Patents by Inventor Minhye Shin

Minhye Shin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240204078
    Abstract: The present disclosure relates to a method of manufacturing a field effect transistor array by direct carbon nanotube printing and a field effect transistor array manufactured by the same. In addition, the method of manufacturing a field effect transistor array according to the present disclosure can implement deposition by adjusting a concentration of carbon nanotubes at a desired location on a substrate without limiting the substrate and very easily control a location by printing carbon nanotubes at an electrode gap location, and since the carbon nanotubes do not contact oxides of the substrate, lower noise to implement excellent sensitivity. In addition, the method of manufacturing a field effect transistor array according to the present disclosure can significantly reduce manufacturing costs and processing time by printing carbon nanotubes at a desired location without additional processes, and can be applied to various devices through a low-temperature process.
    Type: Application
    Filed: November 10, 2023
    Publication date: June 20, 2024
    Applicant: DAEGU GYEONGBUK INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Yoonhee LEE, Hongki Kang, Soohyun Park, Minhye Shin