Patents by Inventor Myung-Woong Kim

Myung-Woong Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Copolymer and composition for organic and antireflective layer
    Patent number: 8021826
    Abstract: The present invention provides an organic anti-reflection coating composition comprising a copolymer represented by the following Formula 1, a light absorbent, a thermal acid generating agent, and a curing agent: wherein R1, R2 and R3 are each independent to each; R1 represents hydrogen or an alkyl group having 1 to 10 carbon atoms; R2 represents hydrogen, an alkyl group having 1 to 10 carbon atoms or an arylalkyl group having 1 to 20 carbon atoms; R3 is hydrogen or a methyl group; m and n are repeating units in the main chain, while m+n=1, and they have values of 0.05<m/(m+n)<0.95 and 0.05<n/(m+n)<0.95. The anti-reflection coating using the polymer of the invention has excellent adhesiveness and storage stability, and a very high dry etching rate, and exhibits excellent resolution in both C/H patterns and L/S patterns.
    Type: Grant
    Filed: June 19, 2008
    Date of Patent: September 20, 2011
    Assignee: Korea Kumho Petrochemicals Co., Ltd.
    Inventors: Myung-Woong Kim, Joo-Hyeon Park, Young-Taek Lim, Hyung-Gi Kim, Jun-Ho Lee, Jong-Don Lee, Seung-Duk Cho
  • Copolymer and composition for organic and antireflective layer
    Publication number: 20080318167
    Abstract: The present invention provides an organic anti-reflection coating composition comprising a copolymer represented by the following Formula 1, a light absorbent, a thermal acid generating agent, and a curing agent: wherein R1, R2 and R3 are each independent to each; R1 represents hydrogen or an alkyl group having 1 to 10 carbon atoms; R2 represents hydrogen, an alkyl group having 1 to 10 carbon atoms or an arylalkyl group having 1 to 20 carbon atoms; R3 is hydrogen or a methyl group; m and n are repeating units in the main chain, while m+n=1, and they have values of 0.05<m/(m+n)<0.95 and 0.05<n/(m+n)<0.95. The anti-reflection coating using the polymer of the invention has excellent adhesiveness and storage stability, and a very high dry etching rate, and exhibits excellent resolution in both C/H patterns and L/S patterns.
    Type: Application
    Filed: June 19, 2008
    Publication date: December 25, 2008
    Applicant: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Myung-Woong Kim, Joo-Hyeon Park, Young-Taek Lim, Hyung-Gi Kim, Jun-Ho Lee, Jong-Don Lee, Seung-Duk Cho