Patents by Inventor Michael Totzeck

Michael Totzeck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7924436
    Abstract: A method for approximating an influence of an optical system on the state of polarization of optical radiation comprises the steps of providing incoming optical radiation for the optical system in several incoming states of polarization, including at least one incoming state having circularly polarized radiation components; directing the incoming optical radiation onto the optical system; measuring at least one characteristic, including a phase distribution, of a resulting outgoing optical radiation emerging from the optical system with respect to each of the incoming states of polarization; and approximating the influence of the optical system on the state of polarization of optical radiation by evaluating the measured characteristics of the outgoing optical radiation.
    Type: Grant
    Filed: February 7, 2007
    Date of Patent: April 12, 2011
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Markus Mengel, Michael Totzeck
  • Publication number: 20110069296
    Abstract: In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
    Type: Application
    Filed: November 15, 2010
    Publication date: March 24, 2011
    Applicant: CARL ZEISS SMT AG
    Inventors: Toralf GRUNER, Daniel KRAEHMER, Michael TOTZECK, Johannes WANGLER, Markus BROTSACK, Nils DIECKMANN, Aksel GOEHNERMEIER, Markus SCHWAB, Damian FIOLKA, Markus ZENZINGER
  • Publication number: 20110007293
    Abstract: The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projection objective, where the illumination system can illuminate an object plane of the projection objective and the projection objective can produce the image of the object plane on an image plane. A polarization-dependent transmission can be produced in the illumination system such that, for at least one polarization distribution in respect of the light impinging on the object plane, a non-homogeneous intensity distribution in the object plane is obtained. The non-homogeneous intensity distribution can afford a homogeneous intensity distribution in the image plane by virtue of polarization-dependent transmission properties of the projection objective.
    Type: Application
    Filed: September 17, 2010
    Publication date: January 13, 2011
    Applicant: CARL ZEISS SMT AG
    Inventors: Damian Fiolka, Michael Totzeck, Alexandra Pazidis, Michael Ricker
  • Patent number: 7847921
    Abstract: In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
    Type: Grant
    Filed: July 22, 2008
    Date of Patent: December 7, 2010
    Assignee: Carl Zeiss SMT AG
    Inventors: Toralf Gruner, Daniel Kraehmer, Michael Totzeck, Johannes Wangler, Markus Brotsack, Nils Dieckmann, Aksel Goehnermeier, Markus Schwab, Damian Fiolka, Markus Zenzinger
  • Patent number: 7817250
    Abstract: The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projection objective, where the illumination system can illuminate an object plane of the projection objective and the projection objective can produce the image of the object plane on an image plane. A polarization-dependent transmission can be produced in the illumination system such that, for at least one polarization distribution in respect of the light impinging on the object plane, a non-homogeneous intensity distribution in the object plane is obtained. The non-homogeneous intensity distribution can afford a homogeneous intensity distribution in the image plane by virtue of polarization-dependent transmission properties of the projection objective.
    Type: Grant
    Filed: June 25, 2008
    Date of Patent: October 19, 2010
    Assignee: Carl Zeiss SMT AG
    Inventors: Damian Fiolka, Michael Totzeck, Alexandra Pazidis, Michael Ricker
  • Patent number: 7808615
    Abstract: The invention concerns a method for operating a projection exposure apparatus to project the image of a structure of an object (5) arranged in an object plane (6) onto a substrate (10) arranged in an image plane (8). The object (5) is illuminated with light of an operating wavelength of the projection exposure apparatus according to one of several adjustable exposure modes. The light produces changes in at least one optical element (9) of the projection exposure apparatus, by which the optical properties of the projection exposure apparatus are influenced. The operation of the projection exposure apparatus makes allowance for the influencing of the optical properties of the projection exposure apparatus or a quantity dependent on the former, being calculated approximately on the basis of the exposure mode used and the structure of the object (5).
    Type: Grant
    Filed: June 28, 2006
    Date of Patent: October 5, 2010
    Assignee: Carl Zeiss SMT AG
    Inventors: Toralf Gruner, Olaf Conradi, Nils Dieckmann, Markus Schwab, Olaf Dittmann, Michael Totzeck, Daniel Kraehmer, Vladimir Kamenov
  • Publication number: 20100201959
    Abstract: A projection objective for microlithography includes at least one optical assembly with optical elements which are disposed between an object plane and an image plane. The optical assembly includes at least one optical terminal element, which is disposed close to the image plane. A first immersion liquid is disposed on the image oriented surface of the optical terminal element. A second immersion liquid is disposed on the object oriented surface of the optical terminal element. The object oriented surface includes a first surface section for the imaging light to enter into the terminal element, and the image oriented surface includes a second surface portion for the imaging light to exit from the terminal element.
    Type: Application
    Filed: March 12, 2010
    Publication date: August 12, 2010
    Applicant: CARL ZEISS SMT AG
    Inventors: Helmut Beierl, Heiko Feldmann, Jochen Hetzler, Michael Totzeck
  • Publication number: 20100142042
    Abstract: A microscope is provided for space-resolved measurement of a predetermined structure (12), said microscope comprising a source of radiation (2), which emits electromagnetic radiation (3) of a predetermined wavelength, an optical system (13), which irradiates the electromagnetic radiation (3) onto the structure (12) to be measured and images the structure (12), irradiated with the electromagnetic radiation, onto a detector (9), wherein the optical system (13) has two eigen polarization conditions (Z1, Z2), and the apparatus includes a polarization module (4) by which a polarization condition can be set for the electromagnetic radiation (3) of the source of radiation (2), which condition includes only components of a known quantity which correspond to the eigen polarization conditions (Z1, Z2).
    Type: Application
    Filed: November 20, 2007
    Publication date: June 10, 2010
    Inventors: Hans-Juergen Mann, Michael Totzeck, Norbert Kerwien
  • Publication number: 20100134891
    Abstract: The disclosure concerns an optical system of a microlithographic projection exposure apparatus. To permit comparatively flexible and fast influencing of intensity distribution and/or the polarization state, an optical system includes at least one layer system that is at least one-side bounded by a lens or a mirror. The layer system is an interference layer system of several layers and has at least one liquid or gaseous layer portion with a maximum thickness of one micrometer (?m), and a manipulator for manipulation of the thickness profile of the layer portion.
    Type: Application
    Filed: January 14, 2010
    Publication date: June 3, 2010
    Applicant: CARL ZEISS SMT AG
    Inventors: Ralf Mueller, Toralf Gruner, Michael Totzeck, Heiko Feldmann, Hans-Jochen Paul
  • Patent number: 7728975
    Abstract: In a method for describing, evaluating and improving optical polarization properties of a projection objective of a microlithographic projection exposure apparatus, the Jones or Stokes vectors are firstly determined at one or more points in the exit pupil of the projection objective. These are then described at least approximately as a linear superposition of predetermined vector modes with scalar superposition coefficients. The optical polarization properties can subsequently be evaluated on the basis of the superposition coefficients.
    Type: Grant
    Filed: February 22, 2006
    Date of Patent: June 1, 2010
    Assignee: Carl Zeiss SMT AG
    Inventors: Michael Totzeck, Heiko Feldmann, Daniel Kraehmer, Olaf Dittmann
  • Publication number: 20100104128
    Abstract: A method is provided for determining the position of a structure on a carrier, relative to a reference point of the carrier, said method comprising the steps of: a) providing an image including a reference structure; b) recording an image of the structure on the carrier by means of a recording device, with a known recording position relative to the reference points; c) superimposing the two images to form one superimposed image; d) determining the image distance of the two structures in the superimposed image; e) shifting the two structures in the superimposed image relative to one another, depending on the determined image distance; f) checking whether the determined image distance is below a predetermined maximum value; wherein, if the image distance is below the maximum value, the method is continued in step g), and, if the image distance is not below the maximum value, steps d)-f) are repeated, taking into account the determined image distance/distances: g) determining the position of the structure relati
    Type: Application
    Filed: November 20, 2007
    Publication date: April 29, 2010
    Inventors: Michael Arnz, Gerd Klose, Michael Totzeck
  • Publication number: 20100079739
    Abstract: A projection objective for applications in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for microstructured components, and a component manufactured using such a manufacturing method are disclosed.
    Type: Application
    Filed: November 24, 2009
    Publication date: April 1, 2010
    Applicant: CARL ZEISS SMT AG
    Inventors: Aksel Goehnermeier, Daniel Kraehmer, Vladimir Kamenov, Michael Totzeck
  • Publication number: 20100079741
    Abstract: A projection objective for use in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for microstructured components, and a component manufactured under the manufacturing method are disclosed.
    Type: Application
    Filed: November 24, 2009
    Publication date: April 1, 2010
    Applicant: CARL ZEISS SMT AG
    Inventors: Daniel Kraehmer, Vladimer Kamenov, Michael Totzeck
  • Publication number: 20090323042
    Abstract: An optical system, such as an illumination device or a projection objective of a microlithographic projection exposure apparatus, is disclosed. The optical system can include a polarization compensator which has at least one polarization-modifying partial element. The optical system can also include a manipulator by which the position of the at least one partial element can be altered. At least one operating mode of the optical system can be set in which the intensity, over a region which belongs to a plane perpendicular to the optical axis and which can be illuminated with light from the light source, does not exceed 20% of the maximum intensity in the plane, and the manipulator is arranged in the region.
    Type: Application
    Filed: July 7, 2009
    Publication date: December 31, 2009
    Applicant: CARL ZEISS SMT AG
    Inventors: Michael Totzeck, Toralf Gruner, Damian Fiolka
  • Publication number: 20090306921
    Abstract: The present disclosure relates to specification, optimization and matching of optical systems by use of orientation Zernike polynomials. In some embodiments, a method for assessing the suitability of an optical system of a microlithographic projection exposure apparatus is provided. The method can include determining a Jones pupil of the optical system, at least approximately describing the Jones pupil using an expansion into orientation Zernike polynomials, and assessing the suitability of the optical system on the basis of the expansion coefficient of at least one of the orientation Zernike polynomials in the expansion.
    Type: Application
    Filed: April 10, 2009
    Publication date: December 10, 2009
    Applicant: CARL ZEISS SMT AG
    Inventors: Michael Totzeck, Daniel Kraehmer, Ralf Mueller, Johannes Ruoff, Vladan Blahnik
  • Publication number: 20090284831
    Abstract: A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element (L3) with an index of refraction greater than 1.6. This element (L3) has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume (L3?) which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.
    Type: Application
    Filed: December 9, 2008
    Publication date: November 19, 2009
    Applicant: CARL ZEISS SMT AG
    Inventors: Karl-Heinz Schuster, Heiko Feldmann, Toralf Gruner, Michael Totzeck, Wilfried Clauss, Susanne Beder, Daniel Kraehmer, Olaf Dittmann
  • Publication number: 20090213356
    Abstract: An illumination system for a microlithographic projection exposure apparatus includes an EUV light source which generates an emission beam of linearly polarized EUV illumination light. An illumination optics guides the emission beam along an optical axis which causes an illumination field in a reticle plane to be illuminated by the emission beam. The illumination system also includes an illumination subunit of the illumination system. The illumination subunit includes at least the EUV light source and a polarization setting device for setting a defined polarization of the EUV emission beam of the illumination subunit.
    Type: Application
    Filed: February 23, 2009
    Publication date: August 27, 2009
    Applicant: Carl Zeiss SMT AG
    Inventors: Toralf Gruner, Michael Totzeck
  • Publication number: 20090201478
    Abstract: A transmitting optical element (33, 37) adapted for use in an objective for a microlithographic projection exposure apparatus is composed of a polycrystalline material (100), with the polycrystalline material (100) having crystallites (102) with a cubic crystal structure, and with the mean crystallite size of these crystallites (102) being at least (0.5) micrometers, and at most (100) micrometers.
    Type: Application
    Filed: December 8, 2005
    Publication date: August 13, 2009
    Applicant: CARL ZEISS SMT AG
    Inventors: Wilfried Clauss, Michael Totzeck, Werner Mueller-Rissmann, Gisela Rissmann
  • Publication number: 20090174876
    Abstract: The disclosure relates to an optical apparatus including a light source that emits light in the form of light pulses having a pulse frequency, and including at least one optical element. The disclosure also relates to a projection exposure machine including a pulsed light source and a projection objective, and to a method for modifying the imaging behavior of such an apparatus, such as in a projection exposure machine.
    Type: Application
    Filed: January 21, 2009
    Publication date: July 9, 2009
    Applicant: CARL ZEISS SMT AG
    Inventors: Martin Schriever, Ulrich Wegmann, Stefan Hembacher, Bernhard Geuppert, Juergen Huber, Norbert Kerwien, Michael Totzeck, Markus Hauf
  • Patent number: 7535640
    Abstract: An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems is provided. The imaging system for emulating high-aperture scanner systems includes imaging optics, a detector and an evaluating unit, wherein at least one polarization-active optical element is arranged as desired in the imaging beam path for selection of different polarization components of the imaging beam, an optical element with intensity attenuation function can be introduced in the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing.
    Type: Grant
    Filed: August 20, 2004
    Date of Patent: May 19, 2009
    Assignee: Carl Zeiss SMS GmbH
    Inventors: Michael Totzeck, Ulrich Stroessner, Joern Greif-Wuestenbecker