Patents by Inventor Na Na KANG

Na Na KANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11732072
    Abstract: A neutral layer composition and a neutral layer formed from the same are disclosed herein. In some embodiments, a neutral layer composition includes a random copolymer having a unit represented by Formula 1, and a unit containing an aromatic structure having one or more halogen atoms, wherein the molar amount of the unit represented by Formula 1 is present in a range of 9 mol % to 32 mol %, based on the total molar amount of the copolymer. The neutral layer can effectively control orientation characteristics of various block copolymers deposited thereon.
    Type: Grant
    Filed: July 16, 2018
    Date of Patent: August 22, 2023
    Inventors: Se Jin Ku, Mi Sook Lee, Na Na Kang, Eung Chang Lee, Sung Soo Yoon, No Jin Park, Je Gwon Lee, Eun Young Choi, Hyung Ju Ryu, Yoon Hyung Hur
  • Patent number: 11613599
    Abstract: Methods for forming a laminate are provided. The method provides a highly aligned block copolymer without orientation defects, coordination number defects distance defects and the like on a substrate, thereby providing a laminate which can be effectively applied to the production of various patterned substrates, and a method for producing a patterned substrate using the same.
    Type: Grant
    Filed: November 7, 2018
    Date of Patent: March 28, 2023
    Inventors: Eung Chang Lee, Mi Sook Lee, Se Jin Ku, Na Na Kang, Hyung Ju Ryu, Sung Soo Yoon, No Jin Park, Je Gwon Lee, Eun Young Choi, Yoon Hyung Hur
  • Patent number: 11530283
    Abstract: A laminate and a method for producing a patterned substrate using the same are disclosed herein. In some embodiments, a laminate includes a substrate, and a stripe pattern having first and second polymer lines alternately and repeatedly disposed on the substrate, wherein the first polymer line comprises a first polymer having a first polymerized unit having a ring structure connected to a main chain and a second polymerized unit represented by Formula 1. The method may be applied to manufacture of devices, such as electronic devices, or of applications, such as integrated optical systems, guidance and detection patterns of magnetic domain memories, flat panel displays, liquid crystal displays (LCDs), thin film magnetic heads or organic light emitting diodes, and may be used to build a pattern on a surface used in manufacture of discrete track media, such as integrated circuits, bit-patterned media and/or magnetic storage devices such as hard drives.
    Type: Grant
    Filed: September 17, 2018
    Date of Patent: December 20, 2022
    Inventors: Na Na Kang, Se Jin Ku, Mi Sook Lee, Eung Chang Lee, Eun Young Choi, Sung Soo Yoon, No Jin Park, Je Gwon Lee, Hyung Ju Ryu, Yoon Hyung Hur
  • Patent number: 11286516
    Abstract: Disclosed is a method of designing a valid primer pair satisfying a specificity condition. The method includes searching for an identifier of a base sequence from a genetic information index based on a query language associated with a gene, searching for a candidate primer from a provided candidate primer set index to satisfy the specificity condition based on the identifier of the base sequence, filtering the candidate primer based on primer-related filtering conditions, and providing information about a primer pair satisfying the query language and the filtering conditions based on a result of the filtering.
    Type: Grant
    Filed: April 26, 2017
    Date of Patent: March 29, 2022
    Assignee: Daegu Gyeongbuk Institute of Science and Technology
    Inventors: Min Soo Kim, Hyerin Kim, Jaehyung Koo, Na Na Kang, KyuHyeon An
  • Patent number: 11062790
    Abstract: A method for designing all coverage of valid primer pairs, which satisfy various filtering constraints provided by users with respect to a given sequence database and has validated specificity to given sequences, is provided. By screening all suitable primer pairs present on a given DNA sequence database without omitting any one primer pair and also screening all primers having a coverage of 1 or more as well as primers having a coverage of 1, a user can be allowed to give rankings to the primers in order to easily select the primers having a high success rate in biological experiments from the resulting primers.
    Type: Grant
    Filed: August 12, 2015
    Date of Patent: July 13, 2021
    Assignee: DAEGU GYEONGBUK INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Min Soo Kim, Jae Hyung Koo, Hye Rin Kim, Na Na Kang, Kang Wook Chon, Seon Ho Kim
  • Publication number: 20200391490
    Abstract: A neutral layer composition and a neutral layer formed from the same are disclosed herein. In some embodiments, a neutral layer composition includes a random copolymer having a unit represented by Formula 1, and a unit containing an aromatic structure having one or more halogen atoms, wherein the molar amount of the unit represented by Formula 1 is present in a range of 9 mol % to 32 mol %, based on the total molar amount of the copolymer. The neutral layer can effectively control orientation characteristics of various block copolymers deposited thereon.
    Type: Application
    Filed: July 16, 2018
    Publication date: December 17, 2020
    Applicant: LG Chem, Ltd.
    Inventors: Se Jin Ku, Mi Sook Lee, Na Na Kang, Eung Chang Lee, Sung Soo Yoon, No Jin Park, Je Gwon Lee, Eun Young Choi, Hyung Ju Ryu, Yoon Hyung Hur
  • Publication number: 20200354487
    Abstract: A method for producing a polymer containing metal atoms or halogen atoms at the terminals thereof with excellent efficiency while minimizing or eliminating side reactions or the like is provided. The method can also freely control molecular weight characteristics of the polymer.
    Type: Application
    Filed: July 16, 2018
    Publication date: November 12, 2020
    Applicant: LG Chem, Ltd.
    Inventors: Yoon Hyung HUR, Je Gwon LEE, Sung Soo YOON, No Jin PARK, Eun Young CHOI, Se Jin KU, Mi Sook LEE, Hyung Ju RYU, Na Na KANG, Eung Chang LEE
  • Publication number: 20200347005
    Abstract: Methods for forming a laminate are provided. The method provides a highly aligned block copolymer without orientation defects, coordination number defects distance defects and the like on a substrate, thereby providing a laminate which can be effectively applied to the production of various patterned substrates, and a method for producing a patterned substrate using the same.
    Type: Application
    Filed: November 7, 2018
    Publication date: November 5, 2020
    Applicant: LG Chem, Ltd.
    Inventors: Eung Chang Lee, Mi Sook Lee, Se Jin Ku, Na Na Kang, Hyung Ju Ryu, Sung Soo Yoon, No Jin Park, Je Gwon Lee, Eun Young Choi, Yoon Hyung Hur
  • Publication number: 20200254714
    Abstract: A laminate and a method for producing a patterned substrate using the same are disclosed herein. In some embodiments, a laminate includes a substrate, and a stripe pattern having first and second polymer lines alternately and repeatedly disposed on the substrate, wherein the first polymer line comprises a first polymer having a first polymerized unit having a ring structure connected to a main chain and a second polymerized unit represented by Formula 1. The method may be applied to manufacture of devices, such as electronic devices, or of applications, such as integrated optical systems, guidance and detection patterns of magnetic domain memories, flat panel displays, liquid crystal displays (LCDs), thin film magnetic heads or organic light emitting diodes, and may be used to build a pattern on a surface used in manufacture of discrete track media, such as integrated circuits, bit-patterned media and/or magnetic storage devices such as hard drives.
    Type: Application
    Filed: September 17, 2018
    Publication date: August 13, 2020
    Applicant: LG Chem, Ltd.
    Inventors: Na Na Kang, Se Jin Ku, Mi Sook Lee, Eung Chang Lee, Eun Young Choi, Sung Soo Yoon, No Jin Park, Je Gwon Lee, Hyung Ju Ryu, Yoon Hyung Hur
  • Publication number: 20200239701
    Abstract: The present application relates to a pinning composition, a laminate comprising the same, and a method for producing the same. The pinning composition of the present application can impart directionality and location selection properties to a polymer membrane comprising a self-assembly structure of a block copolymer. The pinning composition of the present application exhibits excellent reaction selectivity, whereby it can form a vertical lamella structure with a high degree of alignment. In addition, the pinning composition of the present application may be suitable for application to low temperature processes.
    Type: Application
    Filed: October 29, 2018
    Publication date: July 30, 2020
    Applicant: LG Chem, Ltd.
    Inventors: Se Jin Ku, Mi Sook Lee, Na Na Kang, Eung Chang Lee, Sung Soo Yoon, No Jin Park, Je Gwon Lee, Eun Young Choi, Hyung Ju Ryu, Yoon Hyung Hur
  • Patent number: 10647723
    Abstract: This invention relates to a photocleavable mass tag and the use thereof, and particularly to a thiochromene-type compound useful for MALDI-TOF (Matrix-Assisted Laser Desorption/Ionization Time-Of-Flight) mass spectrometry or matrix-less LDI-TOF (Laser Desorption/Ionization Time-Of-Flight) mass spectrometry and the use thereof.
    Type: Grant
    Filed: June 18, 2015
    Date of Patent: May 12, 2020
    Assignee: SOGANG UNIVERSITY RESEARCH FOUNDATION
    Inventors: Bong-Jin Moon, Han-Bin Oh, Na-Na Kang, Ae-Ran Jeon, Kye-Shin Park, Je-Hyun Baek
  • Publication number: 20190375758
    Abstract: This invention relates to a photocleavable mass tag and the use thereof, and particularly to a thiochromene-type compound useful for MALDI-TOF (Matrix-Assisted Laser Desorption/Ionization Time-Of-Flight) mass spectrometry or matrix-less LDI-TOF (Laser Desorption/Ionization Time-Of-Flight) mass spectrometry and the use thereof.
    Type: Application
    Filed: June 18, 2015
    Publication date: December 12, 2019
    Inventors: Bong-Jin MOON, Han-Bin OH, Na-Na KANG, Ae-Ran JEON, Kye-Shin PARK, Je-Hyun BAEK
  • Publication number: 20170369934
    Abstract: Disclosed is a method of designing a valid primer pair satisfying a specificity condition. The method includes searching for an identifier of a base sequence from a genetic information index based on a query language associated with a gene, searching for a candidate primer from a provided candidate primer set index to satisfy the specificity condition based on the identifier of the base sequence, filtering the candidate primer based on primer-related filtering conditions, and providing information about a primer pair satisfying the query language and the filtering conditions based on a result of the filtering.
    Type: Application
    Filed: April 26, 2017
    Publication date: December 28, 2017
    Applicant: Daegu Gyeongbuk Institute of Science and Technology
    Inventors: Min Soo Kim, HYERIN KIM, JAEHYUNG KOO, Na Na Kang, KyuHyeon An
  • Patent number: 9725550
    Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.
    Type: Grant
    Filed: December 8, 2015
    Date of Patent: August 8, 2017
    Assignees: Samsung Display Co., Ltd., KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION, SOGANG UNIVERSITY RESEARCH FOUNDATION
    Inventors: Min Hyuck Kang, Su Mi Lee, Myung Im Kim, Tae Woo Kim, Seung-Won Park, Xie Lei, Na Na Kang, Bong-Jin Moon, Joona Bang, Sang Hoon Woo, Jin Yeong Lee, Hyun Jung Jung, June Huh
  • Publication number: 20160306915
    Abstract: A method for designing all coverage of valid primer pairs, which satisfy various filtering constraints provided by users with respect to a given sequence database and has validated specificity to given sequences, is provided. By screening all suitable primer pairs present on a given DNA sequence database without omitting any one primer pair and also screening all primers having a coverage of 1 or more as well as primers having a coverage of 1, a user can be allowed to give rankings to the primers in order to easily select the primers having a high success rate in biological experiments from the resulting primers.
    Type: Application
    Filed: August 12, 2015
    Publication date: October 20, 2016
    Inventors: Min Soo KIM, Jae Hyung Koo, Hye Rin Kim, Na Na Kang, Kang Wook Chon, Seon Ho Kim
  • Patent number: 9354522
    Abstract: A block copolymer includes: a first block, and a second block copolymerized with the first block. The second block includes a silyl group including a ring-type functional group.
    Type: Grant
    Filed: August 22, 2014
    Date of Patent: May 31, 2016
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Min Hyuck Kang, Tae Woo Kim, Myung Im Kim, Moon Gyu Lee, Su Mi Lee, Seung-Won Park, Lei Xie, Bong-Jin Moon, Na Na Kang
  • Publication number: 20160090435
    Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.
    Type: Application
    Filed: December 8, 2015
    Publication date: March 31, 2016
    Inventors: Min Hyuck KANG, Su Mi LEE, Myung Im KIM, Tae Woo KIM, Seung-Won PARK, Xie LEI, Na Na KANG, Bong-Jin MOON, Joona BANG, Sang Hoon WOO, Jin Yeong LEE, Hyun Jung JUNG, June HUH
  • Patent number: 9255170
    Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.
    Type: Grant
    Filed: November 21, 2013
    Date of Patent: February 9, 2016
    Assignees: SAMSUNG DISPLAY CO., LTD., KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION, SOGANG UNIVERSITY RESEARCH FOUNDATION
    Inventors: Min Hyuck Kang, Su Mi Lee, Myung Im Kim, Tae Woo Kim, Seung-Won Park, Xie Lei, Na Na Kang, Bong-Jin Moon, Joona Bang, Sang Hoon Woo, Jin Yeong Lee, Hyun Jung Jung, June Huh
  • Publication number: 20150218300
    Abstract: A block copolymer includes: a first block, and a second block copolymerized with the first block. The second block includes a silyl group including a ring-type functional group.
    Type: Application
    Filed: August 22, 2014
    Publication date: August 6, 2015
    Inventors: MIN HYUCK KANG, Tae Woo Kim, Myung Im Kim, Moon Gyu Lee, Su Mi Lee, Seung-Won Park, Lei Xie, Bong-Jin Moon, Na Na Kang
  • Publication number: 20140197132
    Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.
    Type: Application
    Filed: November 21, 2013
    Publication date: July 17, 2014
    Applicants: Samsung Display Co., Ltd., Sogang University Research Foundation, KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
    Inventors: Min Hyuck KANG, Su Mi LEE, Myung Im KIM, Tae Woo KIM, Seung-Won PARK, Xie LEI, Na Na KANG, Bong-Jin MOON, Joona BANG, Sang Hoon WOO, Jin Yeong LEE, Hyun Jung JUNG, June HUH