Patents by Inventor Min-hyuck Kang

Min-hyuck Kang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9725550
    Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.
    Type: Grant
    Filed: December 8, 2015
    Date of Patent: August 8, 2017
    Assignees: Samsung Display Co., Ltd., KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION, SOGANG UNIVERSITY RESEARCH FOUNDATION
    Inventors: Min Hyuck Kang, Su Mi Lee, Myung Im Kim, Tae Woo Kim, Seung-Won Park, Xie Lei, Na Na Kang, Bong-Jin Moon, Joona Bang, Sang Hoon Woo, Jin Yeong Lee, Hyun Jung Jung, June Huh
  • Patent number: 9612379
    Abstract: A method of fabricating a wire grid polarizer includes sequentially forming a conductive layer, a guide layer, and a surface treatment protection layer on a substrate, patterning the surface treatment protection layer and the guide layer, forming a surface treatment film on side surfaces and upper surfaces of the first and second patterns, removing the first and second surface treatment protection patterns from the respective first and second patterns on which the surface treatment film is formed, to expose upper surfaces of the first and second guide patterns and providing a block copolymer of two monomers having mutually different etch rates into a space defined by the conductive layer and the first and second guide patterns, wherein a transfer layer which is hydrophobic to the block copolymer of two monomers is formed on the upper surfaces of the first and second guide patterns.
    Type: Grant
    Filed: May 5, 2015
    Date of Patent: April 4, 2017
    Assignee: Samsung Display Co., Ltd.
    Inventors: Eun Ae Kwak, Min Hyuck Kang, Hyeong Gyu Jang
  • Publication number: 20170090285
    Abstract: A method of manufacturing a wire grid pattern includes providing a laminate having a base member, a metal layer disposed on the base member, a mask layer disposed on the metal layer and containing a metal oxide, an adhesive layer disposed on the mask layer, and a patterned resin layer disposed on the adhesive layer and formed by irradiation of first light; and irradiating the laminate with second light. The adhesive layer may comprise a silane coupling agent.
    Type: Application
    Filed: May 31, 2016
    Publication date: March 30, 2017
    Inventors: Min Hyuck Kang, Eun Ae Kwak, Dong Eon Lee, Gug Rae Jo
  • Patent number: 9488765
    Abstract: A wire grid polarizer includes a substrate, and a plurality of wire patterns which is arranged on the substrate at periodic intervals, where the wire patterns include first wire patterns, which are disposed on the substrate, and one or more second wire patterns, which are disposed on one or more of the first wire patterns each of the second wire patterns including at least one of a neutral pattern, a surface treatment pattern and first and second monomer block patterns.
    Type: Grant
    Filed: October 27, 2015
    Date of Patent: November 8, 2016
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Min Hyuck Kang, Hyeong Gyu Jang, Eun Ae Kwak, Moon Gyu Lee
  • Publication number: 20160313481
    Abstract: The wire grid polarizer plate includes a light permeable substrate and a conductive pattern layer arranged on one surface of the light permeable substrate, the conductive pattern layer includes window regions and at least one reflective region arranged in a rectangular region which is circumscribed to the window regions, the window regions have target patterns including conductive simple closed curves surrounding in piles, spaced apart from each other at an interval of a period which is shorter than a wavelength of incident light, transmit first polarized light of the incident light and reflect second polarized light which is perpendicular to the first polarized light and the reflective regions reflect both of the first polarized light and the second polarized light.
    Type: Application
    Filed: January 7, 2016
    Publication date: October 27, 2016
    Inventors: Seung Won PARK, Tae Woo KIM, Min Hyuck KANG, Dae Ho YOON, Moon Gyu LEE
  • Publication number: 20160288373
    Abstract: An imprint lithography method includes providing a substrate, forming a first imprint pattern, forming a first resist pattern, etching an object, removing the first resist pattern, forming a second imprint pattern, forming a second resist pattern, etching the object and removing the second resist pattern. The substrate includes a first area, a second area, a third area, and a fourth area. The first imprint pattern is formed on the base substrate in the first and third area. The first resist pattern is formed configured to cover the second area on the base substrate on which the first imprint pattern is formed. The second imprint pattern is formed on the base substrate in the second and fourth areas. The second resist pattern is formed configured to cover the first area on the base substrate on which the second imprint pattern.
    Type: Application
    Filed: October 13, 2015
    Publication date: October 6, 2016
    Inventors: Tae-Woo Kim, Jung-Gun Nam, Min-Hyuck Kang, Dae-Young Lee, Gug-Rae Jo
  • Publication number: 20160274285
    Abstract: A wire grid polarizer includes a substrate, and a plurality of wire patterns which is arranged on the substrate at periodic intervals, where the wire patterns include first wire patterns, which are disposed on the substrate, and one or more second wire patterns, which are disposed on one or more of the first wire patterns each of the second wire patterns including at least one of a neutral pattern, a surface treatment pattern and first and second monomer block patterns.
    Type: Application
    Filed: October 27, 2015
    Publication date: September 22, 2016
    Inventors: Min Hyuck KANG, Hyeong Gyu JANG, Eun Ae KWAK, Moon Gyu LEE
  • Patent number: 9400346
    Abstract: A display device includes a reflective polarizer plate including a first substrate defining an opening area and a non-opening area, and a wire grid polarizer which is disposed on a surface of the first substrate and includes a polarizing part including a plurality of nano wire patterns which is arranged in the opening area to be spaced apart from each other, and a reflecting part including a metal film provided in the non-opening area.
    Type: Grant
    Filed: December 17, 2014
    Date of Patent: July 26, 2016
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Tae-Woo Kim, Cheol-Kyu Kim, Min Kang, Min-Hyuck Kang, Bong-Yeon Kim, Seung-Won Park, Moon-Gyu Lee
  • Publication number: 20160178822
    Abstract: A method of fabricating a wire grid polarizer includes sequentially forming a conductive layer, a guide layer, and a surface treatment protection layer on a substrate, patterning the surface treatment protection layer and the guide layer, forming a surface treatment film on side surfaces and upper surfaces of the first and second patterns, removing the first and second surface treatment protection patterns from the respective first and second patterns on which the surface treatment film is formed, to expose upper surfaces of the first and second guide patterns and providing a block copolymer of two monomers having mutually different etch rates into a space defined by the conductive layer and the first and second guide patterns, wherein a transfer layer which is hydrophobic to the block copolymer of two monomers is formed on the upper surfaces of the first and second guide patterns.
    Type: Application
    Filed: May 5, 2015
    Publication date: June 23, 2016
    Inventors: Eun Ae KWAK, Min Hyuck KANG, Hyeong Gyu JANG
  • Publication number: 20160170115
    Abstract: A method of manufacturing a wire grid polarizer is provided. The method includes: forming an electrical conductive layer on a substrate; forming a guide pattern layer on the electrical conductive layer, wherein the guide pattern layer includes two or more linear structures separated from one another; forming a fluorocarbon surface modification layer on each of the linear structures using a fluorine-based gas plasma treatment; and forming a neutral layer on the electrical conductive layer, wherein the neutral layer has a nonselective affinity with repeating units of a block copolymer.
    Type: Application
    Filed: April 8, 2015
    Publication date: June 16, 2016
    Inventors: Tae Woo KIM, Min Hyuck KANG, Eun Ae KWAK, Moon Gyu LEE, Hyeong Gyu JANG
  • Patent number: 9354522
    Abstract: A block copolymer includes: a first block, and a second block copolymerized with the first block. The second block includes a silyl group including a ring-type functional group.
    Type: Grant
    Filed: August 22, 2014
    Date of Patent: May 31, 2016
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Min Hyuck Kang, Tae Woo Kim, Myung Im Kim, Moon Gyu Lee, Su Mi Lee, Seung-Won Park, Lei Xie, Bong-Jin Moon, Na Na Kang
  • Publication number: 20160131811
    Abstract: Provided is a method of fabricating a wire grid polarizer, the method comprising an organic light-emitting display panel. According to an aspect of the present disclosure, there is provided a method comprising sequentially stacking a conductive wire pattern layer, a first neutral layer, a guide pattern layer and a second neutral layer on a substrate, forming etch-stop patterns on the second neutral layer, forming second neutral layer patterns and guide patterns by patterning the second neutral layer and the guide pattern layer using the etch-stop patterns, coating a block copolymer of two types of monomer blocks having different etch rates on the first neutral layer and the second neutral layer patterns, aligning the block copolymer, removing one type of monomer blocks from the aligned block copolymer, and patterning the conductive wire pattern layer using the remaining monomer blocks, the second neutral layer patterns, and the guide patterns.
    Type: Application
    Filed: March 25, 2015
    Publication date: May 12, 2016
    Inventors: Su Mi LEE, Min Hyuck KANG
  • Publication number: 20160090435
    Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.
    Type: Application
    Filed: December 8, 2015
    Publication date: March 31, 2016
    Inventors: Min Hyuck KANG, Su Mi LEE, Myung Im KIM, Tae Woo KIM, Seung-Won PARK, Xie LEI, Na Na KANG, Bong-Jin MOON, Joona BANG, Sang Hoon WOO, Jin Yeong LEE, Hyun Jung JUNG, June HUH
  • Publication number: 20160077263
    Abstract: A method of fabricating a wire grid polarizer includes sequentially depositing a conductive wire pattern layer, and a plurality of guide patterns which forms one or more trenches therebetween on the conductive wire pattern layer, hydrophobically treating surfaces of the conductive wire pattern layer exposed in the trenches, and the guide patterns, coating the hydrophobically treated conductive wire pattern layer in the trenches with a neutral layer to partially fill the trenches, filling a remainder of the trenches with a block copolymer of two monomers with different etching rates, aligning the block copolymer filled in the trenches, selectively removing blocks of one monomer among the two monomers from the aligned block copolymer, and patterning the conductive wire pattern layer by using blocks of the other monomer among the two monomers remaining in the trenches and the guide patterns as a mask.
    Type: Application
    Filed: February 17, 2015
    Publication date: March 17, 2016
    Inventors: Eun Ae KWAK, Min Hyuck KANG, Moon Gyu LEE
  • Publication number: 20160077264
    Abstract: A pattering method includes forming guide layer patterns, which are separated from each other, on a top surface of a base substrate, forming a neutral layer, which includes a random copolymer comprising first blocks or second blocks, on an entirety of the top surface of the base substrate exposed between the guide layer patterns, forming hydrophobic layer patterns which extend from top surfaces of the guide layer patterns to side surfaces of the guide layer patterns and are separated from each other, coating a block copolymer, which comprises the first blocks and the second blocks, on a top surface of the neutral layer exposed between the hydrophobic layer patterns, alternately arranging the first blocks and the second blocks by heat-treating or solvent-annealing the block copolymer, and forming block copolymer patterns by removing the first blocks or the second blocks.
    Type: Application
    Filed: February 23, 2015
    Publication date: March 17, 2016
    Inventors: Min Hyuck KANG, Eun Ae KWAK, Lei XIE, Moon Gyu LEE, Hyeong Gyu JANG
  • Patent number: 9255170
    Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.
    Type: Grant
    Filed: November 21, 2013
    Date of Patent: February 9, 2016
    Assignees: SAMSUNG DISPLAY CO., LTD., KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION, SOGANG UNIVERSITY RESEARCH FOUNDATION
    Inventors: Min Hyuck Kang, Su Mi Lee, Myung Im Kim, Tae Woo Kim, Seung-Won Park, Xie Lei, Na Na Kang, Bong-Jin Moon, Joona Bang, Sang Hoon Woo, Jin Yeong Lee, Hyun Jung Jung, June Huh
  • Patent number: 9140917
    Abstract: A method of forming a micropattern structure includes: coating a structure including a plurality of guide blocks extending in a first direction on a substrate and disposed to be spaced apart from each other in a second direction, which is perpendicular to the first direction, with a sacrificial material; ashing a portion of the sacrificial material to expose upper portions of the plurality of guide blocks; coating the structure with a first material having a polarity that is contrary to a polarity of a filling material filling the structure; heat-treating the structure to chemically bond the first material to the upper portions of the plurality of guide blocks; removing the sacrificial material and excess first material to form a first material cap chemically bonded to the upper portions of the plurality of guide blocks; and filling the structure with the filling material.
    Type: Grant
    Filed: December 17, 2013
    Date of Patent: September 22, 2015
    Assignee: Samsung Display Co., Ltd.
    Inventors: Su Mi Lee, Min Hyuck Kang, Myung Im Kim, Tae Woo Kim, Seung-Won Park, Xie Lei, Moon Gyu Lee
  • Publication number: 20150226897
    Abstract: A display device includes a reflective polarizer plate including a first substrate defining an opening area and a non-opening area, and a wire grid polarizer which is disposed on a surface of the first substrate and includes a polarizing part including a plurality of nano wire patterns which is arranged in the opening area to be spaced apart from each other, and a reflecting part including a metal film provided in the non-opening area.
    Type: Application
    Filed: December 17, 2014
    Publication date: August 13, 2015
    Inventors: Tae-Woo KIM, Cheol-Kyu KIM, Min KANG, Min-Hyuck KANG, Bong-Yeon KIM, Seung-Won PARK, Moon-Gyu LEE
  • Publication number: 20150218300
    Abstract: A block copolymer includes: a first block, and a second block copolymerized with the first block. The second block includes a silyl group including a ring-type functional group.
    Type: Application
    Filed: August 22, 2014
    Publication date: August 6, 2015
    Inventors: MIN HYUCK KANG, Tae Woo Kim, Myung Im Kim, Moon Gyu Lee, Su Mi Lee, Seung-Won Park, Lei Xie, Bong-Jin Moon, Na Na Kang
  • Patent number: 9074055
    Abstract: An approach is provided for manufacturing a nanostructure. A first thin film including a first block copolymer is formed on a substrate. A guide pattern is formed on the first thin film. A second thin film including a second block copolymer is formed between portions of the guide pattern. The second thin film is cured. The first block copolymer is a cylinder-type and the second block copolymer is a lamella-type.
    Type: Grant
    Filed: April 25, 2013
    Date of Patent: July 7, 2015
    Assignees: Samsung Display Co., Ltd., Korea University Research and Business Foundation
    Inventors: Eun-Ae Kwak, Min-Hyuck Kang, Su Mi Lee, Jun Han Lee, Moon Gyu Lee, Joona Bang, Hyun Jung Jung