Abstract: A block copolymer includes: a first block, and a second block copolymerized with the first block. The second block includes a silyl group including a ring-type functional group.

Abstract: An approach is provided for manufacturing a nanostructure. A first thin film including a first block copolymer is formed on a substrate. A guide pattern is formed on the first thin film. A second thin film including a second block copolymer is formed between portions of the guide pattern. The second thin film is cured. The first block copolymer is a cylinder-type and the second block copolymer is a lamella-type.

Abstract: A method of forming a micropattern structure includes: coating a structure including a plurality of guide blocks extending in a first direction on a substrate and disposed to be spaced apart from each other in a second direction, which is perpendicular to the first direction, with a sacrificial material; ashing a portion of the sacrificial material to expose upper portions of the plurality of guide blocks; coating the structure with a first material having a polarity that is contrary to a polarity of a filling material filling the structure; heat-treating the structure to chemically bond the first material to the upper portions of the plurality of guide blocks; removing the sacrificial material and excess first material to form a first material cap chemically bonded to the upper portions of the plurality of guide blocks; and filling the structure with the filling material.

Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.

Abstract: A random copolymer having a structure represented by the following Formula 1: wherein R is phosphonic acid, Me is a methyl group, x is a number of styrene units, and y is a number of methyl methacrylate units.

Abstract: A random copolymer having a structure represented by the following Formula 1: wherein R is phosphonic acid, Me is a methyl group, x is a number of styrene units, and y is a number of methyl methacrylate units.

Abstract: The present invention relates to a free radical initiator and a method for peptide sequencing using the same. Compared with diazo or peroxy functionalized precursors, the precursors using the present compounds are chemically more robust and can generate radical species by homolytic cleavage upon thermal activation, enabling sequencing of a wider variety of peptides. In addition, the present invention makes it feasible to sequence peptides carrying disulfide bonds.

Abstract: The present invention relates to a free radical initiator and a method for peptide sequencing using the same. Compared with diazo or peroxy functionalized precursors, the precursors using the present compounds are chemically more robust and can generate radical species by homolytic cleavage upon thermal activation, enabling sequencing of more various peptides. In addition, the present invention makes it feasible to sequence peptides carrying disulfide bonds.