Patents by Inventor Masayuki Shiraishi

Masayuki Shiraishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210370444
    Abstract: A processing apparatus has: a light irradiation apparatus configured to irradiate a coat formed on a base member with a processing light; and a controlling apparatus configured to control the light irradiation apparatus. The processing apparatus is configured to change a thickness of at least a part of the coat by irradiating the coat with the processing light so that the base member is not exposed from the coat.
    Type: Application
    Filed: October 25, 2017
    Publication date: December 2, 2021
    Applicant: NIKON CORPORATION
    Inventors: Masayuki SHIRAISHI, Shigeki EGAMI, Yosuke TATSUZAKI, Yuichi SHIBAZAKI
  • Publication number: 20210220948
    Abstract: A processing apparatus and a build apparatus including an energy beam irradiation part that irradiates a surface of an object with an energy beam to form a melt pool on the surface and a material supply part that supplies build materials to the melt pool; and a change apparatus that changes a positional relationship between the object and the melt pool, wherein the processing apparatus changes a size of a build object, which is built along a first direction by supplying the build materials to the melt pool while changing a positional relationship in the first direction between the object and the melt pool, in a second direction, which intersects with the first direction, on the basis of a position of the build object in the first direction.
    Type: Application
    Filed: December 12, 2017
    Publication date: July 22, 2021
    Applicant: NIKON CORPORATION
    Inventors: Kei SEKIGUCHI, Koichi YASUBA, Kazuki UENO, Masayuki SHIRAISHI
  • Publication number: 20210205920
    Abstract: A processing apparatus has: a light irradiation apparatus that irradiates a surface of an object with a plurality of processing lights; and a first change apparatus that changes a relative positional relationship between light concentration positions of the plurality of processing lights in a direction that intersects with the surface of the object, the processing apparatus changes a thickness of a part of the object by irradiating the surface of the object with the plurality of processing lights.
    Type: Application
    Filed: October 25, 2017
    Publication date: July 8, 2021
    Applicant: NIKON CORPORATION
    Inventors: Masayuki SHIRAISHI, Yoshio KAWABE, Yosuke TATSUZAKI, Yuichi SHIBAZAKI
  • Publication number: 20210197312
    Abstract: A processing apparatus has: a light irradiation apparatus that irradiates a surface of an object with a processing light; and a measurement apparatus that measures a position of an irradiation area, which is formed on the surface of the object by the light irradiation apparatus, relative to the object.
    Type: Application
    Filed: October 25, 2017
    Publication date: July 1, 2021
    Applicant: NIKON CORPORATION
    Inventors: Masayuki SHIRAISHI, Shigeki EGAMI, Yoshio KAWABE, Yosuke TATSUZAKI, Baku OGASAWARA
  • Publication number: 20210197315
    Abstract: A processing apparatus has: a light irradiation apparatus that irradiates a surface of an object with a processing light; and a partition member that surrounds a space including an optical path between the surface of the object and an optical member that is disposed at the most object side in an optical system of the light irradiation apparatus that allows the processing light to pass therethrough.
    Type: Application
    Filed: October 25, 2018
    Publication date: July 1, 2021
    Applicant: NIKON CORPORATION
    Inventors: Masayuki SHIRAISHI, Yosuke TATSUZAKI
  • Publication number: 20210178521
    Abstract: A processing apparatus is a processing apparatus that performs a process for irradiating an object with an energy beam, the processing apparatus is provided with: an energy beam irradiation apparatus that irradiates at least a part of a surface of the object with the energy beam; and a position change apparatus that changes an irradiation position of the energy beam at the surface of the object, the processing apparatus controls the irradiation position of the energy beam by using a shape information relating to a shape of the object.
    Type: Application
    Filed: December 3, 2018
    Publication date: June 17, 2021
    Applicant: NIKON CORPORATION
    Inventors: Kazuki UENO, Kei SEKIGUCHI, Masayuki SHIRAISHI, Shigeki EGAMI
  • Publication number: 20210023779
    Abstract: A processing apparatus with: an irradiation apparatus that emits an energy beam; and a supply apparatus that supplies materials to an irradiation position of the energy beam, the processing apparatus forms a build object by moving the irradiation position from a first position on a first object to a second position that is away from the first object.
    Type: Application
    Filed: January 29, 2019
    Publication date: January 28, 2021
    Applicant: NIKON CORPORATION
    Inventors: Takeshi MATSUDA, Hiroyuki NAGASAKA, Masayuki SHIRAISHI, Shigeki EGAMI, Takehiro YAMAMOTO
  • Publication number: 20200391325
    Abstract: A processing apparatus has: a light irradiation apparatus that irradiates a surface of an object with a processing light; a first position change apparatus that changes a position of at least one of the object and an irradiation area that is formed on the surface of the object by the light irradiation apparatus; and a control apparatus that controls the first position change apparatus to form a structure for reducing a frictional resistance of the surface of the object to a fluid by irradiating the surface of the object with the processing light while changing the position of at least one of the irradiation area and the object to change a thickness of a part of the object.
    Type: Application
    Filed: October 25, 2017
    Publication date: December 17, 2020
    Applicant: NIKON CORPORATION
    Inventors: Masayuki SHIRAISHI, Shigeki EGAMI, Yoshio KAWABE, Yosuke TATSUZAKI, Yuichi SHIBAZAKI
  • Publication number: 20200361036
    Abstract: A processing apparatus has: a light irradiation apparatus that irradiates a surface of an object with a plurality of processing lights; and a first change apparatus that changes an intensity distribution of the plurality of processing lights from the light irradiation apparatus on the surface of the object, the processing apparatus changes a thickness of a part of the object by irradiating the surface of the object with the plurality of processing lights.
    Type: Application
    Filed: October 25, 2017
    Publication date: November 19, 2020
    Applicant: NIKON CORPORATION
    Inventors: Masayuki SHIRAISHI, Yoshio KAWABE, Yosuke TATSUZAKI, Yuichi SHIBAZAKI
  • Publication number: 20200353560
    Abstract: A processing apparatus has: a light irradiation apparatus that irradiates a surface of an object with a processing light; and a measurement apparatus that measures a position of an irradiation area, which is formed on the surface of the object by the light irradiation apparatus, relative to the object.
    Type: Application
    Filed: October 25, 2017
    Publication date: November 12, 2020
    Applicant: NIKON CORPORATION
    Inventors: Masayuki SHIRAISHI, Shigeki EGAMI, Yoshio KAWABE, Yosuke TATSUZAKI, Yuichi SHIBAZAKI
  • Patent number: 9529251
    Abstract: A method for measuring flare information of a projection optical system includes arranging, on an object plane of the projection optical system, a sectoral pattern surrounded by a first side, a second side which is inclined at a predetermined angle with respect to the first side, and an inner diameter portion and an outer diameter portion which connect both ends of the first side and both ends of the second side; projecting an image of the sectoral pattern via the projection optical system; and determining the flare information based on a light amount of the image of the sectoral pattern and a light amount provided at a position away from the image. With the flare measuring method, it possible to correctly measure the flare information in an arbitrary angle range.
    Type: Grant
    Filed: December 19, 2014
    Date of Patent: December 27, 2016
    Assignee: NIKON CORPORATION
    Inventor: Masayuki Shiraishi
  • Publication number: 20150138559
    Abstract: A method for measuring flare information of a projection optical system includes arranging, on an object plane of the projection optical system, a sectoral pattern surrounded by a first side, a second side which is inclined at a predetermined angle with respect to the first side, and an inner diameter portion and an outer diameter portion which connect both ends of the first side and both ends of the second side; projecting an image of the sectoral pattern via the projection optical system; and determining the flare information based on a light amount of the image of the sectoral pattern and a light amount provided at a position away from the image. With the flare measuring method, it possible to correctly measure the flare information in an arbitrary angle range.
    Type: Application
    Filed: December 19, 2014
    Publication date: May 21, 2015
    Applicant: Nikon Corporation
    Inventor: Masayuki SHIRAISHI
  • Patent number: 9030645
    Abstract: In an illumination optical system, a light flux from a light source is made to come into a first fly's eye optical system, and an illumination area is illuminated, via a second fly's eye optical system and a condenser optical system, with light fluxes from a plurality of mirror elements which construct the first fly's eye optical system, wherein a reflecting surface of each of the mirror elements has a width in one direction narrower than a width of each of the mirror elements in a direction perpendicular to the one direction, and a reflectance distribution in the one direction of each of the mirror elements is trapezoidal. The intensity distribution of the illumination area can be set to be a nonuniform distribution, and respective points in the illumination area can be illuminated with the light fluxes having an approximately same aperture angle distribution.
    Type: Grant
    Filed: July 14, 2009
    Date of Patent: May 12, 2015
    Assignee: Nikon Corporation
    Inventor: Masayuki Shiraishi
  • Patent number: 8945802
    Abstract: A method for measuring flare information of a projection optical system includes arranging, on an object plane of the projection optical system, a sectoral pattern surrounded by a first side, a second side which is inclined at a predetermined angle with respect to the first side, and an inner diameter portion and an outer diameter portion which connect both ends of the first side and both ends of the second side; projecting an image of the sectoral pattern via the projection optical system; and determining the flare information based on a light amount of the image of the sectoral pattern and a light amount provided at a position away from the image. With the flare measuring method, it is possible to correctly measure the flare information in an arbitrary angle range of the sectoral pattern.
    Type: Grant
    Filed: December 18, 2009
    Date of Patent: February 3, 2015
    Assignee: Nikon Corporation
    Inventor: Masayuki Shiraishi
  • Patent number: 8800451
    Abstract: The present invention configures a gas generator (A) wherein, with regard to a plug assembly (2), a ring (22) is formed of insulative resin, electrode pins (21) are equipped midway with flange portions (21a), and these flange portions (21a) are integrally formed in a state embedded inside the ring (22), and, in addition, the diameter of the flange portions (21a) is made a larger diameter than the short sides of this opening portion (1a) of the holder (1), the sum of the sector angles (R) formed by the outer peripheral portions (21r) of the flange portions (21a) of the electrode pins (21) located outside the opening portion of the holder (1) and the electrode pins (21) is configured to be 180 degrees or greater, the flange portions (21a) of the electrode pins (21) are further made mutually non-contacting, and the minimum distance (D) between the electrode pins (21) and the periphery of the opening portion (1a) of the holder (1) through which these electrode pins (21) are inserted is made 0.5 mm.
    Type: Grant
    Filed: March 5, 2010
    Date of Patent: August 12, 2014
    Assignee: Showa Kinzoku Kogyo Co., Ltd.
    Inventors: Tetsuya Sawada, Toshihiko Tamura, Masayuki Shiraishi
  • Patent number: 8699014
    Abstract: A measuring member has a first face and a plurality of first marks arranged on the first face. The first marks have respective orientations corresponding to their positions in a first direction.
    Type: Grant
    Filed: December 4, 2009
    Date of Patent: April 15, 2014
    Assignee: Nikon Corporation
    Inventor: Masayuki Shiraishi
  • Patent number: 8421998
    Abstract: An aperture diaphragm plate is provided to define a light flux on a pupil plane of an optical system or a plane or surface disposed in the vicinity of the pupil plane. An aperture, which is formed in the aperture diaphragm plate, has a three-dimensional shape corresponding to an optimum pupil shape of the optical system. It is possible to improve the imaging characteristic brought about by the optical system by providing the optimum pupil shape of the optical system.
    Type: Grant
    Filed: September 17, 2009
    Date of Patent: April 16, 2013
    Assignee: Nikon Corporation
    Inventors: Masayuki Shiraishi, Takuro Ono
  • Patent number: 8194322
    Abstract: Multilayer-film reflective mirrors are disclosed. An exemplary such mirror has a base and a multilayer film formed on the base. The multilayer film includes multiple layer pairs. Each layer pair includes a respective first layer and a respective second layer, wherein the first and second layers are laminated together in an alternating manner. The multilayer film has first and second regions that reflect extreme ultraviolet light. A first group of layers is disposed in the first and second regions and has a first periodic length. A second group disposed in the first region has a second periodic length different from the first periodic length, and a third group disposed in the second region has a substantially same periodic length as the first periodic length.
    Type: Grant
    Filed: March 7, 2008
    Date of Patent: June 5, 2012
    Assignee: Nikon Corporation
    Inventor: Masayuki Shiraishi
  • Publication number: 20120118193
    Abstract: The present invention configures a gas generator (A) wherein, with regard to a plug assembly (2), a ring (22) is formed of insulative resin, electrode pins (21) are equipped midway with flange portions (21a), and these flange portions (21a) are integrally formed in a state embedded inside the ring (22), and, in addition, the diameter of the flange portions (21a) is made a larger diameter than the short sides of this opening portion (1a) of the holder (1), the sum of the sector angles (R) formed by the outer peripheral portions (21r) of the flange portions (21a) of the electrode pins (21) located outside the opening portion of the holder (1) and the electrode pins (21) is configured to be 180 degrees or greater, the flange portions (21a) of the electrode pins (21) are further made mutually non-contacting, and the minimum distance (D) between the electrode pins (21) and the periphery of the opening portion (1a) of the holder (1) through which these electrode pins (21) are inserted is made 0.5 mm.
    Type: Application
    Filed: March 5, 2010
    Publication date: May 17, 2012
    Applicant: SHOWA KINZOKU KOGYO CO., LTD.
    Inventors: Tetsuya Sawada, Toshihiko Tamura, Masayuki Shiraishi
  • Patent number: 7948675
    Abstract: Multilayer-film reflective mirrors are disclosed that exhibit desired optical characteristics and resistance to reflective-surface degradation. An exemplary multilayer-film mirror includes a base and a multilayer film on the base. The multilayer film is made of first and second layers alternatingly laminated at a prescribed period length. The surface of the multilayer film has an irregular surface profile, relative to the surface profile of the base. The multilayer film reflects incident extreme ultraviolet (EUV) light. A third layer, situated on and covering the surface of the multilayer film, is formed of a substance having substantially the same refractive index to EUV light as the refractive index of a vacuum. The third layer has a surface profile substantially the same as the surface contour of the base. The third layer is covered with a protective layer.
    Type: Grant
    Filed: February 19, 2008
    Date of Patent: May 24, 2011
    Assignee: Nikon Corporation
    Inventor: Masayuki Shiraishi