Patents by Inventor Momoyo Enyama

Momoyo Enyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210125806
    Abstract: Provided is an electron beam observation device that includes: an electron source; an objective lens concentrating an electron beam emitted from the electron source; and a control unit configured to perform control such that a plurality of images is generated by capturing images of a reference sample having a specific pattern, and a frequency characteristic is calculated for each of the plurality of images, in which an image is generated based on a secondary signal generated from a sample due to irradiation of the sample with the electron beam, and the control unit holds the plurality of frequency characteristics.
    Type: Application
    Filed: March 30, 2018
    Publication date: April 29, 2021
    Inventors: Koichi HAMADA, Megumi KIMURA, Momoyo ENYAMA, Ryou YUMIBA, Makoto SAKAKIBARA, Kei SAKAI, Satoru YAMAGUCHI, Katsumi SETOGUCHI
  • Publication number: 20210005417
    Abstract: A charged particle beam application apparatus includes a beam separator. The beam separator includes a first magnetic pole, a second magnetic pole facing the first magnetic pole, a first electrode and a second electrode that extend along an optical axis of a primary beam and are arranged in a first direction perpendicular to the optical axis, on a first surface of the first magnetic pole which faces the second magnetic pole, and a third electrode and a fourth electrode that extend along the optical axis and face the first electrode and the second electrode, respectively, on a second surface of the second magnetic pole which faces the first magnetic pole.
    Type: Application
    Filed: March 30, 2018
    Publication date: January 7, 2021
    Inventors: Yasuhiro Shirasaki, Takashi Dobashi, Momoyo Enyama, Akira Ikegami, Yuta Kawamoto
  • Publication number: 20200303152
    Abstract: To provide an electron microscope capable of performing the switching-over between normal illumination and annular illumination, wide-area irradiation, an interference pattern as desired or normal illumination in an expeditious and readily manner or achieving a better S/N ratio, the electron microscope comprises a photocathode 101 with negative electron affinity in use; an excitation optical system to excite the photocathode; and an electron optics system to irradiate an electron beam 13 generated from the photocathode by excitation light 12 irradiated through the excitation optical system onto a sample, the excitation optical system including a light source device 107 for the excitation light; and an optical modulation means 108 which is disposed in an optical path of the excitation light to perform spatial phase modulation to the excitation light.
    Type: Application
    Filed: March 29, 2016
    Publication date: September 24, 2020
    Inventors: Takashi OHSHIMA, Hiroyuki MINEMURA, Yumiko ANZAI, Momoyo ENYAMA, Yoichi OSE, Toshihide AGEMURA
  • Patent number: 10755396
    Abstract: An image forming apparatus includes an observation image input section in which a plurality of observation images is input, an emphasis information input section that inputs information to be emphasized, a storage section that defines a plurality of conversion functions that converts the plurality of observation images into a converted image on the basis of a function for conversion and takes, as a parameter, a gradation value of each pixel in the plurality of observation images and a plurality of emphasis functions that takes, as a parameter, a gradation value of each pixel in the conversion functions, an image calculation section that calculates an image in which information to be emphasized is emphasized on the basis of the plurality of input observation images, the input information of the information to be emphasized, the conversion functions, and the emphasis functions, and an emphasized image output section that outputs the emphasized image.
    Type: Grant
    Filed: February 12, 2018
    Date of Patent: August 25, 2020
    Assignee: HITACHI, LTD.
    Inventors: Momoyo Enyama, Yasuhiro Shirasaki, Michio Hatano, Makoto Sakakibara
  • Publication number: 20200257937
    Abstract: An information processing system creates a teacher database configured to train an analysis model from an observation image and labeling information corresponding to the observation image using an information processor. This system includes a storage unit, an image processing unit, and a teacher database creating unit. The storage unit stores image processing data formed of information showing a relationship between an observation condition and a parameter relating to the observation image. Further stores a first observation image, a first observation condition, and first labeling information. The image processing unit accepts the first observation image and the first observation condition as inputs, performs image processing corresponding to the parameter to the first observation image based on the image processing data, and creates a second observation image corresponding to a second observation condition.
    Type: Application
    Filed: December 12, 2019
    Publication date: August 13, 2020
    Applicant: HITACHI, LTD.
    Inventors: Thantip KRASIENAPIBAL, Sayaka KURATA, Momoyo ENYAMA, Yasuhiro SHIRASAKI
  • Publication number: 20200225175
    Abstract: The purpose of the present invention is to provide a multi-coordinated analyzing device that makes it possible to readily observe the same visual field by using a plurality of different kinds of analyzing device and in which observation results for the same visual field are recorded collectively. An analyzing system according to the present invention includes: a first analyzing unit that obtains first observation data by analyzing a sample and that also obtains position information about the analyzed sample; a position setting unit that performs position alignment of the sample on the basis of the position information obtained by the first analyzing unit; and a second analyzing unit that obtains second observation data by analyzing, by using a method different from the method used by the first analyzing unit, the sample placed at the position aligned by the position setting unit (see FIG. 1).
    Type: Application
    Filed: March 16, 2018
    Publication date: July 16, 2020
    Inventors: Akiko KAGATSUME, Minseok PARK, Momoyo ENYAMA, Yasuhiro SHIRASAKI, Michio HATANO
  • Patent number: 10651004
    Abstract: A charged particle beam device that detects a secondary charged particle beam generated by irradiation of a sample by a primary charged particle beam, includes: an image shift deflector that shifts an irradiation region for irradiation of the sample by the primary charged particle beam; a magnetic sector that separates the primary charged particle beam passing therein from the secondary charged particle beam from the sample using a magnetic field generated therein; a correction mechanism that is placed off of a trajectory of the primary charged particle beam but on a trajectory of the secondary charged particle beam inside the magnetic sector, the correction mechanism deflecting the secondary charged particle beam passing through; and a controller that controls the correction mechanism according to a defined relationship between a shift amount by the image shift deflector and a correction amount by the correction mechanism.
    Type: Grant
    Filed: March 31, 2016
    Date of Patent: May 12, 2020
    Assignee: HITACHI, LTD.
    Inventors: Yasuhiro Shirasaki, Momoyo Enyama
  • Patent number: 10629405
    Abstract: An electron beam device suitable for observing the bottom of a deep groove or hole with a high degree of accuracy under a large current condition includes: an electron optical system having an irradiation optical system to irradiate a first aperture with an electron beam emitted from an electron source and a reduction projection optical system to project and form an aperture image of the first aperture on a sample, detectors to detect secondary electrons emitted by irradiating the sample with the electron beam through the electron optical system. An image processing unit generates a two-dimensional image from detection signals obtained by irradiating the sample while the electron beam scans the sample two-dimensionally by scanning deflectors of the electron optical system. Further, generates a reconstructed image by deconvoluting electron beam intensity distribution information of an ideal aperture image of the first aperture from the generated two-dimensional image information.
    Type: Grant
    Filed: February 14, 2019
    Date of Patent: April 21, 2020
    Assignee: HITACHI, LTD.
    Inventors: Yasunari Sohda, Momoyo Enyama, Megumi Kimura, Koichi Hamada
  • Patent number: 10483083
    Abstract: In this invention, information of material composition, process conditions and candidates of crystal structure either known or imported from material database is used to determine sample stage tilt angle and working distance (WD). Under these determined tilt angle and WD, the intensity of the electrons emitted at different angles and with different energies is measured using a scanning electron microscope (SEM) system comprising: a use of materials database containing materials composition, formation process, crystal structure and its electron yield; a sample stage that is able to move, rotate and tilt; an processing section for calculating optimum working distance for an observation from material database and measurement condition; means for acquiring an image of crystal information of a desired area of a sample based on an image obtained from SEM observation.
    Type: Grant
    Filed: July 24, 2018
    Date of Patent: November 19, 2019
    Assignee: HITACHI, LTD.
    Inventors: Thantip Krasienapibal, Yasuhiro Shirasaki, Momoyo Enyama, Sayaka Kurata
  • Publication number: 20190287757
    Abstract: An electron beam device suitable for observing the bottom of a deep groove or hole with a high degree of accuracy under a large current condition includes: an electron optical system having an irradiation optical system to irradiate a first aperture with an electron beam emitted from an electron source and a reduction projection optical system to project and form an aperture image of the first aperture on a sample, detectors to detect secondary electrons emitted by irradiating the sample with the electron beam through the electron optical system. An image processing unit generates a two-dimensional image from detection signals obtained by irradiating the sample while the electron beam scans the sample two-dimensionally by scanning deflectors of the electron optical system. Further, generates a reconstructed image by deconvoluting electron beam intensity distribution information of an ideal aperture image of the first aperture from the generated two-dimensional image information.
    Type: Application
    Filed: February 14, 2019
    Publication date: September 19, 2019
    Applicant: HITACHI, LTD.
    Inventors: Yasunari SOHDA, Momoyo ENYAMA, Megumi KIMURA, Koichi HAMADA
  • Patent number: 10361063
    Abstract: A charged particle detector including a scintillator that is irradiated with charged particles, a fluorescent film being in contact with a first surface facing a second surface of the scintillator, the second surface being irradiated with the charged particles, and a photodetector that detects luminescence of the fluorescent film, wherein the fluorescent film has a plurality of regions, the plurality of regions respectively have phosphors that absorb luminescence of the scintillator and emit light with different wavelengths from one another, and a charged particle beam device using the charged particle detector.
    Type: Grant
    Filed: March 12, 2018
    Date of Patent: July 23, 2019
    Assignee: Hitachi, Ltd.
    Inventors: Yasuhiro Shirasaki, Momoyo Enyama, Kaori Shirahata, Makoto Sakakibara
  • Patent number: 10319562
    Abstract: To reduce the risk of measurement accuracy degradation and information lost due to adhesion of contamination that occurs by irradiation with charged particle beam. The charged particle beam device includes: a deflector for scanning a charged particle beam; a detector for detecting secondary charged particles generated by the interaction of the charged particle beam with a sample; and a system control unit including a calculation part, a measurement part, and a storage part. The measurement part measures a feature amount from an image formed based on a signal output from the detector after a charged particle beam is scanned on the sample by the deflector (S303). The calculation part calculates an amount of contamination adhering to a surface of the sample by irradiation of the sample with the charged particle beam, from a change in the feature amount measured by the measurement part (S304).
    Type: Grant
    Filed: March 9, 2018
    Date of Patent: June 11, 2019
    Assignee: HITACHI, LTD.
    Inventors: Megumi Kimura, Momoyo Enyama, Makoto Sakakibara
  • Publication number: 20190131104
    Abstract: A charged particle beam device that detects a secondary charged particle beam generated by irradiation of a sample by a primary charged particle beam, includes: an image shift deflector that shifts an irradiation region for irradiation of the sample by the primary charged particle beam; a magnetic sector that separates the primary charged particle beam passing therein from the secondary charged particle beam from the sample using a magnetic field generated therein; a correction mechanism that is placed off of a trajectory of the primary charged particle beam but on a trajectory of the secondary charged particle beam inside the magnetic sector, the correction mechanism deflecting the secondary charged particle beam passing through; and a controller that controls the correction mechanism according to a defined relationship between a shift amount by the image shift deflector and a correction amount by the correction mechanism.
    Type: Application
    Filed: March 31, 2016
    Publication date: May 2, 2019
    Inventors: Yasuhiro SHIRASAKI, Momoyo ENYAMA
  • Patent number: 10256068
    Abstract: A charged particle beam apparatus includes a charged particle source, a separator, a charged particle beam irradiation switch, and a control device. The separator is inserted into a charged particle optical system and deflects a traveling direction of a charged particle beam out of an optical axis of the charged particle optical system or deflects the traveling direction in the optical axis of the charged particle optical system. The charged particle beam irradiation switch absorbs the charged particle beam deflected out of the optical axis of the charged particle optical system or reflects the charged particle beam toward the separator. The control device controls a charged particle beam irradiation switch.
    Type: Grant
    Filed: July 31, 2017
    Date of Patent: April 9, 2019
    Assignee: HITACHI, LTD.
    Inventors: Momoyo Enyama, Yasuhiro Shirasaki, Natsuki Tsuno
  • Publication number: 20190035597
    Abstract: In this invention, information of material composition, process conditions and candidates of crystal structure either known or imported from material database is used to determine sample stage tilt angle and working distance (WD). Under these determined tilt angle and WD, the intensity of the electrons emitted at different angles and with different energies is measured using a scanning electron microscope (SEM) system comprising: a use of materials database containing materials composition, formation process, crystal structure and its electron yield; a sample stage that is able to move, rotate and tilt; an processing section for calculating optimum working distance for an observation from material database and measurement condition; means for acquiring an image of crystal information of a desired area of a sample based on an image obtained from SEM observation.
    Type: Application
    Filed: July 24, 2018
    Publication date: January 31, 2019
    Inventors: Thantip KRASIENAPIBAL, Yasuhiro SHIRASAKI, Momoyo ENYAMA, Sayaka KURATA
  • Publication number: 20180261425
    Abstract: A charged particle detector including a scintillator that is irradiated with charged particles, a fluorescent film being in contact with a first surface facing a second surface of the scintillator, the second surface being irradiated with the charged particles, and a photodetector that detects luminescence of the fluorescent film, wherein the fluorescent film has a plurality of regions, the plurality of regions respectively have phosphors that absorb luminescence of the scintillator and emit light with different wavelengths from one another, and a charged particle beam device using the charged particle detector.
    Type: Application
    Filed: March 12, 2018
    Publication date: September 13, 2018
    Inventors: Yasuhiro SHIRASAKI, Momoyo ENYAMA, Kaori SHIRAHATA, Makoto SAKAKIBARA
  • Publication number: 20180261426
    Abstract: To reduce the risk of measurement accuracy degradation and information lost due to adhesion of contamination that occurs by irradiation with charged particle beam. The charged particle beam device includes: a deflector for scanning a charged particle beam; a detector for detecting secondary charged particles generated by the interaction of the charged particle beam with a sample; and a system control unit including a calculation part, a measurement part, and a storage part. The measurement part measures a feature amount from an image formed based on a signal output from the detector after a charged particle beam is scanned on the sample by the deflector (S303). The calculation part calculates an amount of contamination adhering to a surface of the sample by irradiation of the sample with the charged particle beam, from a change in the feature amount measured by the measurement part (S304).
    Type: Application
    Filed: March 9, 2018
    Publication date: September 13, 2018
    Inventors: Megumi KIMURA, Momoyo ENYAMA, Makoto SAKAKIBARA
  • Publication number: 20180232869
    Abstract: An image forming apparatus includes an observation image input section in which a plurality of observation images is input, an emphasis information input section that inputs information to be emphasized, a storage section that defines a plurality of conversion functions that converts the plurality of observation images into a converted image on the basis of a function for conversion and takes, as a parameter, a gradation value of each pixel in the plurality of observation images and a plurality of emphasis functions that takes, as a parameter, a gradation value of each pixel in the conversion functions, an image calculation section that calculates an image in which information to be emphasized is emphasized on the basis of the plurality of input observation images, the input information of the information to be emphasized, the conversion functions, and the emphasis functions, and an emphasized image output section that outputs the emphasized image.
    Type: Application
    Filed: February 12, 2018
    Publication date: August 16, 2018
    Inventors: Momoyo ENYAMA, Yasuhiro SHIRASAKI, Michio HATANO, Makoto SAKAKIBARA
  • Patent number: 10037866
    Abstract: A charged particle beam apparatus with improved depth of focus and maintained/improved resolution has a charged particle source, an off-axis illumination aperture, a lens, a computer, and a memory unit. The apparatus acquires an image by detecting a signal generated by irradiating a sample with a charged particle beam caused from the charged particle source via the off-axis illumination aperture. The computer has a beam-computing-process unit to estimate a beam profile of the charged particle beam and an image-sharpening-process unit to sharpen the image using the estimated beam profile.
    Type: Grant
    Filed: July 22, 2016
    Date of Patent: July 31, 2018
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Momoyo Enyama, Muneyuki Fukuda, Hideyuki Kazumi, Koichi Hamada, Sayaka Tanimoto
  • Patent number: 9991088
    Abstract: An aberration corrector includes a mirror that corrects an aberration of a charged particle beam, a beam separator, and a bypass optical system in the beam separator. The beam separator includes an entrance of the charged particle beam and an exit from which the charged particle beam is emitted to an objective lens, and separates an incident trajectory from the entrance to the mirror and a reflection trajectory from the mirror to the exit from each other by deflecting the charged particle beam in an ON state. The bypass optical system is disposed at a position at which the trajectory of the charged particle beam bypasses when the beam separator is in the ON state, and the trajectory of the charged particle beam passes when the beam separator is in an OFF state, and controls the charged particle beam so that objective lens optical conditions in a trajectory via the mirror and a trajectory passing through the bypass optical system coincide with each other.
    Type: Grant
    Filed: February 18, 2015
    Date of Patent: June 5, 2018
    Assignee: Hitachi, Ltd.
    Inventors: Yasuhiro Shirasaki, Momoyo Enyama, Hiroya Ohta