Patents by Inventor Mir Farrokh SHAYEGAN SALEK

Mir Farrokh SHAYEGAN SALEK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods of tuning process models
    Patent number: 11614690
    Abstract: Methods of constructing a process model for simulating a characteristic of a product of lithography from patterns produced under different processing conditions. The methods use a deviation between the variation of the simulated characteristic and the variation of the measured characteristic to adjust a parameter of the process model.
    Type: Grant
    Filed: January 24, 2018
    Date of Patent: March 28, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Mu Feng, Mir Farrokh Shayegan Salek, Dianwen Zhu, Leiwu Zheng, Rafael C. Howell, Jen-Shiang Wang
  • METHOD AND APPARATUS FOR PHOTOLITHOGRAPHIC IMAGING
    Publication number: 20220276564
    Abstract: A method of simulating a pattern to be imaged onto a substrate using a photolithography system, the method includes obtaining a pattern to be imaged onto the substrate, smoothing the pattern, and simulating an image of the smoothed pattern. The smoothing may include application of a graphical low pass filter and the simulating may include application of edge filters from an edge filter library.
    Type: Application
    Filed: July 29, 2020
    Publication date: September 1, 2022
    Inventors: Mir Farrokh SHAYEGAN SALEK, Rafael C. HOWELL, Yunan ZHENG, Haiqing WEI, Yu CAO
  • Method and apparatus for pattern correction and verification
    Patent number: 10754256
    Abstract: A method including providing a plurality of unit cells for a plurality of gauge patterns appearing in one or more images of one or more patterning process substrates, each unit cell representing an instance of a gauge pattern of the plurality of gauge patterns, averaging together image information of each unit cell to arrive at a synthesized representation of the gauge pattern, and determining a geometric dimension of the gauge pattern based on the synthesized representation.
    Type: Grant
    Filed: October 3, 2016
    Date of Patent: August 25, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Thomas I. Wallow, Peng-cheng Yang, Adam Lyons, Mir Farrokh Shayegan Salek, Hermanus Adrianus Dillen
  • METHODS OF TUNING PROCESS MODELS
    Publication number: 20190369498
    Abstract: Methods of constructing a process model for simulating a characteristic of a product of lithography from patterns produced under different processing conditions. The methods use a deviation between the variation of the simulated characteristic and the variation of the measured characteristic to adjust a parameter of the process model.
    Type: Application
    Filed: January 24, 2018
    Publication date: December 5, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Mu FENG, Mir Farrokh SHAYEGAN SALEK, Dianwen ZHU, Leiwu ZHENG, Rafael C. HOWELL, Jen-Shiang WANG
  • METHOD AND APPARATUS FOR PATTERN CORRECTION AND VERIFICATION
    Publication number: 20180275521
    Abstract: A method including providing a plurality of unit cells for a plurality of gauge patterns appearing in one or more images of one or more patterning process substrates, each unit cell representing an instance of a gauge pattern of the plurality of gauge patterns, averaging together image information of each unit cell to arrive at a synthesized representation of the gauge pattern, and determining a geometric dimension of the gauge pattern based on the synthesized representation.
    Type: Application
    Filed: October 3, 2016
    Publication date: September 27, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thomas I. WALLOW, Peng-cheng YANG, Adam LYONS, Mir Farrokh SHAYEGAN SALEK, Hermanus Adrianus DILLEN