Patents by Inventor Masao Tomikawa

Masao Tomikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composition of positive photosensitive resin precursor, and display device thereof
    Publication number: 20020090564
    Abstract: A composition of a positive photosensitive resin precursor includes (a) a polyamic acid ester and/or a polyamic acid each having at least one selected from a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group and a thiol group at the end of a principal chain of the polymer, (b) a compound having a phenolic hydroxyl group, and (c) a quinonediazide sulfnate. The composition can be subjected to dissolution in an alkaline developer.
    Type: Application
    Filed: November 1, 2001
    Publication date: July 11, 2002
    Inventors: Mitsuhito Suwa, Kazuto Miyoshi, Masao Tomikawa