Patents by Inventor Naoki Fukutomi
Naoki Fukutomi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20090098097Abstract: The present invention aims to provide a composition suitable for normalizing the blood pressure, which is useful as food, health food, supplement, nutritional supplement, food for specified health uses, food with nutrient function claims, pharmaceutical product, quasi-drug, feed or pet food. The present inventors have found that coenzyme Q has a superior effect for normalizing the blood pressure and completed the present invention. That is, the present invention provides a composition for normalizing the blood pressure, which contains reduced coenzyme Q as an active ingredient, and a composition for normalizing the blood pressure, which contains oxidized coenzyme Q as an active ingredient and improves hypotension.Type: ApplicationFiled: January 25, 2007Publication date: April 16, 2009Applicant: KANEKA CORPORATIONInventors: Toshinori Ikehara, Kenji Fujii, Kiyoshi Temmaru, Mikio Kitahara, Naoki Fukutomi
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Patent number: 7187072Abstract: A semiconductor package substrate is provided, which can meet the move toward high integration of semiconductors. A nickel layer is plated on an electroplated copper foil to form a wiring pattern. An LSI chip is mounted on the copper foil, and terminals of the LSI chip and the wiring pattern are connected by wire bonding, followed by sealing with a semiconductor-sealing epoxy resin. Only the copper foil is dissolved away with an alkali etchant to expose nickel. With a nickel stripper having low copper-dissolving power, the nickel layer is removed to expose the wiring pattern. A solder resist is coated, and a pattern is formed in such a way that connecting terminal portions are exposed. Solder balls are placed at the exposed portions of the wiring pattern and are then fused. The wiring pattern is connected to an external printed board via the solder balls.Type: GrantFiled: November 10, 2003Date of Patent: March 6, 2007Assignee: Hitachi Chemical Company, Ltd.Inventors: Naoki Fukutomi, Yoshiaki Tsubomatsu, Fumio Inoue, Toshio Yamazaki, Hirohito Ohhata, Shinsuke Hagiwara, Noriyuki Taguchi, Hiroshi Nomura
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Publication number: 20040110319Abstract: A semiconductor package substrate is provided, which can meet the move toward high integration of semiconductors. A nickel layer is plated on an electroplated copper foil to form a wiring pattern. An LSI chip is mounted on the copper foil, and terminals of the LSI chip and the wiring pattern are connected by wire bonding, followed by sealing with a semiconductor-sealing epoxy resin. Only the copper foil is dissolved away with an alkali etchant to expose nickel. With a nickel stripper having low copper-dissolving power, the nickel layer is removed to expose the wiring pattern. A solder resist is coated, and a pattern is formed in such a way that connecting terminal portions are exposed. Solder balls are placed at the exposed portions of the wiring pattern and are then fused. The wiring pattern is connected to an external printed board via the solder balls.Type: ApplicationFiled: November 10, 2003Publication date: June 10, 2004Applicant: Hitachi Chemical Company, Ltd.Inventors: Naoki Fukutomi, Yoshiaki Tsubomatsu, Fumio Inoue, Toshio Yamazaki, Hirohito Ohhata, Shinsuke Hagiwara, Noriyuki Taguchi, Hiroshi Nomura
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Patent number: 6746897Abstract: A semiconductor package substrate is provided, which can meet the move toward high integration of semiconductors. A nickel layer is plated on an electroplated copper foil to form a wiring pattern. An LSI chip is mounted on the copper foil, and terminals of the LSI chip and the wiring pattern are connected by wire bonding, followed by sealing with a semiconductor-sealing epoxy resin. Only the copper foil is dissolved away with an alkali etchant to expose nickel. With a nickel stripper having low copper-dissolving power, the nickel layer is removed to expose the wiring pattern. A solder resist is coated, and a pattern is formed in such a way that connecting terminal portions are exposed. Solder balls are placed at the exposed portions of the wiring pattern and are then fused. The wiring pattern is connected to an external printed board via the solder balls.Type: GrantFiled: October 23, 2001Date of Patent: June 8, 2004Inventors: Naoki Fukutomi, Yoshiaki Tsubomatsu, Fumio Inoue, Toshio Yamazaki, Hirohito Ohhata, Shinsuke Hagiwara, Noriyuki Taguchi, Hiroshi Nomura
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Patent number: 6708398Abstract: A substrate for use in a semiconductor package is fabricated by preparing a composite metal laminate consisting of a first metal layer, a second metal layer, and a carrier layer positioned in this order. The first metal layer has etching characteristics different to those of the second metal layer with respect to the same etchant. The first metal layer is selectively etched until the second metal layer is exposed, thereby forming pillar-like interconnections. The gap between the interconnections is then filled with a resin so as to form a resin base with interconnections. The carrier layer is removed from the second metal layer, and the second metal layer is selectively etched until the first metal layer or the resin base is exposed, thereby forming a conductive pattern on the resin base.Type: GrantFiled: July 19, 2001Date of Patent: March 23, 2004Assignee: Hitachi Chemical Co., Ltd.Inventors: Yoshiaki Wakashima, Naoki Fukutomi, Kazuhisa Suzuki, Takeshi Funaki
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Patent number: 6568073Abstract: The present invention provides a process for the fabrication of a wiring board, which comprises the following steps: (a) forming a first wiring pattern on a first side of a self-supporting carrier metal foil so as to obtain a self-supporting wiring sheet comprising the carrier metal foil and the first wiring pattern; (b) superposing and pressing the first side of said self-supporting wiring sheet on and against an insulating substrate so that the first wiring pattern is_embedded in the insulating substrate and constitutes a surface with the insulating substrate; and (c) etching off desired portions of said carrier metal foil to form a second wiring pattern made of said carrier metal foil remaining on the surface constituted by the insulating substrate and the first wiring pattern. The present invention also provides the wiring board for electrical tests so fabricated.Type: GrantFiled: March 6, 1998Date of Patent: May 27, 2003Assignee: Hitachi Chemical Company, Ltd.Inventors: Naoki Fukutomi, Hidehiro Nakamura, Hajime Nakayama, Yoshiaki Tsubomatsu, Masanori Nakamura, Kouichi Kaitou, Atsushi Kuwano, Itsuo Watanabe, Masahiko Itabashi
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Patent number: 6492203Abstract: A semiconductor device fabrication process comprising an encapsulation step of carrying out encapsulation by vacuum pressure differential printing by the use of a liquid resin encapsulant containing a solvent in an amount of from 5% by weight to 50% by weight, and preferably from 25% by weight to 50% by weight. The encapsulation step comprises: printing the liquid resin encapsulant by vacuum pressure differential printing in such a way that; the encapsulant covers at least an internal connecting terminal provided on a substrate, a semiconductor chip, and a wire interconnecting the internal connecting terminal and the semiconductor chip; and that the thickness of the encapsulant lying above the wire at the highest position of the wire comes to be at least 0.8 times the thickness of the encapsulant lying beneath the wire at the same position; and curing or drying the encapsulant.Type: GrantFiled: October 5, 2000Date of Patent: December 10, 2002Assignee: Hitachi Chemical Company, Ltd.Inventors: Yoshiaki Wakashima, Naoki Fukutomi, Kazuhisa Suzuki, Toshio Yamazaki, Tsutomu Kitakatsu, Susumu Naoyuki, Akinari Kida
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Publication number: 20020094606Abstract: A semiconductor package substrate is provided, which can meet the move toward high integration of semiconductors. A nickel layer is plated on an electroplated copper foil to form a wiring pattern. An LSI chip is mounted on the copper foil, and terminals of the LSI chip and the wiring pattern are connected by wire bonding, followed by sealing with a semiconductor-sealing epoxy resin. Only the copper foil is dissolved away with an alkali etchant to expose nickel. With a nickel stripper having low copper-dissolving power, the nickel layer is removed to expose the wiring pattern. A solder resist is coated, and a pattern is formed in such a way that connecting terminal portions are exposed. Solder balls are placed at the exposed portions of the wiring pattern and are then fused. The wiring pattern is connected to an external printed board via the solder balls.Type: ApplicationFiled: January 8, 2002Publication date: July 18, 2002Applicant: Hitachi Chemical Company, Ltd.Inventors: Naoki Fukutomi, Yoshiaki Tsubomatsu, Fumio Inoue, Toshio Yamazaki, Hirohito Ohhata, Shinsuke Hagiwara, Noriyuki Taguchi, Hiroshi Nomura
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Publication number: 20020039808Abstract: A semiconductor package substrate is provided, which can meet the move toward high integration of semiconductors. A nickel layer is plated on an electroplated copper foil to form a wiring pattern. An LSI chip is mounted on the copper foil, and terminals of the LSI chip and the wiring pattern are connected by wire bonding, followed by sealing with a semiconductor-sealing epoxy resin. Only the copper foil is dissolved away with an alkali etchant to expose nickel. With a nickel stripper having low copper-dissolving power, the nickel layer is removed to expose the wiring pattern. A solder resist is coated, and a pattern is formed in such a way that connecting terminal portions are exposed. Solder balls are placed at the exposed portions of the wiring pattern and are then fused. The wiring pattern is connected to an external printed board via the solder balls.Type: ApplicationFiled: October 23, 2001Publication date: April 4, 2002Applicant: Hitachi Chemical Company, Ltd.Inventors: Naoki Fukutomi, Yoshiaki Tsubomatsu, Fumio Inoue, Toshio Yamazaki, Hirohito Ohhata, Shinsuke Hagiwara, Noriyuki Taguchi, Hiroshi Nomura
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Patent number: 6365432Abstract: A semiconductor package substrate is provided, which can meet the move toward high integration of semiconductors. A nickel layer is plated on an electroplated copper foil to form a wiring pattern. An LSI chip is mounted on the copper foil, and terminals of the LSI chip and the wiring pattern are connected by wire bonding, followed by sealing with a semiconductor-sealing epoxy resin. Only the copper foil is dissolved away with an alkali etchant to expose nickel. With a nickel stripper having low copper-dissolving power, the nickel layer is removed to expose the wiring pattern. A solder resist is coated, and a pattern is formed in such a way that connecting terminal portions are exposed. Solder balls are placed at the exposed portions of the wiring pattern and are then fused. The wiring pattern is connected to an external printed board via the solder balls.Type: GrantFiled: January 19, 2000Date of Patent: April 2, 2002Assignee: Hitachi Chemical Company, Ltd.Inventors: Naoki Fukutomi, Yoshiaki Tsubomatsu, Fumio Inoue, Toshio Yamazaki, Hirohito Ohhata, Shinsuke Hagiwara, Noriyuki Taguchi, Hiroshi Nomura
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Publication number: 20020020909Abstract: A substrate for use in a semiconductor package is fabricated by preparing a composite metal laminate consisting of a first metal layer, a second metal layer, and a carrier layer positioned in this order. The first metal layer has etching characteristics different to those of the second metal layer with respect to the same etchant. The first metal layer is selectively etched until the second metal layer is exposed, thereby forming pillar-like interconnections. The gap between the interconnections is then filled with a resin so as to form a resin base with interconnections. The carrier layer is removed from the second metal layer, and the second metal layer is selectively etched until the first metal layer or the resin base is exposed, thereby forming a conductive pattern on the resin base.Type: ApplicationFiled: July 19, 2001Publication date: February 21, 2002Applicant: HITACHI CHEMICAL CO., Ltd.Inventors: Yoshiaki Wakashima, Naoki Fukutomi, Kazuhisa Suzuki, Takeshi Funaki
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Patent number: 6268648Abstract: A semiconductor device comprising a substrate with a cavity portion for mounting a semiconductor chip is provided to achieve a high reliability and to decrease a size and a fabricating cost. The cavity portion capable of mounting the semiconductor chip (1) at the center portion of the substrate is formed by press forming with a projected portion (13a) of a die (13) while adhering a press shapeable wiring body comprising a copper wiring (12) which becomes wiring material, a barrier layer (11) such as nickel alloy or the like, and a copper foil (10) which is a carrier layer, to a plastic substrate (14,15), so as to have wiring (2) buried into a surface of the substrate and to form a ramp between an inner connection terminal portion connecting to the semiconductor chip (1) and an external connection terminal portion connecting to an external connection terminals (5), the internal and external connection terminal portions being two edge portions of the wiring (2).Type: GrantFiled: October 29, 1999Date of Patent: July 31, 2001Assignee: Hitachi Chemical Co., Ltd.Inventors: Naoki Fukutomi, Yoshiaki Wakashima, Susumu Naoyuki, Akinari Kida
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Patent number: 6133534Abstract: A wiring board for electrical tests; having an insulating substrate, wiring of predetermined pattern which is embedded in the insulating substrate, and bump electrodes which are formed on the wiring and which are respectively brought into contact with corresponding electrodes of an article to-be-tested. Thus, even when the electrode pitch of the article to-be-tested such as a semiconductor device has become smaller(for example, less than 0.1 [mm]), the electrodes can be formed so as to cope with the electrical tests of the article.Type: GrantFiled: April 27, 1994Date of Patent: October 17, 2000Assignee: Hitachi Chemical Company, Ltd.Inventors: Naoki Fukutomi, Hidehiro Nakamura, Hajime Nakayama, Yoshiaki Tsubomatsu, Masanori Nakamura, Kouichi Kaitou, Atsushi Kuwano, Itsuo Watanabe, Masahiko Itabashi
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Patent number: 5976912Abstract: A semiconductor package substrate is provided, which can meet the move toward high integration of semiconductors. A nickel layer is plated on an electroplated copper foil to form a wiring pattern. An LSI chip is mounted on the copper foil, and terminals of the LSI chip and the wiring pattern are connected by wire bonding, followed by sealing with a semiconductor-sealing epoxy resin. Only the copper foil is dissolved away with an alkali etchant to expose nickel. With a nickel stripper having low copper-dissolving power, the nickel layer is removed to expose the wiring pattern. A solder resist is coated, and a pattern is formed in such a way that connecting terminal portions are exposed. Solder balls are placed at the exposed portions of the wiring pattern and are then fused. The wiring pattern is connected to an external printed board via the solder balls.Type: GrantFiled: September 18, 1996Date of Patent: November 2, 1999Assignee: Hitachi Chemical Company, Ltd.Inventors: Naoki Fukutomi, Yoshiaki Tsubomatsu, Fumio Inoue, Toshio Yamazaki, Hirohito Ohhata, Shinsuke Hagiwara, Noriyuki Taguchi, Hiroshi Nomura
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Patent number: 5664325Abstract: A wiring board is fabricated through the following steps:(A) forming, on one side of an elongated carrier metal foil made of a first metal, a thin layer with a second metal whose etching conditions are different from those of the first metal;(B) forming, on a surface of the thin layer, a desired wiring pattern with a third metal whose etching conditions are different from those of the second metal;(C) superposing the carrier metal foil on an insulating substrate with the side of the wiring pattern being positioned inside, whereby the wiring pattern is embedded in the insulating substrate; and(D) etching off the carrier metal foil and the thin layer at desired parts thereof.Type: GrantFiled: March 27, 1995Date of Patent: September 9, 1997Assignee: Hitachi Chemical Co. Ltd.Inventors: Naoki Fukutomi, Hajime Nakayama, Yoshiaki Tsubomatsu, Kouichi Kaitou, Yasunobu Yoshidomi, Yoshihiro Takahashi
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Patent number: 5532105Abstract: A photolithographically viahole-forming photosensitive element is formed of a light-transmitting base material and a photosensitive resin composition laminated as a layer on the light-transmitting base material. The photosensitive resin composition comprises:(a) 100 parts by weight of a mixture comprising:(a-1) 10 to 90 parts by weight of a rubber,(a-2) 5 to 40 parts by weight of a phenol resin, and(a-3) 10 to 80 parts by weight of an epoxy resin;(b) 1 to 10 parts by weight of an epoxy resin photoinitiator; and(c) 1 to 10 parts by weight of an aromatic polyazide compound.Type: GrantFiled: August 9, 1993Date of Patent: July 2, 1996Assignee: Hitachi Chemical Company, Ltd.Inventors: Takashi Yamadera, Kazumasa Takeuchi, Ritsuko Obata, Naoki Fukutomi, Kazuko Suzuki
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Patent number: 5504992Abstract: The object of the present invention is to provide a wiring board fabrication process which is, not only so smooth on the surface that a fine wiring pattern can be formed thereon, but also suitable for mounting electronic parts having fine pitch terminals.The present invention is a fabrication process of a wiring board which comprises a wiring conductive line embedded in the surface of an insulating substrate so that the upper face of the conductive line and the surface of the substrate are flat, and a through-hole land which is a conductive portion projected from the surface of the substrate in a through-hole portion, which is characterized in removing the conductive portion projected from the surface of the substrate in the through-hole portion so as to have a flat surface on the surface of the substrate.Type: GrantFiled: June 30, 1994Date of Patent: April 9, 1996Assignee: Hitachi Chemical Company, Ltd.Inventors: Naoki Fukutomi, Yoshiaki Tsubomatsu, Toshio Yamazaki, Masahiko Itabashi, Hirohito Ohhata
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Patent number: 5426850Abstract: A wiring board is fabricated through the following steps:(A) forming, on one side of an elongated carrier metal foil made of a first metal, a thin layer with a second metal whose etching conditions are different from those of the first metal;(B) forming, on a surface of the thin layer, a desired wiring pattern with a third metal whose etching conditions are different from those of the second metal;(C) superposing the carrier metal foil on an insulating substrate with the side of the wiring pattern being positioned inside, whereby the wiring pattern is embedded in the insulating substrate; and(D) etching off the carrier metal foil and the thin layer at desired parts thereof.Type: GrantFiled: November 30, 1992Date of Patent: June 27, 1995Assignee: Hitachi Chemical Company, Ltd.Inventors: Naoki Fukutomi, Hajime Nakayama, Yoshiaki Tsubomatsu, Kouichi Kaitou, Yasunobu Yoshidomi, Yoshihiro Takahashi
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Patent number: 5153987Abstract: By using a composite film comprising an additive layer and an insulating layer containing an epoxy resin and a synthetic rubber as major components, printed wiring boards having a higher circuit density and higher reliability can be produced simply and effectively.Type: GrantFiled: April 10, 1989Date of Patent: October 13, 1992Assignees: Hitachi Chemical Company, Ltd., Hitachi, Condenser Co., Ltd., Yokohama Rubber Company LimitedInventors: Hiroshi Takahashi, Shin Takanezawa, Masao Kanno, Toshiro Okamura, Naoki Fukutomi, Hiroyoshi Yokoyama, Hideo Watanabe, Hajime Yamazaki, Hiroyuki Wakamatsu, Toshinobu Takahashi
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Patent number: 4830691Abstract: A wiring board comprising (A) a base substrate on which the necessary wiring pattern has already been formed, and (B) a multi-layer substrate bonded to the wiring pattern side of said base substrate (A) and comprising heat-resistant resin layers and thin-film wiring patterns formed by a thin film forming method under vacuum can mount LSI chips on the substrate and realize increased density of signal wiring.Type: GrantFiled: March 31, 1987Date of Patent: May 16, 1989Assignee: Hitachi Chemical Company, Ltd.Inventors: Akinari Kida, Naoki Fukutomi, Yoshiaki Tsubomatsu, Takuya Yasuoka