Patents by Inventor Michael Totzeck

Michael Totzeck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170249722
    Abstract: The invention relates to an apparatus and a method for determining a defocussing value (?z, ?z1, ?z2) for at least one image feature in an image, wherein at least one monochromatic image of an object is generated, wherein the defocussing value (?z, ?z1, ?z2) is determined on the basis of the image and depending on the wavelength (?) of the monochromatic image, and a method and apparatus for image-based determination of a dimensional size.
    Type: Application
    Filed: February 22, 2017
    Publication date: August 31, 2017
    Inventors: Philipp JESTER, Oliver SCHWARZ, Michael TOTZECK, Matthias BARNERT, Dirk DOERING, Rainer SCHMIDT
  • Publication number: 20160342097
    Abstract: A method of operating a projection exposure tool for microlithography is provided. The projection exposure tool has a projection objective for imaging object structures on a mask into an image plane using electromagnetic radiation, during which imaging the electromagnetic radiation causes a change in optical properties of the projection objective.
    Type: Application
    Filed: August 3, 2016
    Publication date: November 24, 2016
    Inventors: Olaf Conradi, Michael Totzeck, Ulrich Loering, Dirk Juergens, Ralf Mueller, Christian Wald
  • Patent number: 9442381
    Abstract: A method of operating a projection exposure tool for microlithography is provided. The projection exposure tool has a projection objective for imaging object structures on a mask into an image plane using electromagnetic radiation, during which imaging the electromagnetic radiation causes a change in optical properties of the projection objective.
    Type: Grant
    Filed: July 11, 2013
    Date of Patent: September 13, 2016
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Olaf Conradi, Michael Totzeck, Ulrich Loering, Dirk Juergens, Ralf Mueller, Christian Wald
  • Patent number: 9411145
    Abstract: A test sample device for an optical microscope which images a sample in different light states with a local resolution in the subwavelength range of the visible spectral range, wherein the test sample device comprises: a test piece, which is designed to be microexamined with the microscope and has a surface on which nanostructures are arranged, wherein each nanostructure, viewed along the surface, has a dimension in the subwavelength range, wherein the nanostructures are spaced apart from one another by an amount which lies above the wavelength of the visible spectral range, and wherein the nanostructures are switchable collectively between a bright state, in which they illuminate, and a dark state, in which they do not illuminate, and a drive, which is designed to move the test piece in the subwavelength range, whereby the different light states can be realized by different movement states of the test piece.
    Type: Grant
    Filed: August 21, 2013
    Date of Patent: August 9, 2016
    Assignee: CARL ZEISS MICROSCOPY GMBH
    Inventors: Thomas Kalkbrenner, Michael Totzeck
  • Publication number: 20160195820
    Abstract: An illumination optical unit for microlithography illuminates an object field with illumination light. The unit includes a first facet mirror that has a plurality of first facets, and a second facet mirror that has a plurality of second facets. The unit has facet pairs which include respectively a facet of the first facet mirror and a facet of the second facet mirror which predefine a plurality of illumination channels for illuminating the object field. At least some of the illumination channels have in each case an assigned polarization element for predefining an individual polarization state of the illumination light guided in the respective illumination channel.
    Type: Application
    Filed: February 18, 2016
    Publication date: July 7, 2016
    Inventors: Damian Fiolka, Michael Totzeck, Hartmut Enkisch, Stephan Muellender
  • Patent number: 9304405
    Abstract: An illumination optical unit for microlithography illuminates an object field with illumination light. The unit includes a first facet mirror that has a plurality of first facets, and a second facet mirror that has a plurality of second facets. The unit has facet pairs which include respectively a facet of the first facet mirror and a facet of the second facet mirror which predefine a plurality of illumination channels for illuminating the object field. At least some of the illumination channels have in each case an assigned polarization element for predefining an individual polarization state of the illumination light guided in the respective illumination channel.
    Type: Grant
    Filed: December 21, 2010
    Date of Patent: April 5, 2016
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Damian Fiolka, Michael Totzeck, Hartmut Enkisch, Stephan Muellender
  • Patent number: 9134626
    Abstract: A microscope is provided for space-resolved measurement of a predetermined structure. The microscope includes a source of radiation, which emits electromagnetic radiation of a predetermined wavelength, an optical system, which irradiates the electromagnetic radiation onto the structure to be measured and images the structure, irradiated with the electromagnetic radiation, onto a detector. The optical system has two eigen polarization conditions, and the optical system includes a polarization module by which a polarization condition can be set for the electromagnetic radiation of the source of radiation, the polarization conditions corresponding to the eigen polarization conditions.
    Type: Grant
    Filed: November 20, 2007
    Date of Patent: September 15, 2015
    Assignee: Carl Zeiss SMS GmbH
    Inventors: Hans-Juergen Mann, Michael Totzeck, Norbert Kerwien
  • Patent number: 9063439
    Abstract: A projection objective for applications in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for microstructured components, and a component manufactured using such a manufacturing method are disclosed. The projection objective includes an optical component configured so that, during use of the projection objective, the optical component generates a stray light component in the exposure field of the projection objective which adapts a parameter of the projection objective to a parameter of a second projection objective. The parameter is the stray light component at the exposure field of the projection objective and/or a variation of the stray light component at the exposure field of the projection objective.
    Type: Grant
    Filed: November 24, 2009
    Date of Patent: June 23, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Aksel Goehnermeier, Daniel Kraehmer, Vladimir Kamenov, Michael Totzeck
  • Patent number: 8982325
    Abstract: The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.
    Type: Grant
    Filed: December 21, 2011
    Date of Patent: March 17, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Michael Totzeck, Aksel Goehnermeier, Wolfgang Singer, Helmut Beierl, Heiko Feldmann, Hans-Juergen Mann, Jochen Hetzler
  • Patent number: 8854606
    Abstract: The invention relates to a projection exposure system, in particular for micro-lithography. The projection exposure system according to the invention comprises a light source for producing light in the EUV region. The projection exposure system further comprises a first optical system for illuminating a mask by the light of the light source and a second optical system for imaging the mask on a component. At least one polarization-optical element is disposed on the beam path between the light source and the component.
    Type: Grant
    Filed: June 15, 2011
    Date of Patent: October 7, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Hans-J├╝rgen Mann, Wolfgang Singer, Toralf Gruner, Olaf Dittmann, Michael Totzeck
  • Patent number: 8767181
    Abstract: In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
    Type: Grant
    Filed: November 15, 2010
    Date of Patent: July 1, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Toralf Gruner, Daniel Kraehmer, Michael Totzeck, Johannes Wangler, Markus Brotsack, Nils Dieckmann, Aksel Goehnermeier, Markus Schwab, Damian Fiolka, Markus Zenzinger
  • Patent number: 8736849
    Abstract: The invention relates to a method for measuring structures on masks (1) for photolithography, wherein firstly the mask (1) is mounted on a spatially movable platform (2). The position of the platform (2) is controlled in this case. The structure on the mask (1) is illuminated with illumination light from an illumination light source which emits coherent light. The light coming from the mask (1) is imaged onto a detection device (6) by an imaging optical unit (4) and detected. The detected signals are evaluated in an evaluation device (7) and the positions and dimensions of the structures are determined. The invention also relates to an apparatus by which these method steps, in particular, can be carried out. In this case, the accuracy of the position and dimension determination is increased by the properties of the illumination light being coordinated with the structure to be measured.
    Type: Grant
    Filed: September 18, 2009
    Date of Patent: May 27, 2014
    Assignee: Carl Zeiss SMS GmbH
    Inventors: Ulrich Stroessner, Gerd Klose, Michael Totzeck
  • Publication number: 20140055593
    Abstract: A test sample device for an optical microscope which images a sample in different light states with a local resolution in the subwavelength range of the visible spectral range, wherein the test sample device comprises: a test piece, which is designed to be microexamined with the microscope and has a surface on which nanostructures are arranged, wherein each nanostructure, viewed along the surface, has a dimension in the subwavelength range, wherein the nanostructures are spaced apart from one another by an amount which lies above the wavelength of the visible spectral range, and wherein the nanostructures are switchable collectively between a bright state, in which they illuminate, and a dark state, in which they do not illuminate, and a drive, which is designed to move the test piece in the subwavelength range, whereby the different light states can be realized by different movement states of the test piece.
    Type: Application
    Filed: August 21, 2013
    Publication date: February 27, 2014
    Inventors: Thomas Kalkbrenner, Michael Totzeck
  • Publication number: 20130335552
    Abstract: The invention relates to a method for mask inspection and to a mask inspection installation. A method according to the invention involves a lighting system lighting a mask with a lighting beam pencil, and said mask being observed with an observation beam pencil which is directed onto a sensor arrangement, wherein the light hitting the sensor arrangement is evaluated in order to check the mapping effect of the mask. The lighting system produces a spot of light with limited refraction on the mask, and during the evaluation of the light hitting the sensor arrangement a finite component of the light setting out from the mask to produce the observation beam pencil is disregarded.
    Type: Application
    Filed: December 8, 2011
    Publication date: December 19, 2013
    Applicants: CARL ZEISS AG, CARL ZEISS SMT GMBH
    Inventors: Heiko Feldmann, Michael Totzeck
  • Patent number: 8605257
    Abstract: In a projection objective for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, at least one optical component is provided which has a substrate in which at least one substrate surface is covered with an interference layer system having a great spatial modulation of the reflectance and/or of the transmittance over a usable cross section of the optical component, the modulation being adapted to a spatial transmission distribution of the remaining components of the projection objective in such a way that an intensity distribution of the radiation that is measured in a pupil surface has a substantially reduced spatial modulation in comparison with a projection objective without the interference layer system.
    Type: Grant
    Filed: June 3, 2005
    Date of Patent: December 10, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Alexandra Pazidis, Reiner Garreis, Michael Totzeck, Heiko Feldmann, Paul Graeupner, Hans-Juergen Rostalski, Wolfgang Singer, Guenter Scheible, Sigrid Scheible
  • Patent number: 8593618
    Abstract: The disclosure relates to an optical system of a microlithographic projection exposure apparatus and to a microlithographic exposure method. An optical system of a microlithographic projection exposure apparatus includes an image rotator, which is arranged in the optical system such that light impinging on the image rotator is at least partially polarized. The image rotator rotates, for light impinging on the image rotator, both the intensity distribution and the polarization distribution of through a given angle of rotation.
    Type: Grant
    Filed: December 17, 2010
    Date of Patent: November 26, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Michael Totzeck
  • Publication number: 20130301024
    Abstract: A method of operating a projection exposure tool for microlithography is provided. The projection exposure tool has a projection objective for imaging object structures on a mask into an image plane using electromagnetic radiation, during which imaging the electromagnetic radiation causes a change in optical properties of the projection objective.
    Type: Application
    Filed: July 11, 2013
    Publication date: November 14, 2013
    Inventors: Olaf Conradi, Michael Totzeck, Ulrich Loering, Dirk Juergens, Ralf Mueller, Christian Wald
  • Patent number: 8570488
    Abstract: A transmitting optical element adapted for use in an objective for a microlithographic projection exposure apparatus is composed of a polycrystalline material, with the polycrystalline material having crystallites with a cubic crystal structure, and with the mean crystallite size of these crystallites being at least micrometers, and at most micrometers.
    Type: Grant
    Filed: December 8, 2005
    Date of Patent: October 29, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Wilfried Clauss, Michael Totzeck, Gisela Rissmann
  • Patent number: 8436982
    Abstract: A projection objective for microlithography includes at least one optical assembly with optical elements which are disposed between an object plane and an image plane. The optical assembly includes at least one optical terminal element, which is disposed close to the image plane. A first immersion liquid is disposed on the image oriented surface of the optical terminal element. A second immersion liquid is disposed on the object oriented surface of the optical terminal element. The object oriented surface includes a first surface section for the imaging light to enter into the terminal element, and the image oriented surface includes a second surface portion for the imaging light to exit from the terminal element.
    Type: Grant
    Filed: March 12, 2010
    Date of Patent: May 7, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Helmut Beierl, Heiko Feldmann, Jochen Hetzler, Michael Totzeck
  • Patent number: RE44216
    Abstract: An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing.
    Type: Grant
    Filed: October 23, 2009
    Date of Patent: May 14, 2013
    Assignee: Carl Zeiss SMS GmbH
    Inventors: Michael Totzeck, Heiko Feldmann, Toralf Gruner, Karl-Heinz Schuster, Joern Greif-Wuestenbecker, Thomas Scheruebl, Wolfgang Harnisch, Norbert Rosenkranz, Ulrich Matejka