 3, and the substrate 2 having the modified transparent conductive film 3 is removed from the vacuum chamber 10.Type: GrantFiled: September 17, 2013Date of Patent: September 16, 2014Assignee: SANYO Electric Co., Ltd.Inventor: Masaki Shima
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Patent number: 8835210Abstract: The present invention reduces the time required to manufacture a solar cell. After etching main surfaces (10B1, 10B2) of a crystalline silicon substrate (10B) using one etching solution, the main surfaces (10B1, 10B2) of the crystalline silicon substrate (10B) are etched at a lower etching rate than the etching performed using the one etching solution by using another etching solution that has a higher concentration of etching components than the one etching solution. In this way, a textured structure is formed in the main surfaces (10B1, 10B2) of the crystalline silicon substrate (10B).Type: GrantFiled: November 27, 2013Date of Patent: September 16, 2014Assignee: Sanyo Electric Co., Ltd.Inventors: Takuo Nakai, Naoki Yoshimura, Masaki Shima
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Publication number: 20140162394Abstract: Provided is a method for manufacturing a solar cell with improved output characteristics. A hydrogen radical treatment, in which ions are not used, is performed on at least one of the first and second semiconductor layers (11, 13).Type: ApplicationFiled: November 26, 2013Publication date: June 12, 2014Applicant: SANYO ELECTRIC CO., LTD.Inventors: Motohide Kai, Tomonori Ueyama, Masaki Shima
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Publication number: 20140080246Abstract: The present invention reduces the time required to manufacture a solar cell. After etching main surfaces (10B1, 10B2) of a crystalline silicon substrate (10B) using one etching solution, the main surfaces (10B1, 10B2) of the crystalline silicon substrate (10B) are etched at a lower etching rate than the etching performed using the one etching solution by using another etching solution that has a higher concentration of etching components than the one etching solution. In this way, a textured structure is formed in the main surfaces (10B1, 10B2) of the crystalline silicon substrate (10B).Type: ApplicationFiled: November 27, 2013Publication date: March 20, 2014Applicant: Sanyo Electric Co., Ltd.Inventors: Takuo Nakai, Naoki Yoshimura, Masaki Shima
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Publication number: 20140073083Abstract: A manufacturing method for a solar cell having improved output characteristics is provided. After forming a p-side transparent conductive oxide layer (15), an n-side transparent conductive oxide layer (16) is formed.Type: ApplicationFiled: November 21, 2013Publication date: March 13, 2014Applicant: Sanyo Electric Co., Ltd.Inventors: Masaki Shima, Yoshihiro Matsubara
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Publication number: 20140017849Abstract: The purpose of the present invention is to favorably modify a transparent conductive film and provide a transparent conductive film with few grain boundaries. In the manufacturing method for the transparent conductive film of the present invention, a transparent conductive film 3 is formed on a substrate 2 inside a vacuum chamber 10, after which radiant heat is imparted from a surface modifying device 4 arranged near the substrate 2 to modify the transparent conductive film 3, and the substrate 2 having the modified transparent conductive film 3 is removed from the vacuum chamber 10.Type: ApplicationFiled: September 17, 2013Publication date: January 16, 2014Applicant: Sanyo Electric Co., Ltd.Inventor: Masaki Shima
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Patent number: 8513047Abstract: In accordance with the present invention, the dividing grooves 8 are formed so as not to be parallel to cleavage planes of the semiconductor substrate 1, and the semiconductor substrate 1 is bent along the dividing grooves 8, whereby the semiconductor substrate 1 is fractured along the dividing grooves 8.Type: GrantFiled: November 29, 2012Date of Patent: August 20, 2013Assignee: Sanyo Electric Co., Ltd.Inventors: Hiroyuki Kannou, Masaki Shima
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Patent number: 8389320Abstract: In accordance with the present invention, the dividing grooves 8 are formed so as not to be parallel to cleavage planes of the semiconductor substrate 1, and the semiconductor substrate 1 is bent along the dividing grooves 8, whereby the semiconductor substrate 1 is fractured along the dividing grooves 8.Type: GrantFiled: March 12, 2008Date of Patent: March 5, 2013Assignee: Sanyo Electric Co., Ltd.Inventors: Hiroyuki Kannou, Masaki Shima
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Patent number: 8383927Abstract: A back metal electrode, a bottom cell using microcrystalline silicon for a photoelectric conversion layer, a front cell using amorphous silicon for a photoelectric conversion layer, and a transparent front electrode are formed in this order on a supporting substrate. At least one of the concentration of impurities contained in the front photoelectric conversion layer and the concentration of impurities contained in the bottom photoelectric conversion layer is controlled such that the concentration of impurities in the bottom photoelectric conversion layer is higher than the concentration of impurities in the front photoelectric conversion layer. Impurities do not include a p-type dopant or an n-type dopant but are any one, two, or all of carbon, nitrogen, and oxygen.Type: GrantFiled: November 18, 2011Date of Patent: February 26, 2013Assignee: SANYO Electric Co., Ltd.Inventors: Masaki Shima, Kunimoto Ninomiya
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Patent number: 8263859Abstract: An aspect of the present invention provides a stacked photovoltaic device that comprises a first power generating unit including a first semiconductor layer made of a substantially intrinsic non-single crystal semiconductor layer which functions as a photoelectric conversion layer; and a second power generating unit formed above the first power generating unit, the second power generating unit including a second semiconductor layer made of a substantially intrinsic non-crystalline semiconductor layer which functions as a photoelectric conversion layer. In the stacked photovoltaic device, a first density of an element mainly constituting the first semiconductor layer of the first power generating unit is lower than a second density of an element mainly constituting the second semiconductor layer of the second power generating unit.Type: GrantFiled: April 27, 2006Date of Patent: September 11, 2012Assignee: SANYO Electric Co., Ltd.Inventor: Masaki Shima
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Publication number: 20120190149Abstract: In a catalytic CVD equipment, a holder includes an antireflective structure for preventing reflection of a radiant ray that is ejected from the catalytic wire toward the side of the substrate.Type: ApplicationFiled: March 30, 2012Publication date: July 26, 2012Applicants: ULVAC, INC., SANYO ELECTRIC CO., LTD.Inventors: Masaki SHIMA, Yoshinori WAKAMIYA, Shuji OSONO, Satohiro OKAYAMA, Hideyuki OGATA
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Publication number: 20120060893Abstract: A back metal electrode, a bottom cell using microcrystalline silicon for a photoelectric conversion layer, a front cell using amorphous silicon for a photoelectric conversion layer, and a transparent front electrode are formed in this order on a supporting substrate. At least one of the concentration of impurities contained in the front photoelectric conversion layer and the concentration of impurities contained in the bottom photoelectric conversion layer is controlled such that the concentration of impurities in the bottom photoelectric conversion layer is higher than the concentration of impurities in the front photoelectric conversion layer. Impurities do not include a p-type dopant or an n-type dopant but are any one, two, or all of carbon, nitrogen, and oxygen.Type: ApplicationFiled: November 18, 2011Publication date: March 15, 2012Applicant: SANYO ELECTRIC CO., LTD.Inventors: Masaki SHIMA, Kunimoto NINOMIYA