Abstract: A method of manufacturing a laminated assembly includes depositing an oxide film on each of one surface of a plate-shaped object and a temporary joint surface of a temporary support substrate in an atmosphere whose temperature is kept in a first temperature range, performing a hydrophilizing process on an exposed surface of the oxide film, temporarily joining the plate-shaped object and the temporary support substrate with the oxide film interposed therebetween, forming a joint member on a joint surface of a support substrate, joining the plate-shaped object and the support substrate to each other with the joint member interposed therebetween, vaporizing water contained in the oxide film in an atmosphere whose temperature is kept in a second temperature range higher than the first temperature range, and separating the plate-shaped object and the temporary support substrate from each other.

Abstract: An object is to realize a novel reverse osmosis membrane (more specifically, reverse osmosis composite membrane) that is capable of suppressing biofouling. The object is attained with use of a reverse osmosis composite membrane which is obtained by chemically modifying a surface thereof with a compound that has an amino group and that is obtained by modifying the amino group with two molecules of ?-picolyl group and has a dipicolylamine structure.

Abstract: A degree of freedom in image production regarding tracking of a subject is improved. Designation of a placement position in a display area of a tracking target is received on a first screen in which a predetermined image is displayed in the display area. For example, a user is allowed to designate a position (a position within the display area) in which a tracking target subject is disposed in a state in which image content can be recognized on a display screen.

Abstract: Disclosed is a method for processing a device wafer, in which a device layer, the device layer constituting devices, is stacked on a base material and the devices are formed, respectively, in regions defined by a plurality of intersecting streets on a front surface of the base material. The method includes a first step of dividing the device layer along the streets, a second step of dividing the base material by plasma etching along the streets, and a third step of, before performing at least the second step, forming half-cut grooves by a cutting blade or a laser beam in the base material along the streets, respectively, from a side of a front surface or a side of a back surface of the device wafer. The third and second steps are performed from the side of the same surface of the device wafer.

Abstract: A device wafer processing method includes a holding step of holding a face side of a device wafer by a holding table, a cutting step of cutting the device wafer by a cutting blade from a reverse side of the device wafer along streets and forming cutting grooves that do not reach a functional layer, and a laser processing step of applying a laser beam having a wavelength absorbable by the device wafer to the device wafer from the reverse side of the device wafer along the cutting grooves and dividing the device wafer into individual devices. The laser processing step is carried out in a state in which the device wafer is continuously held on the holding table without being unloaded from the holding table, after the cutting step is carried out.

Abstract: A device wafer processing method includes a protective film coating step of coating a face side of a device wafer with a protective film, a laser processing step of applying a laser beam having a wavelength absorbable by the device wafer to the device wafer along streets and forming laser processing grooves that divide a device layer, a tape affixing step of affixing a tape to the protective film on the device wafer, a holding step of holding the face side of the device wafer by a holding table via the tape and exposing a reverse side of the device wafer, and a cutting step of cutting the device wafer held on the holding table, by a cutting blade from the reverse side along the streets, and dividing the device wafer into individual devices.

Abstract: A laminate substrate is divided along a plurality of intersecting scheduled division lines. The laminate substrate has a first substrate and a second substrate formed of the same material, laminated through an intermediate layer containing metal. The laminate substrate is divided by cutting the laminate substrate along the scheduled division lines by use of a substrate cutting blade to form the first substrate with first cut grooves each having a width larger than a cutting edge thickness of a metal cutting blade which is larger in cutting edge thickness than the substrate cutting blade, and thereafter cutting the laminate substrate along the first cut grooves by use of the metal cutting blade to cut the intermediate layer and to form second cut grooves each having a width corresponding to the cutting edge thickness of the metal cutting blade.

Abstract: There is provided a processing apparatus which processes a workpiece. The processing apparatus includes a processing mechanism having a holding unit which holds the workpiece, and a processing unit which processes the workpiece held by the holding unit, a first cleaning mechanism having a spinner table on which the workpiece processed by the processing unit is held, and a cleaning fluid nozzle which supplies a cleaning fluid containing water to clean the workpiece held on the spinner table, and a second cleaning mechanism including a cleaning holding unit which holds the workpiece cleaned by the first cleaning mechanism, a polishing cleaning liquid supply unit which supplies a polishing cleaning liquid to the workpiece held by the cleaning holding unit, and a polishing pad which abuts on the workpiece supplied with the polishing cleaning liquid to polish the workpiece, thereby cleaning the workpiece.

Abstract: A wafer processing method includes an outer edge removing step of removing an outer edge of a first wafer having a first wiring layer formed on a front surface thereof from the front surface, and a polishing step of polishing the first wiring layer on the front surface of the first wafer after the outer edge removing step.

Abstract: A thermocompression bonding method for thermocompression bonding a sheet to a workpiece, where the method includes a stacking step of placing the sheet between a flat plate and the workpiece to form a stack in which the sheet is held between the workpiece and an entire surface of the flat plate and a thermocompression bonding step of thermocompression bonding the sheet to the workpiece while planarizing the sheet with the flat plate by heating the sheet and applying an external force to the stack, after performing the stacking step.

Abstract: An inspection method for a divided wafer includes a wafer lamination step of stacking a transfer wafer on top of a wafer that has been divided into a plurality of chips, a particle transfer step of, after the wafer lamination step is carried out, positioning the transfer wafer on a lower side and the divided wafer on an upper side and applying a vibration to the wafer stacked on the transfer wafer, to drop particles adhering to side surfaces of the chips onto the transfer wafer, and an inspection step of, after the particle transfer step is carried out, inspecting the particles on the transfer wafer.

Abstract: Provided is a method for machining a workpiece including a substrate that has front and back surfaces and a ductile material layer that contains a ductile material and is disposed on the front or back surface. The method includes a tape bonding step of bonding a tape on a side of the substrate of the workpiece, a holding step of holding the workpiece by a holding table via the tape, and a cutting step of relatively moving the holding table and a cutting blade to cause the cutting blade to cut into the ductile material layer and the substrate. In the cutting step, the cutting blade is rotated such that a portion of the cutting blade, the portion being located on a forward side in a moving direction of the cutting blade relative to the holding table, cuts into the workpiece from the ductile material layer toward the substrate.

Abstract: A substrate having a first side and a second side opposite to the first side is processed by attaching a protective film to the first side and, after attachment, processing the substrate from the second side of the substrate. After processing from the second side, the second side is inspected for defects on the second side of the substrate. After inspection for defects, a support film is attached to the second side of the substrate. The protective film is removed from the first side of the substrate and, after removing the protective film, the first side of the substrate is inspected for defects on the first side of the substrate.

Abstract: A thermocompression bonding method for thermocompression bonding a sheet to a workpiece, where the method includes a stacking step of placing the sheet between a flat plate and the workpiece to form a stack in which the sheet is held between the workpiece and an entire surface of the flat plate and a thermocompression bonding step of thermocompression bonding the sheet to the workpiece while planarizing the sheet with the flat plate by heating the sheet and applying an external force to the stack, after performing the stacking step.

Abstract: A workpiece cutting method includes attaching a tape to a lower surface of the workpiece, holding the lower surface through the tape on a holding table including a holding plate, at least a part of a holding surface of the holding plate being an imaging area formed of a material transparent to visible light, cutting the workpiece held on the holding table to divide the workpiece, thereby forming a dividing groove, and imaging at least a part of the dividing groove from a upper surface side of the workpiece by using an upper camera portion located above the holding plate, thereby obtaining an upper image, and also imaging the above part of the dividing groove from the lower surface side of the workpiece through the imaging area of the holding plate and the tape by using a lower camera portion located below the holding plate, thereby obtaining a lower image.

Abstract: A processing method for a workpiece, which includes a stacking step of stacking a sheet and a flat plate on a front side of the workpiece to form a stack, a thermocompression bonding step of thermocompression bonding the sheet to the workpiece while planarizing the sheet with the flat plate by heating the sheet and applying an external force to the stack, a holding step of holding the workpiece via the sheet by a holding table having a transparent portion, an alignment step of performing an alignment by imaging the workpiece through the transparent portion and the sheet, and a processing step of processing the workpiece by a processing unit.

Abstract: A manufacturing method of chips from a workpiece including plural planned dividing lines on a front surface includes a cutting step of causing a cutting blade to cut into the workpiece for which a side of the front surface of the workpiece is held by a holding table in such a manner that a side of a back surface of the workpiece is exposed and forming a cut groove that does not reach the front surface of the workpiece on the side of the back surface of the workpiece along each planned dividing line, a sticking step of sticking an expanding sheet to the workpiece, and a dividing step of dividing the workpiece along each planned dividing line by expanding the expanding sheet to form the chips from the workpiece after the sticking step and the cutting step.

Abstract: A processing method for a workpiece includes a cutting step of cutting the workpiece along streets by a cutting blade having a V-shaped tip end, to form V grooves of which shallower parts are wider than deeper parts, and a cleaning step of cleaning a back surface of the workpiece with cleaning water, after the cutting step is carried out.

Abstract: A cutting method includes: disposing a dicing tape on a back surface of a wafer; holding the wafer on a chuck table through the dicing tape; causing a cutting blade to cut into the wafer held on the chuck table until the tip of the cutting blade reaches the dicing tape to form cut grooves; imaging the cut groove from the front surface side of the wafer by a first imaging section to form a picked-up image of a front surface portion of the cut groove, and imaging the cut groove from the front surface side of the wafer by a second imaging section to form a picked-up image of a back surface portion of the cut groove, thereby checking the picked-up images of the front surface portion and the back surface portion of the cut groove.

Abstract: A package substrate processing method for processing a package substrate having a division line, an electrode being formed on the division line includes a cutting step of cutting the package substrate along the division line by using a cutting blade and a burr removing step of removing burrs produced from the electrode in the cutting step by spraying a fluid to the package substrate along the division line after performing the cutting step. The cutting step includes a step of supplying a cutting liquid containing an organic acid and an oxidizing agent to a cutting area where the package substrate is to be cut by the cutting blade.