Patents by Inventor Masatomo KITA

Masatomo KITA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220277981
    Abstract: According to an aspect of the present disclosure, there is provided a transfer system comprising a transfer robot configured to transfer a transfer target object by an end effector based on an operation instruction, and a controller configured to output the operation instruction to the transfer robot, wherein at least any one of the end effector and the transfer target object has at least any one of a sensor and a camera, the controller calculates a relative position between the end effector and the transfer target object based on at least any one of a detected result of the sensor and a captured result of the camera, and the controller determines a teaching position of the end effector with respect to the transfer target object based on the relative position, and outputs the operation instruction to the transfer robot such that the end effector is disposed at the teaching position.
    Type: Application
    Filed: February 25, 2022
    Publication date: September 1, 2022
    Applicant: Tokyo Electron Limited
    Inventors: Norihiko AMIKURA, Toshiaki TOYOMAKI, Masatomo KITA
  • Publication number: 20220243336
    Abstract: A storage container for accommodating an annular member having a notch on at least one of an outer circumference and an inner circumference thereof is disclosed. The storage container comprises a base plate on which the annular member is placed. The base plate comprises a plurality of guide pins that protrude from the base plate and are configured to position the annular member. The plurality of guide pins include a pin engaged with the notch.
    Type: Application
    Filed: February 1, 2022
    Publication date: August 4, 2022
    Applicant: Tokyo Electron Limited
    Inventors: Norihiko AMIKURA, Masatomo KITA, Toshiyuki MAKABE
  • Publication number: 20220230898
    Abstract: Embodiments of this application discloses a substrate processing apparatus comprising: a vacuum transfer module having a vacuum transfer space and an opening; a wall unit attached to the opening and including a first gate valve and a second gate valve; a substrate processing module attached to the wall unit and having a substrate processing space communicating with the vacuum transfer space via the first gate valve; and a ring stocker attached to the wall unit and having a storage space for storing at least one annular member used in a plasma processing module. Moreover, the apparatus further includes a transfer mechanism disposed in the vacuum transfer space and transfers a substrate between the vacuum transfer space and the substrate processing space through the first gate valve and also transfers at least one annular member between the vacuum transfer space and the storage space via the second gate valve.
    Type: Application
    Filed: January 17, 2022
    Publication date: July 21, 2022
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Masahiro DOGOME, Masatomo KITA
  • Publication number: 20220208576
    Abstract: A substrate processing apparatus includes one or more substrate processing modules; a vacuum transfer module connected to the one or more substrate processing modules; and a load-lock module including at least three load-lock chambers arranged along a first horizontal direction. A tubular fitting module is disposed between the vacuum transfer module and the load-lock module, and the tubular fitting module has a first opening and a second opening. The first opening is connected to the load-lock module, and the second opening is connected to the vacuum transfer module. The first opening has a first length in the first horizontal direction, the second opening has a second length in the first horizontal direction, and the first length is larger than the second length. A transfer mechanism transfers a substrate between the one or more substrate processing modules and the load-lock module through the tubular fitting module.
    Type: Application
    Filed: December 28, 2021
    Publication date: June 30, 2022
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Masahiro DOGOME, Masatomo KITA
  • Publication number: 20220208574
    Abstract: A transfer apparatus includes a first vacuum transfer module; a first transfer robot disposed in the first vacuum transfer module and at least one ring. In addition, a second vacuum transfer module is provided; and a second transfer robot is disposed in the second vacuum transfer module. A tubular connecting module is disposed between the first vacuum transfer module and the second vacuum transfer module. Further, the first vacuum transfer module, the second vacuum transfer module and the tubular connecting module are arranged along a first direction, with the tubular connecting module having a first length in the first direction, and the first length is smaller than the diameter of the wafer. A wafer support is rotatably attached to the tubular connecting module and at least three ring supporting members outwardly extend from the wafer support to support the at least one ring.
    Type: Application
    Filed: December 28, 2021
    Publication date: June 30, 2022
    Applicant: Tokyo Electron Limited
    Inventors: Masahiro Dogome, Masatomo Kita
  • Publication number: 20220148857
    Abstract: There is provided a detection device for detecting position misalignment of an object to be transferred with respect to a transfer mechanism. The detection device comprises: an image sensor configured to capture images including the transfer mechanism and the object to be transferred which is held by the transfer mechanism; and a calculation unit configured to calculate an amount of position misalignment including misalignment in a horizontal direction and a rotational direction of the object to be transferred based on the images captured by the image sensor.
    Type: Application
    Filed: November 12, 2021
    Publication date: May 12, 2022
    Applicant: Tokyo Electron Limited
    Inventors: Norihiko AMIKURA, Masatomo KITA
  • Publication number: 20220130695
    Abstract: There is provided a processing system. The processing system comprises: a chamber in which a consumable member is installed; a storage module configured to store the consumable member; a position detection sensor configured to detect a position of the consumable member; a vacuum transfer module connected to the chamber and the storage module, the vacuum transfer module having a transfer robot configured to transfer the consumable member between the chamber and the storage module; and a controller.
    Type: Application
    Filed: October 26, 2021
    Publication date: April 28, 2022
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Norihiko Amikura, Masatomo Kita
  • Publication number: 20220080476
    Abstract: A substrate processing apparatus is disclosed. The apparatus comprises a vacuum transfer chamber including a top surface, a bottom surface, and side surfaces between the top and the bottom surfaces, including a first side surface and a second side surface opposite to the first side surface; a transfer robot, disposed in the vacuum transfer chamber, for transfering a substrate; a load lock module connected to the first side surface; a pipe, connected to a purge gas supply source, for supplying a purge gas into the vacuum transfer chamber; one or more gas ports provided in the top surface in the vicinity of the second side surface and connected to the pipe; and one or more exhaust ports, provided in the bottom surface in the vicinity of the first side surface, to which an exhaust pump for exhausting the purge gas supplied into the vacuum transfer chamber is connected.
    Type: Application
    Filed: September 17, 2021
    Publication date: March 17, 2022
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Norihiko AMIKURA, Hideyuki OSADA, Genichi NANASAKI, Seiichi KAISE, Masatomo KITA, Takashi TAKIZAWA, Eiji TAKAHASHI
  • Publication number: 20220068689
    Abstract: A transfer apparatus includes a transfer arm, an irradiator, a light receiver, and a controller. The transfer arm transfers the member. The irradiator irradiates light obliquely onto a passage area, through which the member passes, when the member is transferred by the transfer arm. The light receiver receives the light, which is irradiated from the irradiator and reflected from the member, when the member passes through the passage area. The controller determines whether the member has passed through the passage area according to whether the light irradiated from the irradiator is received by the light receiver.
    Type: Application
    Filed: August 31, 2021
    Publication date: March 3, 2022
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Norihiko AMIKURA, Masatomo KITA
  • Publication number: 20220051928
    Abstract: A transfer device for simultaneously or separately transferring a wafer and a consumable part having a circular shape is disclosed. The consumable part is disposed in a wafer processing module, and the outer diameter of the consumable part is larger than the outer diameter of the wafer. The transfer device comprises an end effector configured to place the wafer and the consumable part thereon simultaneously or separately, an arm configured to move the end effector, and a controller configured to control the arm, to place the consumable part on the end effector such that the center of gravity of the consumable part coincides with a first position when transferring the consumable part, and to place the wafer on the end effector such that the center of gravity of the wafer coincides with a second position between the first position and front ends of the end effector when transferring the wafer.
    Type: Application
    Filed: August 16, 2021
    Publication date: February 17, 2022
    Applicant: Tokyo Electron Limited
    Inventors: Norihiko AMIKURA, Masatomo KITA, Masahiro DOGOME, Takami FUKASAWA, Daisuke HAYASHI, Toshiaki TOYOMAKI
  • Publication number: 20210398838
    Abstract: A storage module includes a substrate support, a sensor, a rotating unit, a storage unit and an elevating unit. The substrate support has a consumable member thereon. The sensor detects an orientation of the consumable member. The rotating unit rotates the consumable member in a predetermined direction based on the orientation of the consumable member detected by the sensor. The storage unit is disposed below the substrate support to store the consumable member. The elevating unit vertically moves the storage unit.
    Type: Application
    Filed: June 18, 2021
    Publication date: December 23, 2021
    Applicant: Tokyo Electron Limited
    Inventors: Norihiko AMIKURA, Masatomo KITA
  • Publication number: 20210287927
    Abstract: A substrate processing system includes a substrate processing module, an atmospheric substrate transfer module, a first and a second vacuum substrate transfer module, a load lock module, and a vacuum substrate transfer robot. The first vacuum substrate transfer module having a first transfer space is disposed adjacent to the atmospheric substrate transfer module and the substrate processing module. The second vacuum substrate transfer module, having a second transfer space in communication with the first transfer space and external dimensions smaller than those of the first vacuum substrate transfer module in a plan view, is disposed on or under the first vacuum substrate transfer module. The load lock module is disposed between the atmospheric substrate transfer module and the second vacuum substrate transfer module. The vacuum substrate transfer robot is disposed in the first transfer space or the second transfer space to transfer a substrate.
    Type: Application
    Filed: March 8, 2021
    Publication date: September 16, 2021
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Norihiko AMIKURA, Masatomo KITA
  • Publication number: 20210280441
    Abstract: A substrate transfer system includes an atmospheric substrate transfer module, a vacuum substrate transfer module, and a load lock module disposed on a side surface of the atmospheric substrate transfer module and disposed on an upper surface or a lower surface of the vacuum substrate transfer module. The load lock module includes a container having a first substrate transfer opening and a second substrate transfer opening, a first gate configured to open or close the first substrate transfer opening, a second gate configured to open or close the second substrate transfer opening, and a substrate actuator configured to vertically move a substrate through the second substrate transfer opening between a first position in the container and a second position in the vacuum substrate transfer module.
    Type: Application
    Filed: March 8, 2021
    Publication date: September 9, 2021
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Norihiko AMIKURA, Masahiro DOGOME, Masatomo KITA
  • Patent number: 10643825
    Abstract: A particle generation preventing method for preventing particle generation in a vacuum apparatus including an alumite-treated component is provided. The particle generation preventing method includes an evacuation step of evacuating the vacuum apparatus to reduce a pressure within the vacuum apparatus to less than or equal to 1.3×10?1 Pa (1 mTorr), a pressure increasing step of increasing the pressure within the vacuum apparatus to atmospheric pressure after the evacuation step, and a moisture adhesion step of causing moisture to be adhered to the alumite-treated component after the pressure increasing step.
    Type: Grant
    Filed: October 4, 2018
    Date of Patent: May 5, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Takashi Tetsuka, Hiroshi Nagaike, Masatomo Kita, Chihiro Sato, Naoya Suenaga
  • Publication number: 20190108987
    Abstract: A particle generation preventing method for preventing particle generation in a vacuum apparatus including an alumite-treated component is provided. The particle generation preventing method includes an evacuation step of evacuating the vacuum apparatus to reduce a pressure within the vacuum apparatus to less than or equal to 1.3×10?1 Pa (1 mTorr), a pressure increasing step of increasing the pressure within the vacuum apparatus to atmospheric pressure after the evacuation step, and a moisture adhesion step of causing moisture to be adhered to the alumite-treated component after the pressure increasing step.
    Type: Application
    Filed: October 4, 2018
    Publication date: April 11, 2019
    Inventors: Takashi TETSUKA, Hiroshi NAGAIKE, Masatomo KITA, Chihiro SATO, Naoya SUENAGA