Patents by Inventor Michael John Janicki

Michael John Janicki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240055293
    Abstract: Various carrier ring designs and configurations to control an amount of deposition at a wafer's front side and bevel edge are provided. The carrier ring designs can control the amount of deposition at various locations of the wafer while deposition is performed on the wafer's back side, with no deposition desired on the front side of the wafer. These locations include front side, edge, and back side of bevel; and front and back side of the wafer. Edge profiles of the carrier rings are designed to control flow of process gases, flow of front side purge gas, and plasma effects. In some designs, through holes are added to the carrier rings to control gas flows. The edge profiles and added features can reduce or eliminate deposition at the wafer's front side and bevel edge.
    Type: Application
    Filed: October 25, 2023
    Publication date: February 15, 2024
    Inventors: Michael John Janicki, Brian Joseph Williams
  • Publication number: 20230221697
    Abstract: Various embodiments include apparatuses, systems, and methods for using a remote-plasma cleaning system with a directional-flow device for concurrently cleaning multiple processing stations in a processing tool used in the semiconductor and allied fields. In one example, an apparatus used to perform a remote-plasma clean (RPC) in a multi-station process chamber is disclosed and includes an RPC directional-flow device that is to be coupled between an RPC reactor and the process chamber. The RPC directional-flow device includes a number of ramped gas-diversion areas to direct at least a radical species generated by the RPC reactor to a separate one of the processing stations. An incoming cleaning-gas diversion hub is to receive the radical species and distribute at least the species substantially-uniformly to each of the of the ramped gas-diversion areas. Other apparatuses, systems, and methods are disclosed.
    Type: Application
    Filed: March 2, 2023
    Publication date: July 13, 2023
    Inventors: Michael John JANICKI, James Forest LEE
  • Patent number: 8430391
    Abstract: In a tandem media supply, two vertical stacks of media sheets are stored. The first stack is positioned on a lift plate that rises as top sheets are removed from the stack of media. When the first stack is exhausted, the second stack is moved by an actuator towards a position where the lift plate was loaded with the first stack of media sheets. Movement of the second stack displaces a biased gate to decouple the lift plate from a drive member that elevated the lift plate. The lift plate drops under the effect of gravity to a position where the second stack of media sheets moves onto the lift plate. Once the second stack is on the lift plate, a biasing force returns the biased gate to a position that enables the drive member to elevate the lift plate.
    Type: Grant
    Filed: October 13, 2011
    Date of Patent: April 30, 2013
    Assignee: Xerox Corporation
    Inventors: Daniel Clark Park, Timothy Carlysle Shaw, Michael John Janicki
  • Publication number: 20130093135
    Abstract: In a tandem media supply, two vertical stacks of media sheets are stored. The first stack is positioned on a lift plate that rises as top sheets are removed from the stack of media. When the first stack is exhausted, the second stack is moved by an actuator towards a position where the lift plate was loaded with the first stack of media sheets. Movement of the second stack displaces a biased gate to decouple the lift plate from a drive member that elevated the lift plate. The lift plate drops under the effect of gravity to a position where the second stack of media sheets moves onto the lift plate. Once the second stack is on the lift plate, a biasing force returns the biased gate to a position that enables the drive member to elevate the lift plate.
    Type: Application
    Filed: October 13, 2011
    Publication date: April 18, 2013
    Applicant: XEROX CORPORATION
    Inventors: Daniel Clark Park, Timothy Carlysle Shaw, Michael John Janicki
  • Patent number: 6755954
    Abstract: An apparatus for electrochemical treatment of a substrate, in particular for electroplating an integrated circuit wafer. An apparatus preferably includes dynamically operable concentric anodes and dielectric shields in an electrochemical bath. Preferably, the bath height of an electrochemical bath, the substrate height, and the shape and positions of an insert shield and a diffuser shield are dynamically variable during electrochemical treatment operations. Step include varying anode current, bath height and substrate height, shield shape, and shield position.
    Type: Grant
    Filed: April 4, 2002
    Date of Patent: June 29, 2004
    Assignee: Novellus Systems, Inc.
    Inventors: Steven T. Mayer, Timothy Patrick Cleary, Michael John Janicki, Edmund B. Minshall, Thomas A. Ponnuswamy
  • Publication number: 20020195352
    Abstract: An apparatus for electrochemical treatment of a substrate, in particular for electroplating an integrated circuit wafer. An apparatus preferably includes dynamically operable concentric anodes and dielectric shields in an electrochemical bath. Preferably, the bath height of an electrochemical bath, the substrate height, and the shape and positions of an insert shield and a diffuser shield are dynamically variable during electrochemical treatment operations. Step include varying anode current, bath height and substrate height, shield shape, and shield position.
    Type: Application
    Filed: April 4, 2002
    Publication date: December 26, 2002
    Inventors: Steven T. Mayer, Timothy Patrick Cleary, Michael John Janicki, Edmund B. Minshall, Thomas A. Ponnuswamy