Patents by Inventor Minako Kobayashi

Minako Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming fine resist pattern
    Patent number: 5340702
    Abstract: A resist pattern is formed by(a) forming a thick film of a positive photoresist on a substrate,(b) forming a light-shielding film directly on a surface of the thick film of the positive photoresist,(c) processing the light-shielding film into a pattern,(d) exposing the thick film of the positive photoresist to light, and(e) developing the exposed, thick film of the positive photoresist.According to this method, a thick, fine pattern of a photoresist can be accurately and advantageously formed.
    Type: Grant
    Filed: August 27, 1992
    Date of Patent: August 23, 1994
    Assignee: Japan Synthetic Rubber Co., Ltd.
    Inventors: Hiroyuki Hirasawa, Minako Kobayashi, Yasuo Matsuki
  • Tissue paper case having an inclined lid member with concave undercut portions to guide the fingers of a user
    Patent number: 4969575
    Abstract: A tissue paper case includes a case body having a lifting plate urged upwardly by a spring and adapted to allow a stack of tissue paper sheets to be placed thereon and a lid member formed substantially in the shape of a gable roof having a peak and provided along the peak with a takeout hole and in the intermediate portion thereof with an undercut portion, whereby the tissue paper sheet which is partly drawn out from the takeout hole is supported in an upwardly projecting state so as to facilitate successively removing the tissue paper sheets one by one.
    Type: Grant
    Filed: June 23, 1989
    Date of Patent: November 13, 1990
    Inventor: Minako Kobayashi