Patents by Inventor Merrill W. Shafer

Merrill W. Shafer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4623906
    Abstract: An improved glass or silicon ink jet nozzle is described having a three-layer coating that provides improved mechanical and chemical properties. The coating includes a first layer of silicon nitride, an intermediate layer graded in composition, and a top-most layer of aluminum nitride. The intermediate layer is typically a solid solution of silicon and aluminum nitrides being silicon-rich at the interface with the silicon nitride layer, and aluminum-rich at the interface with the overlying aluminum nitride layer. This three-layer coating provides the required dielectric properties, displays very low wettability, and is extremely corrosion resistant to all types of inks.
    Type: Grant
    Filed: October 31, 1985
    Date of Patent: November 18, 1986
    Assignee: International Business Machines Corporation
    Inventors: G. V. Chandrashekhar, Merrill W. Shafer
  • Patent number: 4415905
    Abstract: The present invention provides a process for electrolytic printing using an improved electrode. The electrode has a region which is an oxide of a metal from the group of ruthenium, iridium, platinum or an alloy thereof. The oxide region is at the extremity of the electrode which during the printing is in close proximity to the printing medium. This oxide region provides an increase in wear resistance of about two orders of magnitude over non-oxidized electrodes. Method for fabricating the described electrode is also set forth.
    Type: Grant
    Filed: February 10, 1983
    Date of Patent: November 15, 1983
    Assignee: International Business Machines Corporation
    Inventors: Joseph W. Mitchell, Merrill W. Shafer, Carlos J. Sambucetti
  • Patent number: 4231892
    Abstract: A series of solid solutions in the systems Zn.sub.2 SiO.sub.4 -Zn.sub.2 M.sup.+3.sub..5 M.sup.+5.sub..5 O.sub.4, is synthesized by practice of this disclosure. Solid reaction technique is used where M.sup.+3 and M.sup.+5 signify ions from Groups III and V of the periodic table.Large increases in the efficiency compared to the prior art P1 phosphor (Zn.sub.2 SiO.sub.4 :Mn) are achieved by substituting various combinations of Group III and V oxides for SiO.sub.2, e.g., Al and P to provide Zn.sub.2-y Mn.sub.y Si.sub.1-2x Al.sub.x P.sub.x O.sub.4. The photoluminescence efficiency of the phosphors of this disclosure exhibit strong dependence on the III-V substitution concentration, x, having highest efficiency for the approximate range of x=0.25% to 1.5%.
    Type: Grant
    Filed: March 5, 1979
    Date of Patent: November 4, 1980
    Assignee: International Business Machines Corporation
    Inventors: Ifay F. Chang, Merrill W. Shafer