Patents by Inventor Naohiko Okunishi

Naohiko Okunishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10665416
    Abstract: A substrate processing apparatus includes a chamber, a pedestal provided in the chamber and having a substrate holding region to hold a substrate thereon, and a gas supply part to supply a gas into the chamber. A plurality of electron gun arrays two-dimensionally arranged so as to cover the substrate holding region is provided and configured to emit electrons toward the gas to cause interactions between the emitted electrons and the gas. A plurality of electron energy control parts is correspondingly provided at each of the electron gun arrays and configured to control energy of the electrons emitted from each of the electron gun arrays independently of each other.
    Type: Grant
    Filed: July 19, 2018
    Date of Patent: May 26, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Shinji Kubota, Naohiko Okunishi, Yosuke Tamuro, Shota Kaneko
  • Patent number: 10651813
    Abstract: A method is provided to design a filter. In the method, a difference between a high frequency to be blocked and a resonance frequency of a distributed constant type reference filter is obtained, the reference filter including a reference coil having windings wound at a plurality of pitches having the same length in an axial direction and a capacitor connected in parallel to the reference coil. When the difference is greater than the predetermined value, a split position in the reference coil where the reference coil is divided into a first coil element and a second coil element connected in series and a split distance between the first coil element and the second coil element to reduce the first difference.
    Type: Grant
    Filed: June 20, 2017
    Date of Patent: May 12, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Nozomu Nagashima, Naohiko Okunishi, Eiichiro Kikuchi
  • Publication number: 20200126759
    Abstract: A plasma processing method for a workpiece in a plasma processing apparatus includes (i) performing a first plasma processing on a workpiece, and (ii) performing a second plasma processing on the workpiece. Power of second radio frequency waves set in the second plasma processing is greater than the power of the second radio frequency waves set in the first plasma processing. In the second plasma processing, a magnetic field distribution having a horizontal component on an edge side of the workpiece greater than a horizontal component on a center of the workpiece is formed by an electromagnet.
    Type: Application
    Filed: December 18, 2019
    Publication date: April 23, 2020
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Akihiro YOKOTA, Takanori BANSE, Joji TAKAYOSHI, Shinya MORIKITA, Naohiko OKUNISHI
  • Patent number: 10546723
    Abstract: A plasma processing method for a workpiece in a plasma processing apparatus includes (i) performing a first plasma processing on a workpiece, and (ii) performing a second plasma processing on the workpiece. Power of second radio frequency waves set in the second plasma processing is greater than the power of the second radio frequency waves set in the first plasma processing. In the second plasma processing, a magnetic field distribution having a horizontal component on an edge side of the workpiece greater than a horizontal component on a center of the workpiece is formed by an electromagnet.
    Type: Grant
    Filed: September 25, 2018
    Date of Patent: January 28, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Akihiro Yokota, Takanori Banse, Joji Takayoshi, Shinya Morikita, Naohiko Okunishi
  • Publication number: 20200027688
    Abstract: A substrate processing apparatus includes a chamber, a pedestal provided in the chamber and having a substrate holding region to hold a substrate thereon, and a gas supply part to supply a gas into the chamber. A plurality of electron gun arrays two-dimensionally arranged so as to cover the substrate holding region is provided and configured to emit electrons toward the gas to cause interactions between the emitted electrons and the gas. A plurality of electron energy control parts is correspondingly provided at each of the electron gun arrays and configured to control energy of the electrons emitted from each of the electron gun arrays independently of each other.
    Type: Application
    Filed: July 19, 2018
    Publication date: January 23, 2020
    Inventors: Shinji KUBOTA, Naohiko OKUNISHI, Yosuke TAMURO, Shota KANEKO
  • Publication number: 20190348263
    Abstract: There is provided a filter device. In the filter device, a plurality of coils are arranged coaxially. Each of a plurality of wirings is electrically connected to one end of each of the coils. Each of a plurality of capacitors is connected between the other end of each of the coils and the ground. A housing is electrically grounded and configured to accommodate therein the coils. Further, each of the wirings at least partially extends into the housing and has a length that is adjustable in the housing.
    Type: Application
    Filed: May 9, 2019
    Publication date: November 14, 2019
    Applicant: TOKYO ELECTRON LIMITED
    Inventor: Naohiko OKUNISHI
  • Publication number: 20190318914
    Abstract: A processing apparatus that processes an substrate inside a processing container includes a first electrode disposed inside the processing container, the first electrode being configured to mount the substrate, a second electrode disposed so as to face the first electrode, an electric power supply unit configured to apply high frequency power to the first electrode or the second electrode, a coil disposed on a surface opposite to the surface to which the first electrode or the second electrode faces and on a surface of any one of the first electrode and the second electrode, one end of the coil being connected to the any one of the the first electrode and the second electrode, another end of the coil being connected to ground, and an adjusting mechanism configured to control a magnetic field strength of a magnetic field that is from the coil and passes through the coil.
    Type: Application
    Filed: April 9, 2019
    Publication date: October 17, 2019
    Inventors: Naohiko OKUNISHI, Hiroshi NAGAHATA, Masaru ISAGO, Hiraku MURAKAMI
  • Publication number: 20190295819
    Abstract: In a plasma processing apparatus, a high frequency power source is electrically connected to a lower electrode of a supporting table through a power feeding unit. The power feeding unit is surrounded by a conductor pipe outside the chamber. An electrostatic chuck of the supporting table has therein a plurality of heaters. A filter device is provided between the heaters and a heater controller. The filter device includes a plurality of coil groups, each of the coil groups including two or more coils. In each of the coil groups, the two or more coils are arranged such that winding portions of the two or more coils extend in a spiral shape around a central axis and turns of the winding portions are arranged sequentially and repeatedly, and the coil groups are provided coaxially to the central axis to surround the conductor pipe directly below the chamber.
    Type: Application
    Filed: March 22, 2019
    Publication date: September 26, 2019
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Naohiko OKUNISHI, Katsumi SEKIGUCHI, Ryuichi YUI
  • Patent number: 10332728
    Abstract: In a plasma processing apparatus, a heating element 50 provided in a susceptor 12 is electrically connected to a heater power supply 58 disposed at an outside of a chamber 10 via an internal conductor 51 provided through the susceptor 12, a power feed conductor 52 provided across a space SP, a filter unit 54 and an electric cable 56. A casing 110 of the filter unit 54 is vertically fastened, from a bottom of the chamber 10, to an opening 114 formed in a bottom wall (base) 10a of the chamber 10 to be adjacent to a cylindrical conductive cover 42 that surrounds a power feed rod 40. The casing 110 is physically or electrically coupled to the bottom wall 10a of the chamber 10.
    Type: Grant
    Filed: October 18, 2013
    Date of Patent: June 25, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Naohiko Okunishi
  • Publication number: 20190096635
    Abstract: A plasma processing method for a workpiece in a plasma processing apparatus includes (i) performing a first plasma processing on a workpiece, and (ii) performing a second plasma processing on the workpiece. Power of second radio frequency waves set in the second plasma processing is greater than the power of the second radio frequency waves set in the first plasma processing. In the second plasma processing, a magnetic field distribution having a horizontal component on an edge side of the workpiece greater than a horizontal component on a center of the workpiece is formed by an electromagnet.
    Type: Application
    Filed: September 25, 2018
    Publication date: March 28, 2019
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Akihiro YOKOTA, Takanori BANSE, Joji TAKAYOSHI, Shinya MORIKITA, Naohiko OKUNISHI
  • Publication number: 20190096639
    Abstract: A plasma processing apparatus includes a stage including a lower electrode in an inner space of a chamber main body. An upper electrode is provided above the stage. A first radio frequency power supply is electrically connected to the upper electrode through a power feed conductor. A second radio frequency power supply is electrically connected to a lower electrode. A ground conductor extends above the chamber main body to cover the upper electrode. The ground conductor provides an external space at the outside thereof on the side of the inner space. the third portion, the external space being provided on the second portion and above the inner space. The external space is spaced upward from the upper electrode and is shielded from the upper electrode by the ground conductor. An electromagnet is disposed in the external space.
    Type: Application
    Filed: September 25, 2018
    Publication date: March 28, 2019
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Shuichi TAKAHASHI, Takaharu MIYADATE, Norinao TAKASU, Etsuji ITO, Akihiro YOKOTA, Naohiko OKUNISHI
  • Publication number: 20190027344
    Abstract: A plasma processing apparatus includes a stage for supporting a target object in a chamber defined by a chamber body. The stage includes a lower electrode, an electrostatic chuck provided on the lower electrode, heaters provided in the electrostatic chuck, and terminals electrically connected to the heaters. A conductor pipe electrically connects a high frequency power supply and the lower electrode and extends from the lower electrode to the outside of the chamber body. Power supply lines supply power from a heater controller to the heaters. Filters partially forming the power supply lines prevent the inflow of high frequency power from the heaters to the heater controller. The power supply lines include wirings which respectively connect the terminals and the filters and extend to the outside of the chamber body through an inner bore of the conductor pipe.
    Type: Application
    Filed: July 17, 2018
    Publication date: January 24, 2019
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Naohiko OKUNISHI, Nozomu NAGASHIMA, Tomoyuki TAKAHASHI
  • Publication number: 20180350570
    Abstract: A stage according to an exemplary embodiment has an electrostatic chuck. The electrostatic chuck has a base and a chuck main body. The chuck main body is provided on the base and configured to hold a substrate with electrostatic attractive force. The chuck main body has a plurality of first heaters and a plurality of second heaters. The number of second heaters is larger than the number of first heaters. The first heater controller drives the plurality of first heaters by an alternating current output or a direct current output from a first power source. The second heater controller drives the plurality of second heaters by an alternating current output or a direct current output from a second power source which has electric power lower than electric power of the output from the first power source.
    Type: Application
    Filed: May 25, 2018
    Publication date: December 6, 2018
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hiroki ENDO, Katsuyuki KOIZUMI, Naohiko OKUNISHI
  • Publication number: 20180309423
    Abstract: Provided is a filter device including a plurality of coils, a plural of capacitors, and a frame. The coils constitute a plurality of coil groups. Each coil group includes two or more coils. The two or more coils in each coil group are provided such that respective windings of the two or more coils extend spirally about a central axis and respective turns of the two or more coils are sequentially and repeatedly arranged in an axial direction in which the central axis extends. The coil groups are provided coaxially with the central axis. A pitch between the respective turns of the two or more coils of any one coil group among the coil groups is larger than a pitch between the respective turns of the two or more coils of the coil group provided inside the one coil group among the coil groups.
    Type: Application
    Filed: April 24, 2018
    Publication date: October 25, 2018
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Naohiko OKUNISHI, Nozomu NAGASHIMA
  • Patent number: 10096454
    Abstract: A resonance frequency can be adjusted by shifting the resonance frequency without reducing an impedance function or a withstanding voltage characteristic against a high frequency noise, when blocking, by using a multiple parallel resonance characteristic of a distributed constant line, the high frequency noise introduced into a power feed line from an electrical member other than a high frequency electrode within a processing vessel. Comb teeth M of a comb-teeth member 114 are inserted into winding gaps of air core coils 104(1) and 104(2). For example, first comb teeth M? having a thickness m? smaller than a standard thickness ts are mainly inserted in an effective zone A in a central portion of the air core coils. Further, in non-effective zones B at both sides or both end portions thereof, second comb teeth M+ having a thickness m+ equal to or larger than the standard thickness ts are arranged.
    Type: Grant
    Filed: March 10, 2015
    Date of Patent: October 9, 2018
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Naohiko Okunishi, Nozomu Nagashima
  • Patent number: 10074519
    Abstract: Provided is a plasma processing apparatus in which an external circuit is electrically connected, via a line, to a predetermined electric member within a processing container thereof, and noises of first and second high frequency waves are attenuated or blocked by a filter provided on the line when the noises enter the line from the electric member toward the external circuit. The filter includes: an air core coil provided at a first stage when viewed from the electric member side; a toroidal coil connected in series with the air core coil; an electroconductive casing configured to accommodate or enclose the air core coil and the toroidal coil; a first condenser electrically connected between a connection point between the air core coil and the toroidal coil and the casing; and a second condenser connected between a terminal of the toroidal coil at the external circuit side and the casing.
    Type: Grant
    Filed: September 9, 2013
    Date of Patent: September 11, 2018
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Keiki Ito, Masaki Nishikawa, Naohiko Okunishi, Junichi Shimada, Ken Koyanagi
  • Publication number: 20180139834
    Abstract: A filter device includes a plurality of coils of which central axes are spaced apart from one another and in parallel to one another and a plurality of ground members spaced apart from one another and extending in parallel to the central axes of the coils outside of the coils. Each of the coils is spaced apart from another coil closest thereto by a first distance. Each of the ground members is spaced apart from a coil closest thereto by a second distance. The number of ground members spaced apart from each of the coils by the second distance is the same.
    Type: Application
    Filed: November 3, 2017
    Publication date: May 17, 2018
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Nozomu NAGASHIMA, Naohiko OKUNISHI
  • Publication number: 20180053635
    Abstract: A plasma processing apparatus includes at least one asymmetry member that causes a non-uniformity of plasma density around a high frequency electrode in an azimuthal direction; and a plasma density distribution controller. The plasma density distribution controller includes a first conductor which has first and second surfaces facing opposite directions to each other and is electrically connected with the high frequency electrode, the first surface facing a portion of a rear surface of the high frequency electrode; a second conductor which includes a first connecting portion electrically connected with a portion of the second surface of the first conductor and a second connecting portion electrically connected with a conductive grounding member electrically grounded around the high frequency electrode; and a conductor moving unit for varying a position of at least one of the first conductor and the second conductor in an azimuthal direction of the high frequency electrode.
    Type: Application
    Filed: October 31, 2017
    Publication date: February 22, 2018
    Inventors: Yohei Yamazawa, Naohiko Okunishi, Hironobu Misawa, Hidehito Soeta
  • Publication number: 20170373659
    Abstract: A method is provided to design a filter. In the method, a difference between a high frequency to be blocked and a resonance frequency of a distributed constant type reference filter is obtained, the reference filter including a reference coil having windings wound at a plurality of pitches having the same length in an axial direction and a capacitor connected in parallel to the reference coil. When the difference is greater than the predetermined value, a split position in the reference coil where the reference coil is divided into a first coil element and a second coil element connected in series and a split distance between the first coil element and the second coil element to reduce the first difference.
    Type: Application
    Filed: June 20, 2017
    Publication date: December 28, 2017
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Nozomu NAGASHIMA, Naohiko OKUNISHI, Eiichiro KIKUCHI
  • Patent number: 9754766
    Abstract: A resonance frequency is adjusted or optimized by shifting the resonance frequency without reducing an impedance function or a withstand voltage characteristic against a high frequency noise, when blocking, by using a multiple parallel resonance characteristic of a distributed constant line, the high frequency noise introduced into a line such as a power feed line or a signal line from an electrical member other than a high frequency electrode within a processing vessel. Regarding winding pitches, each of the solenoid coils 104(1) and 104(2) is divided to multiple sections K1, K2, . . . in a coil axis direction, and, a winding pitch pi in each section Ki (i=1, 2, . . . ) is set independently. Comb teeth M inserted into winding gaps of both solenoid coils 104(1) and 104(2) are formed on inner surfaces of multiple rod-shaped comb-teeth member 114 provided adjacent to the solenoid coils 104(1) and 104(2).
    Type: Grant
    Filed: May 14, 2014
    Date of Patent: September 5, 2017
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Naohiko Okunishi