Patents by Inventor Naoki Ishibashi

Naoki Ishibashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11807602
    Abstract: The present invention relates to a process for preparing a 3-isopropenyl-6-heptenal compound of the following formula (2): wherein R1 represents a hydrogen atom or a methyl group, the process comprising: subjecting a 3-isopropenyl-6-heptenoate ester compound of the following formula (1): wherein R1 is as defined above, and R2 represents a monovalent hydrocarbon group having 1 to 10 carbon atoms, to a reduction reaction with a reducing agent to form the 3-isopropenyl-6-heptenal compound (2).
    Type: Grant
    Filed: December 7, 2021
    Date of Patent: November 7, 2023
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Akihiro Baba, Takeshi Kinsho, Naoki Ishibashi, Yusuke Nagae
  • Publication number: 20230153277
    Abstract: A system in an example of the present invention can more appropriately support appreciation of a work of art. A system includes a database unit capable of storing first art data, second art data, and third art data, a first access providing unit connected to the database unit and capable of providing the first art data via a first network in a first art facility, a second access providing unit connected to the database unit and capable of providing the second art data which is a part of the first art data, via a second network in a second art facility, and a third access providing unit connected to the database unit and capable of providing the third art data, which is a part of the first art data, via a third network provided to public.
    Type: Application
    Filed: June 30, 2020
    Publication date: May 18, 2023
    Inventor: Naoki Ishibashi
  • Publication number: 20230107121
    Abstract: A positive resist material contains an acid generator, and a base polymer containing a repeating unit having two carboxyl groups whose hydrogen atoms are substituted with two tertiary carbon atoms each bonded to a double bond or triple bond. The repeating unit having two carboxyl groups whose hydrogen atoms are substituted with two tertiary carbon atoms each bonded to a double bond or triple bond is represented by a repeating unit-a in the following formula (1). Thus, the present invention provides: a positive resist material having higher sensitivity than conventional positive resist materials and smaller dimensional variation; and a patterning process.
    Type: Application
    Filed: July 7, 2022
    Publication date: April 6, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Naoki ISHIBASHI, Masayoshi SAGEHASHI
  • Publication number: 20220324783
    Abstract: The present invention provides a process for preparing a dimethylcyclobutane compound of the following general formula (1A), the process comprising reacting a dimethylcyclobutanone compound of the following general formula (2) with a phosphonic ester compound of the following general formula (3) to produce an unsaturated ester compound of the following general formula (4), having a dimethylcyclobutane ring, and subjecting the unsaturated ester compound (4), having a dimethylcyclobutane ring, to a reduction reaction to produce the dimethylcyclobutane compound (1A).
    Type: Application
    Filed: June 7, 2022
    Publication date: October 13, 2022
    Inventors: Naoki Ishibashi, Yusuke Nagae, Takeshi Kinsho
  • Publication number: 20220269171
    Abstract: A positive resist composition is provided comprising a base polymer comprising repeat units (a) derived from a triple bond-containing maleimide compound and repeat units (b) adapted to increase solubility in an alkaline developer under the action of acid. A pattern of good profile with a high resolution, reduced edge roughness, and reduced size variations is formed therefrom.
    Type: Application
    Filed: February 3, 2022
    Publication date: August 25, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun HATAKEYAMA, Masahiro FUKUSHIMA, Naoki ISHIBASHI
  • Publication number: 20220259136
    Abstract: The present invention provides a process for preparing a diester compound of the following general formula (1), having a dimethylcyclobutane ring, wherein R1 and R2 represent, independently of each other, a monovalent hydrocarbon group having 1 to 10 carbon atoms, the process comprising reacting a dimethylcyclobutanone compound of the following general formula (2), wherein R1 is as defined above, with a phosphonic ester compound of the following general formula (3), wherein R2 and R3 represent, independently of each other, a monovalent hydrocarbon group having 1 to 10 carbon atoms, to produce the diester compound (1), having a dimethylcyclobutane ring.
    Type: Application
    Filed: May 5, 2022
    Publication date: August 18, 2022
    Inventors: Naoki Ishibashi, Yusuke Nagae, Takeshi Kinsho
  • Patent number: 11384043
    Abstract: The present invention provides a process for preparing a dimethylcyclobutane compound of the following general formula (1A), the process comprising reacting a dimethylcyclobutanone compound of the following general formula (2) with a phosphonic ester compound of the following general formula (3) to produce an unsaturated ester compound of the following general formula (4), having a dimethylcyclobutane ring, and subjecting the unsaturated ester compound (4), having a dimethylcyclobutane ring, to a reduction reaction to produce the dimethylcyclobutane compound (1A).
    Type: Grant
    Filed: July 16, 2020
    Date of Patent: July 12, 2022
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoki Ishibashi, Yusuke Nagae, Takeshi Kinsho
  • Publication number: 20220185763
    Abstract: The present invention relates to a process for preparing a 3-isopropenyl-6-heptenal compound of the following formula (2): wherein R1 represents a hydrogen atom or a methyl group, the process comprising: subjecting a 3-isopropenyl-6-heptenoate ester compound of the following formula (1): wherein R1 is as defined above, and R2 represents a monovalent hydrocarbon group having 1 to 10 carbon atoms, to a reduction reaction with a reducing agent to form the 3-isopropenyl-6-heptenal compound (2).
    Type: Application
    Filed: December 7, 2021
    Publication date: June 16, 2022
    Inventors: Akihiro Baba, Takeshi Kinsho, Naoki Ishibashi, Yusuke Nagae
  • Patent number: 11352312
    Abstract: The present invention provides a process for preparing a diester compound of the following general formula (1), having a dimethylcyclobutane ring, wherein R1 and R2 represent, independently of each other, a monovalent hydrocarbon group having 1 to 10 carbon atoms, the process comprising reacting a dimethylcyclobutanone compound of the following general formula (2), wherein R1 is as defined above, with a phosphonic ester compound of the following general formula (3), wherein R2 and R3 represent, independently of each other, a monovalent hydrocarbon group having 1 to 10 carbon atoms, to produce the diester compound (1), having a dimethylcyclobutane ring.
    Type: Grant
    Filed: July 16, 2020
    Date of Patent: June 7, 2022
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoki Ishibashi, Yusuke Nagae, Takeshi Kinsho
  • Publication number: 20220050378
    Abstract: A positive resist material contains a base polymer containing: a repeating unit having two carboxyl groups whose hydrogen atoms are substituted with two tertiary carbon atoms each bonded to a double bond or triple bond; and a repeating unit having an acid generator shown by any of the following formulae (b1) to (b3). Thus, the present invention provides: a positive resist material having higher sensitivity than conventional positive resist materials, and smaller dimensional variation; and a patterning process using this inventive positive resist material.
    Type: Application
    Filed: July 15, 2021
    Publication date: February 17, 2022
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Naoki ISHIBASHI, Masayoshi SAGEHASHI
  • Publication number: 20210329911
    Abstract: A composition for forming an aerosol, an aerosol sprayer for insect pest mating disruption, and a method for insect pest mating disruption, thereby reducing disadvantageous effects caused by falling to a ground surface and oxidative decomposition of the sprayed particles. More specifically, the composition including an aerosol stock solution containing an aliphatic linear aldehyde having 10 to 20 carbon atoms and a non-alcoholic diluent, and a propellant, wherein a weight ratio of the aerosol stock solution to the propellant is from 45:55 to 65:35; the sprayer including the composition and a pressure resistant container for enclosing the composition therein, wherein sprayed particles at a spray travel distance of 15 cm have a median particle size (Dv50) at 25° C. of from 35 to 65 ?m by a volume-based cumulative particle size distribution and; the method using the aerosol sprayer; and the like.
    Type: Application
    Filed: April 28, 2021
    Publication date: October 28, 2021
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoki ISHIBASHI, Yuki MIYAKE, Takeshi KINSHO
  • Patent number: 11097999
    Abstract: A process for preparing 4-penten-2-ynal of the following formula (2): CH2?CHC?CCHO??(2) the process comprising a step of hydrolyzing a 5,5-dialkoxy-1-penten-3-yne compound of the following general formula (1): CH2?CHC?CCH(OR1)(OR2)??(1) wherein R1 and R2 represent, independently of each other, a monovalent hydrocarbon group having 1 to 15 carbon atoms, preferably 1 to 8, more preferably 1 to 4, or R1 and R2 may be bonded to each other to form a divalent hydrocarbon group, R1-R2, having from 2 to 10 carbon atoms, to obtain 4-penten-2-ynal (2).
    Type: Grant
    Filed: September 2, 2020
    Date of Patent: August 24, 2021
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuki Miyake, Naoki Ishibashi, Takeshi Kinsho
  • Patent number: 11007567
    Abstract: A die casting machine is provided with a movable platen for holding a movable mold, a stationary platen for holding a stationary mold, and tie bars inserted into insertion holes provided in the movable platen and the stationary platen, the movable platen being arranged so as to be capable of advancing to and retreating from the fixed platen along the tie bars. A hollow section is provided in at least one of the movable platen and the stationary platen.
    Type: Grant
    Filed: July 21, 2017
    Date of Patent: May 18, 2021
    Assignee: Ube Machinery Corporation, Ltd.
    Inventor: Naoki Ishibashi
  • Publication number: 20210061745
    Abstract: A process for preparing 4-penten-2-ynal of the following formula (2): CH2?CHC?CCHO??(2) the process comprising a step of hydrolyzing a 5,5-dialkoxy-1-penten-3-yne compound of the following general formula (1): CH2?CHC?CCH(OR1)(OR2)??(1) wherein R1 and R2 represent, independently of each other, a monovalent hydrocarbon group having 1 to 15 carbon atoms, preferably 1 to 8, more preferably 1 to 4, or R1 and R2 may be bonded to each other to form a divalent hydrocarbon group, R1-R2, having from 2 to 10 carbon atoms, to obtain 4-penten-2-ynal (2).
    Type: Application
    Filed: September 2, 2020
    Publication date: March 4, 2021
    Inventors: Yuki Miyake, Naoki Ishibashi, Takeshi Kinsho
  • Publication number: 20210017115
    Abstract: The present invention provides a process for preparing a diester compound of the following general formula (1), having a dimethylcyclobutane ring, wherein R1 and R2 represent, independently of each other, a monovalent hydrocarbon group having 1 to 10 carbon atoms, the process comprising reacting a dimethylcyclobutanone compound of the following general formula (2), wherein R1 is as defined above, with a phosphonic ester compound of the following general formula (3), wherein R2 and R3 represent, independently of each other, a monovalent hydrocarbon group having 1 to 10 carbon atoms, to produce the diester compound (1), having a dimethylcyclobutane ring.
    Type: Application
    Filed: July 16, 2020
    Publication date: January 21, 2021
    Inventors: Naoki Ishibashi, Yusuke Nagae, Takeshi Kinsho
  • Publication number: 20210017112
    Abstract: The present invention provides a process for preparing a dimethylcyclobutane compound of the following general formula (1A), the process comprising reacting a dimethylcyclobutanone compound of the following general formula (2) with a phosphonic ester compound of the following general formula (3) to produce an unsaturated ester compound of the following general formula (4), having a dimethylcyclobutane ring, and subjecting the unsaturated ester compound (4), having a dimethylcyclobutane ring, to a reduction reaction to produce the dimethylcyclobutane compound (1A).
    Type: Application
    Filed: July 16, 2020
    Publication date: January 21, 2021
    Inventors: Naoki Ishibashi, Yusuke Nagae, Takeshi Kinsho
  • Patent number: 10624339
    Abstract: There is provided a method of controlling filbertworm capable of reducing the number of release positions without changing a dosage amount per unit area. More specifically, there is provided a method of controlling filbertworm comprising the step of: providing E,E-8,10-dodecadienyl acetate or a composition comprising 80% by weight or more of E,E-8,10-dodecadienyl acetate at 1 to 100 release positions/ha to release the E,E-8,10-dodecadienyl acetate at a release rate of from 0.01 to 5 g/day/ha for mating disruption.
    Type: Grant
    Filed: August 11, 2015
    Date of Patent: April 21, 2020
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tatsuya Hojo, Erina Ohno, Naoki Ishibashi
  • Patent number: 10533624
    Abstract: A stopper mechanism includes a second cylinder provided at an end portion in an inner cylinder, and a second piston configured to move along with movement of a piston rod to be capable of being fit-inserted through the second cylinder. The second piston includes a stopper coupled to the piston rod, a castle integrated with the stopper by plastic flow to form a ring groove on an outer periphery of the second piston between the castle and the stopper, and a piston ring fixed into a ring groove formed by the stopper and the castle so that the piston ring is displaceable in the ring groove in an axial direction and is retained in the ring groove, and has an annular shape with both ends in a circumferential direction which are formed by partially cutting the piston ring.
    Type: Grant
    Filed: June 13, 2016
    Date of Patent: January 14, 2020
    Assignee: HITACHI AUTOMOTIVE SYSTEMS, LTD.
    Inventors: Yu Ishimaru, Naoki Ishibashi, Takayuki Ohno, Makoto Tajima
  • Publication number: 20190176225
    Abstract: A die casting machine is provided with a movable platen for holding a movable mold, a stationary platen for holding a stationary mold, and tie bars inserted into insertion holes provided in the movable platen and the stationary platen, the movable platen being arranged so as to be capable of advancing to and retreating from the fixed platen along the tie bars. A hollow section is provided in at least one of the movable platen and the stationary platen.
    Type: Application
    Filed: July 21, 2017
    Publication date: June 13, 2019
    Inventor: Naoki Ishibashi
  • Patent number: 10244750
    Abstract: Provided are an insect pest-targeting gel composition causing neither leakage nor reaction of a volatile substance and capable of releasing the volatile substance at a constant rate; and a sustained release preparation including the insect pest-targeting gel composition. More specifically, provided is an insect pest-targeting gel composition including one or more volatile substances and an oil gelling agent, wherein the volatile substance is included in an amount of from 70.0 to 99.0% by weight by the insect pest-targeting gel composition.
    Type: Grant
    Filed: December 6, 2012
    Date of Patent: April 2, 2019
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoki Ishibashi, Ryuichi Saguchi, Tatsuya Hojo, Takehiko Fukumoto