Abstract: The invention provides a block copolymerization polyimide composition comprising a block copolymerization polyimide obtained by heating a tetracarboxylic dianhydride and a diamine in at least one solvent selected from a ketone, an ether and an ester and in the presence of a catalyst generated from a lactone and a base, a positive type block copolymerization polyimide composition or ink containing a photooxygenation agent, and processes of producing them. The block copolymerization polyimide composition of the invention is never whitened even in the air.

Abstract: There is provided a photosensitive composition suitable for a resist material. This photosensitive composition has a high sensitivity and a high resolution with respect to a light source having a short wavelength, does not cause a phase separation in a film state, and makes it possible to stably form fine resist patterns. The photosensitive composition contains a polymer obtained by protecting an alkali-soluble group of an alkali-soluble polymer by a group which is unstable with respect to an acid, a compound which generates an acid upon being irradiated with light, at least one compound which is selected from the group consisting of an imidazole compound, an alanine compound, an adenine compound, an adenosine compound, and a quaternary ammonium salt compound, and which increases miscibility in a resist film, and a phenol compound.

Abstract: A radiation-sensitive layer comprising as a main component a radiation-sensitive composition containing a compound capable of generating an acid when exposed to a chemical radiation and a compound having at least one linkage decomposable by an acid is formed on a substrate. An acidic coating layer is formed on the radiation-sensitive layer. The radiation-sensitive layer and the acidic coating layer are pattern-exposed to a chemical radiation. The radiation-sensitive layer and the acidic coating layer are baked and developed by using an aqueous alkaline solution to obtain a pattern comprising lines and spaces, each having a predetermined width. A fine pattern of a rectangular sectional shape can be formed without producing eaves caused by a surface inhibition layer layer, which is produced on the film surface.

Abstract: A solder resist composition contains a specified partially acrylated and/or methacrylated bisphenol A novolak epoxy resin component, and a specified partially acrylated and/or methacrylated cresol novolak and/or phenol novolak epoxy resin component. The composition further contain a photopolymerization initiator, a thermosetting agent, an inorganic filler, and an organic solvent. The composition may further include a silane or titanate coupling agent.

Abstract: A solder resist ink composition is disclosed which contains a photo-curable resin obtained by causing an unsaturated monocarboxylic acid to react with a cresolnovolak- or phenolnovolak-type epoxy resin, and causing a polybasic carboxylic anhydride to react with the resultant reaction product, a photo-curable resin obtained by causing an unsaturated monocarboxylic acid to react with a bisphenol A novolak- or cycloaliphatic oxirane novolak-type opoxy resin, and causing a polybasic carboxylic anhydride to react with the resultant reaction product, at least one photo-polymerizable compound selected from photo-polymerizable monomers, a photo-polymerization initiator, an organic solvent, and an inorganic filler. Also disclosed are two other solder resist ink compositions each having a different photo-curable component.

Abstract: A photosensitive resin composition contains a co-polymer of a glycidyl (meth)acrylate or glycidyl (.alpha.-methyl)vinyl ether with a (meth)acrylic amide or ester having a quaternary ammonium salt structure, and an aromatic azide as a photosensitizer. A color filter can be prepared by coating the composition on a substrate, and exposing and developing the coated composition to form a pattern. The resultant pattern is then dyed.

Abstract: A color imaging device includes a solid state image sensor formed with a plurality of picture elements in a two dimensional array. A color filter array has filter portions in one-to-one correspondence with the picture elements. The filter portions are formed as lenses to provide a focusing effect. These lenses can include cyan focusing color filter portions, yellow focusing color filter portions, and full-color light-transmitting focusing color filter portions. All of these filter portions focus incident light using a lens effect onto respective elements on the solid state image sensor. In one embodiment, protective layers are located between filter parts. Other embodiments use tannic acid in their formation. In this way, inaccuracies in color signal separation are minimized.

Abstract: A positive image-forming material consisting of a methylpentene homopolymer or a methylpentene copolymer containing 50 mole percent or more of methylpentene units which has an intrinsic viscosity of not less than 0.2 dl/g as measured in decalin at 135.degree. C. and being soluble in not more than 100 times by weight of cyclohexene at 25.degree. C.

Abstract: An electrochromic display device includes a transparent first electrode and a second electrode opposing said first electrode to be spaced apart therefrom. An electrochromic layer is formed in a space formed between the first and second electrodes so as to be in contact with the first electrode. The electrochromic layer is formed of certain naphthalene derivatives, certain tetracene derivatives or certain fulvalene derivatives. An ionic conductor layer is formed in the space so as to be in contact with the electrochromic layer.

Abstract: Disclosed is an electrochromic display element having an electrochromic material layer and an ion-conductive material layer being in contact therewith, characterized in that said electrochromic layer comprises a transition metal oxide and said ion-conductive material layer comprises a light-transmissive organic polymeric resin and an inorganic ion-conductive material.

Abstract: Disclosed are organic photoconductive compositions for use in electrophotography, comprising a polymer containing as main units a naphthalene derivative and/or a naphthacene derivative; and an electron acceptor and/or a sensitizer.

Abstract: A radiation-sensitive layer comprising as a main component a radiation-sensitive composition containing a compound capable of generating an acid when exposed to a chemical radiation and a compound having at least one linkage decomposable by an acid is formed on a substrate. An acidic coating layer is formed on the radiation-sensitive layer. The radiation-sensitive layer and the acidic coating layer are pattern-exposed to a chemical radiation. The radiation-sensitive layer and the acidic coating layer are baked and developed by using an aqueous alkaline solution to obtain a pattern comprising lines and spaces, each having a predetermined width. A fine pattern of a rectangular sectional shape can be formed without producing eaves caused by a surface inhibition layer layer, which is produced on the film surface.