Patents by Inventor Motoi Nakao
Motoi Nakao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20210395607Abstract: The present invention provides a fluorescent diamond containing an MV center emitting fluorescence at a concentration of 1×1014/cm3 or higher, where M represents a metal or metalloid, and V represents a vacancy.Type: ApplicationFiled: October 29, 2019Publication date: December 23, 2021Applicants: DAICEL CORPORATION, KYUSHU INSTITUTE OF TECHNOLOGYInventors: Motoi NAKAO, Shinji NAGAMACHI, Masahiro NISHIKAWA, Ming LIU
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Patent number: 7393763Abstract: There is provided a monocrystalline gallium nitride localized substrate suitable for manufacturing electronic-optical united devices in which electronic devices and optical devices are mixedly mounted on the same silicon substrate. An area in which monocrystalline gallium nitride 410 is grown is locally present on a silicon substrate 100 by forming silicon carbide 200 on the silicon substrate 100 to locally form the monocrystalline gallium nitride 410 on the above-mentioned silicon carbide 200. Silicon nitride 220 is used as a mask in forming the above-mentioned monocrystalline gallium nitride 410.Type: GrantFiled: February 14, 2005Date of Patent: July 1, 2008Assignees: Osaka Prefecture, Hosiden CorporationInventors: Katsutoshi Izumi, Motoi Nakao, Yoshiaki Ohbayashi, Keiji Mine, Seisaku Hirai, Fumihiko Jobe, Tomoyuki Tanaka
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Patent number: 7128788Abstract: A manufacturing method for a buried insulating layer-type semiconductor silicon carbide substrate comprises the step of placing an SOI substrate 100, which has a surface silicon layer 130 of a predetermined thickness and a buried insulator 120, in a heating furnace 200 and of increasing the temperature of the atmosphere within heating furnace 200 while supplying a mixed gas (G1+G2) of a hydrogen gas G1 and of a hydrocarbon gas G2 into heating furnace 200, thereby, of metamorphosing surface silicon layer 130 of SOI substrate 100 into a single crystal silicon carbide thin film 140.Type: GrantFiled: March 18, 2004Date of Patent: October 31, 2006Assignees: Osaka Prefecture, Hosiden CorporationInventors: Katsutoshi Izumi, Motoi Nakao, Yoshiaki Ohbayashi, Keiji Mine, Seisaku Hirai, Fumihiko Jobe, Tomoyuki Tanaka
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Patent number: 7084049Abstract: A manufacturing method for a buried insulating layer-type semiconductor silicon carbide substrate comprises the step of placing an SOI substrate 100, which has a surface silicon layer 130 of a predetermined thickness and a buried insulator 120, in a heating furnace 200 and of increasing the temperature of the atmosphere within heating furnace 200 while supplying a mixed gas (G1+G2) of a hydrogen gas G1 and of a hydrocarbon gas G2 into heating furnace 200, thereby, of metamorphosing surface silicon layer 130 of SOI substrate 100 into a single crystal silicon carbide thin film 140.Type: GrantFiled: January 27, 2003Date of Patent: August 1, 2006Assignees: Osaka Prefecture, Hosiden CorporationInventors: Katsutoshi Izumi, Motoi Nakao, Yoshiaki Ohbayashi, Keiji Mine, Seisaku Hirai, Fumihiko Jobe, Tomoyuki Tanaka
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Patent number: 7077875Abstract: Provided is a manufacturing method of a buried insulating layer type semiconductor silicon carbide substrate excellent in flatness of an interfaces in contact the insulating layer and a manufacturing device thereof. In the manufacturing device, an SOI substrate having a buried insulating layer positioned on a silicon substrate and a surface silicon layer formed on this buried insulating layer is placed in this film formation chamber. The manufacturing device includes: the film formation chamber in which the SOI substrate is placed; a gas supplying unit for supplying various types of gasses required for the manufacturing of a buried insulating layer type semiconductor silicon carbide substrate into the film formation chamber; an infrared ray irradiating unit for irradiating the surface silicon layer of the SOI substrate with infrared rays; and a control part for controlling the gas supplying unit and the infrared ray irradiating unit.Type: GrantFiled: February 7, 2005Date of Patent: July 18, 2006Assignees: Osaka Prefecture, Hosiden CorporationInventors: Katsutoshi Izumi, Motoi Nakao, Yoshiaki Ohbayashi, Keiji Mine, Seisaku Hirai, Fumihiko Jobe, Tomoyuki Tanaka
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Patent number: 6927144Abstract: Provided is a manufacturing method of a buried insulating layer type semiconductor silicon carbide substrate excellent in flatness of an interfaces in contact the insulating layer and a manufacturing device thereof. In the manufacturing device, an SOI substrate having a buried insulating layer positioned on a silicon substrate and a surface silicon layer formed on this buried insulating layer is placed in this film formation chamber. The manufacturing device includes: the film formation chamber in which the SOI substrate is placed; a gas supplying unit for supplying various types of gasses required for the manufacturing of a buried insulating layer type semiconductor silicon carbide substrate into the film formation chamber; an infrared ray irradiating unit for irradiating the surface silicon layer of the SOI substrate with infrared rays; and a control part for controlling the gas supplying unit and the infrared ray irradiating unit.Type: GrantFiled: March 12, 2004Date of Patent: August 9, 2005Assignees: Osaka Prefecture, Hosiden CorporationInventors: Katsutoshi Izumi, Motoi Nakao, Yoshiaki Ohbayashi, Keiji Mine, Seisaku Hirai, Fumihiko Jobe, Tomoyuki Tanaka
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Publication number: 20050148108Abstract: There is provided a monocrystalline gallium nitride localized substrate suitable for manufacturing electronic-optical united devices in which electronic devices and optical devices are mixedly mounted on the same silicon substrate. An area in which monocrystalline gallium nitride 410 is grown is locally present on a silicon substrate 100 by forming silicon carbide 200 on the silicon substrate 100 to locally form the monocrystalline gallium nitride 410 on the above-mentioned silicon carbide 200. Silicon nitride 220 is used as a mask in forming the above-mentioned monocrystalline gallium nitride 410.Type: ApplicationFiled: February 14, 2005Publication date: July 7, 2005Applicants: Osaka Prefecture, Hosiden CorporationInventors: Katsutoshi Izumi, Motoi Nakao, Yoshiaki Ohbayashi, Keiji Mine, Seisaku Hirai, Fumihiko Jobe, Tomoyuki Tanaka
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Publication number: 20050136611Abstract: Provided is a manufacturing method of a buried insulating layer type semiconductor silicon carbide substrate excellent in flatness of an interfaces in contact the insulating layer and a manufacturing device thereof. In the manufacturing device, an SOI substrate having a buried insulating layer positioned on a silicon substrate and a surface silicon layer formed on this buried insulating layer is placed in this film formation chamber. The manufacturing device includes: the film formation chamber in which the SOI substrate is placed; a gas supplying unit for supplying various types of gasses required for the manufacturing of a buried insulating layer type semiconductor silicon carbide substrate into the film formation chamber; an infrared ray irradiating unit for irradiating the surface silicon layer of the SOI substrate with infrared rays; and a control part for controlling the gas supplying unit and the infrared ray irradiating unit.Type: ApplicationFiled: February 7, 2005Publication date: June 23, 2005Applicants: Osaka Prefecture, Hosiden CorporationInventors: Katsutoshi Izumi, Motoi Nakao, Yoshiaki Ohbayashi, Keiji Mine, Seisaku Hirai, Fumihiko Jobe, Tomoyuki Tanaka
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Publication number: 20040191966Abstract: Provided is a manufacturing method of a buried insulating layer type semiconductor silicon carbide substrate excellent in flatness of an interfaces in contact the insulating layer and a manufacturing device thereof. In the manufacturing device, an SOI substrate having a buried insulating layer positioned on a silicon substrate and a surface silicon layer formed on this buried insulating layer is placed in this film formation chamber. The manufacturing device includes: the film formation chamber in which the SOI substrate is placed; a gas supplying unit for supplying various types of gasses required for the manufacturing of a buried insulating layer type semiconductor silicon carbide substrate into the film formation chamber; an infrared ray irradiating unit for irradiating the surface silicon layer of the SOI substrate with infrared rays; and a control part for controlling the gas supplying unit and the infrared ray irradiating unit.Type: ApplicationFiled: March 12, 2004Publication date: September 30, 2004Applicants: OSAKA PREFECTURE,, HOSIDEN CORPORATIONInventors: Katsutoshi IZUMI, Motoi NAKAO, Yoshiaki OHBAYASHI, Keiji MINE, Seisaku HIRAI, Fumihiko JOBE, Tomoyuki TANAKA
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Publication number: 20040173154Abstract: A manufacturing method for a buried insulating layer-type semiconductor silicon carbide substrate comprises the step of placing an SOI substrate 100, which has a surface silicon layer 130 of a predetermined thickness and a buried insulator 120, in a heating furnace 200 and of increasing the temperature of the atmosphere within heating furnace 200 while supplying a mixed gas (G1+G2) of a hydrogen gas G1 and of a hydrocarbon gas G2 into heating furnace 200, thereby, of metamorphosing surface silicon layer 130 of SOI substrate 100 into a single crystal silicon carbide thin film 140.Type: ApplicationFiled: March 18, 2004Publication date: September 9, 2004Applicants: Osaka Prefecture, Hosiden CorporationInventors: Katsutoshi Izumi, Motoi Nakao, Yoshiaki Ohbayashi, Keiji Mine, Seisaku Hirai, Fumihiko Jobe, Tomoyuki Tanaka
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Patent number: 6773508Abstract: To economically and easily fabricate a single crystal silicon carbide thin film. The apparatus for fabricating a single crystal silicon carbide thin film comprises a film-formation chamber 200 adapted to receive a SOI substrate 100 for film-formation, a gas supply means 300 for supplying various gases G1 to G4 necessary to fabricate a single crystal silicon carbide thin film to the film-formation chamber 200, a gas treatment means 500 for treating argon gas as an inert gas G1, propane gas as a hydrocarbon-based gas G2, hydrogen gas as a carrier gas, and oxygen gas G4 supplied to the film-formation chamber 200, and a temperature control means 400 for controlling the temperature of the film-formation chamber 200.Type: GrantFiled: June 3, 2002Date of Patent: August 10, 2004Assignees: Osaka Prefecture, Hosiden CorporationInventors: Katsutoshi Izumi, Motoi Nakao, Yoshiaki Ohbayashi, Keiji Mine, Fumihiko Jobe
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Publication number: 20040099871Abstract: There is provided a monocrystalline gallium nitride localized substrate suitable for manufacturing electronic-optical united devices in which electronic devices and optical devices are mixedly mounted on the same silicon substrate.Type: ApplicationFiled: November 4, 2003Publication date: May 27, 2004Applicants: OSAKA PREFECTURE, HOSIDEN CORPORATIONInventors: Katsutoshi Izumi, Motoi Nakao, Yoshiaki Ohbayashi, Keiji Mine, Seisaku Hirai, Fumihiko Jobe, Tomoyuki Tanaka
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Publication number: 20030148586Abstract: A manufacturing method for a buried insulating layer-type semiconductor silicon carbide substrate comprises the step of placing an SOI substrate 100, which has a surface silicon layer 130, of a predetermined thickness and a buried insulator 120, in a heating furnace 200 and of increasing the temperature of the atmosphere within heating furnace 200 while supplying a mixed gas (G1+G2) of a hydrogen gas G1 and of a hydrocarbon gas G2 into heating furnace 200, thereby, of metamorphosing surface silicon layer 130 of SOI substrate 100 into a single crystal silicon carbide thin film 140.Type: ApplicationFiled: January 27, 2003Publication date: August 7, 2003Applicant: OSAKA PREFECTUREInventors: Katsutoshi Izumi, Motoi Nakao, Yoshiaki Ohbayashi, Keiji Mine, Seisaku Hirai, Fumihiko Jobe, Tomoyuki Tanaka
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Publication number: 20020185058Abstract: To economically and easily fabricate a single crystal silicon carbide thin film. The apparatus for fabricating a single crystal silicon carbide thin film comprises a film-formation chamber 200 adapted to receive a SOI substrate 100 for film-formation, a gas supply means 300 for supplying various gases G1 to G4 necessary to fabricate a single crystal silicon carbide thin film to the film-formation chamber 200, a gas treatment means 500 for treating argon gas as an inert gas G1, propane gas as a hydrocarbon-based gas G2, hydrogen gas as a carrier gas, and oxygen gas G4 supplied to the film-formation chamber 200, and a temperature control means 400 for controlling the temperature of the film-formation chamber 200.Type: ApplicationFiled: June 3, 2002Publication date: December 12, 2002Applicant: Osaka PrefectureInventors: Katsutoshi Izumi, Motoi Nakao, Yoshiaki Ohbayashi, Keiji Mine, Fumihiko Jobe
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Patent number: 6053035Abstract: A method for evaluating material is carried out by making current measurements in an electrolyte positioned between a sensor and a material to be evaluated. The sensor has a substrate and a sensor surface. A light source is disposed in a spaced relationship with the substrate of the sensor. An electrolyte such as a gas or a solution is positioned to contact the sensor surface, and a material to be evaluated is positioned to contact the electrolyte, such that the electrolyte is positioned between the sensor and the material to be evaluated. A change in a property of the electrolyte, for example, pH, is caused by irradiating the sensor with the light beam. By generating a current in the substrate and then measuring the current, the pH of the electrolyte may be determined.Type: GrantFiled: May 1, 1998Date of Patent: April 25, 2000Inventors: Satoshi Nomura, Shuji Takamatsu, Motoi Nakao