Patents by Inventor Ming Yang

Ming Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12156450
    Abstract: The present application relates to a display panel, a manufacturing method thereof, and a display device. The display panel includes a base substrate, a plurality of pixel structures on the base substrate, and a color resist layer on a side of the plurality of pixel structures facing away the base substrate. The color resist layer includes a plurality of color resist blocks in one-to-one correspondence with the plurality of pixel structures. Light emitted from each of the plurality of pixel structures has the same color as the color resist block corresponding thereto.
    Type: Grant
    Filed: May 24, 2022
    Date of Patent: November 26, 2024
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Can Wang, Can Zhang, Xiaochuan Chen, Minghua Xuan, Han Yue, Ming Yang, Ning Cong
  • Patent number: 12156376
    Abstract: A two-phase immersion-type heat dissipation structure having a porous structure is provided. The two-phase immersion-type heat dissipation structure includes a heat dissipation substrate, a plurality of fins, and a reinforcement frame. The heat dissipation substrate has a fin surface and a non-fin surface that face away from each other, the non-fin surface is configured to be in contact with a heat source immersed in a two-phase coolant, and the fins are integrally formed on the fin surface. A porous structure is covered onto at least one portion of the fin surface and at least one portion of the plurality of fins, and has a porosity of from 10% to 50% and a thickness that is from 0.1 mm to 1 mm. The reinforcement frame is bonded to the heat dissipation substrate and surrounds another one portion of the plurality of fins.
    Type: Grant
    Filed: November 1, 2022
    Date of Patent: November 26, 2024
    Assignee: AMULAIRE THERMAL TECHNOLOGY, INC.
    Inventors: Ching-Ming Yang, Chun-Te Wu, Tze-Yang Yeh
  • Patent number: 12153346
    Abstract: An organometallic precursor for extreme ultraviolet (EUV) lithography is provided. An organometallic precursor includes a chemical formula of MaXbLc, where M is a metal, X is a multidentate aromatic ligand that includes a pyrrole-like nitrogen and a pyridine-like nitrogen, L is an extreme ultraviolet (EUV) cleavable ligand, a is between 1 and 2, b is equal to or greater than 1, and c is equal to or greater than 1.
    Type: Grant
    Filed: February 17, 2021
    Date of Patent: November 26, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chih-Cheng Liu, Yi-Chen Kuo, Yen-Yu Chen, Jr-Hung Li, Chi-Ming Yang, Tze-Liang Lee
  • Publication number: 20240385523
    Abstract: Method of manufacturing semiconductor device includes forming photoresist layer over substrate. Forming photoresist layer includes combining first precursor and second precursor in vapor state to form photoresist material, wherein first precursor is organometallic having formula: MaRbXc, where M at least one of Sn, Bi, Sb, In, Te, Ti, Zr, Hf, V, Co, Mo, W, Al, Ga, Si, Ge, P, As, Y, La, Ce, Lu; R is substituted or unsubstituted alkyl, alkenyl, carboxylate group; X is halide or sulfonate group; and 1?a?2, b?1, c?1, and b+c?5. Second precursor is at least one of an amine, a borane, a phosphine. Forming photoresist layer includes depositing photoresist material over the substrate. The photoresist layer is selectively exposed to actinic radiation to form latent pattern, and the latent pattern is developed by applying developer to selectively exposed photoresist layer to form pattern.
    Type: Application
    Filed: July 31, 2024
    Publication date: November 21, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chih-Cheng LIU, Yi-Chen KUO, Jia-Lin WEI, Ming-Hui WENG, Yen-Yu CHEN, Jr-Hung LI, Yahru CHENG, Chi-Ming YANG, Tze-Liang LEE, Ching-Yu CHANG
  • Publication number: 20240385516
    Abstract: An organometallic precursor for extreme ultraviolet (EUV) lithography is provided. An organometallic precursor includes an aromatic di-dentate ligand, a transition metal coordinated to the aromatic di-dentate ligand, and an extreme ultraviolet (EUV) cleavable ligand coordinated to the transition metal. The aromatic di-dentate ligand includes a plurality of pyrazine molecules.
    Type: Application
    Filed: June 28, 2024
    Publication date: November 21, 2024
    Inventors: Chih-Cheng Liu, Yi-Chen Kuo, Yen-Yu Chen, Jr-Hung Li, Chi-Ming Yang, Tze-Liang Lee
  • Publication number: 20240387173
    Abstract: In a pattern formation method, a photoresist layer is formed over a substrate by combining a first precursor and a second precursor in a vapor state to form a photoresist material. The first precursor is an organometallic having a formula MaRbXc, where M is one or more selected from the group consisting of Sn, Bi, Sb, In, and Te, R is an alkyl group that is substituted by different EDG and/or EWG, X is a halide or sulfonate group, and 1?a?2, b?1, c?1, and b+c?4. The second precursor is water, an amine, a borane, and/or a phosphine. The photoresist material is deposited over the substrate, and selectively exposed to actinic radiation to form a latent pattern, and the latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a pattern.
    Type: Application
    Filed: July 26, 2024
    Publication date: November 21, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chih-Cheng LIU, Ming-Hui WENG, Jr-Hung LI, Yahru CHENG, Chi-Ming YANG, Tze-Liang LEE, Ching-Yu CHANG
  • Publication number: 20240385376
    Abstract: Optical devices, polarization rotators, and mode converters are provided. An optical device of the present disclosure includes a polarization rotator and a mode converter. The polarization rotator includes a straight waveguide segment having a first end and a second end, a first widening waveguide segment continuing from the second end, a first tapering waveguide segment continuing from the first widening waveguide segment, a second widening waveguide segment disposed over the first widening waveguide segment, and a second tapering waveguide segment continuing from the second widening waveguide segment. The mode converter includes a third tapering waveguide segment continuing from the second tapering waveguide segment, and a third widening waveguide segment disposed over the third tapering waveguide segment. An output end of the polarization rotator is coupled to an input end of the mode converter.
    Type: Application
    Filed: May 15, 2023
    Publication date: November 21, 2024
    Inventors: Ming Yang Jung, Lan-Chou Cho, Stefan Rusu, Cheng-Tse Tang, Tai-Chun Huang, You-Cheng Lu
  • Publication number: 20240385514
    Abstract: A method of manufacturing a semiconductor device includes forming a photoresist layer over a substrate, including combining a first precursor and a second precursor in a vapor state to form a photoresist material, and depositing the photoresist material over the substrate. A protective layer is formed over the photoresist layer. The photoresist layer is selectively exposed to actinic radiation through the protective layer to form a latent pattern in the photoresist layer. The protective layer is removed, and the latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a pattern.
    Type: Application
    Filed: July 26, 2024
    Publication date: November 21, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Ming-Hui WENG, Chen-Yu LIU, Chih-Cheng LIU, Yi-Chen KUO, Jia-Lin WEI, Yen-Yu CHEN, Jr-Hung LI, Yahru CHENG, Chi-Ming YANG, Tze-Liang LEE, Ching-Yu CHANG
  • Publication number: 20240377732
    Abstract: An organometallic precursor for extreme ultraviolet (EUV) lithography is provided. An organometallic precursor includes a chemical formula of MaXbLc, where M is a metal, X is a multidentate aromatic ligand that includes a pyrrole-like nitrogen and a pyridine-like nitrogen, L is an extreme ultraviolet (EUV) cleavable ligand, a is between 1 and 2, b is equal to or greater than 1, and c is equal to or greater than 1.
    Type: Application
    Filed: July 23, 2024
    Publication date: November 14, 2024
    Inventors: Chih-Cheng Liu, Yi-Chen Kuo, Yen-Yu Chen, Jr-Hung Li, Chi-Ming Yang, Tze-Liang Lee
  • Publication number: 20240379447
    Abstract: The present disclosure provides a dehydrating chemical for dehydrating a semiconductor substrate under an ambient temperature, including a first chemical having a melting point below the ambient temperature, and a second chemical having a melting point greater than the melting point of the first chemical, wherein the dehydrating chemical has a melting point less than the ambient temperature by predetermined ?T0 degrees, and at least one of the first chemical and the second chemical has a saturated vapor pressure greater than a predetermined pressure Psv under 1 atm.
    Type: Application
    Filed: July 25, 2024
    Publication date: November 14, 2024
    Inventors: CHUNG-CHIEH LEE, CHI-MING YANG, CHYI SHYUAN CHERN
  • Publication number: 20240377598
    Abstract: A co-packaged structure for optics and electrics includes a substrate, an optical module and an electrical connection layer. The optical module includes a carrier and an optical transceiver unit. The carrier is mounted on the substrate. The optical module is mounted on the carrier. The electrical connection layer is mounted on the substrate, and the carrier is electrically connected with a circuitry on the substrate through the electrical connection layer. A plurality of fiber accommodation through hole are formed on the substrate and correspond to the optical transceiver unit.
    Type: Application
    Filed: June 22, 2023
    Publication date: November 14, 2024
    Applicant: UNIMICRON TECHNOLOGY CORP.
    Inventors: Chin-Sheng WANG, Kai-Ming YANG, Chen-Hao LIN, Pu-Ju LIN
  • Patent number: 12140386
    Abstract: The heat-dissipating substrate structure includes a base layer and a cold spray coating layer. The cold spray coating layer is formed on a surface of the base layer. The cold spray coating layer is a film formed on the surface of the base layer by spraying a solid-phase metal powder and a high-pressure compressed gas onto the base layer. The solid-phase metal powder at least includes a film-forming powder with an apparent density of 3 to 4 g/cm3 and a median particle diameter (D50) of 30 ?m or less. A maximum depth of a bottom of the cold spray coating layer embedded in the base layer is less than 60 ?m. A cooler contains an internal cooling fin joined to the base layer. An internal coolant passage is defined between the base layer, the internal cooling fin, and an interior of the cooler.
    Type: Grant
    Filed: September 6, 2022
    Date of Patent: November 12, 2024
    Assignee: AMULAIRE THERMAL TECHNOLOGY, INC.
    Inventors: Ching-Ming Yang, Tze-Yang Yeh
  • Publication number: 20240370604
    Abstract: A method and apparatus for optimally configuring a capacity of a high-proportion new energy system, a device, and a medium, which belong to the field of new energy system optimization and are used for solving the problems of insufficient flexibility of the high-proportion new energy system during the heating period and difficult consumption of renewable energy. The method includes: constructing a high-proportion new energy system structure; establishing a concentrating solar power (CSP) unit model and a combined heat and power (CHP) unit model based on the proposed structure; establishing a high-proportion new energy system collaborative optimization model based on the proposed unit models; acquiring relevant data of various units and renewable resource data; and obtaining a capacity configuration and operation optimization scheme of various units in the high-proportion new energy system according to the established model, thereby improving the renewable energy consumption of the system.
    Type: Application
    Filed: February 8, 2024
    Publication date: November 7, 2024
    Applicants: SHANDONG UNIVERSITY, NORTH CHINA ELECTRIC POWER UNIVERSITY, SHANGHAI JIAO TONG UNIVERSITY, CHINA ELECTRIC POWER RESEARCH INSTITUTE
    Inventors: Tianguang LV, Jing Li, Fei Wang, Zhaohao Ding, Xing He, Wanxing Sheng, Rui Li, Haoyuan Cheng, Qian Ai, Ming Yang, Xueshan Han, Guibin Zou, Chengfu Wang
  • Publication number: 20240369785
    Abstract: A semiconductor device includes a plurality of intermediate waveguides. The plurality of intermediate waveguides are vertically disposed on top of one another, and vertically adjacent ones of the plurality of intermediate waveguides are laterally offset from each other. When viewed from the top, each of the plurality of intermediate waveguides essentially consists of a first portion and a second portion, the first portion has a first varying width that increases from a first end of the corresponding intermediate waveguide to a middle of the corresponding intermediate waveguide, and the second portion has a second varying width that decreases from the middle of the corresponding intermediate waveguide to a second end of the corresponding intermediate waveguide.
    Type: Application
    Filed: July 17, 2024
    Publication date: November 7, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Cheng-Tse Tang, Chewn-Pu Jou, Chih-Wei Tseng, Hsing-Kuo Hsia, Ming Yang Chung
  • Publication number: 20240368087
    Abstract: Provided is a compound of formula (I) in which Ar1, R1, U, V, W, X, and p are as described herein. Also provided are methods of using a compound of formula (I), including a method of treating cancer, a method of treating a patient with cancer cells resistant to an anti-cancer agent, and a method of inhibiting lactate dehydrogenase A (LDHA) and/or lactate dehydrogenase B (LDHB) activity in a cell.
    Type: Application
    Filed: February 5, 2024
    Publication date: November 7, 2024
    Inventors: David J. MALONEY, Alex Gregory WATERSON, Ganesh Rai BANTUKALLU, Kyle Ryan BRIMACOMBE, Plamen CHRISTOV, Chi V. DANG, Victor DARLEY-USMAR, Xin HU, Ajit JADHAV, Somnath JANA, Kwangho KIM, Jennifer L. KOUZNETSOVA, William J. MOORE, Bryan T. MOTT, Leonard M. NECKERS, Anton SIMEONOV, Gary Allen SULIKOWSKI, Daniel Jason URBAN, Shyh Ming YANG
  • Publication number: 20240365734
    Abstract: A vertical farming system includes a support unit, at least one planting assembly, and a water circulation assembly. The support unit includes a fixing rack provided with at least one positioning portion. The at least one planting assembly includes a hanging member and at least one plant container hung below the fixing rack through the hanging member and having a drainage hole. The hanging member has a head detachably engaged with the positioning portion. The water circulation assembly includes a nutrient device and a pipeline having at least one outlet hole and at least one collection hole. The nutrient device is disposed on the pipeline and is located between the outlet hole and the collection hole. Irrigation water passes through the outlet hole to irrigate plants and then passes through the drainage hole of the plant container and returns to the pipeline through the collection hole.
    Type: Application
    Filed: April 30, 2024
    Publication date: November 7, 2024
    Applicant: CHANGYANG Technology Ltd.
    Inventors: YU-TSE WU, YAO-MING YANG
  • Patent number: 12135501
    Abstract: A method of manufacturing a semiconductor device includes forming a photoresist layer over a substrate, including combining a first precursor and a second precursor in a vapor state to form a photoresist material, and depositing the photoresist material over the substrate. A protective layer is formed over the photoresist layer. The photoresist layer is selectively exposed to actinic radiation through the protective layer to form a latent pattern in the photoresist layer. The protective layer is removed, and the latent pattern is developed by applying a developer to the selectively exposed photoresist layer to form a pattern.
    Type: Grant
    Filed: August 3, 2023
    Date of Patent: November 5, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Ming-Hui Weng, Chen-Yu Liu, Chih-Cheng Liu, Yi-Chen Kuo, Jia-Lin Wei, Yen-Yu Chen, Jr-Hung Li, Yahru Cheng, Chi-Ming Yang, Tze-Liang Lee, Ching-Yu Chang
  • Publication number: 20240364042
    Abstract: A connector module for connecting a cable. The connector module comprises a connector, a circuit adapter board, a shell and a first insulation sheet. The connector has at least one terminal pin and a housing. The circuit adapter board is configured to electrically connect with the at least one terminal pin and at least one wire of the cable. The shell is configured to cover the circuit adapter board and at least a portion of the housing. The first insulation sheet is arranged over a first surface of the circuit adapter board, and located in the shell. Wherein the first insulation sheet has an inner concave structure to form a space between the first insulation sheet and the first surface.
    Type: Application
    Filed: April 16, 2024
    Publication date: October 31, 2024
    Applicant: ELKA INTERNATIONAL LTD.
    Inventor: Jui-Ming YANG
  • Publication number: 20240365389
    Abstract: Various aspects of the present disclosure generally relate to wireless communication. In some aspects, a user equipment (UE) may receive information that indicates one or more parameters that correspond to one or more initial active bandwidth parts (BWPs), each initial active BWP being smaller than a full available BWP. The UE may select an initial active BWP from the one or more initial active BWPs. The UE may transmit a random access channel message based at least in part on a first parameter, of the one or more parameters, that corresponds to the selected initial active BWP. Numerous other aspects are described.
    Type: Application
    Filed: April 28, 2023
    Publication date: October 31, 2024
    Inventors: Ming YANG, Kausik RAY CHAUDHURI, Juan MONTOJO
  • Patent number: D1051600
    Type: Grant
    Filed: August 19, 2022
    Date of Patent: November 19, 2024
    Inventor: Ming Yang