Abstract: The carbonizing apparatus includes a heating chamber that thermally decomposes a treatment object by heating, a preliminary chamber through which the treatment object is carried from an outside into the heating member in a state in which the heating chamber is substantially shielded from the outside, the preliminary chamber being provided between the heating chamber and the outside, a plurality of cooling chambers in which the treatment object is treated after thermal decomposition, shielding doors that close the preliminary chamber, the heating chamber, and the cooling chambers arranged in series, a transport means that transports the treatment object while opening and closing the shielding doors, and exhaust pipes through which gas discharged from the preliminary chamber, the heating chamber, and the cooling chambers is exhausted. The treatment object is carbonized while being sequentially passed through the preliminary chamber, the heating chamber, and the cooling chambers.

Abstract: The carbonizing apparatus includes a heating chamber that thermally decomposes a treatment object by heating, a preliminary chamber through which the treatment object is carried from an outside into the heating member in a state in which the heating chamber is substantially shielded from the outside, the preliminary chamber being provided between the heating chamber and the outside, a plurality of cooling chambers in which the treatment object is treated after thermal decomposition, shielding doors that close the preliminary chamber, the heating chamber, and the cooling chambers arranged in series, a transport means that transports the treatment object while opening and closing the shielding doors, and exhaust pipes through which gas discharged from the preliminary chamber, the heating chamber, and the cooling chambers is exhausted. The treatment object is carbonized while being sequentially passed through the preliminary chamber, the heating chamber, and the cooling chambers.

Abstract: A lithography mask blank used as a material for producing a lithography mask includes at least one thin film which is formed on a substrate and has a desired function. The blank has a nitrogen-containing thin film as the above-mentioned thin film and an ammonium ion production preventing layer for preventing production of ammonium ions, which is formed on the nitrogen-containing thin film or at least at a surface portion of the nitrogen-containing thin film and which is exposed on the surface of the lithography mask after the lithography mask is manufactured.

Abstract: A method for treating migraine comprising administering, as an active ingredient, a xanthine derivative represented by the following formula or a pharmaceutically acceptable salt thereof.

Abstract: (wherein R1, R2 and R3 are the same or different, and represent a hydrogen atom, lower alkyl, lower alkenyl or lower alkynyl; R4 represents cycloalkyl, —(CH2)n—R5 or a group represented by the above formula (II); and X1 and X2 are the same or different, and represent an oxygen atom or a sulfur atom) The present invention provides, for example, agents for treating migraine comprising, as an active ingredient, a xanthine derivative represented by the above formula (I) or a pharmaceutically acceptable salt thereof.

Abstract: A lithography mask blank used as a material for producing a lithography mask includes at least one thin film which is formed on a substrate and has a desired function. The blank has a nitrogen-containing thin film as the above-mentioned thin film and an ammonium ion production preventing layer for preventing production of ammonium ions, which is formed on the nitrogen-containing thin film or at least at a surface portion of the nitrogen-containing thin film and which is exposed on the surface of the lithography mask after the lithography mask is manufactured.

Abstract: There is disclosed a halftone phase shift mask blank, in which, for example, a semitransparent film (halftone phase shifter film) 2 contains silicon, palladium, and at least one selected from nitrogen, oxygen and hydrogen, and silicon and palladium contained in the semitransparent film are in a relation represented by the following equation: [atom % of palladium in the film]/[(atom % of palladium in the film)+(atom % of silicon in the film)]×100=10 to 40(%).

Abstract: The method of manufacturing a halftone phase shift mask blank enables the accurate and easy control over the composition of an MSi semitransparent film that makes it easy to obtain an MSi semitransparent film having a desired specific component, the formation of film with ease at a good reproducibility and the reduction of defects in the layer.

Abstract: In a half-tone type phase shift mask blank in which a semi-transparent film is formed on a transparent substrate, and the semi-transparent film serves to shift phase of a first optical light beam which transmits the semi-transparent film for a second optical light beam which directly transmits the transparent substrate and further, serves to reduce strength of the first optical light beam, the semi-transparent film includes silicon and nickel, and at least one selected from the group consisting of nitrogen, oxygen and hydrogen, and the relationship between the silicon and the nickel is specified by a formula in which a rate of [atom % of the nickel in the film] for [atom % of the nickel in the film+atom % of the silicon in the film] falls within the range between 0.15 and 0.5.

Abstract: Electro-conductive oxides showing excellent electro-conductivity, electrodes using the electro-conductive oxide and methods for manufacturing the same are described. The electro-conductive oxides are represented by the general formula: M(1).sub.x M(2).sub.y In.sub.z O.sub.(x+3y/2+3z/2)-d. The above electro-conductive oxides show not only excellent electro-conductivity but also excellent transparency all over the visible region and therefore they are particularly useful as, for example, electrodes for liquid crystal displays, EL displays and solar cells, which require light transmission.

Abstract: Electro-conductive oxides showing excellent electro-conductivity, electrodes using the electro-conductive oxide and methods for manufacturing the same are described. The electro-conductive oxides are represented by the general formula: M(1).sub.x M(2).sub.y In.sub.z O.sub.(x+3y/2+3s/2)-d. The above electro-conductive oxides show not only excellent electro-conductivity but also excellent transparency all over the visible region and therefore they are particularly useful as, for example, electrodes for liquid crystal displays, EL displays and solar cells, which require light transmission.

Abstract: Electro-conductive oxides showing excellent electro-conductivity, electrodes using the electro-conductive oxide and methods for manufacturing the same are described. The electro-conductive oxides are represented by the general formula: M(1).sub.x M(2).sub.y In.sub.z O.sub.(x+3y/2+3z/2)-d. The above electro-conductive oxides show not only excellent electro-conductivity but also excellent transparency all over the visible region and therefore they are particularly useful as, for example, electrodes for liquid crystal displays, EL displays and solar cells, which require light transmission.

Abstract: Electro-conductive oxides showing excellent electro-conductivity, electrodes using the electro-conductive oxide and methods for manufacturing the same are described. The electro-conductive oxides are represented by the general formula:M(1).sub.x M(2).sub.y In.sub.z O.sub.(x+.spsb.3.sub.y/.spsb.2.sub.+.spsb.3.sub.z/.spsb.2.sub.)-d.The above electro-conductive oxides show not only excellent electro-conductivity but also excellent transparency all over the visible region and therefore they are particularly useful as, for example, electrodes for liquid crystal displays, EL displays and solar cells, which require light transmission.