Patents by Inventor Md. Motasim BELLAH
Md. Motasim BELLAH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11675277Abstract: Two pairs of alignment targets (one aligned, one misaligned by a bias distance) are formed on different masks to produce a first pair of conjugated interference patterns. Other pairs of alignment targets are also formed on the masks to produce a second pair of conjugated interference patterns that are inverted the first. Misalignment of the dark and light regions of first interference patterns and the second interference patterns in both pairs of conjugated interference patterns is determined when patterns formed using the masks are overlaid. A magnification factor (of the interference pattern misalignment to the target misalignment) is calculated as a ratio of the difference of misalignment of the relatively dark and relatively light regions in the pairs of interference patterns, over twice the bias distance. The interference pattern misalignment is divided by the magnification factor to produce a self-referenced and self-calibrated target misalignment amount, which is then output.Type: GrantFiled: December 23, 2021Date of Patent: June 13, 2023Assignee: KLA CorporationInventors: Dongyue Yang, Xintuo Dai, Dongsuk Park, Minghao Tang, Md Motasim Bellah, Pavan Kumar Chinthamanipeta Sripadarao, Cheuk Wun Wong
-
Publication number: 20220334502Abstract: Two pairs of alignment targets (one aligned, one misaligned by a bias distance) are formed on different masks to produce a first pair of conjugated interference patterns. Other pairs of alignment targets are also formed on the masks to produce a second pair of conjugated interference patterns that are inverted the first. Misalignment of the dark and light regions of first interference patterns and the second interference patterns in both pairs of conjugated interference patterns is determined when patterns formed using the masks are overlaid. A magnification factor (of the interference pattern misalignment to the target misalignment) is calculated as a ratio of the difference of misalignment of the relatively dark and relatively light regions in the pairs of interference patterns, over twice the bias distance. The interference pattern misalignment is divided by the magnification factor to produce a self-referenced and self-calibrated target misalignment amount, which is then output.Type: ApplicationFiled: December 23, 2021Publication date: October 20, 2022Inventors: Dongyue Yang, Xintuo Dai, Dongsuk Park, Minghao Tang, Md Motasim Bellah, Pavan Kumar Chinthamanipeta Sripadarao, Cheuk Wun Wong
-
Patent number: 11231654Abstract: Two pairs of alignment targets (one aligned, one misaligned by a bias distance) are formed on different masks to produce a first pair of conjugated interference patterns. Other pairs of alignment targets are also formed on the masks to produce a second pair of conjugated interference patterns that are inverted the first. Misalignment of the dark and light regions of the first interference patterns and the second interference patterns in both pairs of conjugated interference patterns is determined when patterns formed using the masks are overlaid. A magnification factor (of the interference pattern misalignment to the target misalignment) is calculated as a ratio of the difference of misalignment of the relatively dark and relatively light regions in the pairs of interference patterns, over twice the bias distance. The interference pattern misalignment is divided by the magnification factor to produce a self-referenced and self-calibrated target misalignment amount, which is then output.Type: GrantFiled: April 14, 2020Date of Patent: January 25, 2022Assignee: GlobalFoundries U.S. Inc.Inventors: Dongyue Yang, Xintuo Dai, Dongsuk Park, Minghao Tang, Md Motasim Bellah, Pavan Kumar Chinthamanipeta Sripadarao, Cheuk Wun Wong
-
Patent number: 10833022Abstract: In an exemplary method, a first layer is formed on a substrate. First overlay marks are formed in a first zone of the first layer. A non-transparent layer is formed on top of the first layer. At least a portion of the non-transparent layer is removed from an area above the first zone of the first layer. This provides optical access to the first overlay marks. A second layer is formed on top of the non-transparent layer. Second overlay marks are formed in a second zone of the second layer. Position information is obtained from each of the first overlay marks and the second overlay marks.Type: GrantFiled: October 16, 2019Date of Patent: November 10, 2020Assignee: GLOBALFOUNDRIES INC.Inventors: Cung D. Tran, Huaxiang Li, Bradley Morgenfeld, Xintuo Dai, Sanggil Bae, Rui Chen, Md Motasim Bellah, Dongyue Yang, Minghao Tang, Christian J. Ayala, Ravi Prakash Srivastava, Kripa Nidhan Chauhan, Pavan Kumar Chinthamanipeta Sripadarao
-
Publication number: 20200241429Abstract: Two pairs of alignment targets (one aligned, one misaligned by a bias distance) are formed on different masks to produce a first pair of conjugated interference patterns. Other pairs of alignment targets are also formed on the masks to produce a second pair of conjugated interference patterns that are inverted the first. Misalignment of the dark and light regions of the first interference patterns and the second interference patterns in both pairs of conjugated interference patterns is determined when patterns formed using the masks are overlaid. A magnification factor (of the interference pattern misalignment to the target misalignment) is calculated as a ratio of the difference of misalignment of the relatively dark and relatively light regions in the pairs of interference patterns, over twice the bias distance. The interference pattern misalignment is divided by the magnification factor to produce a self-referenced and self-calibrated target misalignment amount, which is then output.Type: ApplicationFiled: April 14, 2020Publication date: July 30, 2020Applicant: GLOBALFOUNDRIES INC.Inventors: Dongyue Yang, Xintuo Dai, Dongsuk Park, Minghao Tang, Md Motasim Bellah, Pavan Kumar Chinthamanipeta Sripadarao, Cheuk Wun Wong
-
Patent number: 10705435Abstract: Two pairs of alignment targets (one aligned, one misaligned by a bias distance) are formed on different masks to produce a first pair of conjugated interference patterns. Other pairs of alignment targets are also formed on the masks to produce a second pair of conjugated interference patterns that are inverted the first. Misalignment of the dark and light regions of the first interference patterns and the second interference patterns in both pairs of conjugated interference patterns is determined when patterns formed using the masks are overlaid. A magnification factor (of the interference pattern misalignment to the target misalignment) is calculated as a ratio of the difference of misalignment of the relatively dark and relatively light regions in the pairs of interference patterns, over twice the bias distance. The interference pattern misalignment is divided by the magnification factor to produce a self-referenced and self-calibrated target misalignment amount, which is then output.Type: GrantFiled: January 12, 2018Date of Patent: July 7, 2020Assignee: GLOBALFOUNDRIES INC.Inventors: Dongyue Yang, Xintuo Dai, Dongsuk Park, Minghao Tang, Md Motasim Bellah, Pavan Kumar Chinthamanipeta Sripadarao, Cheuk Wun Wong
-
Publication number: 20200051923Abstract: In an exemplary method, a first layer is formed on a substrate. First overlay marks are formed in a first zone of the first layer. A non-transparent layer is formed on top of the first layer. At least a portion of the non-transparent layer is removed from an area above the first zone of the first layer. This provides optical access to the first overlay marks. A second layer is formed on top of the non-transparent layer. Second overlay marks are formed in a second zone of the second layer. Position information is obtained from each of the first overlay marks and the second overlay marks.Type: ApplicationFiled: October 16, 2019Publication date: February 13, 2020Applicant: GLOBALFOUNDRIES INC.Inventors: Cung D. Tran, Huaxiang Li, Bradley Morgenfeld, Xintuo Dai, Sanggil Bae, Rui Chen, Md Motasim Bellah, Dongyue Yang, Minghao Tang, Christian J. Ayala, Ravi Prakash Srivastava, Kripa Nidhan Chauhan, Pavan Kumar Chinthamanipeta Sripadarao
-
Patent number: 10504851Abstract: In an exemplary method, a first layer is formed on a substrate. First overlay marks are formed in a first zone of the first layer. A non-transparent layer is formed on top of the first layer. At least a portion of the non-transparent layer is removed from an area above the first zone of the first layer. This provides optical access to the first overlay marks. A second layer is formed on top of the non-transparent layer. Second overlay marks are formed in a second zone of the second layer. Position information is obtained from each of the first overlay marks and the second overlay marks.Type: GrantFiled: February 26, 2018Date of Patent: December 10, 2019Assignee: GLOBALFOUNDRIES INC.Inventors: Cung D. Tran, Huaxiang Li, Bradley Morgenfeld, Xintuo Dai, Sanggil Bae, Rui Chen, Md Motasim Bellah, Dongyue Yang, Minghao Tang, Christian J. Ayala, Ravi Prakash Srivastava, Kripa Nidhan Chauhan, Pavan Kumar Chinthamanipeta Sripadarao
-
Publication number: 20190267329Abstract: In an exemplary method, a first layer is formed on a substrate. First overlay marks are formed in a first zone of the first layer. A non-transparent layer is formed on top of the first layer. At least a portion of the non-transparent layer is removed from an area above the first zone of the first layer. This provides optical access to the first overlay marks. A second layer is formed on top of the non-transparent layer. Second overlay marks are formed in a second zone of the second layer. Position information is obtained from each of the first overlay marks and the second overlay marks.Type: ApplicationFiled: February 26, 2018Publication date: August 29, 2019Applicant: GLOBALFOUNDRIES INC.Inventors: Cung D. Tran, Huaxiang Li, Bradley Morgenfeld, Xintuo Dai, Sanggil Bae, Rui Chen, Md Motasim Bellah, Dongyue Yang, Minghao Tang, Christian J. Ayala, Ravi Prakash Srivastava, Kripa Nidhan Chauhan, Pavan Kumar Chinthamanipeta Sripadarao
-
Publication number: 20190219930Abstract: Two pairs of alignment targets (one aligned, one misaligned by a bias distance) are formed on different masks to produce a first pair of conjugated interference patterns. Other pairs of alignment targets are also formed on the masks to produce a second pair of conjugated interference patterns that are inverted the first. Misalignment of the dark and light regions of the first interference patterns and the second interference patterns in both pairs of conjugated interference patterns is determined when patterns formed using the masks are overlaid. A magnification factor (of the interference pattern misalignment to the target misalignment) is calculated as a ratio of the difference of misalignment of the relatively dark and relatively light regions in the pairs of interference patterns, over twice the bias distance. The interference pattern misalignment is divided by the magnification factor to produce a self-referenced and self-calibrated target misalignment amount, which is then output.Type: ApplicationFiled: January 12, 2018Publication date: July 18, 2019Applicant: GLOBALFOUNDRIES INC.Inventors: Dongyue Yang, Xintuo Dai, Dongsuk Park, Minghao Tang, Md Motasim Bellah, Pavan Kumar Chinthamanipeta Sripadarao, Cheuk Wun Wong
-
Publication number: 20180197535Abstract: Language learning and speech training techniques are implemented to provide automated and real-time quantitative feedback to the user. Sound samples produced by a speaker are transcribed and analyzed against database sound samples to: provide speech therapy, compute the accuracy of a speaker's pronunciation, aid in learning a foreign language, and help members of the deaf community learn to communicate with spoken language.Type: ApplicationFiled: July 11, 2016Publication date: July 12, 2018Applicant: Board of Regents, The University of Texas SystemInventors: Md. Motasim BELLAH, Jodi M. TOMMERDAHI, Mohammad Raziul HASAN, Samir M. IQBAL