Abstract: To provide a method of designing a semiconductor integrated circuit with a high workability also in an increase in a scale of an LSI and an enhancement in an integration and designing a semiconductor integrated circuit system in which an unnecessary radiation is reduced and which is excellent in a heat characteristic, a reverse design flow to that in the conventional art is implemented, and a mounting substrate such as a printed-circuit board is first designed and a package substrate for mounting an LSI is designed based on a result of the design of the mounting substrate, and a layout design of the LSI to be mounted on the package substrate is then carried out.

Abstract: To provide a method of designing a semiconductor integrated circuit with a high workability also in an increase in a scale of an LSI and an enhancement in an integration and designing a semiconductor integrated circuit system in which an unnecessary radiation is reduced and which is excellent in a heat characteristic, a reverse design flow to that in the conventional art is implemented, and a mounting substrate such as a printed-circuit board is first designed and a package substrate for mounting an LSI is designed based on a result of the design of the mounting substrate, and a layout design of the LSI to be mounted on the package substrate is then carried out.

Abstract: At least a groove for separating a semiconductor substrate into a first region of a relatively large area and a second region of a relatively small area is formed. An insulating film is formed on the surface of the semiconductor substrate including the interior of the groove. The insulating film is etched using an etching mask having a lattice window pattern in such a manner that openings corresponding to the lattice window pattern are formed in the first region. As an alternative, openings corresponding to a single opening pattern are formed in the first region using an etching mask having the single opening pattern and the lattice window pattern, and the insulating film is etched in such a manner that openings corresponding to the lattice window pattern are formed in the second region. In both cases, the remaining insulating film is polished off.

Abstract: To provide a method of designing a semiconductor integrated circuit with a high workability also in an increase in a scale of an LSI and an enhancement in an integration and designing a semiconductor integrated circuit system in which an unnecessary radiation is reduced and which is excellent in a heat characteristic, a reverse design flow to that in the conventional art is implemented, and a mounting substrate such as a printed-circuit board is first designed and a package substrate for mounting an LSI is designed based on a result of the design of the mounting substrate, and a layout design of the LSI to be mounted on the package substrate is then carried out.

Abstract: Verification of the pattern area ratio of a semiconductor integrated circuit device or the pattern occupancy ratio in a check window set for the semiconductor integrated circuit device is performed on an assumption that a dummy pattern defined by process conditions is placed in an unoccupied region of the semiconductor integrated circuit device or in an unoccupied region in at least one instance provided in the semiconductor integrated circuit device.

Abstract: To provide a pattern generating method for a semiconductor device capable of forming a highly reliable semiconductor device, the accuracy of which is high. A method of generating a pattern for a semiconductor device comprises: a step of designing and arranging a layout pattern of a semiconductor chip; a step of extracting an area ratio of the mask pattern from the layout pattern; and a step of adding and arranging a dummy pattern to the layout pattern, while consideration is given to the most appropriate area ratio of the layout pattern of the layer obtained according to a process condition of the layer composing the layout pattern, so that the area ratio of the layer can be the most appropriate area ratio.

Abstract: At least a groove for separating a semiconductor substrate into a first region of a relatively large area and a second region of a relatively small area is formed. An insulating film is formed on the surface of the semiconductor substrate including the interior of the groove. The insulating film is etched using an etching mask having a lattice window pattern in such a manner that openings corresponding to the lattice window pattern are formed in the first region. As an alternative, openings corresponding to a single opening pattern are formed in the first region using an etching mask having the single opening pattern and the lattice window pattern, and the insulating film is etched in such a manner that openings corresponding to the lattice window pattern are formed in the second region. In both cases, the remaining insulating film is polished off.

Abstract: In the LSI design stage, areas indicating the circuits that handle a minute signal are formed as wiring excluding area patterns. The coordinates of the wiring excluding area patterns in a state that the LSI chip is flipped are calculated, and the substrate design tool is caused to recognize such coordinates. No wiring is provided in the recognized wiring excluding areas when the substrate wirings are designed by the substrate design tool. As a result, the electric coupling between the substrate wirings and the minute signal circuit can be suppressed, and also a malfunction of the circuit can be prevented.

Abstract: At least a groove for separating a semiconductor substrate into a first region of a relatively large area and a second region of a relatively small area is formed. An insulating film is formed on the surface of the semiconductor substrate including the interior of the groove. The insulating film is etched using an etching mask having a lattice window pattern in such a manner that openings corresponding to the lattice window pattern are formed in the first region. As an alternative, openings corresponding to a single opening pattern are formed in the first region using an etching mask having the single opening pattern and the lattice window pattern, and the insulating film is etched in such a manner that openings corresponding to the lattice window pattern are formed in the second region. In both cases, the remaining insulating film is polished off.

Abstract: To provide a semiconductor device characterized in that: a decoupling capacitor can be increased; noise generated from an electric power supply can be effectively absorbed; and a stable operation of a circuit can be realized. Irrespective of whether or not a region is close to a power supply wiring or a ground wiring, MOS is spread all over a spare area of a chip and connected to a power supply wiring and ground wiring by utilizing a wiring layer and diffusion layer.

Abstract: Verification of the pattern area ratio of a semiconductor integrated circuit device or the pattern occupancy ratio in a check window set for the semiconductor integrated circuit device is performed on an assumption that a dummy pattern defined by process conditions is placed in an unoccupied region of the semiconductor integrated circuit device or in an unoccupied region in at least one instance provided in the semiconductor integrated circuit device.

Abstract: A pattern analysis method includes: a first step of preparing pattern layout data including a plurality of first regions and a plurality of second regions; a second step of selecting either said plurality of first regions or said plurality of second regions as a target region in which a critical area of said pattern layout data is to be calculated; and a third step of extracting, from said target region, rectangular regions each having a width within a given range. The method further includes; a fourth step of obtaining a total area of said rectangular regions; and a fifth step of calculating said critical area by using said total area.

Abstract: To provide a pattern generating method for a semiconductor device capable of forming a highly reliable semiconductor device, the accuracy of which is high.

Abstract: To provide a semiconductor device characterized in that: a decoupling capacitor can be increased; noise generated from an electric power supply can be effectively absorbed; and a stable operation of a circuit can be realized.

Abstract: At least a groove for separating a semiconductor substrate into a first region of a relatively large area and a second region of a relatively small area is formed. An insulating film is formed on the surface of the semiconductor substrate including the interior of the groove. The insulating film is etched using an etching mask having a lattice window pattern in such a manner that openings corresponding to the lattice window pattern are formed in the first region. As an alternative, openings corresponding to a single opening pattern are formed in the first region using an etching mask having the single opening pattern and the lattice window pattern, and the insulating film is etched in such a manner that openings corresponding to the lattice window pattern are formed in the second region. In both cases, the remaining insulating film is polished off.

Abstract: By changing the shape of a bypass capacitor, inserting an inductance cell and using the bypass capacitor for each operating frequency characteristic, power source noise is absorbed to realize the stabilized operation of a circuit.

Abstract: After a layout for a semiconductor device including power and ground lines has been defined, patterns for bypass capacitors, which will be located under the power lines, are created. In this case, a pattern for a semiconductor device, where a bypass capacitor array is inlaid and substrate contacts are located under ground lines, is defined based on design rules input. Next, power lines are extracted and resized. Thereafter, logical operations are performed to place the bypass capacitors and the bypass capacitors are resized. Subsequently, logical operations are performed to define interconnecting diffused layers and the diffused layers are resized. Since the patterns for the power lines have already been defined before the patterns for the bypass capacitors are created, the patterns for the bypass capacitors to be placed under the power lines can be defined automatically. Thus, a pattern for a miniaturized semiconductor device with reduced power supply noise can be created automatically.