Patents by Inventor Masatoshi Arai

Masatoshi Arai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10324377
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component which exhibits changed solubility in a developing solution under action of acid and an acid diffusion control agent, the base component including a structural unit represented by general formula (a0-1) shown below in which R represents H, C1-C5 alkyl group or C1-C5 halogenated alkyl group; Ya represents C; Xa represents a group which forms a divalent cyclic hydrocarbon group with Ya; Ra01 to Ra03 represents H, C1-C10 monovalent saturated chain hydrocarbon group or C3-C20 monovalent saturated cyclic hydrocarbon group; the acid diffusion control agent containing an acid which exhibits an acid dissociation constant of 1.5 or more.
    Type: Grant
    Filed: June 6, 2016
    Date of Patent: June 18, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Taku Hirayama, Daisuke Kawana, Yoshitaka Komuro, Masatoshi Arai, Shogo Matsumaru, Kenta Suzuki, Takashi Kamizono, Tatsuya Fujii
  • Publication number: 20190163057
    Abstract: A resist composition including a resin component having a structural unit derived form a compound represented by formula (a0-1) (in the formula, W represents a polymerizable group-containing group; Ra01 is a group which is bonded to Ra03 to form an aliphatic cyclic group, or bonded to Ra04 to form an aliphatic cyclic group; Ra02 represents a hydrocarbon group which may have a substituent; Ra03 is a hydrogen atom or a monovalent organic group in the case where Ra01 is not bonded thereto; Ra04 is a hydrogen atom or a monovalent organic group in the case where Ra01 is not bonded thereto; and Ra05 to Ra07 each independently represents a hydrogen atom or a monovalent organic group).
    Type: Application
    Filed: October 29, 2018
    Publication date: May 30, 2019
    Inventors: Takuya IKEDA, Masatoshi ARAI
  • Patent number: 10295905
    Abstract: A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va01 and Va03 are a divalent hydrocarbon group, na01 and na03 each are an integer of 0 to 2, Ra0? is a specific acid dissociable group, Va02 is a divalent linking group containing a hetero atom or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, and na022 is an integer of 1 to 3.
    Type: Grant
    Filed: July 17, 2017
    Date of Patent: May 21, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshitaka Komuro, Masatoshi Arai, Koshi Onishi, KhanhTin Nguyen, Takaya Maehashi
  • Publication number: 20190107779
    Abstract: A resist composition including a resin component having a structural unit derived from a compound represented by formula (a0-1), in which W represents a polymerizable group-containing group; Ra01 represents an alkyl group or an aromatic heterocyclic group containing an oxygen atom or a sulfur atom; in the case where Ra01 is an aromatic heterocyclic group containing an oxygen atom or a sulfur atom, Ra02 is a group which forms an aliphatic cyclic group containing an electron-withdrawing group, together with the tertiary carbon atom (*C) to which Ra01 is bonded; and when Ra01 is an alkyl group, Ra02 is a group in which an aliphatic cyclic group containing an electron-withdrawing group forms a condensed ring together with an aromatic heterocyclic group containing an oxygen atom or a sulfur atom.
    Type: Application
    Filed: October 1, 2018
    Publication date: April 11, 2019
    Inventors: Masatoshi ARAI, Takuya IKEDA, Koshi ONISHI
  • Publication number: 20190081030
    Abstract: A semiconductor device includes a first semiconductor region of a first conductivity type, a plurality of second semiconductor regions of a second conductivity type, each comprising a first part, on the first semiconductor region, wherein the second semiconductor regions are spaced apart in a first direction, a third semiconductor region of the first conductivity type on each of the second semiconductor regions, an insulation portion between two of the second semiconductor regions, the insulation portion having one side in contact with one of the first parts and the other side in contact with one of the third semiconductor regions, a first electrode within the insulation portion, a gate electrode spaced apart from the first electrode and within the insulation portion, and a second electrode on the third semiconductor region and electrically connected to the first electrode and the third semiconductor region.
    Type: Application
    Filed: November 13, 2018
    Publication date: March 14, 2019
    Inventors: Hiroaki Katou, Masatoshi Arai, Chikako Yoshioka
  • Patent number: 10100134
    Abstract: A method for manufacturing a polymer compound which has a constituent unit (a10) which includes a hydroxy group and a constituent unit (a1) which includes an acid decomposable group of which a polarity increases due to an effect of an acid, the method including copolymerizing a monomer for deriving a constituent unit (a0) which includes a group which protects a phenolic hydroxyl group or a hydroxy group of a carboxy group with an organic silicon compound and a monomer for deriving the constituent unit (a1) and obtaining a prepolymer which has the constituent unit (a0) and the constituent unit (a1), and selectively deprotecting the constituent unit (a0) by reacting a compound which has a fluoride anion with the prepolymer and obtaining a polymer compound which has the constituent unit (a10) and the constituent unit (a1).
    Type: Grant
    Filed: December 5, 2016
    Date of Patent: October 16, 2018
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Masatoshi Arai, Yoshitaka Komuro, Akiya Kawaue
  • Publication number: 20180240867
    Abstract: According to an embodiment, a semiconductor device includes a semiconductor layer, a first electrode, and a first insulating film. The first electrode extends in a first direction and is provided inside the semiconductor layer. The first insulating film is provided between the semiconductor layer and the first electrode, a thickness of the first insulating film in a direction from the first electrode toward the semiconductor layer increasing in stages along the first direction. The first insulating film has three or more mutually-different thicknesses.
    Type: Application
    Filed: August 30, 2017
    Publication date: August 23, 2018
    Inventors: Shunsuke Nitta, Takeru Matsuoka, Shunsuke Katoh, Masatoshi Arai, Shinya Ozawa, Bungo Tanaka
  • Publication number: 20180149973
    Abstract: A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid, and a compound (B1) having an anion moiety and a cation moiety and being represented by general formula (b1) (wherein R01 to R014 each independently represents a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of R01 to R014 may be mutually bonded to form a ring structure, provided that at least two of R01 to R014 are mutually bonded to form a ring structure, and at least one of R01 to R014 has an anion group, and the anion moiety as a whole forms an anion having a valency of n; n represents an integer of 1 or more; represents an integer of 1 or more; and Mm+ represents an organic cation having a valency of m).
    Type: Application
    Filed: November 27, 2017
    Publication date: May 31, 2018
    Inventors: Masatoshi ARAI, Takaya MAEHASHI, Takuya IKEDA
  • Patent number: 9954055
    Abstract: A semiconductor device includes a layer having first and second surfaces and a first type first region, a second type second region in the layer between the first region and first surface, a first type third region in the layer between the second region and first surface, first and second gate electrodes, wherein the second region is between the first and second gate electrodes, a first field plate electrode between the second surface and first gate electrode, a second field plate electrode between the second surface and second gate electrode, a first film, at least a portion between the first field plate electrode and first region, a second film at least a portion between the second field plate electrode and first region, and a second type fourth region in the first region between the first and second films. A portion of the first region is between second and fourth regions.
    Type: Grant
    Filed: August 29, 2016
    Date of Patent: April 24, 2018
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventors: Kenya Kobayashi, Masatoshi Arai
  • Publication number: 20180102308
    Abstract: In some embodiments, a semiconductor device includes a semiconductor chip including a first terminal, a second terminal and a third terminal, a frame electrically coupled to the second terminal, the frame mounting the semiconductor chip, a first conductor including a chip connection electrically coupled to the first terminal, a first connection connecting to the chip connection and protruding from the chip connection, and a second connection connecting to the chip connection, protruding from the chip connection, and being provided physically spaced from the first connection. The semiconductor device further includes a second conductor electrically coupled to the third terminal.
    Type: Application
    Filed: March 1, 2017
    Publication date: April 12, 2018
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Tatsuya NISHIWAKI, Shunsuke KATOH, Masatoshi ARAI, Chikako YOSHIOKA, Bungo TANAKA, Shinya OZAWA, Takahiro KAWANO
  • Patent number: 9917183
    Abstract: A semiconductor device is provided including a first electrode and a first semiconductor layer of a first conductivity type connected to the first electrode. The semiconductor device further includes a second semiconductor layer of a second conductivity type provided on the first semiconductor layer, a third semiconductor layer of the first conductivity type provided on the second semiconductor layer, and a second electrode provided on the third semiconductor layer. The semiconductor device further includes a third electrode disposed between the first electrode and the second electrode. The semiconductor device further includes a fourth electrode having an upper end connected to the second electrode, where the fourth electrode has a higher resistivity than the second electrode.
    Type: Grant
    Filed: August 5, 2015
    Date of Patent: March 13, 2018
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masatoshi Arai, Yoshitaka Hokomoto, Tatsuya Nishiwaki
  • Publication number: 20180022916
    Abstract: A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, R1 and R2 are each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Va01 is a divalent hydrocarbon group which may have an ether bond, na01 is an integer of 0 to 2, Ra10 is a tertiary alkyl ester-type acid dissociable group, Va02 is a divalent linking group containing a heteroatom, or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, Ra20 is an acid dissociable group, and na022 is an integer of 1 to 3.
    Type: Application
    Filed: July 5, 2017
    Publication date: January 25, 2018
    Inventors: Yoshitaka KOMURO, Masatoshi ARAI, Koshi ONISHI, KhanhTin NGUYEN, Masahiro SHIOSAKI, Takuya IKEDA, Takaya MAEHASHI
  • Publication number: 20180024433
    Abstract: A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va01 and Va03 are a divalent hydrocarbon group, na01 and na03 each are an integer of 0 to 2, Ra0? is a specific acid dissociable group, Va02 is a divalent linking group containing a hetero atom or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, and na022 is an integer of 1 to 3.
    Type: Application
    Filed: July 17, 2017
    Publication date: January 25, 2018
    Inventors: Yoshitaka KOMURO, Masatoshi ARAI, Koshi ONISHI, KhanhTin NGUYEN, Takaya MAEHASHI
  • Patent number: 9829827
    Abstract: A developer container including: a container body that contains developer to be supplied to an apparatus body and is capable of being attached to and removed from the apparatus body, the container body having a discharge port through which the developer is discharged; an opening-and-closing member that opens and closes the discharge port in response to relative attachment and removal of the container body to and from the apparatus body; a first elastic member that is provided so as to surround the discharge port and seals between the container body and the opening-and-closing member; and a second elastic member that comes into contact with a leading end of the opening-and-closing member in a direction in which the opening-and-closing member moves when the discharge port is closed.
    Type: Grant
    Filed: May 5, 2016
    Date of Patent: November 28, 2017
    Assignee: FUJI XEROX CO., LTD.
    Inventors: Masatoshi Arai, Ryoji Kawasaki
  • Patent number: 9778567
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) including a polymeric compound (A1) having a structural unit (a0) represented by general formula (a0-0) shown below (wherein V11 represents an aliphatic cyclic group with or without a substituent; R1 represents a lactam-containing cyclic group or a sultam-containing cyclic group; Y1 represents an oxygen atom (—O—), an ester bond (—C(?O)—O—) or a single bond; and W2 represents a group formed by a polymerization reaction of a polymerizable group-containing group).
    Type: Grant
    Filed: November 13, 2014
    Date of Patent: October 3, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Masatoshi Arai, Yoshiyuki Utsumi
  • Patent number: 9766541
    Abstract: A positive-type resist composition which generates an acid upon exposure and whose solubility in an alkali developing solution increases under the action of an acid, the composition including a base material component whose solubility in an alkali developing solution increases under the action of an acid; and a compound represented by the following general formula (m0): Z01 to Z04 each independently represent a substituent having electron withdrawing properties, Rb21 and Rb22 each independently represent an alkyl group, an alicyclic hydrocarbon group which may have a substituent, or a hydroxyl group, Rb1 represents an aryl group which may have a substituent, an alkyl group, or an alkenyl group, n1 and n2 represent an integer of 0 to 3, and X0? represents an organic anion.
    Type: Grant
    Filed: June 17, 2016
    Date of Patent: September 19, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Hiroto Yamazaki, Yoshitaka Komuro, Masatoshi Arai, Daisuke Kawana, Kenta Suzuki, Tatsuya Fujii
  • Publication number: 20170263699
    Abstract: A semiconductor device includes a layer having first and second surfaces and a first type first region, a second type second region in the layer between the first region and first surface, a first type third region in the layer between the second region and first surface, first and second gate electrodes, wherein the second region is between the first and second gate electrodes, a first field plate electrode between the second surface and first gate electrode, a second field plate electrode between the second surface and second gate electrode, a first film, at least a portion between the first field plate electrode and first region, a second film at least a portion between the second field plate electrode and first region, and a second type fourth region in the first region between the first and second films. A portion of the first region is between second and fourth regions.
    Type: Application
    Filed: August 29, 2016
    Publication date: September 14, 2017
    Inventors: Kenya KOBAYASHI, Masatoshi ARAI
  • Patent number: 9690194
    Abstract: A method of forming a resist pattern using a resist composition containing a base component (A) which exhibits reduced solubility in an organic solvent under action of an acid and an acid-generator component (B) which generates an acid upon exposure, the base component (A) including a resin component (A1) having a structural unit (a0) derived from a compound represented by general formula (a0-1) shown below and a structural unit (a2) containing a lactone-containing cyclic group or the like (in formula (a0-1), Ra1 represents a monovalent substituent having a polymerizable group, La1 represents O, S or a methylene group, R1 represents a linear or branched hydrocarbon group of 2 to 20 carbon atoms which may have a substituent, or a cyclic hydrocarbon group which may have a hetero atom, and n represents an integer of 0 to 5).
    Type: Grant
    Filed: November 25, 2013
    Date of Patent: June 27, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Tsuyoshi Nakamura, Takahiro Dazai, Masatoshi Arai
  • Publication number: 20170166664
    Abstract: A method for manufacturing a polymer compound which has a constituent unit (a10) which includes a hydroxy group and a constituent unit (a1) which includes an acid decomposable group of which a polarity increases due to an effect of an acid, the method including copolymerizing a monomer for deriving a constituent unit (a0) which includes a group which protects a phenolic hydroxyl group or a hydroxy group of a carboxy group with an organic silicon compound and a monomer for deriving the constituent unit (a1) and obtaining a prepolymer which has the constituent unit (a0) and the constituent unit (a1), and selectively deprotecting the constituent unit (a0) by reacting a compound which has a fluoride anion with the prepolymer and obtaining a polymer compound which has the constituent unit (a10) and the constituent unit (a1).
    Type: Application
    Filed: December 5, 2016
    Publication date: June 15, 2017
    Inventors: Masatoshi ARAI, Yoshitaka KOMURO, Akiya KAWAUE
  • Publication number: 20170160673
    Abstract: A developer container including: a container body that contains developer to be supplied to an apparatus body and is capable of being attached to and removed from the apparatus body, the container body having a discharge port through which the developer is discharged; an opening-and-closing member that opens and closes the discharge port in response to relative attachment and removal of the container body to and from the apparatus body; a first elastic member that is provided so as to surround the discharge port and seals between the container body and the opening-and-closing member; and a second elastic member that comes into contact with a leading end of the opening-and-closing member in a direction in which the opening-and-closing member moves when the discharge port is closed.
    Type: Application
    Filed: May 5, 2016
    Publication date: June 8, 2017
    Applicant: FUJI XEROX Co., Ltd.
    Inventors: Masatoshi ARAI, Ryoji KAWASAKI