Patents by Inventor Muneo Kudo

Muneo Kudo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6316155
    Abstract: An external additive for electrostatically charged latent image developing toner is provied. The additive includes spherical hydrophobic fine silica particles having primary particles having a particle diameter of from 0.01 to 5 &mgr;m, which fine silica particles fulfill the following conditions (i) and (ii): (i) when an organic compound which is liquid at room temperature and has a dielectric constant of from 1 to 40 F/m and fine silica particles are mixed in a weight ratio of 5:1 and shaken, the fine silica particles disperse uniformly in the organic compound; and (ii) the quantity of primary particles remaining as primary particles when methanol is evaporated under heating by means of an evaporator from a dispersion prepared by dispersing the fine silica particles in methanol and thereafter the particles are held at a temperature of 100° C. for 2 hours, represents at least 20% of the quantity of primary particles originally present.
    Type: Grant
    Filed: March 13, 2000
    Date of Patent: November 13, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Muneo Kudo, Masaki Tanaka, Yoshiteru Sakatsume, Shoji Ichinohe, Mitsuo Asai
  • Publication number: 20010036986
    Abstract: A coating composition comprising the reaction product of a benzotriazole compound having a polymerizable vinyl group and a hydroxyl group with a silane compound and/or a (partial) hydrolyzate thereof is applied to plastic substrates, typically polycarbonate resin substrates to form transparent coatings having improved mar, weather and chemical resistance.
    Type: Application
    Filed: February 2, 2001
    Publication date: November 1, 2001
    Inventors: Kazuyuki Matsumura, Masaaki Yamaya, Koichi Higuchi, Muneo Kudo, Yoshifumi Kato, Takashi Komori, Toshihisa Shimo
  • Patent number: 6166163
    Abstract: A process for producing an organosilicon resin is disclosed. The process includes the steps of equilibrating a mixture of silane compounds of Si(OR.sup.3).sub.4 wherein R.sup.3 's are a monovalent hydrocarbon group having 1 to 6 carbon atoms; R.sup.2 Si(OR.sup.4).sub.3 wherein R.sup.2 is a monovalent hydrocarbon group having 1 to 20 carbon atoms, and R.sup.4 's are a monovalent hydrocarbon group having 1 to 6 carbon atoms; and R.sup.1.sub.3 SiX wherein X is an --OH group, an --OSiR.sup.1.sub.3 group or a hydrolyzable group, and R.sup.1 's are a monovalent hydrocarbon group having 1 to 6 carbon atoms; adding water to the product of the equilibration reaction to carry out hydrolysis reaction; and adding an aqueous alkali to the product of the hydrolysis reaction to carry out condensation reaction. The organosilicon resin obtained is well dispersible in a resin premix containing a polyol, a blowing agent, a catalyst and a foam stabilizer, and also is highly hydrophobic and low reactive.
    Type: Grant
    Filed: June 13, 2000
    Date of Patent: December 26, 2000
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Muneo Kudo, Shinichi Morioka, Mitsuo Asai
  • Patent number: 6124369
    Abstract: A process for producing an organosilicon resin is disclosed. The process includes the steps of equilibrating a mixture of silane compounds of Si(OR.sup.3).sub.4 wherein R.sup.3 's are a monovalent hydrocarbon group having 1 to 6 carbon atoms; R.sup.2 Si(OR.sup.4).sub.3 wherein R.sup.2 is a monovalent hydrocarbon group having 1 to 20 carbon atoms, and R.sup.4 's are a monovalent hydrocarbon group having 1 to 6 carbon atoms; and R.sup.1.sub.3 SiX wherein X is an --OH group, an --OSiR.sup.1.sub.3 group or a hydrolyzable group, and R.sup.1 's are a monovalent hydrocarbon group having 1 to 6 carbon atoms; adding water to the product of the equilibration reaction to carry out hydrolysis reaction; and adding an aqueous alkali to the product of the hydrolysis reaction to carry out condensation reaction. The organosilicon resin obtained is well dispersible in a resin premix containing a polyol, a blowing agent, a catalyst and a foam stabilizer, and also is highly hydrophobic and low reactive.
    Type: Grant
    Filed: September 16, 1999
    Date of Patent: September 26, 2000
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Muneo Kudo, Shinichi Morioka, Mitsuo Asai
  • Patent number: 5840952
    Abstract: After reacting sodium sulfide anhydride and hydrogen sulfide, 3-halopropylalkoxy silane represented by the general formulaX (CH.sub.2).sub.3 Si (OR).sub.a R.sub.3-a (I)is added reacted, wherein X denotes Cl or Br; R denotes a methyl, ethyl or propyl group wherein R's can be all identical or different from each other; and "a" denotes an integer 1, 2 or 3.
    Type: Grant
    Filed: October 31, 1996
    Date of Patent: November 24, 1998
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Muneo Kudo, Hideyoshi Yanagisawa, Shoji Ichinohe, Akira Yamamoto, Satoru Beppu, Hiroyuki Iwaki, Satoshi Sekizawa
  • Patent number: 5466847
    Abstract: A process for preparing hexamethylcyclo-trisilazane by heating octamethylcyclotetra-silazane in the presence of a catalyst such as a Lewis acid or a sulfur compound of the following formula ##STR1## wherein M represents Ca, Mg, Al, Fe or NH.sub.4, R represents OH, a phenyl group or a substituted phenyl group, x is 0, 1 or 2 and y is 0, 1, 2 or 3 provided that x and y are not zero at the same time, and z is 0, 1, 2 or 3.
    Type: Grant
    Filed: October 28, 1994
    Date of Patent: November 14, 1995
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shinohara, Akio Yokoo, Muneo Kudo, Motoaki Iwabuchi, Kazuyuki Matsumura
  • Patent number: 5451693
    Abstract: Herein disclosed are a tert-butyl cycloalkyl dialkoxysilane compound which is quite useful as a water repellant for treating the surface of a variety of construction materials such as wood, concrete and marble and which can easily be used, and a method for preparing the compound. A Grignard reagent represented by the formula: R.sup.1 MgX is reacted with a silane compound represented by the formula: (CH.sub.3).sub.3 CSiH(OR.sup.2).sub.2. Then the resulting silane compound: (CH.sub.3).sub.3 CSiHR.sup.1 (OR.sup.2) is further reacted with an alcohol: R.sup.2 OH in the presence of a catalyst to give a tert-butyl cycloalkyl dialkoxysilane compound: (CH.sub.3).sub.3 CSiR.sup.1 (OR.sup.2).sub.2.
    Type: Grant
    Filed: September 7, 1994
    Date of Patent: September 19, 1995
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tohru Kubota, Akira Yamamoto, Muneo Kudo
  • Patent number: 5264601
    Abstract: N,O-bis(trimethylsilyl)acetamide is improved in thermal stability by adding about 0.01 to 5 mol % of a 2-mercaptobenzothiazole or a salt thereof thereto.
    Type: Grant
    Filed: July 29, 1992
    Date of Patent: November 23, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shinohara, Muneo Kudo, Susumu Ueno, Masao Maruyama
  • Patent number: 5245066
    Abstract: Hexamethylcyclotrisilazane is prepared by reacting dimethyldichlorosilane with ammonia at a temperature between -20.degree. C. and 20.degree. C. Preferably, ammonia is blown into dimethyldichlorosilane at the temperature, and the reaction mixture is washed with 20% or higher alkaline water within one hour from the end of reaction for removing ammonium chloride by dissolving it in the water. Then hexamethylcyclotrisilazane of high purity is prepared in high yields. The method can be scaled up for commercial manufacture.
    Type: Grant
    Filed: August 21, 1992
    Date of Patent: September 14, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shinohara, Akio Yokoo, Muneo Kudo, Kazuyuki Matsumura
  • Patent number: 5227504
    Abstract: A silylating agent comprising an N-(trialkylsilyl)benzanilide having the following general formula: ##STR1## wherein R.sup.1 is a lower alkyl group. This agent is reacted with a secondary amine to produce an N,N-dialkylaminotrialkylsilane. This process is free of formation of amine hydrochlorides as by-products. Therefore, the problem associated with disposal of such amine hydrochlorides and the problem of limitations on the use of the silane compound product due to mixing of such amine hydrochlorides can be obviated effectively.
    Type: Grant
    Filed: May 14, 1992
    Date of Patent: July 13, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shinohara, Muneo Kudo, Kazuyuki Matsumura
  • Patent number: 5142080
    Abstract: Highly pure diethylaminotrimethylsilane can be manufactured in a high yield through the reaction between diethylamine and an N,O-bis(trimethylsilyl)acetamide represented by the following general formula: ##STR1## wherein X represents H or F.
    Type: Grant
    Filed: November 7, 1991
    Date of Patent: August 25, 1992
    Assignee: Shin-Etsu Chemical Company, Limited
    Inventors: Toshio Shinohara, Muneo Kudo, Kazuyuki Matsumura, Nobuyuki Suzuki
  • Patent number: 5136073
    Abstract: Several thexyl trialkoxy silanes as a novel class of organosilicon compounds were synthesized by the reaction of dehydrochlorination condensation between thexyl trichlorosilane and an alcohol, e.g., methyl, ethyl, isopropyl and isobutyl alcohols, and characterized by the analytical data. These compounds are useful as an intermediate in the synthetic preparation of other organosilicon compounds, starting material of various silicones, surface-treatment agent of inorganic materials and additive in complex catalysts.
    Type: Grant
    Filed: November 22, 1991
    Date of Patent: August 4, 1992
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshio Shinohara, Muneo Kudo, Motoaki Iwabuchi