Abstract: A semiconductor structure includes an alternating stack of insulating layers and electrically conductive layers located over a substrate, memory openings vertically extending through the alternating stack, memory opening fill structures located in the memory openings, where each of the memory opening fill structures includes a memory film and a vertical semiconductor channel that extend vertically, and each memory film includes a first metal oxide blocking dielectric layer, and a second metal oxide blocking dielectric layer located between each of the vertically neighboring electrically conductive layers and insulating layers, and located between each of the first metal oxide blocking dielectric layers and each of the electrically conductive layers.

Abstract: A memory die includes an alternating stack of insulating layers and electrically conductive layers located between a drain-side dielectric layer and a source-side dielectric layer. Memory openings vertically extend through the alternating stack. Each of the memory openings has a greater lateral dimension an interface with the source-side dielectric layer than at an interface with the drain-side dielectric layer. Memory opening fill structures are located in the memory openings. Each of the memory opening fill structures includes a vertical semiconductor channel, a vertical stack of memory elements, and a drain region. A logic die may be bonded to a source-side dielectric layer side of the memory die.

Abstract: A semiconductor structure includes an alternating stack of insulating layers and electrically conductive layers located over a substrate, memory openings vertically extending through the alternating stack, memory opening fill structures located in the memory openings, where each of the memory opening fill structures contains a memory film and a vertical semiconductor channel that extend vertically, and each memory film includes a crystalline blocking dielectric metal oxide layer, and a metal oxide amorphous dielectric nucleation layer located between each of the vertically neighboring electrically conductive layers and insulating layers, and located between each of the crystalline blocking dielectric metal oxide layers and each of the electrically conductive layers.

Abstract: A memory die includes an alternating stack of insulating layers and electrically conductive layers located between a drain-side dielectric layer and a source-side dielectric layer. Memory openings vertically extend through the alternating stack. Each of the memory openings has a greater lateral dimension an interface with the source-side dielectric layer than at an interface with the drain-side dielectric layer. Memory opening fill structures are located in the memory openings. Each of the memory opening fill structures includes a vertical semiconductor channel, a vertical stack of memory elements, and a drain region. A logic die may be bonded to a source-side dielectric layer side of the memory die.

Abstract: A memory die includes an alternating stack of insulating layers and electrically conductive layers located between a drain-side dielectric layer and a source-side dielectric layer. Memory openings vertically extend through the alternating stack. Each of the memory openings has a greater lateral dimension an interface with the source-side dielectric layer than at an interface with the drain-side dielectric layer. Memory opening fill structures are located in the memory openings. Each of the memory opening fill structures includes a vertical semiconductor channel, a vertical stack of memory elements, and a drain region. A logic die may be bonded to a source-side dielectric layer side of the memory die.

Abstract: A memory die includes an alternating stack of insulating layers and electrically conductive layers located between a drain-side dielectric layer and a source-side dielectric layer. Memory openings vertically extend through the alternating stack. Each of the memory openings has a greater lateral dimension an interface with the source-side dielectric layer than at an interface with the drain-side dielectric layer. Memory opening fill structures are located in the memory openings. Each of the memory opening fill structures includes a vertical semiconductor channel, a vertical stack of memory elements, and a drain region. A logic die may be bonded to a source-side dielectric layer side of the memory die.

Abstract: A semiconductor structure includes an alternating stack of insulating layers and electrically conductive layers located over a substrate, memory openings vertically extending through the alternating stack, memory opening fill structures located in the memory openings, where each of the memory opening fill structures contains a memory film and a vertical semiconductor channel that extend vertically, and each memory film includes a crystalline blocking dielectric metal oxide layer, and a metal oxide amorphous dielectric nucleation layer located between each of the vertically neighboring electrically conductive layers and insulating layers, and located between each of the crystalline blocking dielectric metal oxide layers and each of the electrically conductive layers.

Abstract: A semiconductor structure includes an alternating stack of insulating layers and electrically conductive layers located over a substrate, memory openings vertically extending through the alternating stack, memory opening fill structures located in the memory openings, where each of the memory opening fill structures contains a memory film and a vertical semiconductor channel that extend vertically, and each memory film includes a crystalline blocking dielectric metal oxide layer, and a metal oxide amorphous dielectric nucleation layer located between each of the vertically neighboring electrically conductive layers and insulating layers, and located between each of the crystalline blocking dielectric metal oxide layers and each of the electrically conductive layers.

Abstract: First memory openings are formed through a first alternating stack of first insulating layers and first spacer material layers. Each first memory opening is filled with a first memory film, a sacrificial dielectric liner, and a first-tier opening fill material portion. Second memory openings are formed through a second alternating stack of second insulating layers and second spacer material layers. A second memory film is formed in each second memory opening. The first-tier opening fill material portions are removed selective to the sacrificial dielectric liners. The sacrificial dielectric liners are removed selective to the second memory films and the first memory films. A vertical semiconductor channel can be formed on each vertical stack of a first memory film and a second memory film.

Abstract: A bonded assembly includes a memory die including a three-dimensional memory array located on a first single crystalline semiconductor substrate, and a logic die including a peripheral circuitry located on a second single crystalline semiconductor substrate and bonded to the memory die. The three-dimensional memory array includes word lines and bit lines. The logic die includes field effect transistors having semiconductor channels configured to flow electrical current along a channel direction that is parallel to the bit lines or word lines. Different crystallographic orientations are used for the first and second single crystalline semiconductor substrates. The crystallographic orientations of the first single crystalline semiconductor substrate are selected to minimize stress deformation of the memory chip, while the crystallographic orientations of the second single crystalline semiconductor substrate are selected to maximize device performance of the peripheral circuitry.

Abstract: Memory stack structures and dielectric wall structures are formed through a vertically alternating sequence of continuous insulating layers and continuous sacrificial material layers. Backside trenches are formed to divide the vertically alternating sequence into multiple alternating stacks. First portions of the continuous sacrificial material layers are replaced with electrically conductive layers. A connection region including a pair of dielectric wall structures is provided between a first memory array region and a second memory array region of a first alternating stack. Second portions of the continuous sacrificial material layers remain between the pair of dielectric wall structures as a vertical stack of dielectric plates. An upper subset of the first electrically conductive layers is patterned and is divided into multiple discrete portions. The multiple discrete portions are electrically connected by a respective set of connection metal interconnect structures.

Abstract: First memory openings are formed through a first alternating stack of first insulating layers and first spacer material layers. Each first memory opening is filled with a first memory film, a sacrificial dielectric liner, and a first-tier opening fill material portion. Second memory openings are formed through a second alternating stack of second insulating layers and second spacer material layers. A second memory film is formed in each second memory opening. The first-tier opening fill material portions are removed selective to the sacrificial dielectric liners. The sacrificial dielectric liners are removed selective to the second memory films and the first memory films. A vertical semiconductor channel can be formed on each vertical stack of a first memory film and a second memory film.

Abstract: A bonded assembly includes a memory die including a three-dimensional memory array located on a first single crystalline semiconductor substrate, and a logic die including a peripheral circuitry located on a second single crystalline semiconductor substrate and bonded to the memory die. The three-dimensional memory array includes word lines and bit lines. The logic die includes field effect transistors having semiconductor channels configured to flow electrical current along a channel direction that is parallel to the bit lines or word lines. Different crystallographic orientations are used for the first and second single crystalline semiconductor substrates. The crystallographic orientations of the first single crystalline semiconductor substrate are selected to minimize stress deformation of the memory chip, while the crystallographic orientations of the second single crystalline semiconductor substrate are selected to maximize device performance of the peripheral circuitry.

Abstract: A bonded assembly includes a memory die including a three-dimensional memory array located on a first single crystalline semiconductor substrate, and a logic die including a peripheral circuitry located on a second single crystalline semiconductor substrate and bonded to the memory die. The three-dimensional memory array includes word lines and bit lines. The logic die includes field effect transistors having semiconductor channels configured to flow electrical current along a channel direction that is parallel to the bit lines or word lines. Different crystallographic orientations are used for the first and second single crystalline semiconductor substrates. The crystallographic orientations of the first single crystalline semiconductor substrate are selected to minimize stress deformation of the memory chip, while the crystallographic orientations of the second single crystalline semiconductor substrate are selected to maximize device performance of the peripheral circuitry.

Abstract: A three-dimensional memory device includes laterally spaced apart vertically alternating stacks of insulating strips and word line electrically conductive strips located over a substrate, memory stack structures extending through the multiple vertically alternating stacks, word line contact via structures contacting a top surface of the respective word line electrically conductive strips, field effect transistors overlying the word line contact via structures, and connector line structures which are electrically connected to respective subsets of the word line electrically conductive strips in different vertically alternating stacks through the field effect transistors.

Abstract: A memory device contains a stack of insulating layers and electrically conductive word line layers, at least one first drain select gate electrode located over the stack and extending through a first drain select transistor and a second drain select transistor, at least one second drain select gate electrode located between the first drain select electrode and the stack, and extending through a third drain select transistor and a fourth drain select transistor. The first drain select transistor and the third drain select transistor are located in a first NAND memory string. The second drain select transistor and the fourth drain select transistor are located in a second NAND memory string different from the first NAND memory string. The first drain select transistor has a higher threshold voltage than the second drain select transistor. The third drain select transistor has a lower threshold voltage than the fourth drain select transistor.

Abstract: A memory device contains a stack of insulating layers and electrically conductive word line layers, at least one first drain select gate electrode located over the stack and extending through a first drain select transistor and a second drain select transistor, at least one second drain select gate electrode located between the first drain select electrode and the stack, and extending through a third drain select transistor and a fourth drain select transistor. The first drain select transistor and the third drain select transistor are located in a first NAND memory string. The second drain select transistor and the fourth drain select transistor are located in a second NAND memory string different from the first NAND memory string. The first drain select transistor has a higher threshold voltage than the second drain select transistor. The third drain select transistor has a lower threshold voltage than the fourth drain select transistor.

Abstract: A three-dimensional memory device includes laterally spaced apart vertically alternating stacks of insulating strips and word line electrically conductive strips located over a substrate, memory stack structures extending through the multiple vertically alternating stacks, word line contact via structures contacting a top surface of the respective word line electrically conductive strips, field effect transistors overlying the word line contact via structures, and connector line structures which are electrically connected to respective subsets of the word line electrically conductive strips in different vertically alternating stacks through the field effect transistors.

Abstract: A three-dimensional memory device includes an alternating stack of insulating layers and electrically conductive layers located over a semiconductor surface, a memory opening extending through the alternating stack, a semiconductor pedestal channel portion located at a bottom portion of the memory opening and contacting a top surface of the semiconductor surface, and a memory stack structure located in the memory opening and contacting a top surface of the pedestal channel portion. The memory stack structure includes a memory film and a vertical semiconductor channel located inside the memory film. A maximum lateral extent of the pedestal channel portion is greater than a maximum lateral dimension of an entire interface between the pedestal channel portion and the memory stack structure.

Abstract: A first tier structure including a first alternating stack of first insulating layers and first sacrificial material layers is formed over a substrate. First support openings and first memory openings are formed through the first tier structure. A dielectric material portion providing electrical isolation from the substrate is formed in each first memory openings. A second tier structure including a second alternating stack of second insulating layers and second sacrificial material layers is formed the first tier structure. Second support openings and second memory openings are formed through the second tier structure above the first support openings and the first memory openings. Memory stack structures are formed in inter-tier openings formed by adjoining the first and second memory openings.