Patents by Inventor Mitsuhiro Fujita
Mitsuhiro Fujita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230087940Abstract: The present invention provides a pattern forming method with which a pattern having excellent LER performance is obtained. In addition, the present invention provides an actinic ray-sensitive or radiation-sensitive composition and a method for manufacturing an electronic device, which relate to the pattern forming method. The pattern forming method of the present invention includes, in the following order, an exposure step of exposing a resist film, the resist film including an acid-decomposable group a which reacts to generate a polar group having a pKa of 6.0 or more, an acid-decomposable group b which reacts to generate a polar group having a pKa of less than 6.0, and a photoacid-generating component, a first heating step for reacting at least a part of the acid-decomposable group a with an acid to generate the polar group having a pKa of 6.0 or more, a second heating step for reacting at least a part of the acid-decomposable group b to generate the polar group having a pKa of less than 6.Type: ApplicationFiled: September 29, 2022Publication date: March 23, 2023Applicant: FUJIFILM CorporationInventors: Hironori OKA, Michihiro Shirakawa, Mitsuhiro Fujita, Kazunari Yagi
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Patent number: 11604414Abstract: A photosensitive composition for EUV light includes a predetermined resin and a photoacid generator, or includes a predetermined resin having a repeating unit having a photoacid generating group, and satisfies Conditions 1 and 2, Condition 1: The A value determined by Formula (1) is 0.14 or more, A=([H]×0.04+[C]×1.0+[N]×2.1+[O]×3.6+[F]×5.6+[S]×1.5+[I]×39.5)/([H]×1+[C]×12+[N]×14+[O]×16+[F]×19+[S]×32+[I]×127)??Formula (1): Condition 2: The concentration of the solid content in the photosensitive composition for EUV light is 2.5% by mass or less.Type: GrantFiled: October 17, 2019Date of Patent: March 14, 2023Assignee: FUJIFILM CorporationInventors: Michihiro Shirakawa, Hajime Furutani, Mitsuhiro Fujita, Tomotaka Tsuchimura, Takashi Kawashima, Michihiro Ogawa, Akihiro Kaneko, Hironori Oka, Yasuharu Shiraishi
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Publication number: 20230045851Abstract: A method for producing a resist composition includes setting parameter, acquiring a pattern size for a regression analysis, analyzing performing a regression analysis, calculating a pattern size of a target resist composition based on the regression analysis, comparing the pattern size of the target resist composition and the target pattern size, determining a formulating amount of the resist composition in a case where a difference between the pattern size of the target resist composition and the target pattern size is within an allowable range, and producing a resist composition based on the determined formulating amount, in which, in a case where the difference is out of the allowable range, the method further includes changing at least the content of components in the target resist composition, and the formulating amount of the resist composition is determined based on the changed physical quantity to produce the resist composition.Type: ApplicationFiled: September 6, 2022Publication date: February 16, 2023Applicant: FUJIFILM CORPORATIONInventors: Naohiro TANGO, Michihiro SHIRAKAWA, Kyohei SAKITA, Akiyoshi GOTO, Kazunari YAGI, Mitsuhiro FUJITA
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Patent number: 11560010Abstract: An on-machine development lithographic printing plate precursor includes an image-recording layer on an aluminum support having an anode oxide film, wherein an end portion of the lithographic printing plate precursor has a shear droop shape, the image-recording layer contains a compound having a support adsorptive property, having a molecular weight of 1,000 or less, and not having an unsaturated double bond group in a molecule, and a content of the compound is substantially the same in a plane of the image-recording layer.Type: GrantFiled: February 26, 2020Date of Patent: January 24, 2023Assignee: FUJIFILM CorporationInventors: Akira Sakaguchi, Yuki Sakamoto, Mitsuhiro Fujita, Yusuke Namba
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Publication number: 20220179307Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin X including a repeating unit derived from a compound including two or more structural moieties consisting of an anionic moiety and a cationic moiety, and a polymerizable group, in which the compound generates an acid including an acidic moiety derived from the anionic moiety in the two or more structural moieties by irradiation with actinic rays or radiation.Type: ApplicationFiled: February 23, 2022Publication date: June 9, 2022Applicant: FUJIFILM CorporationInventors: Akira TAKADA, Akiyoshi GOTO, Masafumi KOJIMA, Aina USHIYAMA, Michihiro SHIRAKAWA, Keita KATO, Hironori OKA, Mitsuhiro FUJITA, Yasuharu SHIRAISHI
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Patent number: 11156917Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin having an acid-decomposable group whose polarity increases through decomposition by the action of an acid, an acid generator A capable of generating a first acid upon irradiation with actinic rays or radiation, and an acid generator B capable of generating a second acid upon irradiation with actinic rays or radiation, and the first acid and the second acid satisfy predetermined requirements.Type: GrantFiled: August 21, 2019Date of Patent: October 26, 2021Assignee: FUJIFILM CorporationInventors: Kyohei Sakita, Mitsuhiro Fujita, Takumi Tanaka, Keishi Yamamoto, Akiyoshi Goto, Keita Kato
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Patent number: 11072555Abstract: The present invention relates to a glass member in which an inorganic phosphor is dispersed in a glass matrix, in which the glass member includes an SiO2—B2O3 based glass as the glass matrix, and the SiO2—B2O3 based glass includes SiO2 as a main component thereof, and includes, based on a total amount of the SiO2—B2O3 based glass: Al2O3 in an amount of 4 to 10 wt %; and MgO and ZnO in a total amount of 0.1 to 0.7 wt %.Type: GrantFiled: March 1, 2019Date of Patent: July 27, 2021Assignee: COORSTEK KKInventors: Ramesh Vallepu, Yu Yokoyama, Mitsuhiro Fujita, Masako Uematsu, Yukiko Kikuchi
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Publication number: 20200189305Abstract: Provided are an on-machine development-type lithographic printing plate precursor including: an image-recording layer on an aluminum support having an anode oxide film, in which an end portion of the lithographic printing plate precursor has a shear droop shape, the image-recording layer contains a compound having a support adsorptive property, having a molecular weight of 1,000 or less, and not having an unsaturated double bond group in a molecule, and a content of the compound is substantially the same in a plane of the image-recording layer and a method for producing a lithographic printing plate in which the lithographic printing plate precursor is used.Type: ApplicationFiled: February 26, 2020Publication date: June 18, 2020Applicant: FUJIFILM CorporationInventors: Akira SAKAGUCHI, Yuki SAKAMOTO, Mitsuhiro FUJITA, Yusuke NAMBA
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Patent number: 10663592Abstract: A flight control device 10 is device for controlling an unmanned aircraft 20, including: a region detection unit 11 that detects a flight-restricted region 30 in which flight is restricted; a distance calculation unit 12 that calculates a distance d from the flight-restricted region 30 to the unmanned aircraft 20; and a collision determination unit 13 that specifies an altitude and a speed of the unmanned aircraft 20, and determines whether the unmanned aircraft 20 lands in the flight-restricted region 30 in case of a crash, based on the altitude and the speed that have been specified and the calculated distance d.Type: GrantFiled: August 9, 2016Date of Patent: May 26, 2020Assignee: NEC SOLUTION INNOVATORS, LTD.Inventors: Mitsuhiro Fujita, Hisashi Noda, Hideshi Yamashita, Yasuyuki Ihara
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Publication number: 20200050106Abstract: A photosensitive composition for EUV light includes a predetermined resin and a photoacid generator, or includes a predetermined resin having a repeating unit having a photoacid generating group, and satisfies Conditions 1 and 2, Condition 1: The A value determined by Formula (1) is 0.14 or more, A=([H]×0.04+[C]×1.0+[N]×2.1+[O]×3.6+[F]×5.6+[S]×1.5+[I]×39.5)/([H]×1+[C]×12+[N]×14+[O]×16+[F]×19+[S]×32+[I]×127)??Formula (1): Condition 2: The concentration of the solid content in the photosensitive composition for EUV light is 2.5% by mass or less.Type: ApplicationFiled: October 17, 2019Publication date: February 13, 2020Applicant: FUJIFILM CorporationInventors: Michihiro SHIRAKAWA, Hajime FURUTANI, Mitsuhiro FUJITA, Tomotaka TSUCHIMURA, Takashi KAWASHIMA, Michihiro OGAWA, Akihiro KANEKO, Hironori OKA, Yasuharu SHIRAISHI
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Publication number: 20190377261Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin having an acid-decomposable group whose polarity increases through decomposition by the action of an acid, an acid generator A capable of generating a first acid upon irradiation with actinic rays or radiation, and an acid generator B capable of generating a second acid upon irradiation with actinic rays or radiation, and the first acid and the second acid satisfy predetermined requirements.Type: ApplicationFiled: August 21, 2019Publication date: December 12, 2019Applicant: FUJIFILM CorporationInventors: Kyohei Sakita, Mitsuhiro Fujita, Takumi Tanaka, Keishi Yamamoto, Akiyoshi Goto, Keita Kato
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Patent number: 10431394Abstract: An object of the present invention is to provide a capacitor excellent in reliability, of which charge-discharge characteristics are hardly deteriorated. The capacitor of the present invention includes: a capacitor element including a positive electrode and a negative electrode; and a case that stores the capacitor element together with an electrolytic solution, wherein at least one of the positive electrode and the negative electrode contains activated carbon, and a sum of volumes per unit weight of pores having a pore diameter of from 30 ? to 100 ? inclusive among pores of the activated carbon is 0.2 cm3/g or more.Type: GrantFiled: December 16, 2016Date of Patent: October 1, 2019Assignee: Panasonic Intellectual Property Management Co., Ltd.Inventors: Eri Hirose, Mitsuhiro Fujita, Hiroyuki Yanagisawa, Yasuyuki Ito
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Publication number: 20190270665Abstract: The present invention relates to a glass member in which an inorganic phosphor is dispersed in a glass matrix, in which the glass member includes an SiO2—B2O3 based glass as the glass matrix, and the SiO2—B2O3 based glass includes SiO2 as a main component thereof, and includes, based on a total amount of the SiO2—B2O3 based glass:Al2O3 in an amount of 4 to 10 wt %; and MgO and ZnO in a total amount of 0.1 to 0.7 wt %.Type: ApplicationFiled: March 1, 2019Publication date: September 5, 2019Inventors: Ramesh VALLEPU, Yu YOKOYAMA, Mitsuhiro FUJITA, Masako UEMATSU, Yukiko KIKUCHI
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Patent number: 10296845Abstract: The present invention provides an attribute estimation system capable of acquiring an image of a person whose attributes are to be estimated accurately and informing the person of an attribute estimation result. The attribute estimation system (1) includes: a mirror (11) equipped with an information display terminal (12); and an attribute estimation device (3). The information display terminal (12) includes an image acquisition unit. The information display terminal (12) is disposed on the mirror (11) in such a manner that the information display terminal (12) can display information on a surface of the mirror (11) and that the image acquisition unit can acquire an image of a user of the mirror (11). The information display terminal (12) and the attribute estimation device (3) can be connected to each other via a communication line network (2). The attribute estimation device (3) generates attribute information estimated from the acquired image of the user of the mirror (11).Type: GrantFiled: May 19, 2014Date of Patent: May 21, 2019Assignee: NEC SOLUTION INNOVATORS, LTD.Inventors: Iwao Waga, Tomomi Kinoshita, Mitsuhiro Fujita
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Publication number: 20180330623Abstract: A flight control device 10 is device for controlling an unmanned aircraft 20, including: a region detection unit 11 that detects a flight-restricted region 30 in which flight is restricted; a distance calculation unit 12 that calculates a distance d from the flight-restricted region 30 to the unmanned aircraft 20; and a collision determination unit 13 that specifies an altitude and a speed of the unmanned aircraft 20, and determines whether the unmanned aircraft 20 lands in the flight-restricted region 30 in case of a crash, based on the altitude and the speed that have been specified and the calculated distance d.Type: ApplicationFiled: August 9, 2016Publication date: November 15, 2018Applicant: NEC Solution Innovators, Ltd.Inventors: Mitsuhiro FUJITA, Hisashi NODA, Hideshi YAMASHITA, Yasuyuki IHARA
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Patent number: 10040693Abstract: Particles for a monolithic refractory are made of a spinet porous sintered body which is represented by a chemical formula of MgAl2O4, wherein pores having a pore size of 0.01 ?m or more and less than 0.8 ?m occupy 10 vol % or more and 50 vol % or less with respect to a total volume of pores having a pore size of 10 ?m or less in the particles, and the particles for a monolithic refractory have grain size distribution in which particles having a particle size of less than 45 ?m occupy 60 vol % or less, particles having a particle size of 45 ?m or more and less than 100 ?m occupy 20 vol % or more and 60 vol % or less, and particles having a particle size of 100 ?m or more and 1000 ?m or less occupy 10 vol % or more and 50 vol % or less.Type: GrantFiled: December 20, 2016Date of Patent: August 7, 2018Assignee: COORSTEK KKInventors: Mitsuhiro Fujita, Shuko Akamine
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Patent number: 9997300Abstract: A capacitor electrode includes a substrate having electrical conductivity, a conductive layer formed on a surface of the substrate, and an electrode layer formed on the conductive layer. The electrode layer is allowed to adsorb and desorb ions on a surface thereof. The conductive layer contains flake graphite. A density of the conductive layer is greater than 1.1 g/cm3. An average particle size D50 of the flake graphite, which is measured by using a dynamic light scattering method, is less than or equal to 10 ?m.Type: GrantFiled: July 6, 2016Date of Patent: June 12, 2018Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Yasuyuki Ito, Hiroyuki Yanagisawa, Koichi Morikawa, Eri Hirose, Nao Matsumura, Mitsuhiro Fujita
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Patent number: 9938195Abstract: A heat insulating material includes a porous sintered body formed of MgAl2O4 and having a porosity of 60% or more and less than 73%. In the heat insulating material, pores having a pore diameter of 0.8 ?m or more and less than 10 ?m occupy 30 vol % or more and less than 90 vol % of a total pore volume, pores having a pore diameter of 0.01 ?m or more and less than 0.8 ?m occupy 10 vol % or more and less than 60 vol % of the total pore volume, the thermal conductivity at 20° C. or higher and 1500° C. or lower is 0.45 W/(m·K) or less, and the compressive strength is 2 MPa or more.Type: GrantFiled: June 23, 2015Date of Patent: April 10, 2018Assignee: COORSTEK KKInventors: Shuko Akamine, Mitsuhiro Fujita
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Publication number: 20170336014Abstract: A heat insulator including a porous sintered body having a porosity of 70 vol % or more, pores having a pore size of more than 1000 ?m in a proportion of 10 vol % or less of all pores and pores having a pore size of 0.8 ?m or more and less than 10 ?m occupy 50 vol % or more and 80 vol % or less of pores having a pore size of 1000 ?m or less, while pores having a pore size of 0.01 ?m or more and less than 0.8 ?occupy 10 vol % or more and 30 vol % or less pores having a pore size of 1000 ?m or less. The porous sintered body is formed from MgAl2O4 raw material and includes a fibrous layer formed from inorganic material fibers, the heat conductivity of the heat insulator at 1000° C. or more and 1500° C. or less being 0.40 W/m·K) or less.Type: ApplicationFiled: August 10, 2017Publication date: November 23, 2017Applicant: Covalent Materials CorporationInventors: Shuko AKAMINE, Mitsuhiro FUJITA
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Patent number: 9799455Abstract: A capacitor electrode includes a conductive base member and an electrode part electrically connected to the base member. The electrode part contains carbon particles of a first carbon material capable of adsorbing and desorbing ions. The electrode part further contains voids including first voids with diameters of not less than 0.2 ?m and not more than 1.0 ?m, and second voids with diameters of not less than 0.05 ?m and less than 0.2 ?m. The value of (VA×VA)/(VB×M) is greater than 0.022, where VA is the sum of the volumes of the first voids, VB is the sum of the volumes of the second voids, and M is the volume of the electrode part per unit weight of the electrode part.Type: GrantFiled: November 1, 2013Date of Patent: October 24, 2017Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.Inventors: Chiho Nobumori, Motohiro Sakata, Mitsuhiro Fujita