Patents by Inventor Nao Murakami
Nao Murakami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11618807Abstract: A film is provided with void spaces having a porous structure with less cracks and a high proportion of void space as well as having strength. The film with void spaces includes one kind or two or more kinds of structural units that form a structure with minute void spaces, wherein the structural units are chemically bonded through catalysis. For example, the abrasion resistance measured with BEMCOT® is in the range from 60% to 100%, and the folding endurance measured by the MIT test is 100 times or more. The film with void spaces can be produced by forming the precursor of the silicone porous body using sol containing pulverized products of a gelled silicon compound and then chemically bonding the pulverized products contained in the precursor of the silicone porous body. The chemical bond among the pulverized products is preferably a chemical crosslinking bond among the pulverized products.Type: GrantFiled: December 25, 2015Date of Patent: April 4, 2023Assignee: NITTO DENKO CORPORATIONInventors: Daisuke Hattori, Hiromoto Haruta, Kozo Nakamura, Kazuki Uwada, Hiroyuki Takemoto, Nao Murakami
-
Patent number: 10815355Abstract: The present invention provides, for example, a silicone porous body having a porous structure with less cracks and a high proportion of void space as well as having a strength. The silicone porous body of the present invention includes silicon compound microporous particles, wherein the silicon compound microporous particles are chemically bonded by catalysis. For example, the abrasion resistance measured with BEMCOT® is in the range from 60% to 100%, and the folding endurance measured by the MIT test is 100 times or more. The silicone porous body can be produced, for example, by forming the precursor of the silicone porous body using sol containing pulverized products of a gelled silicon compound and then chemically bonding the pulverized products contained in the precursor of the silicone porous body. The chemical bond among the pulverized products is preferably a chemical crosslinking bond among the pulverized products, for example.Type: GrantFiled: July 3, 2019Date of Patent: October 27, 2020Assignee: NITTO DENKO CORPORATIONInventors: Hiromoto Haruta, Kozo Nakamura, Kazuki Uwada, Hiroyuki Takemoto, Nao Murakami, Daisuke Hattori
-
Patent number: 10754065Abstract: An object of the present invention is to provide a retardation film excellent in various properties such as optical properties, heat resistance, mechanical properties, and reliability. The present invention relates to a retardation film containing a thermoplastic resin and composed of a single layer, in which the retardation film has a value of wavelength dispersion that is a ratio of retardations at a wavelength of 450 nm and at a wavelength of 550 nm being 0.75 or more and 0.92 or less; a birefringence at a wavelength of 550 nm and the wavelength dispersion satisfy a relationship of ?n?0.0140×(R450/R550)?0.0082; and a photoelastic coefficient is 25×10?12 Pa?1 or less.Type: GrantFiled: October 14, 2016Date of Patent: August 25, 2020Assignees: NITTO DENKO CORPORATION, Mitsubishi Chemical CorporationInventors: Shingo Namiki, Yuuichi Hirami, Hisatoshi Uehara, Hiroyuki Hayashi, Takashi Shimizu, Hiroshi Sumimura, Nao Murakami
-
Patent number: 10732323Abstract: The retardation film of the present invention contains a resin having positive refractive index anisotropy and containing at least one bonding group of a carbonate bond and an ester bond and one or more structural units selected from the group consisting of a structural unit represented by the general formula (1) and a structural unit represented by the general formula (2), in which the value of wavelength dispersion (R450/R550) as a ratio of retardation R450 at a wavelength of 450 nm to retardation R550 at a wavelength of 550 nm is more than 0.5 and less than 1.0: (in formula (1) and formula (2), definitions of R1 to R9 are the same as in the description).Type: GrantFiled: October 14, 2016Date of Patent: August 4, 2020Assignees: NITTO DENKO CORPORATION, Mitsubishi Chemical CorporationInventors: Shingo Namiki, Yuuichi Hirami, Hisatoshi Uehara, Hiroyuki Hayashi, Takashi Shimizu, Hiroshi Sumimura, Nao Murakami
-
Patent number: 10670773Abstract: The retardation film of the present invention contains a thermoplastic resin and is constituted of a single layer. A value of wavelength dispersion (R450/R550) that is a ratio of a retardation R450 at a wavelength of 450 nm and a retardation R550 at a wavelength of 550 nm is 0.70 or more and 0.85 or less; and a photoelastic coefficient is 14×10?12 Pa?1 or less.Type: GrantFiled: October 14, 2016Date of Patent: June 2, 2020Assignees: NITTO DENKO CORPORATION, Mitsubishi Chemical CorporationInventors: Shingo Namiki, Yuuichi Hirami, Hisatoshi Uehara, Hiroyuki Hayashi, Takashi Shimizu, Hiroshi Sumimura, Nao Murakami
-
Patent number: 10632696Abstract: Disclosed herein is a process for producing a transparent film, including the step of stretching a film in at least one direction under a condition(s) that satisfies an expression (5): 200%/min?[stretching speed(strain rate)]?1,200%/min??(5), wherein the film comprises a polycarbonate resin containing at least a constitutional unit derived from a dihydroxy compound (A) that has a bonded structure represented by a structural formula (1): in which no hydrogen atom is bonded to the oxygen atom contained in the structural formula (1).Type: GrantFiled: May 5, 2017Date of Patent: April 28, 2020Assignees: MITSUBISHI CHEMICAL CORPORATION, NITTO DENKO CORPORATIONInventors: Tomohiko Tanaka, Michiaki Fuji, Nao Murakami, Takashi Shimizu
-
Patent number: 10634836Abstract: There is provided a circularly polarizing plate for an organic EL display apparatus that is excellent in productivity, is prevented from warping, and can achieve an excellent tint. An elongated circularly polarizing plate for an organic EL display apparatus according to an embodiment of the present invention includes in the following order: an elongated polarizer having an absorption axis in a longitudinal direction thereof; an elongated first retardation layer functioning as a ?/2 plate; and an elongated second retardation layer functioning as a ?/4 plate. An angle formed between the absorption axis of the elongated polarizer and a slow axis of the elongated first retardation layer is front 15° to 30°; and the absorption axis of the elongated polarizer and a slow axis of the elongated second retardation layer are substantially perpendicular to each other.Type: GrantFiled: April 28, 2015Date of Patent: April 28, 2020Assignee: NITTO DENKO CORPORATIONInventors: Kentarou Takeda, Hironori Yaginuma, Kazuki Uwada, Tadashi Kojima, Nao Murakami
-
Patent number: 10472483Abstract: The present invention provides, for example, a silicone porous body having a porous structure with less cracks and a high proportion of void space as well as having a strength. The silicone porous body of the present invention includes silicon compound microporous particles, wherein the silicon compound microporous particles are chemically bonded by catalysis. For example, the abrasion resistance measured with BEMCOT® is in the range from 60% to 100%, and the folding endurance measured by the MIT test is 100 times or more. The silicone porous body can be produced, for example, by forming the precursor of the silicone porous body using sol containing pulverized products of a gelled silicon compound and then chemically bonding the pulverized products contained in the precursor of the silicone porous body. The chemical bond among the pulverized products is preferably a chemical crosslinking bond among the pulverized products, for example.Type: GrantFiled: December 25, 2015Date of Patent: November 12, 2019Assignee: NITTO DENKO CORPORATIONInventors: Hiromoto Haruta, Kozo Nakamura, Kazuki Uwada, Hiroyuki Takemoto, Nao Murakami, Daisuke Hattori
-
Publication number: 20190330438Abstract: The present invention provides, for example, a silicone porous body having a porous structure with less cracks and a high proportion of void space as well as having a strength. The silicone porous body of the present invention includes silicon compound microporous particles, wherein the silicon compound microporous particles are chemically bonded by catalysis. For example, the abrasion resistance measured with BEMCOT® is in the range from 60% to 100%, and the folding endurance measured by the MIT test is 100 times or more. The silicone porous body can be produced, for example, by forming the precursor of the silicone porous body using sol containing pulverized products of a gelled silicon compound and then chemically bonding the pulverized products contained in the precursor of the silicone porous body. The chemical bond among the pulverized products is preferably a chemical crosslinking bond among the pulverized products, for example.Type: ApplicationFiled: July 3, 2019Publication date: October 31, 2019Applicant: NITTO DENKO CORPORATIONInventors: Hiromoto Haruta, Kozo Nakamura, Kazuki Uwada, Hiroyuki Takemoto, Nao Murakami, Daisuke Hattori
-
Patent number: 10435531Abstract: The present invention provides, for example, a silicone porous body having a porous structure with less cracks and a high proportion of void space as well as having a strength. The silicone porous body of the present invention includes silicon compound microporous particles, wherein the silicon compound microporous particles are chemically bonded by catalysis. For example, the abrasion resistance measured with BEMCOT® is in the range from 60% to 100%, and the folding endurance measured by the MIT test is 100 times or more. The silicone porous body can be produced, for example, by forming the precursor of the silicone porous body using sol containing pulverized products of a gelled silicon compound and then chemically bonding the pulverized products contained in the precursor of the silicone porous body. The chemical bond among the pulverized products is preferably a chemical crosslinking bond among the pulverized products, for example.Type: GrantFiled: December 25, 2015Date of Patent: October 8, 2019Assignee: NITTO DENKO CORPORATIONInventors: Hiromoto Haruta, Kozo Nakamura, Kazuki Uwada, Hiroyuki Takemoto, Nao Murakami, Daisuke Hattori
-
Patent number: 10385179Abstract: The present invention provides, for example, a silicone porous body having a porous structure with less cracks and a high proportion of void space as well as having a strength. The silicone porous body of the present invention includes silicon compound microporous particles, wherein the silicon compound microporous particles are chemically bonded by catalysis. For example, the abrasion resistance measured with BEMCOT® is in the range from 60% to 100%, and the folding endurance measured by the MIT test is 100 times or more. The silicone porous body can be produced, for example, by forming the precursor of the silicone porous body using sol containing pulverized products of a gelled silicon compound and then chemically bonding the pulverized products contained in the precursor of the silicone porous body. The chemical bond among the pulverized products is preferably a chemical crosslinking bond among the pulverized products, for example.Type: GrantFiled: December 25, 2015Date of Patent: August 20, 2019Assignee: NITTO DENKO CORPORATIONInventors: Hiromoto Haruta, Kozo Nakamura, Kazuki Uwada, Hiroyuki Takemoto, Nao Murakami, Daisuke Hattori
-
Patent number: 10175403Abstract: There is provided an optical member that can realize a liquid crystal display apparatus that is excellent in mechanical strength and has high illuminance. An optical member according to an embodiment of the present invention includes a polarizing plate, a reflective polarizer, and a prism sheet in the stated order. The optical member has a reflectance of 70% or more for linearly polarized light having a wavelength of 650 nm entering the reflective polarizer at 45°.Type: GrantFiled: May 7, 2014Date of Patent: January 8, 2019Assignee: NITTO DENKO CORPORATIONInventors: Kozo Nakamura, Shouhei Maezawa, Takehito Fuchida, Hiroyuki Takemoto, Nao Murakami
-
Patent number: 10036840Abstract: There is provided a circularly polarizing plate capable of realizing a bendable display apparatus in which an excellent reflection hue is obtained and a color change due to bending is suppressed. A circularly polarizing plate according to the present invention is used in a bendable display apparatus. The circularly polarizing plate includes: a polarizer; and a retardation film arranged on one side of the polarizer. In-plane retardations of the retardation film satisfy a relationship of Re(450)<Re(550)<Re(650), and a slow axis direction of the retardation film is adjusted so as to form an angle of from 20° to 70° with respect to a bending direction of the display apparatus.Type: GrantFiled: January 29, 2014Date of Patent: July 31, 2018Assignee: NITTO DENKO CORPORATIONInventors: Kentarou Takeda, Hironori Yaginuma, Hiroshi Sumimura, Nao Murakami
-
Patent number: 10001669Abstract: There is provided an optical member that suppresses the occurrence of moire, and can realize a liquid crystal display apparatus that is excellent in mechanical strength and has high brightness. An optical member according to an embodiment of the present invention includes a polarizing plate, a light diffusion layer, a reflective polarizer, and a prism sheet in the stated order.Type: GrantFiled: April 10, 2013Date of Patent: June 19, 2018Assignee: NITTO DENKO CORPORATIONInventors: Takehito Fuchida, Shouhei Maezawa, Hiroyuki Takemoto, Nao Murakami, Kozo Nakamura
-
Patent number: 9950461Abstract: Provided is a method capable of producing a retardation film suppressed in biaxiality, having a small Nz coefficient, and having a slow axis in an oblique direction with high production efficiency. The production method for a retardation film of the present invention includes: holding left and right side edge portions of a film to be stretched with left and right variable pitch-type clips configured to have clip pitches changing in a longitudinal direction, respectively; preheating the film; reducing, under a state in which a position at which the clip pitch of the clips on one side out of the left and right clips starts to reduce and a position at which the clip pitch of the clips on another side starts to reduce are set to different positions in the longitudinal direction, the clip pitch of each of the clips to a predetermined pitch to subject the film to oblique stretching; and releasing the clips holding the film.Type: GrantFiled: March 12, 2014Date of Patent: April 24, 2018Assignee: NITTO DENKO CORPORATIONInventors: Takashi Shimizu, Satoshi Hirata, Seiji Kondo, Nao Murakami
-
Publication number: 20180002508Abstract: A film is provided with void spaces having a porous structure with less cracks and a high proportion of void space as well as having strength. The film with void spaces includes one kind or two or more kinds of structural units that form a structure with minute void spaces, wherein the structural units are chemically bonded through catalysis. For example, the abrasion resistance measured with BEMCOT® is in the range from 60% to 100%, and the folding endurance measured by the MIT test is 100 times or more. The film with void spaces can be produced by forming the precursor of the silicone porous body using sol containing pulverized products of a gelled silicon compound and then chemically bonding the pulverized products contained in the precursor of the silicone porous body. The chemical bond among the pulverized products is preferably a chemical crosslinking bond among the pulverized products.Type: ApplicationFiled: December 25, 2015Publication date: January 4, 2018Applicant: NITTO DENKO CORPORATIONInventors: Daisuke Hattori, Hiromoto Haruta, Kozo Nakamura, Kazuki Uwada, Hiroyuki Takemoto, Nao Murakami
-
Publication number: 20170342232Abstract: The present invention provides, for example, a silicone porous body having a porous structure with less cracks and a high proportion of void space as well as having a strength. The silicone porous body of the present invention includes silicon compound microporous particles, wherein the silicon compound microporous particles are chemically bonded by catalysis. For example, the abrasion resistance measured with BEMCOT® is in the range from 60% to 100%, and the folding endurance measured by the MIT test is 100 times or more. The silicone porous body can be produced, for example, by forming the precursor of the silicone porous body using sol containing pulverized products of a gelled silicon compound and then chemically bonding the pulverized products contained in the precursor of the silicone porous body. The chemical bond among the pulverized products is preferably a chemical crosslinking bond among the pulverized products, for example.Type: ApplicationFiled: December 25, 2015Publication date: November 30, 2017Applicant: Nitto Denko CorporationInventors: Hiromoto Haruta, Kozo Nakamura, Kazuki Uwada, Hiroyuki Takemoto, Nao Murakami, Daisuke Hattori
-
Patent number: 9804313Abstract: Provided is a method capable of producing a retardation film being excellent in axial accuracy, showing small changes in retardation and dimensions at the time of its heating, and having a slow axis in an oblique direction with high production efficiency. The production method for a retardation film of the present invention includes: holding left and right end portions of a film with left and right variable pitch-type clips configured to have clip pitches changing in a longitudinal direction, respectively; preheating the film; causing the clip pitches of the left and right clips to each independently change to obliquely stretch the film; reducing the clip pitches of the left and right clips to shrink the film in the longitudinal direction; and releasing the film from being held with the clips.Type: GrantFiled: March 12, 2014Date of Patent: October 31, 2017Assignee: NITTO DENKO CORPORATIONInventors: Takashi Shimizu, Satoshi Hirata, Seiji Kondo, Nao Murakami
-
Patent number: 9796146Abstract: The present invention provides a method capable of producing a retardation film having an elongated shape, having high uniaxiality and a high in-plane alignment property, and having a slow axis in an oblique direction with high production efficiency.Type: GrantFiled: March 12, 2014Date of Patent: October 24, 2017Assignee: NITTO DENKO CORPORATIONInventors: Takashi Shimizu, Satoshi Hirata, Seiji Kondo, Nao Murakami
-
Publication number: 20170239899Abstract: A polycarbonate resin film of the present invention is formed from a polycarbonate resin which contains at least a constitutional unit derived from a dihydroxy compound having a bonded structure represented by the following structural formula (1) and satisfies the following expression (2) when subjected to a tensile test at a standard stretching temperature for the polycarbonate resin and at a pulling speed (strain rate) of 1,000%/min. [Chem. 1] ?CH2—O???(1) (No hydrogen atom is bonded to the oxygen atom contained in the structural formula (1).) 0.Type: ApplicationFiled: May 5, 2017Publication date: August 24, 2017Applicants: MITSUBISHI CHEMICAL CORPORATION, NITTO DENKO CORPORATIONInventors: Tomohiko TANAKA, Michiaki FUJI, Nao MURAKAMI, Takashi SHIMIZU