Patents by Inventor Mitsutaka Nishijima

Mitsutaka Nishijima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130327384
    Abstract: The present invention provides a multi-junction solar cell capable of increasing the degree of freedom of the selection of compound semiconductors. The multi-junction solar cell 1 includes a layered structure section 4 including compound semiconductor photovoltaic devices 2 and 3 matched in lattice constant with each other and joined to each other, and a nanopillar structure section 7 including a compound semiconductor photovoltaic device or a plurality of compound semiconductor photovoltaic devices 5 and 6 joined to each other.
    Type: Application
    Filed: March 16, 2012
    Publication date: December 12, 2013
    Applicant: HONDA MOTOR CO., LTD.
    Inventors: Hirotaka Endo, Hajime Goto, Takanori Maebashi, Mitsutaka Nishijima, Natsuo Nakamura
  • Patent number: 8172634
    Abstract: To provide a manufacturing method of a field emission cathode, which method exerts no adverse effect on element characteristics at the time when etching is performed with an ion beam. A sacrificial layer 4 made of a thermosetting resin is formed on a gate electrode layer 3. An opening section 5 is formed in the sacrificial layer 4 and the gate electrode layer 3 by irradiating a focused ion beam, and a hole section 6 is formed by etching the insulating layer 2 by using the sacrificial layer 4 and the gate electrode layer 3 as a mask. An emitter electrode 8 is formed in the hole section 6, and the emitter material 7 on the sacrificial layer 4 is removed together with the sacrificial layer 4 on the gate electrode layer 3.
    Type: Grant
    Filed: December 2, 2010
    Date of Patent: May 8, 2012
    Assignee: Honda Motor Co., Ltd.
    Inventors: Mitsutaka Nishijima, Kenichi Toya, Takashi Iwasa
  • Publication number: 20110143626
    Abstract: To provide a manufacturing method of a field emission cathode, which method exerts no adverse effect on element characteristics at the time when etching is performed with an ion beam. A sacrificial layer 4 made of a thermosetting resin is formed on a gate electrode layer 3. An opening section 5 is formed in the sacrificial layer 4 and the gate electrode layer 3 by irradiating a focused ion beam, and a hole section 6 is formed by etching the insulating layer 2 by using the sacrificial layer 4 and the gate electrode layer 3 as a mask. An emitter electrode 8 is formed in the hole section 6, and the emitter material 7 on the sacrificial layer 4 is removed together with the sacrificial layer 4 on the gate electrode layer 3.
    Type: Application
    Filed: December 2, 2010
    Publication date: June 16, 2011
    Inventors: Mitsutaka Nishijima, Kenichi Toya, Takashi Iwasa