Patents by Inventor Masashi Kume
Masashi Kume has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11807747Abstract: The present invention provides a fiber for artificial hair and a hair decorating product having superior combing property. A fiber for artificial hair includes vinyl chloride based resin, vinyl based copolymer, and vinyl chloride based acrylic graft copolymer.Type: GrantFiled: April 9, 2019Date of Patent: November 7, 2023Assignee: Denka Company LimitedInventors: Atsushi Horihata, Masamich Kanaoka, Atsushi Takei, Masashi Kume
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Patent number: 11432607Abstract: A polyvinyl chloride-based fiber for artificial hair that has excellent low glossiness and grip performance when woven and can be stably spun.Type: GrantFiled: May 23, 2018Date of Patent: September 6, 2022Assignee: DENKA COMPANY LIMITEDInventors: Takuya Akahane, Masamichi Kanaoka, Masashi Kume
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Publication number: 20210246294Abstract: A fiber for artificial hair, the fiber containing 50 parts by mass or more and 95 parts by mass or less of a vinyl chloride-based resin and 5 parts by mass or more and 50 parts by mass or less of a vinyl-based copolymer resin, in which the vinyl-based copolymer resin contains 60% by mass or more and less than 70% by mass of a styrene-based monomer unit and more than 30% by mass and 40% by mass or less of an acrylonitrile-based monomer unit on the basis of the entire vinyl-based copolymer resin.Type: ApplicationFiled: March 18, 2019Publication date: August 12, 2021Applicant: DENKA COMPANY LIMITEDInventors: Atsushi HORIHATA, Masamichi KANAOKA, Masashi KUME, Atsushi TAKEI
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Publication number: 20210171754Abstract: The present invention provides a fiber for artificial hair and a hair decorating product having superior combing property. A fiber for artificial hair includes vinyl chloride based resin, vinyl based copolymer, and vinyl chloride based acrylic graft copolymer.Type: ApplicationFiled: April 9, 2019Publication date: June 10, 2021Applicant: Denka Company LimitedInventors: Atsushi HORIHATA, Masamich KANAOKA, Atsushi TAKEI, Masashi KUME
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Publication number: 20200077725Abstract: A polyvinyl chloride-based fiber for artificial hair that has excellent low glossiness and grip performance when woven and can be stably spun.Type: ApplicationFiled: May 23, 2018Publication date: March 12, 2020Applicant: DENKA COMPANY LIMITEDInventors: Takuya AKAHANE, Masamichi KANAOKA, Masashi KUME
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Patent number: 9267059Abstract: After an adhesive sheet is pasted on a semiconductor wafer, an adhesive of the sheet increases tight attachment to the semiconductor wafer because wetting spreads over time. Due to this, at the time of peeling the adhesive sheet from the ground semiconductor wafer, the semiconductor wafer used to be damaged. This phenomenon is likely to occur for a thinner semiconductor wafer. The present invention resides in an adhesive sheet including a substrate and an adhesive layer disposed on the substrate. The substrate is formed of an ethylene/vinyl acetate copolymer having a vinyl acetate content of 10% by mass or less. The adhesive layer contains 100 parts by mass of a (meth)acrylate ester copolymer, 1 to 10 parts by mass of a cross-linker, 0.05 to 5 parts by mass of a silicone compound. The (meth)acrylate ester copolymer is formed of a copolymer produced by polymerizing a (meth)acrylate ester monomer and a functional-group-containing monomer.Type: GrantFiled: May 31, 2010Date of Patent: February 23, 2016Assignee: DENKA COMPANY LIMITEDInventors: Masashi Kume, Tomomichi Takatsu
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Patent number: 8764933Abstract: Provided is a adhesive and an adhesive sheet which exhibit excellent chip-holding properties during dicing and from which chips can be easily stripped during pick up, even when considering changes over time. It is a adhesive composition which contains both (A) a (meth)acrylic acid ester copolymer component that has functional-group containing monomer units and a weight average molecular weight of less than 350,000 and (B) a (meth)acrylic ester copolymer component that has functional-group containing monomer units and a weight average molecular weight of 350,000 to 2,000,000 at a weight ratio of 10:90 to 90:10, and further contains 0.5 to 20 parts by mass of a crosslinking agent per 100 parts by mass of components (A) and (B) in total, the crosslinking agent being a crosslinking agent that reacts with both the functional groups of the component (A) and the functional groups of the component (B).Type: GrantFiled: February 9, 2010Date of Patent: July 1, 2014Assignee: Denki Kagaku Kogyo Kabushiki KaishaInventors: Tomomichi Takatsu, Masashi Kume
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Patent number: 8651919Abstract: An adhesive sheet comprising a sheetlike base material and, superimposed on one major surface thereof, an adhesive layer, wherein the average surface roughness on one major surface of the base material is in the range of 0.1 to 3.5 ?m and on the other major surface thereof is in the range of 0.05 to 0.7 ?m. In this structure, the average surface roughness values on both the major surfaces of the base material as a constituent of the adhesive sheet are regulated so as to fall within respective specified ranges, so that not only can any blocking occurring in backwinding of reeled adhesive sheet be inhibited but also any occurrence of minute unevenness (waving) on the wafer surface after grinding can be inhibited, and further that the transparency of the adhesive sheet can be maintained.Type: GrantFiled: August 30, 2007Date of Patent: February 18, 2014Assignee: Denki Kagaku Kogyo Kabushiki KaishaInventors: Masanobu Kutsumi, Masashi Kume
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Publication number: 20120052772Abstract: After an adhesive sheet is pasted on a semiconductor wafer, an adhesive of the sheet increases tight attachment to the semiconductor wafer because wetting spreads over time. Due to this, at the time of peeling the adhesive sheet from the ground semiconductor wafer, the semiconductor wafer used to be damaged. This phenomenon is likely to occur for a thinner semiconductor wafer. The present invention resides in an adhesive sheet including a substrate and an adhesive layer disposed on the substrate. The substrate is formed of an ethylene/vinyl acetate copolymer having a vinyl acetate content of 10% by mass or less. The adhesive layer contains 100 parts by mass of a (meth)acrylate ester copolymer, 1 to 10 parts by mass of a cross-linker, 0.05 to 5 parts by mass of a silicone compound. The (meth)acrylate ester copolymer is formed of a copolymer produced by polymerizing a (meth)acrylate ester monomer and a functional-group-containing monomer.Type: ApplicationFiled: May 31, 2010Publication date: March 1, 2012Inventors: Masashi Kume, Tomomichi Takatsu
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Publication number: 20120000599Abstract: Provided is a adhesive and an adhesive sheet which exhibit excellent chip-holding properties during dicing and from which chips can be easily stripped during pick up, even when considering changes over time. It is a adhesive composition which contains both (A) a (meth)acrylic acid ester copolymer component that has functional-group containing monomer units and a weight average molecular weight of less than 350,000 and (B) a (meth)acrylic ester copolymer component that has functional-group containing monomer units and a weight average molecular weight of 350,000 to 2,000,000 at a weight ratio of 10:90 to 90:10, and further contains 0.5 to 20 parts by mass of a crosslinking agent per 100 parts by mass of components (A) and (B) in total, the crosslinking agent being a crosslinking agent that reacts with both the functional groups of the component (A) and the functional groups of the component (B).Type: ApplicationFiled: February 9, 2010Publication date: January 5, 2012Applicant: DENKI KAGAKU KOGYO KABUSHIKI KAISHAInventors: Tomomichi Takatsu, Masashi Kume
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Publication number: 20110059682Abstract: An adhesive sheet comprising a sheetlike base material and, superimposed on one major surface thereof, an adhesive layer, wherein the average surface roughness on one major surface of the base material is in the range of 0.1 to 3.5 ?m and on the other major surface thereof is in the range of 0.05 to 0.7 ?m. In this structure, the average surface roughness values on both the major surfaces of the base material as a constituent of the adhesive sheet are regulated so as to fall within respective specified ranges, so that not only can any blocking occurring in backwinding of reeled adhesive sheet be inhibited but also any occurrence of minute unevenness (waving) on the wafer surface after grinding can be inhibited, and further that the transparency of the adhesive sheet can be maintained.Type: ApplicationFiled: August 30, 2007Publication date: March 10, 2011Applicant: DENKI KAGAKU KOGYO KABUSHIKI KAISHAInventors: Masanobu Kutsumi, Masashi Kume