Abstract: A dry process high sensitivity imaging film includes a solid, high optical density and substantially opaque film of dispersion imaging material deposited on a substrate. The film of dispersion imaging material comprises a plurality of separate layers of different and substantially mutually insoluble metal components having relatively high melting points and relatively low melting point eutectics, and interfaces between said layers having relatively low melting points.

Abstract: An imaging film comprising, as an essential component thereof, an imaging structure formed of a thin layer of a metal, or metal-like, image forming material on which there is provided a thin layer of an energy sensitive material. The imaging structure, in turn, has a coating or layer of a sensitizing material thereon which material comprises a composition formed of a mixture of one, or more, amines, organic halogen compounds and a polymer or copolymer. The sensitizing material acts not only to increase the absolute sensitivity of the basic imaging structure but, also, to extend its spectral sensitivity from essentially the invisible, or ultraviolet light region to the visible light region enabling the imaging film to be used as a primary recording film for the production, for example, of original microfilm having, among other things, uniquely high contrast, resolution and acuity characteristics.

Abstract: An imaging film, and a method of making it, comprising a flexible plastic substrate having a thin, high optical density, continuous layer of bismuth, or an alloy of bismuth, deposited on a surface thereof. The bismuth layer has a roughened outer surface. To this roughened surface a layer of a photoactive material is applied which serves as a photoresist as well as a protective overlayer for the bismuth. The photoactive material may be positive or negative working. A layer of a developable photographic emulsion may be applied to the photoactive material layer to impart camera speed to the imaging film. The photoresist side of the film has a non-shiny, essentially non-reflecting black surface which resembles the appearance of developed silver halide films. The substrate side of the film, on the other hand, has a metallic appearance which is easily distinguishable from the photoresist side. This feature of the film enables an operator to readily ascertain the photoresist side of the film and speeds plate making.