Abstract: A laminate that improves barrier properties of an atomic layer deposition film in spite of use of a substrate made of a polymer material, and provides a gas barrier film and a method of producing the same. The laminate includes: a substrate made a polymer material; an undercoat layer disposed on at least part of a surface of the substrate and made up of an inorganic material containing Ta; and an atomic layer deposition film disposed so as to cover a surface of the undercoat layer.

Abstract: An atomic layer deposition apparatus for forming an atomic layer on a flexible substrate, the apparatus including an unwinding chamber having an unwinding roll for unwinding the flexible substrate, a winding chamber having a winding roll for winding the flexible substrate on which the atomic layer is formed, a plurality of reaction chambers provided between the unwinding chamber and the winding chamber so that the flexible substrate can pass therethrough, a first supply part for storing a gas containing a first precursor, a first supply pipe connected to the first supply part, a second supply part for storing a purge gas, a second supply pipe connected to the second supply part, a third supply part for storing a gas containing a second precursor, a third supply pipe connected to the third supply part, and an exhaust pipe connected to the plurality of reaction chambers.

Abstract: A laminate includes a substrate made of an organic polymer having a functional group containing an oxygen atom or a nitrogen atom, a functional layer bonded to the functional group of the organic polymer contained in the substrate and formed by an atomic layer deposition process, and an overcoat layer provided to cover the functional layer and containing transition metal atoms. Because the adhesion between the substrate and the functional layer is improved and the functional layer is protected by the overcoat layer, it is possible to achieve both improved gas barrier properties and/or improved durability against an environmental stress such as heat, humidity and the like.

Abstract: A laminate includes: a substrate having a first surface and made of a high-molecular-weight material; an undercoat layer located on at least part of the first surface of the substrate and containing a first inorganic substance that has adsorption sites to be coupled to precursors serving as film-forming materials of an atomic layer deposition film; a functional layer located covering an outer surface of the undercoat layer and containing a second inorganic substance to be coupled to the adsorption sites of the undercoat layer, the functional layer being the atomic layer deposition film formed of the precursors; and an overcoat layer located covering an outer surface of the functional layer and containing a third inorganic substance.

Abstract: A laminate that improves barrier properties of an atomic layer deposition film in spite of use of a substrate made of a polymer material, and provides a gas barrier film and a method of producing the same. The laminate includes: a substrate made a polymer material; an undercoat layer disposed on at least part of a surface of the substrate and made up of an inorganic material containing Ta; and an atomic layer deposition film disposed so as to cover a surface of the undercoat layer.

Abstract: A laminate of the present invention includes: a substrate made of a polymer material; an undercoat layer disposed on at least part of an outer surface of the substrate and made up of an inorganic material containing an inorganic substance having a functional group; and an atomic layer deposition film disposed so as to cover an outer surface of the undercoat layer and containing a precursor which is a deposition raw material such that the precursor located on the outer surface of the undercoat layer and the functional group of the inorganic substance are bound to each other.

Abstract: A laminate includes: a substrate having a first surface and made of a high-molecular-weight material; an undercoat layer located on at least part of the first surface of the substrate and containing a first inorganic substance that has adsorption sites to be coupled to precursors serving as film-forming materials of an atomic layer deposition film; a functional layer located covering an outer surface of the undercoat layer and containing a second inorganic substance to be coupled to the adsorption sites of the undercoat layer, the functional layer being the atomic layer deposition film formed of the precursors; and an overcoat layer located covering an outer surface of the functional layer and containing a third inorganic substance.

Abstract: An atomic layer deposition apparatus for forming an atomic layer on a flexible substrate, the apparatus including an unwinding chamber having an unwinding roll for unwinding the flexible substrate, a winding chamber having a winding roll for winding the flexible substrate on which the atomic layer is formed, a plurality of reaction chambers provided between the unwinding chamber and the winding chamber so that the flexible substrate can pass therethrough, a first supply part for storing a gas containing a first precursor, a first supply pipe connected to the first supply part, a second supply part for storing a purge gas, a second supply pipe connected to the second supply part, a third supply part for storing a gas containing a second precursor, a third supply pipe connected to the third supply part, and an exhaust pipe connected to the plurality of reaction chambers.

Abstract: A laminate includes: a base material having a top surface; an under coat layer formed on at least a part of the top surface of the base material, having a membranous shape or a film shape and containing an organic polymer having an OH group; and an atomic layer deposition film formed in a membranous shape to cover an exposed surface of the under coat layer, the atomic layer deposition film being formed by a precursor as a material thereof. At least a part of the precursor is coupled to the OH group of the organic polymer.

Abstract: A laminate includes a substrate made of an organic polymer having a functional group containing an oxygen atom or a nitrogen atom, a functional layer bonded to the functional group of the organic polymer contained in the substrate and formed by an atomic layer deposition process, and an overcoat layer provided to cover the functional layer and containing transition metal atoms. Because the adhesion between the substrate and the functional layer is improved and the functional layer is protected by the overcoat layer, it is possible to achieve both improved gas barrier properties and/or improved durability against an environmental stress such as heat, humidity and the like.

Abstract: A laminate that improves barrier properties of an atomic layer deposition film in spite of use of a substrate made of a polymer material, and provides a gas barrier film and a method of producing the same. The laminate includes: a substrate made a polymer material; an undercoat layer disposed on at least part of a surface of the substrate and made up of an inorganic material containing Ta; and an atomic layer deposition film disposed so as to cover a surface of the undercoat layer.

Abstract: A laminate (1) provided with: a substrate (2); an undercoat layer (3), which is formed on at least a portion of the outer surface of the substrate (2), contains an organic polymer with a functional group, and is formed in a membrane form or film form; and an atomic layer deposition film (4), which contains a precursor (6) that serves as a starting material, is formed so as to cover the surface of the undercoat layer (3), and in which at least some of the precursor (6) are bonded to the functional groups. The linear expansion coefficient of a layered film provided with the substrate (2) and the undercoat layer (3) is from about 1.0×10?5/K to about 8.0×10?5/K.

Abstract: A rolled film formation apparatus including a first chamber in which a first precursor is applied to a substrate, a second chamber in which a second precursor is applied to the substrate such that the first and second precursors react with each other and that an atomic layer is deposited on the substrate, a third chamber in which a purge gas is applied to the substrate, and conveyance roller pairs which are positioned in the first, second and third chambers, and convey the substrate. Each conveyance roller pair includes a first roller and a second roller which sandwich the substrate in a thickness direction of the substrate. At least one of the first and second rollers has an outer peripheral surface having a surface unevenness. The substrate is moved back and forth among the first, second and third chambers. The atomic layer is deposited more than once on the substrate.

Abstract: A laminate of the present invention includes: a substrate made of a polymer material; an undercoat layer disposed on at least part of an outer surface of the substrate and made up of an inorganic material containing an inorganic substance having a functional group; and an atomic layer deposition film disposed so as to cover an outer surface of the undercoat layer and containing a precursor which is a deposition raw material such that the precursor located on the outer surface of the undercoat layer and the functional group of the inorganic substance are bound to each other.

Abstract: A laminate body includes a base material, a film-like or a membrane-like undercoat layer that is formed in at least a portion of the outer surface of the base material, and an atomic layer deposition film that is formed on a surface opposite to a surface coming into contact with the base material among both surfaces of the undercoat layer in the thickness direction thereof. At least a portion of precursors of the atomic layer deposition film bind to the undercoat layer, and the atomic layer deposition film is formed into a membrane shape covering the undercoat layer.

Abstract: A laminate includes: a base material having a top surface; an under coat layer formed on at least a part of the top surface of the base material, having a membranous shape or a film shape and containing an organic polymer having an OH group; and an atomic layer deposition film formed in a membranous shape to cover an exposed surface of the under coat layer, the atomic layer deposition film being formed by a precursor as a material thereof. At least a part of the precursor is coupled to the OH group of the organic polymer.

Abstract: A laminate (1) provided with: a substrate (2); an undercoat layer (3), which is formed on at least a portion of the outer surface of the substrate (2), contains an organic polymer with a functional group, and is formed in a membrane form or film form; and an atomic layer deposition film (4), which contains a precursor (6) that serves as a starting material, is formed so as to cover the surface of the undercoat layer (3), and in which at least some of the precursor (6) are bonded to the functional groups. The linear expansion coefficient of a layered film provided with the substrate (2) and the undercoat layer (3) is from about 1.0×10?5/K to about 8.0×10?5/K.

Abstract: A rolled film formation apparatus including a first chamber in which a first precursor is applied to a substrate, a second chamber in which a second precursor is applied to the substrate such that the first and second precursors react with each other and that an atomic layer is deposited on the substrate, a third chamber in which a purge gas is applied to the substrate, and conveyance roller pairs which are positioned in the first, second and third chambers, and convey the substrate. Each conveyance roller pair includes a first roller and a second roller which sandwich the substrate in a thickness direction of the substrate. At least one of the first and second rollers has an outer peripheral surface having a surface unevenness. The substrate is moved back and forth among the first, second and third chambers. The atomic layer is deposited more than once on the substrate.

Abstract: A laminate body includes a base material, a film-like or a membrane-like undercoat layer that is formed in at least a portion of the outer surface of the base material, and an atomic layer deposition film that is formed on a surface opposite to a surface coming into contact with the base material among both surfaces of the undercoat layer in the thickness direction thereof. At least a portion of precursors of the atomic layer deposition film bind to the undercoat layer, and the atomic layer deposition film is formed into a membrane shape covering the undercoat layer.

Abstract: A laminate body of the present invention includes a base material, an atomic layer deposition film that is formed along the outer surface of the base material, and an overcoat layer that covers the atomic layer deposition film with a film having a mechanical strength higher than that of the atomic layer deposition film.