Patents by Inventor Min Young Lim

Min Young Lim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100331439
    Abstract: Disclosed is a multifunctional urethane monomer prepared by reacting (a) an epoxy compound having two or more epoxy groups, (b) a diol compound having an acidic group and (c) a compound having an ethylenically unsaturated group and an isocyanate group with one another. The photosensitive resin composition comprising the multifunctional urethane monomer has low viscosity, superior sensitivity, excellent chemical resistance and heat-resistance and high development margin.
    Type: Application
    Filed: June 30, 2009
    Publication date: December 30, 2010
    Inventors: Yoon Hee Heo, Min Young Lim, Ho Chan Ji, Sung-Hyun Kim, Han Soo Kim, Sun Hwa Kim
  • Publication number: 20100323295
    Abstract: The present invention relates to a novel alkali-developable resin, a method of producing the alkali-developable resin, a photosensitive resin composition including the alkali-developable resin, and a device that is manufactured by using the photosensitive composition. In the case of when the alkali-developable resin is used as a component of the photosensitive composition, the photosensitivity, the developability and the film remaining rate of the pattern are improved.
    Type: Application
    Filed: February 11, 2008
    Publication date: December 23, 2010
    Inventors: Min-Young Lim, Han-Soo Kim, Yoon-Hee Heo, Ji-Heum Yoo, Sung-Hyun Kim
  • Patent number: 7795361
    Abstract: Provided are a photoreactive polymer that includes a multi-cyclicmulticyclic compound at as its main chain and a method of preparing the same. The photoreactive polymer exhibits excellent thermal stability since it includes a multi-cyclicmulticyclic compound having a high glass transition temperature at as its main chain. In addition, the photoreactive polymer has a relatively large vacancy so that a photoreactive group can move relatively freely in the main chain therein. As a result, a slow photoreaction rate, which is a disadvantage of a conventional polymer material used to form an alignment layer for a liquid crystal display device, can be overcome.
    Type: Grant
    Filed: January 5, 2006
    Date of Patent: September 14, 2010
    Assignee: LG Chem, Ltd.
    Inventors: Heon Kim, Sung Ho Chun, Keon Woo Lee, Sung Joon Oh, Kyungjun Kim, Jungho Jo, Byung Hyun Lee, Min Young Lim, Hye Won Jeong
  • Publication number: 20100201925
    Abstract: Provided is a novel fluorene-based polymer having urethane bonds and a method for preparing the fluorene-based polymer. According to the method, a diol compound is condensed with a diisocyanate instead of an acid dianhydride, and then an acid anhydride is reacted with the reaction mixture to introduce desired acid groups into the final polymer. Further provided is a negative-type photosensitive resin composition comprising of the fluorene-based polymer as a binder resin. The composition exhibits improved chemical resistance, good development margin and high sensitivity due to presence of the acid groups despite the low molecular weight of the fluorene-based polymer.
    Type: Application
    Filed: September 26, 2008
    Publication date: August 12, 2010
    Applicant: LG CHEM LTD.
    Inventors: Han Soo Kim, Sung Hyun Kim, Dong Chang Choi, Kyung Soo Choi, Ho Chan Ji, Min Young Lim, Geun Young Cha, Yoon Hee Heo, Ji Heum Yoo, Sun Hwa Kim
  • Publication number: 20100196824
    Abstract: An alkali-soluble resin is provided. The alkali-soluble resin is prepared using a polyfunctional thiol compound as a chain transfer agent. The alkali-soluble resin has a lower viscosity than a resin having the same molecular weight. Further provided is a negative-type photosensitive resin composition comprising the alkali-soluble resin as a binder resin. The use of the alkali-soluble resin lowers the overall viscosity of the photosensitive resin composition to effectively reduce the height of a stepped portion of a photoresist pattern using a small amount of the photosensitive resin composition.
    Type: Application
    Filed: October 6, 2008
    Publication date: August 5, 2010
    Applicant: LG CHEM, LTD.
    Inventors: Han Soo Kim, Sung Hyun Kim, Kwang Han Park, Min Young Lim, Yoon Hee Heo, Ji Heum Yoo, Sun Hwa Kim
  • Publication number: 20100179294
    Abstract: A heat-curable ink composition and a color filter produced using the ink composition are provided. The ink composition and the color filter are highly resistant to heat and chemicals due to the use of a polyester resin prepared by polycondensation. In addition, unreacted anhydride groups are removed using a monohydric alcohol in the preparation of the ink composition to make the ink composition and the color filter very stable during storage.
    Type: Application
    Filed: August 26, 2008
    Publication date: July 15, 2010
    Applicant: LG CHEM. LTD.
    Inventors: Dae Hyun Kim, Han Soo Kim, Mi Ae Kim, Dong Myung Shin, Jae Joon Kim, Jin Woo Cho, Ji Su Kim, Mi Kyoung Kim, Min A. Yu, Min Young Lim, Sung Hyun Kim
  • Publication number: 20100168266
    Abstract: Provided are a photosensitive resin and a photosensitive resin composition comprising the photosensitive resin. The photosensitive resin has the structure of Formula 1, which is described in the specification. The photosensitive resin and the photosensitive resin composition have good sensitivity, improved resistance to heat and chemicals, and excellent storage stability. Further provided are a method for preparing the photosensitive resin and a cured product of the photosensitive resin composition.
    Type: Application
    Filed: August 20, 2008
    Publication date: July 1, 2010
    Applicant: LG CHEM, LTD.
    Inventors: Min Young Lim, Sung Hyung Kim, Han Soo Kim, Yoon Hee Heo, Dae Hyun Kim, Ji Heum Yoo, Sun Hwa Kim
  • Publication number: 20100104981
    Abstract: A colored dispersion according to the present invention comprises a resin including monomers of Formulas 1 to 4, as a binder resin. Accordingly, a photoresist composition for a black matrix of a high light shielding property, which has the dispersion stability of the colored dispersion according to the present invention, could be provided, and a black matrix of high sensibility having an uniform process characteristic while maintaining a high light-shielding property could be produced.
    Type: Application
    Filed: November 10, 2008
    Publication date: April 29, 2010
    Inventors: Dong Chang Choi, Kyung Soo Choi, Ho Chan Ji, Geun Young Cha, Min Young Lim, Sung Hyun Kim, Han soo Kim, Yoon Hee Heo, Ji Heum Yoo
  • Publication number: 20100105793
    Abstract: The present invention relates to a polymer resin compound including a new polycyclic compound, and a photosensitive resin composition including the polymer resin compound as an effective binder matrix. In particular, the photosensitive resin composition according to the present invention uses a polymer resin compound, which includes a compound having double cyclic structure in one molecule as a monomer, as a binder matrix. Accordingly, the photosensitive resin composition has an excellent photosensitivity and an excellent developing property, and has a low distortion property during plastic processing. For this reason, the photosensitive resin composition has an advantage of curing various transparent photosensitive materials used to manufacture a color filter of a liquid crystal display, for example, a column spacer, an overcoat, a passivation material, and the like.
    Type: Application
    Filed: January 15, 2008
    Publication date: April 29, 2010
    Inventors: Keon-Woo Lee, Sung-Hyun Kim, Chang-Ho Cho, Dong-Kung Oh, Min-Young Lim, Ji-Heum Yoo, Sang-Kyu Kwak
  • Publication number: 20100081089
    Abstract: The present invention relates to a photosensitive resin composition that includes a polymer prepared by using a macromonomer as an alkali soluble resin. The photosensitive resin composition is used for various types of purposes such as a photoresist for preparing a color filter, an overcoat photoresist, a column spacer, and an insulating material having a light blocking property, and improves physical properties such as residue or not, chemical resistance, and heat resistance of the photoresist.
    Type: Application
    Filed: April 11, 2008
    Publication date: April 1, 2010
    Inventors: Han-Soo Kim, Min-Young Lim, Yoon-Hee Heo, Ji-Heum Yoo, Sung-Hyun Kim, Kwang-Han Park
  • Publication number: 20100051883
    Abstract: The present invention relates to a composition for preparing a curable resin, comprising a) a compound represented by Formula 1; b) glycidyl (meth)acrylate; c) acid monoanhydride; and d) a solvent, a curable resin manufactured by the composition, and an ink composition comprising the same. The curable resin has a low viscosity and excellent flow properties, and the ink composition is excellent in terms of storage stability, heat resistance and chemical resistance.
    Type: Application
    Filed: April 11, 2008
    Publication date: March 4, 2010
    Applicant: LG CHEM LTD
    Inventors: Min-Young Lim, Jae-Joon Kim, Mi-Ae Kim, Dae-Hyun Kim, Han-Soo Kim, Yoon-Hee Heo, Ji-Heum Yoo, Sung-Hyun Kim
  • Publication number: 20100029892
    Abstract: The present invention relates to a fluorene-based resin polymer having a repeating unit of Formula 1 and a method for preparing the same. The fluorene-based resin polymer has a high molecular weight and low acid value, and has an excellent developing property, adhesive property, and stability.
    Type: Application
    Filed: January 21, 2008
    Publication date: February 4, 2010
    Inventors: Yoon-Hee Heo, Kyung-Soo Choi, Han-Soo Kim, Min-Young Lim, Ji-Heum Yoo
  • Patent number: 7655284
    Abstract: Disclosed is a multi-functional monomer including a heat-curable functional group as well as a typical photoreactive group. In the multi-functional monomer, the photoreactive group is not chained to a main chain of a polymer. Thus, since it is possible to perform desirable alignment treatment even though polarized UV is radiated for a short time, the production time and the production cost are reduced and alignment regulating force of liquid crystals is increased, thereby increasing a dichroic ratio.
    Type: Grant
    Filed: September 22, 2006
    Date of Patent: February 2, 2010
    Assignee: LG Chem, Ltd.
    Inventors: Kyung Jun Kim, Keon Woo Lee, Byung Hyun Lee, Min Young Lim, Hye Won Jeong, Jung Ho Jo, Heon Kim, Sung Joon Oh, Sung Ho Chun
  • Patent number: 7556910
    Abstract: The present invention relates to a photosensitive composition comprising a triazine-based photoactive compound containing oxime ester. The photosensitive composition according to the present invention has good sensitivity, retention rate, mechanical strength, heat resistance, chemical resistance and developing durability since it contains, as photopolymerization initiator, a compound having an oxime ester group and a triazine group in one molecule and thus effectively absorbs UV radiation. Therefore, the photosensitive composition according to the present invention is advantageous not only in curing of materials for color filters, resin black matrixes, column spacers, overcoats and passivation films of liquid crystal displays, but also in high temperature process characteristics.
    Type: Grant
    Filed: November 29, 2006
    Date of Patent: July 7, 2009
    Assignee: LF Chem, Ltd.
    Inventors: Sung Hyun Kim, Kyung Jun Kim, Dong Chang Choi, Jeong Ae Yoon, Hee Kwan Park, Geun Young Cha, Keon Woo Lee, Il Eok Kwon, Dong Kung Oh, Jong Hyun Park, Xiang Li Li, Han Soo Kim, Min Young Lim, Chang Ho Cho
  • Patent number: 7541073
    Abstract: The present invention provides a composition for forming a liquid crystal alignment film, which comprises a photoreactive polymer including a multicyclic compound having a photoreactive group on a main chain thereof. The present invention also provides a liquid crystal alignment film produced using the composition, and a liquid crystal display including the liquid crystal alignment film. The photoreactive polymer including the multicyclic compound on the main chain thereof has a high glass transition temperature, thus thermal stability is excellent. Since lattice vacancy is relatively large, the photoreactive group is capable of moving relatively freely in the main chain of the polymer, thus it is possible to improve a slow photoreaction rate, which is considered a disadvantage of a conventional polymer material.
    Type: Grant
    Filed: January 19, 2006
    Date of Patent: June 2, 2009
    Assignee: LG Chem, Ltd.
    Inventors: Kyung Jun Kim, Keon Woo Lee, Byung Hyun Lee, Min Young Lim, Hye Won Jeong, Sung Ho Chun, Heon Kim, Sung Joon Oh
  • Patent number: 7449574
    Abstract: The present invention relates to a triazine based photoactive compound containing an oxime ester group. The compound according to the present invention is a photoactive compound containing both an oxime ester group and a triazine group in one molecule, has excellent radical-generating efficiency due to effective absorption of UV radiation, particularly i-line (365 nm) radiation and can function as an effective initiator for photopolymerization of various compounds containing unsaturated groups, particularly an acryl compound.
    Type: Grant
    Filed: November 6, 2006
    Date of Patent: November 11, 2008
    Assignee: LG Chem, Ltd.
    Inventors: Sung Hyun Kim, Jeong Ae Yoon, Raisa Kharbash, Han Soo Kim, Xiang Li Li, Min Young Lim, Chang Ho Cho
  • Patent number: 7422778
    Abstract: Provided are a photoreactive compound represented by formula (1), a liquid crystal alignment layer using the compound, a method of manufacturing the alignment layer, and a liquid crystal display device including the alignment layer: where n is an integer of 20-1000; m is an integer of 1-5; and R is a hydrogen atom, CN, a C1-C5 alkyloxy group, a halogen atom, or a maleimide group.
    Type: Grant
    Filed: December 2, 2005
    Date of Patent: September 9, 2008
    Assignee: LG Chem, Ltd.
    Inventors: Byung Hyun Lee, Min Young Lim, Kyungjun Kim, Sung Ho Chun, Sung Joon Oh, Keon Woo Lee, Heon Kim, Hye Won Jeong