Patents by Inventor Naoki Kobayashi

Naoki Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12032600
    Abstract: A method of analyzing measurement data includes sorting EDSs into similarity clusters including a representative RDS; labeling the similarity clusters; sorting the EDSs or RDSs into sub-clusters; selecting one of the EDSs or RDSs in each of the sub-clusters as a search seed representative of the sub-cluster; sorting measurement EDSs from measurement data into measurement clusters including a representative measurement RDS; determining for each search seed a most similar one of the measurement EDSs or RDSs; identifying the determined most similar one of the measurement EDSs or RDSs for each search seed as a classification segment corresponding to the search seed; sorting new measurement EDSs or RDSs into classification clusters with the classification segments; classifying all the new measurement EDSs or RDSs in each classification cluster the same as the corresponding classification segment; and determining whether patterns of interest are in the measurement data stream based on the classification clusters.
    Type: Grant
    Filed: June 29, 2021
    Date of Patent: July 9, 2024
    Assignee: KEYSIGHT TECHNOLOGIES, INC.
    Inventors: Masaharu Goto, Naoki Kobayashi
  • Publication number: 20240201595
    Abstract: The present invention is a compound for forming a metal-containing film to be contained in a composition for forming a metal-containing film used in manufacturing a semiconductor, where the compound is represented by the following general formula (A). This provides: a compound for forming a metal-containing film having better dry etching resistance than conventional resist underlayer film materials and also having high filling and planarizing properties; a composition for forming a metal-containing film containing the compound; and a patterning process in which the composition is used as a resist underlayer film material.
    Type: Application
    Filed: November 3, 2023
    Publication date: June 20, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoki KOBAYASHI, Nobuhiro NAGAMACHI, Daisuke KORI
  • Patent number: 11993671
    Abstract: A chloroprene-unsaturated nitrile copolymer having 3 to 20% by mass of a structural unit derived from an unsaturated nitrile monomer, in which the chloroprene-unsaturated nitrile copolymer has a peak at 5.80 to 6.00 ppm in a 1H-NMR spectrum as measured in a deuterochloroform solvent, and a ratio (A/B) of a peak area (A) at 5.80 to 6.00 ppm and a peak area (B) at 4.05 to 6.20 ppm is 0.6/100 to 1.1/100.
    Type: Grant
    Filed: November 6, 2019
    Date of Patent: May 28, 2024
    Assignee: Denka Company Limited
    Inventors: Wataru Nishino, Suguru Onuki, Atsunori Kondo, Yuhei Ishigaki, Naoki Kobayashi
  • Publication number: 20240148256
    Abstract: The presently disclosed subject matter provides a circulating blood volume determination apparatus includes a detection unit configured to detect a pulse wave from a sensor attached to a predetermined portion of a living body, an analysis unit configured to analyze a state of a venous component in the detected pulse wave, and a determination unit configured to perform a determination as to a circulating blood volume based on the analysis result of the analysis unit.
    Type: Application
    Filed: May 18, 2022
    Publication date: May 9, 2024
    Applicant: NIHON KOHDEN CORPORATION
    Inventors: Naoki KOBAYASHI, Haruka MORIMOTO, Taiki GOTO
  • Publication number: 20240153771
    Abstract: The present invention is a composition for forming a metal oxide film, including: (A) a metal oxide nanoparticle; (B) a flowability accelerator containing a resin having a structural unit represented by the following general formula (1); (C) a dispersion stabilizer having two or more benzene rings or having one benzene ring and a structure represented by the following general formula (C-1), and the dispersion stabilizer being composed of an aromatic group-containing compound having a molecular weight of 500 or less; and (D) an organic solvent, wherein the flowability accelerator (B) has a content of 9 mass % or more in an entirety of the composition, a ratio Mw/Mn of 2.50?Mw/Mn?9.00, and the flowability accelerator (B) having no cardo structure.
    Type: Application
    Filed: May 7, 2023
    Publication date: May 9, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoki KOBAYASHI, Daisuke KORI, Hironori SATOH, Toshiharu YANO
  • Patent number: 11965078
    Abstract: A chloroprene-unsaturated nitrile copolymer composition containing 100 parts by mass of a chloroprene-unsaturated nitrile copolymer having 3 to 20% by mass of a structural unit derived from an unsaturated nitrile monomer, and 0.05 to 2.0 parts by mass of a xanthogen compound.
    Type: Grant
    Filed: November 6, 2019
    Date of Patent: April 23, 2024
    Assignee: Denka Company Limited
    Inventors: Suguru Onuki, Wataru Nishino, Atsunori Kondo, Yuhei Ishigaki, Naoki Kobayashi
  • Publication number: 20240128675
    Abstract: A connector includes a terminal fitting having a terminal portion in which a plurality of tab portions extends and a contact portion, a housing having a plurality of accommodating chambers in which the tab portions are accommodated, and a plurality of terminal-attached electric wires. The terminal fitting includes a first locking portion provided on the tab portions located from one end of the tab continuous portion to an intermediate position thereof, and a second locking portion provided on the tab portions located from the intermediate position to another end thereof. The first locking portion has a relatively large holding force for holding the tab portion in the accommodation chamber compared to the second locking portion. The counterpart terminal includes a tubular box portion and an opening provided on a side wall of the box portion and having a width through which the tab portion is able to pass.
    Type: Application
    Filed: September 20, 2023
    Publication date: April 18, 2024
    Inventors: Naoki Kobayashi, Masaki Tanaka
  • Publication number: 20240128663
    Abstract: A housing unit includes a terminal fitting and a housing in which the terminal fitting is inserted into an accommodating chamber in a predetermined insertion direction and accommodated therein. The terminal fitting has a first terminal portion in which a plurality of first tab portions extend, a second terminal portion in which a plurality of second tab portions extend, a connecting portion connecting the first and second terminal portions, and a contact portion connected to a first tab coupling portion and to be connected to an external terminal, and is formed of a continuous conductor plate. The terminal fitting includes a heat sink portion extending from at least one of the connecting portion and a second tab coupling portion in a direction opposite to the insertion direction. At least a part of the heat sink portion is exposed to an outside of the housing.
    Type: Application
    Filed: September 21, 2023
    Publication date: April 18, 2024
    Inventors: Naoki Kobayashi, Masaki Tanaka
  • Publication number: 20240116958
    Abstract: A compound for forming a metal-containing film to be contained in a composition for forming a metal-containing film used in manufacturing a semiconductor, where the compound for forming a metal-containing film is represented by the following general formula (M-1) or (M-2). This provides: a compound for forming a metal-containing film having better dry etching resistance than conventional resist underlayer film materials and also having high filling and planarizing properties; a composition for forming a metal-containing film containing the compound; a patterning process in which the composition is used as a resist underlayer film material; a patterning process in which the composition is used as a resist material; and a semiconductor photoresist material containing the composition.
    Type: Application
    Filed: September 6, 2023
    Publication date: April 11, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoki KOBAYASHI, Shohei IWAMORI, Daisuke KORI, Shun KIKUCHI, Ryunosuke HANDA, Seiichiro TACHIBANA
  • Publication number: 20240087905
    Abstract: An object of the present invention is to provide a wafer edge protection film having dry etching resistance superior to those of the previously-known wafer edge protection films, as well as excellent film forming property even at wafer edge portions, which are difficult to coat: a wafer edge protection film forming method for forming a protection film on a wafer edge of a substrate, including the steps of (i) coating a peripheral edge of the substrate with a composition for forming a protection film including an aromatic ring-containing resin (A) having an organic group represented by the following general formula (1), and a solvent; and (ii) curing the applied composition for forming a protection film by heat or optical irradiation to form the protection film on the peripheral edge of the substrate. wherein RA is a hydrogen atom or a monovalent organic group having 1 to 10 carbon atoms, and * represents a bonding site.
    Type: Application
    Filed: August 3, 2023
    Publication date: March 14, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoki KOBAYASHI, Toshiharu YANO
  • Patent number: 11919031
    Abstract: A coating device includes a head, a wiping mechanism, an arm, and a controller. The head includes a nozzle surface for discharging a coating material. The wiping mechanism wipes the nozzle surface. The arm holds the head. The controller controls movement of the head via the arm. The controller relatively moves the head with respect to the wiping mechanism to wipe the nozzle surface.
    Type: Grant
    Filed: October 28, 2020
    Date of Patent: March 5, 2024
    Assignee: KYOCERA CORPORATION
    Inventors: Naoki Kobayashi, Daisuke Hozumi, Ryota Nagaike, Nobuaki Yamakuchi
  • Publication number: 20240055782
    Abstract: A terminal fitting comprising: a first terminal portion in which first tab portions, extending from a first tab continuous connecting portion, are arranged; a second terminal portion in which second tab portions, extending from a second tab continuous connecting portion, are arranged; a connecting portion connecting the first and second terminal portions; and a contact portion to be connected to an external terminal. The terminal fitting has a three-dimensional shape in which the terminal fitting having a preliminary shape is bent at the connecting portion. In the three-dimensional shape, the first terminal portion and the second terminal portion are three-dimensionally arranged to be connected at the connecting portion. In the preliminary shape, the first terminal portion and the second terminal portion are arranged to be fitted to each other, and the first tab continuous connecting portion and the second tab continuous connecting portion are connected at the connecting portion.
    Type: Application
    Filed: July 17, 2023
    Publication date: February 15, 2024
    Inventors: Masaki Tanaka, Naoki Kobayashi, Jun Ishikawa
  • Patent number: 11879943
    Abstract: A system for detecting changes in an electronic component and a method for operating a data processing system for finding events that predict an electronic component's failure are disclosed. The system includes an input port that receives a data stream that includes an ordered sequence of data values generated by the electronic component. A controller identifies a segment of the data stream (EDS), transforms the EDS to a CSV, and compares the CSV to a plurality of reference signature vectors (RSVs) to determine if the CSV is similar to any of the RSVs. Information identifying a new CSV is stored in an RSV database if the new CSV is similar to one of the RSVs, and a new RSV is created if the new CSV is not similar to any of the RSVs in said RSV database. A predictor RSV that occurs as the electronic component ages is identified.
    Type: Grant
    Filed: May 31, 2021
    Date of Patent: January 23, 2024
    Assignee: KEYSIGHT TECHNOLOGIES, INC.
    Inventors: Masaharu Goto, Kiyoshi Chikamatsu, Naoki Kobayashi
  • Publication number: 20240019782
    Abstract: The present invention is a composition for forming a metal oxide film including (A) an organic-inorganic composite material and (B) a solvent, (A) the organic-inorganic composite material being a reaction product of a metal source (I) and an organic source (II), the metal source (I) containing one or more compounds derived from a metal compound represented by the general formula (I-1), and the organic source (II) containing a compound having a unit represented by the general formula (II-1) and a cardo structure. The present invention provides a composition for forming a metal oxide film which has excellent coatability relative to a previously-known material for forming a metal oxide film and also has high filling and planarizing properties, a patterning process using the material, and a method for forming a metal oxide film.
    Type: Application
    Filed: July 6, 2023
    Publication date: January 18, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoki KOBAYASHI, Nobuhiro NAGAMACHI, Daisuke KORI
  • Publication number: 20230314705
    Abstract: In order to achieve an optical transmitter that is reduced in size and price, an optical waveguide module includes a wavelength controller that controls a wavelength of output light output from a light source, and a wavelength locker that receives an input of the output light and outputs an electric signal indicating a relation between a wavelength of the output light and a target wavelength, wherein the wavelength controller and the wavelength locker are formed as a semiconductor optical waveguide on the same semiconductor substrate.
    Type: Application
    Filed: January 17, 2023
    Publication date: October 5, 2023
    Applicant: NEC Corporation
    Inventor: Naoki KOBAYASHI
  • Publication number: 20230305405
    Abstract: The present invention is a composition for forming a silicon-containing metal hard mask, including: (A) a metal oxide nanoparticle; (B) a thermally crosslinkable polysiloxane (Sx) having no aromatic-ring-containing organic group; and (C) a solvent. This provides a composition for forming a silicon-containing metal hard mask that has a high effect of inhibiting collapse of an ultrafine pattern in a multilayer resist method, that can form a resist pattern having excellent LWR, that has more excellent dry etching resistance and wet removability than a conventional silicon-containing underlayer film material, and that has more excellent filling ability than a conventional metal hard mask material.
    Type: Application
    Filed: March 21, 2023
    Publication date: September 28, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoki KOBAYASHI, Kanata TAKIZAWA, Ryo MITSUI, Toshiharu YANO
  • Publication number: 20230291649
    Abstract: A management system stores peripheral information apparatus management information for managing a configuration of a peripheral information apparatus on a network of a to-be-managed information apparatus. The peripheral information apparatus management information indicates an identifier of the peripheral information apparatus recognized in the network. The management system receives, from the to-be-managed information apparatus, current peripheral information apparatus configuration information indicating a configuration of the peripheral information apparatus in a current network of the to-be-managed information apparatus. The current peripheral information apparatus configuration information indicates an identifier of the peripheral information apparatus recognized in the current network.
    Type: Application
    Filed: August 15, 2022
    Publication date: September 14, 2023
    Inventors: Naoki KOBAYASHI, Shinya TAKEUCHI, Hiroshi HAYAKAWA
  • Publication number: 20230280648
    Abstract: The present invention is a composition for forming a metal oxide film, comprising (A) a metal oxide nanoparticle, (B) a flowability accelerator, which is a compound and/or a polymer having a molecular weight of 5000 or less represented by one or more selected from the following general formulae (I), (II) and (III), and (C) an organic solvent, wherein a weight ratio of the (A) metal oxide nanoparticle to the (B) flowability accelerator is 10/90 to 90/10. This makes it possible to provide a composition for forming a metal oxide film having excellent dry etching resistance relative to a previously-known organic underlayer film composition and also has high filling and planarizing properties, a patterning process using the composition, and a method for forming a metal oxide film (resist underlayer film).
    Type: Application
    Filed: February 7, 2023
    Publication date: September 7, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoki Kobayashi, Daisuke Kori, Toshiharu Yano
  • Publication number: 20230271804
    Abstract: A medium processing apparatus includes a liquid applier, a crimper, a stapler, and circuitry. The liquid applier applies liquid to a liquid application position of a medium. The crimper presses and deforms at least a part to which the liquid is applied by the liquid applier, to bind a plurality of media including the medium to which the liquid is applied. The stapler performs stapling with a staple on a medium bundle in which the plurality of media is bound by the crimper. The circuitry controls operations of the crimper, the liquid applier, and the stapler, and selectively switches between first binding performed by the liquid applier and the crimper and second binding performed by only the stapler, in accordance with information on the medium or a binding position at which the medium bundle is bound by the crimper.
    Type: Application
    Filed: February 24, 2023
    Publication date: August 31, 2023
    Applicant: Ricoh Company, Ltd.
    Inventors: Kohta ABE, Kei SASAKI, Kazuki SETO, Kazuki MISHINA, Naoki KOBAYASHI
  • Publication number: 20230244147
    Abstract: A composition for forming an organic film, containing: a material for forming an organic film shown by the following general formula; and an organic solvent, where R1 represents a hydrogen atom, an allyl group, or a propargyl group, R2 represents a nitro group, a halogen atom, a hydroxy group, an alkyloxy group having 1 to 4 carbon atoms, an alkynyloxy group having 2 to 4 carbon atoms, an alkenyloxy group having 2 to 4 carbon atoms, a linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms, a trifluoromethyl group, or a trifluoromethyloxy group, m = 0 or 1, n = 1 or 2, 1 = 0 or 1, k represents an integer of 0 to 2, W represents a divalent organic group having 1 to 40 carbon atoms, and each V independently represents a hydrogen atom or a linking moiety.
    Type: Application
    Filed: September 15, 2022
    Publication date: August 3, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daisuke KORI, Yasuyuki YAMAMOTO, Naoki KOBAYASHI