Abstract: A semiconductor device for use in a memory cell including an active matrix provided with a transistor and a first insulating layer formed around the transistor; a capacitor structure, formed on top of the first insulating layer and composed of a bottom electrode, a capacitor thin film placed on top of the bottom electrode and a top electrode formed on top of the capacitor thin film; a second insulating layer formed on top of the transistor and the capacitor structure; a metal interconnection formed on top of the second insulating layer and the active matrix to electrically connect the transistor to the capacitor structure; and a hydrogen barrier layer formed on top of the metal interconnection, wherein the hydrogen barrier layer is made of an aluminum oxide (AlxOy) layer.

Abstract: A method for manufacturing a ferroelectric memory device including steps of forming a ferroelectric layer, carrying out a rapid thermal process (RTP) to the ferroelectric layer to form perovskite crystal nuclei therein, and carrying out a heat treatment to the ferroelectric layer below 650° C. in the presence of O2 gas to crystallize the ferroelectric layer.

Abstract: A ferroelectric memory device includes: a plurality of cell groups, wherein each cell group includes a transistor and at least two ferroelectric capacitors commonly coupled to the transistor; at least one word line for selecting the cell groups; at least two plate lines for driving the capacitors contained in a memory cell of a selected cell group; and at least one bit line for transmitting data to the selected memory cell. Therefore, the integrity of device is increased by coupling at least two memory cells to one bit line and one word line through one transistor.

Abstract: A semiconductor device, and corresponding method of fabrication, includes a device isolation region formed in a semiconductor layer of a SOI substrate, the semiconductor layer having a first type of conductivity, a first impurity region made of portions of the semiconductor layer, and second and third impurity regions formed in the semiconductor layer outside of the first impurity region, the second and third impurity regions having a second type of conductivity. A base electrode is electrically connected to the first impurity region, a bit line electrode is electrically connected to the second impurity region and a capacitor is electrically connected to the third impurity region. The base electrode may be formed by etching a first contact hole through a first interlayer insulating film formed over the semiconductor layer and filling the first contact hole with an electrically conductive material.

Abstract: A semiconductor device for use in a memory cell including an active matrix provided with a transistor and a first insulating layer formed around the transistor; a capacitor structure formed on top of the first insulating layer, composed of a bottom electrode, a capacitor thin film placed on top of the bottom electrode and a top electrode formed on top of the capacitor thin film; a second insulating layer formed on top of the transistor and the capacitor structure; a metal interconnection formed on top of the second insulating layer and the active matrix to electrically connect the transistor to the capacitor structure; and a hydrogen barrier layer formed on top of the metal interconnection.

Abstract: A semiconductor device, and corresponding method of fabrication, includes a device isolation region formed in a semiconductor layer of a SOI substrate, the semiconductor layer having a first type of conductivity, a first impurity region made of portions of the semiconductor layer, and second and third impurity regions formed in the semiconductor layer outside of the first impurity region, the second and third impurity regions having a second type of conductivity. A base electrode is electrically connected to the first impurity region, a bit line electrode is electrically connected to the second impurity region and a capacitor is electrically connected to the third impurity region. The base electrode may be formed by etching a first contact hole through a first interlayer insulating film formed over the semiconductor layer and filling the first contact hole with an electrically conductive material.

Abstract: A semiconductor memory device stably operates over a wide range of the power supply voltage by including a power supply voltage level detector for generating detecting signals according to predetermined levels of the power supply voltage and an oscillator for generating a frequency-controlled oscillation pulse whose frequency is changeable according to the detecting signals. Thus, a boosting ratio of a boosting circuit, the refresh period of a refresh circuit and the substrate voltage of a substrate voltage generator can be adaptively changeable according to the variation of the power supply voltage.

Abstract: A semiconductor memory device stably operates over a wide range of the power supply voltage by including a power supply voltage level detector for generating detecting signals according to predetermined levels of the power supply voltage and an oscillator for generating a frequency-controlled oscillation pulse whose frequency is changeable according to the detecting signals. Thus, a boosting ratio of a boosting circuit, the refresh period of a refresh circuit and the substrate voltage of a substrate voltage generator can be adaptively changeable according to the variation of the power supply voltage.

Abstract: A semiconductor memory device stably operates over a wide range of the power supply voltage by including a power supply voltage level detector for generating detecting signals according to predetermined levels of the power supply voltage and an oscillator for generating a frequency-controlled oscillation pulse whose frequency is changeable according to the detecting signals. Thus, a boosting ratio of a boosting circuit, the refresh period of a refresh circuit and the substrate voltage of a substrate voltage generator can be adaptively changeable according to the variation of the power supply voltage.