Patents by Inventor Motohiro Arakawa
Motohiro Arakawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240332617Abstract: In a method for producing a composition containing an electrolyte, a non-aqueous solvent, and an anionic component, the electrolyte contains a sulfonylimide compound represented by the general formula (1), and the anionic component contains a conjugate acid with an acid dissociation constant pKa (a first-step acid dissociation constant pKa1 for acids that ionize multiple times) of 0 or more and 6.5 or less and is contained at a concentration of 10000 ppm by mass or less with respect to the electrolyte. The method includes dehydrating of adding the anionic component to a solution containing the electrolyte and the non-aqueous solvent to dehydrate the solution for solvent replacement. LiN (XSO2) (FSO2) (1) (where X represents a fluorine atom, an alkyl group with 1 to 6 carbon atoms, or a fluoroalkyl group with 1 to 6 carbon atoms).Type: ApplicationFiled: June 22, 2022Publication date: October 3, 2024Applicant: NIPPON SHOKUBAI CO., LTD.Inventors: Takayuki KOBATAKE, Chie OOKUBO, Ryo WATABE, Motohiro ARAKAWA
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Publication number: 20230378537Abstract: A non-aqueous electrolyte solution contains a sulfonylimide compound represented by the general formula (1): LiN(R1SO2)(R2SO2) (wherein R1 and R2 are identical or different from each other and each represents a fluorine atom, an alkyl group having 1 to 6 carbon atoms, or a fluoroalkyl group having 1 to 6 carbon atoms) as an electrolyte salt, an electrolyte solution solvent, and at least one of carbon dioxide (CO2), carbon monoxide (CO), a bicarbonate ion (HCO3?), or a carbonate ion (CO32?) dissolved therein. The electrolyte solution solvent includes at least one selected from the group consisting of a carbonate solvent, a lactone solvent, an ether solvent, a nitrile solvent, and a chain ester solvent, and a total amount of the at least one of CO2, CO, HCO3?, or CO32? dissolved is 20 ppm by mass or more.Type: ApplicationFiled: September 16, 2021Publication date: November 23, 2023Applicant: NIPPON SHOKUBAI CO., LTD.Inventors: Ryo NISHIHATA, Hiroyuki MIZUNO, Motohiro ARAKAWA
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Publication number: 20230089471Abstract: To provide a composition containing a sulfonylimide salt, which has excellent storage stability even at a high temperature and can be used for an electrolytic solution material or an electrolytic solution. The composition contains an electrolyte, a solvent, and an anion component. The electrolyte contains a sulfonylimide salt, the anion component contains an acid component having an acid-dissociation constant pKa (an acid-dissociation constant pKa1 in a first stage for a plurality of ionized acids) of 0 or more and 6.5 or less at a concentration of 50 ppm or more and 10000 ppm or less relative to the electrolyte, a concentration of fluoride ion is 100 ppm or less relative to the electrolyte, and a concentration of sulfate ion is 100 ppm or less relative to the electrolyte.Type: ApplicationFiled: February 4, 2021Publication date: March 23, 2023Applicant: NIPPON SHOKUBAI CO., LTD.Inventors: Yusuke OYAMA, Motohiro ARAKAWA, Takayuki KOBATAKE, Chie ONODA
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Publication number: 20220238920Abstract: An electrolyte composition includes: a sulfonylimide compound represented by the following general formula (1) as an electrolyte salt; and an amidosulfuric acid component. LiN(X1SO2)(X2SO2)??(1) (where X1 and X2 are identical to or different from each other, and each represent a fluorine atom, an alkyl group with a carbon number of 1 to 6, or a fluoroalkyl group with a carbon number of 1 to 6).Type: ApplicationFiled: April 28, 2020Publication date: July 28, 2022Applicant: NIPPON SHOKUBAI CO., LTD.Inventors: Hiroyuki MIZUNO, Yukihiro FUKATA, Ryo WATABE, Motohiro ARAKAWA, Takayuki KOBATAKE, Yusuke OYAMA, Chie ONODA
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Patent number: 11374258Abstract: The present invention provides an electrolyte composition that provides better charging/discharging performance when used in a cell than a conventional electrolyte composition. The present invention relates to an electrolyte composition containing an alkali metal salt, at least one polymer selected from the group consisting of a polyether polymer, a (meth)acrylic polymer, a nitrile polymer, and a fluoropolymer, and an ion dissociation accelerator. The composition has an alkali metal salt concentration of 1.8 mol/kg or higher.Type: GrantFiled: June 19, 2018Date of Patent: June 28, 2022Assignee: Nippon Shokubai Co., Ltd.Inventors: Shin-ya Shibata, Motohiro Arakawa
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Patent number: 11342583Abstract: The present invention provides an electrolyte composition that provides better charging/discharging performance when used in a cell than a conventional electrolyte composition. The present invention relates to an electrolyte composition containing an alkali metal salt, at least one polymer selected from the group consisting of a polyether polymer, a (meth)acrylic polymer, a nitrile polymer, and a fluoropolymer, and an ion dissociation accelerator. The composition has an alkali metal salt concentration of 1.8 mol/kg or higher.Type: GrantFiled: June 19, 2018Date of Patent: May 24, 2022Assignee: Nippon Shokubai Co., Ltd.Inventors: Shin-ya Shibata, Motohiro Arakawa
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Publication number: 20210135283Abstract: The present invention provides an electrolyte composition that provides better charging/discharging performance when used in a cell than a conventional electrolyte composition. The present invention relates to an electrolyte composition containing an alkali metal salt, at least one polymer selected from the group consisting of a polyether polymer, a (meth)acrylic polymer, a nitrile polymer, and a fluoropolymer, and an ion dissociation accelerator. The composition has an alkali metal salt concentration of 1.8 mol/kg or higher.Type: ApplicationFiled: June 19, 2018Publication date: May 6, 2021Inventors: Shin-ya SHIBATA, Motohiro ARAKAWA
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Patent number: 6765029Abstract: A method for dehydrating a porous cross-linked polymer conveniently to a low final water content is provided. A porous cross-linked polymer sheet is produced by a method which comprises causing a porous cross-linked polymer obtained by forming and polymerizing a water-in-oil type higher internal phase emulsion to be dehydrated by the use of non-woven fabric rolls furnished with an aspiration mechanism. Properly in this case, the porous cross-linked polymer is subjected to preliminary squeezing. In accordance with the present invention, a porous cross-linked polymer abounding in a water absorbing property to be dehydrated to a low final water content with a small number of rolls.Type: GrantFiled: June 13, 2002Date of Patent: July 20, 2004Assignees: Nippon Shokubai Co., Ltd., The Proctor & Gamble CompanyInventors: Masazumi Sasabe, Katsuhiko Sakamoto, Kozo Nogi, Motohiro Arakawa
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Patent number: 6730712Abstract: A method for producing a porous cross-linked polymer sheet capable of slicing quickly is provided. This method comprises a step for obtaining a porous cross-linked polymer by forming and polymerizing an HIPE, a step for dehydrating the porous cross-linked polymer, and a step for subsequently slicing the dehydrated porous cross-linked polymer. According to this invention, by performing the step of dehydration prior to the conventional step of slicing, it is made possible to prevent the porous cross-linked polymer from adhering to the blade and the guides provided for a slicer, and allow the slicing to be attained quickly. By removing the salt from the polymer, it is further made possible to prevent a production device from gathering rust and the porous cross-linked polymer from permitting adhesion of rust thereto.Type: GrantFiled: September 27, 2002Date of Patent: May 4, 2004Assignee: Nippon Shokubai Co., Ltd.Inventors: Masazumi Sasabe, Katsuhiko Sakamoto, Kozo Nogi, Motohiro Arakawa
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Publication number: 20040019152Abstract: It is an object of the present invention, which has been made in view of the above-mentioned state of the art, to provide a protolytically leaving group-containing copolymer which can exhibit high levels of changes in characteristics, such as solubility in alkaline aqueous solutions after free proton treatment as compared with the, solubility before such treatment, and of substrate adhesion, developability, chemical resistance and etching resistance and which can judiciously be applied in various fields of application.Type: ApplicationFiled: April 24, 2003Publication date: January 29, 2004Applicant: Nippon Shokubai Co., Ltd.Inventors: Yohei Murakami, Masatoshi Yoshida, Osamu Konosu, Shinichi Goto, Motohiro Arakawa, Tadayoshi Ugamura
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Publication number: 20030153637Abstract: A method for producing a porous cross-linked polymer sheet capable of slicing quickly is provided. This method comprises a step for obtaining a porous cross-linked polymer by forming and polymerizing an HIPE, a step for dehydrating the porous cross-linked polymer, and a step for subsequently slicing the dehydrated porous cross-linked polymer. According to this invention, by performing the step of dehydration prior to the conventional step of slicing, it is made possible to prevent the porous cross-linked polymer from adhering to the blade and the guides provided for a slicer, and allow the slicing to be attained quickly. By removing the salt from the polymer, it is further made possible to prevent a production device from gathering rust and the porous cross-linked polymer from permitting adhesion of rust thereto.Type: ApplicationFiled: September 27, 2002Publication date: August 14, 2003Inventors: Masazumi Sasabe, Katsuhiko Sakamoto, Kozo Nogi, Motohiro Arakawa
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Publication number: 20030036575Abstract: A method for dehydrating a porous cross-linked polymer conveniently to a low final water content is provided. A porous cross-linked polymer sheet is produced by a method which comprises causing a porous cross-linked polymer obtained by forming and polymerizing a water-in-oil type higher internal phase emulsion to be dehydrated by the use of non-woven fabric rolls furnished with an aspiration mechanism. Properly in this case, the porous cross-linked polymer is subjected to preliminary squeezing. In accordance with the present invention, a porous cross-linked polymer abounding in a water absorbing property to be dehydrated to a low final water content with a small number of rolls.Type: ApplicationFiled: June 13, 2002Publication date: February 20, 2003Inventors: Masazumi Sasabe, Katsuhiko Sakamoto, Kozo Nogi, Motohiro Arakawa
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Patent number: 6015651Abstract: The photo-curable liquid solder resist ink composition of the present invention mainly comprises a photo-polymerizable resin having sufficient molecular weight and (meth)acryloyl groups which are imparted by both of introduction of (meth)acryloyl groups into a novolak-type epoxy resin having 4 or more of benzene nuclei and polymerization using a chain-extension agent. The composition is useful for a photo-curable type resist, since it can produce a coated film excellent in tack free characteristic and resolution, and can produce a cured film excellent in heat resistance, adhesiveness, and chemical resistance. In addition, by reacting with an acid anhydride, development with alkalis becomes possible.Type: GrantFiled: April 28, 1997Date of Patent: January 18, 2000Assignee: Nippon Shokubai Co., Ltd.Inventors: Toshio Awaji, Nobuaki Otsuki, Motohiro Arakawa, Hiromichi Tanaka
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Patent number: 5849857Abstract: The present invention provides a production method for a photo-sensitive resin, characterized in reacting a difunctional epoxy resin (B) having two epoxy groups in a molecule with carboxyl groups contained in a resin (A) having two or more (meth)acryloyl groups and at least one carboxyl group in a molecule. Since the photo-sensitive resin prepared by extending the resin (A) to a high molecular weight linearly via the difunctional epoxy resin (B) is obtained, a resist layer having an excellent tack-free property can be formed. Further, a resist layer irradiated with rays through a patterning film can be developed rapidly and correctly in an alkaline aqueous solution. Accordingly, it has been possible to provide the high-performance liquid photo-sensitive resin compositions useful for a solder resist used for producing printed circuit boards and for an electroless plating resist or useful for producing black matrices and color filters for liquid crystal displays.Type: GrantFiled: May 14, 1996Date of Patent: December 15, 1998Assignee: Nippon Shokubai Co., Ltd.Inventors: Toshio Awaji, Nobuaki Ohtsuki, Motohiro Arakawa