Patents by Inventor Naomasa Suzuki

Naomasa Suzuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210027976
    Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.
    Type: Application
    Filed: October 1, 2020
    Publication date: January 28, 2021
    Inventors: Akira IKEGAMI, Yuta KAWAMOTO, Naomasa SUZUKI, Manabu YANO, Yasushi EBIZUKA, Naoma BAN
  • Patent number: 10879037
    Abstract: To provide a charged particle beam device which enables observation and evaluation of the surface and the inside of a sample with low damage to the sample, the charged particle beam device has: a charged particle beam source 2; a sample table 9 in which the sample 210 is placed; a charged particle beam optical system which pulsates a charged particle beam 100 and irradiates the charged particle beam to the sample at an acceleration voltage within a range of 0 kV to 5 kV; a split distance selector 125 for selecting a measurement object of the sample; and a split distance setting unit 124 for setting a split distance in one line scanning of the charged particle beam on the sample.
    Type: Grant
    Filed: April 27, 2016
    Date of Patent: December 29, 2020
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Natsuki Tsuno, Naomasa Suzuki, Atsushi Okita, Muneyuki Fukuda
  • Patent number: 10832886
    Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.
    Type: Grant
    Filed: March 4, 2019
    Date of Patent: November 10, 2020
    Assignee: Hitachi High-Tech Corporation
    Inventors: Akira Ikegami, Yuta Kawamoto, Naomasa Suzuki, Manabu Yano, Yasushi Ebizuka, Naoma Ban
  • Publication number: 20200312606
    Abstract: This charged particle beam device is provided with: a plurality of detectors for detecting secondary particles, the detectors being disposed in a symmetrical manner around the optical axis of a primary charged particle beam closer to the charged particle source side than an objective lens; electrodes for forming an electric field oriented in directions corresponding to each of the plurality of detectors, the electrodes being provided on the travel routes of secondary particles from a sample to the detectors; and a control power supply for applying a voltage to the electrodes. Adjusting the voltage applied to each of the electrodes makes it possible to detect, upon deflecting, the secondary particles, and to control the range of azimuths of the secondary particles to be detected.
    Type: Application
    Filed: June 17, 2020
    Publication date: October 1, 2020
    Inventors: Takanori KISHIMOTO, Ichiro TACHIBANA, Naomasa SUZUKI
  • Patent number: 10734191
    Abstract: This charged particle beam device is provided with: a plurality of detectors for detecting secondary particles, the detectors being disposed in a symmetrical manner around the optical axis of a primary charged particle beam closer to the charged particle source side than an objective lens; electrodes for forming an electric field oriented in directions corresponding to each of the plurality of detectors, the electrodes being provided on the travel routes of secondary particles from a sample to the detectors; and a control power supply for applying a voltage to the electrodes. Adjusting the voltage applied to each of the electrodes makes it possible to detect, upon deflecting, the secondary particles, and to control the range of azimuths of the secondary particles to be detected.
    Type: Grant
    Filed: July 6, 2015
    Date of Patent: August 4, 2020
    Assignee: Hitachi High-Tech Corporation
    Inventors: Takanori Kishimoto, Ichiro Tachibana, Naomasa Suzuki
  • Publication number: 20190287754
    Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.
    Type: Application
    Filed: March 4, 2019
    Publication date: September 19, 2019
    Inventors: Akira IKEGAMI, Yuta KAWAMOTO, Naomasa SUZUKI, Manabu YANO, Yasushi EBIZUKA, Naoma BAN
  • Patent number: 10269536
    Abstract: The objective of the present invention is to simultaneously achieve image observations at a high resolution using an electron microscope, and X-ray analysis at a high energy-resolution using a microcalorimeter. An X-ray detector is disposed at a position where the intensity of the magnetic field from an objective lens is weaker than the critical magnetic field of a material used in a thermal insulation shield for a superconducting transition-edge sensor or a microcalorimeter. In addition, an optical system for transmitting X-rays to the detector is inserted between a sample and the detector. Alternatively, a magnetic field shield for shielding the X-ray detector is used.
    Type: Grant
    Filed: March 25, 2015
    Date of Patent: April 23, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Satoshi Takada, Naomasa Suzuki, Kazuo Aoki, Takehiko Konno, Takayuki Hoshino
  • Publication number: 20190051490
    Abstract: To provide a charged particle beam device which enables observation and evaluation of the surface and the inside of a sample with low damage to the sample, the charged particle beam device has: a charged particle beam source 2; a sample table 9 in which the sample 210 is placed; a charged particle beam optical system which pulsates a charged particle beam 100 and irradiates the charged particle beam to the sample at an acceleration voltage within a range of 0 kV to 5 kV; a split distance selector 125 for selecting a measurement object of the sample; and a split distance setting unit 124 for setting a split distance in one line scanning of the charged particle beam on the sample.
    Type: Application
    Filed: April 27, 2016
    Publication date: February 14, 2019
    Inventors: Natsuki TSUNO, Naomasa SUZUKI, Atsushi OKITA, Muneyuki FUKUDA
  • Patent number: 10121632
    Abstract: Provided is a charged particle beam apparatus which includes a charged particle source, a sample table on which a sample is placed, a charged particle beam optical system that includes an objective lens and emits a charged particle beam emitted from the charged particle source onto the sample, a plurality of detectors which detect secondary particles emitted from the sample when being irradiated with the charged particle beam, and a rotation member which magnetically, electrically, or mechanically changes a detected azimuth angle of the secondary particles emitted from the sample.
    Type: Grant
    Filed: April 14, 2017
    Date of Patent: November 6, 2018
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Nobuhiro Okai, Natsuki Tsuno, Naomasa Suzuki, Tomoyasu Shojo
  • Publication number: 20180240643
    Abstract: The objective of the present invention is to simultaneously achieve image observations at a high resolution using an electron microscope, and X-ray analysis at a high energy-resolution using a microcalorimeter. An X-ray detector is disposed at a position where the intensity of the magnetic field from an objective lens is weaker than the critical magnetic field of a material used in a thermal insulation shield for a superconducting transition-edge sensor or a microcalorimeter. In addition, an optical system for transmitting X-rays to the detector is inserted between a sample and the detector. Alternatively, a magnetic field shield for shielding the X-ray detector is used.
    Type: Application
    Filed: March 25, 2015
    Publication date: August 23, 2018
    Inventors: Satoshi TAKADA, Naomasa SUZUKI, Kazuo AOKI, Takehiko KONNO, Takayuki HOSHINO
  • Publication number: 20180204706
    Abstract: This charged particle beam device is provided with: a plurality of detectors for detecting secondary particles, the detectors being disposed in a symmetrical manner around the optical axis of a primary charged particle beam closer to the charged particle source side than an objective lens; electrodes for forming an electric field oriented in directions corresponding to each of the plurality of detectors, the electrodes being provided on the travel routes of secondary particles from a sample to the detectors; and a control power supply for applying a voltage to the electrodes. Adjusting the voltage applied to each of the electrodes makes it possible to detect, upon deflecting, the secondary particles, and to control the range of azimuths of the secondary particles to be detected.
    Type: Application
    Filed: July 6, 2015
    Publication date: July 19, 2018
    Inventors: Takanori KISHIMOTO, Ichiro TACHIBANA, Naomasa SUZUKI
  • Publication number: 20170316915
    Abstract: Provided is a charged particle beam apparatus which includes a charged particle source, a sample table on which a sample is placed, a charged particle beam optical system that includes an objective lens and emits a charged particle beam emitted from the charged particle source onto the sample, a plurality of detectors which detect secondary particles emitted from the sample when being irradiated with the charged particle beam, and a rotation member which magnetically, electrically, or mechanically changes a detected azimuth angle of the secondary particles emitted from the sample.
    Type: Application
    Filed: April 14, 2017
    Publication date: November 2, 2017
    Inventors: Nobuhiro OKAI, Natsuki TSUNO, Naomasa SUZUKI, Tomoyasu SHOJO
  • Patent number: 9704687
    Abstract: The charged particle beam application device is provided with a charged particle source and an objective lens that converges charged particle beam generated by the charged particle source onto a sample. In this case, the charged particle beam application device is further provided with an aberration generating element installed between the charged particle beam source and the objective lens, a tilt-use deflector installed between the aberration generating element and the objective lens, a deflection aberration control unit for controlling the aberration generating element, a first electromagnetic field superposing multipole installed between the aberration generating element and the objective lens, and an electromagnetic field superposing multipole control unit for controlling the first electromagnetic field superposing multipole.
    Type: Grant
    Filed: June 16, 2015
    Date of Patent: July 11, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Momoyo Enyama, Akira Ikegami, Hideto Dohi, Hideyuki Kazumi, Naomasa Suzuki
  • Patent number: 9659744
    Abstract: A charged particle beam apparatus makes it possible to acquire information in the cross-sectional direction (depth direction) of a sample having an internal structure in a nondestructive manner with reduced damage. Further, the apparatus makes it possible to analyze the depth and/or dimensions in the depth direction of the internal structure. The charged particle beam apparatus includes: a means for providing a time base for control signals; a means for applying a charged particle beam to a sample in synchronization with the time base and controlling an irradiation position; a means for analyzing the emission characteristics of an emission electron from the sample from a detection signal of the emission electron; and a means for analyzing the electrical characteristics or cross-sectional morphological characteristics of the sample based on the emission characteristics.
    Type: Grant
    Filed: November 20, 2015
    Date of Patent: May 23, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Natsuki Tsuno, Naomasa Suzuki, Hideyuki Kazumi, Shoji Hotta, Yoshinobu Kimura
  • Patent number: 9653256
    Abstract: Provided is a charged-particle-beam device capable of simultaneously cancelling out a plurality of aberrations caused by non-uniform distribution of the opening angle and energy of a charged particle beam. The charged-particle-beam device is provided with an aberration generation lens for generating an aberration due to the charged particle beam passing off-axis, and a corrective lens for causing the trajectory of the charged particle beam to converge on the main surface of an objective lens irrespective of the energy of the charged particle beam. The main surface of the corrective lens is disposed at a crossover position at which a plurality of charged particle beams having differing opening angles converge after passing through the aberration generation lens.
    Type: Grant
    Filed: November 5, 2014
    Date of Patent: May 16, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Ikegami, Hideto Dohi, Hideyuki Kazumi, Yoichi Ose, Naomasa Suzuki, Momoyo Enyama, Ryuji Nishi, Akio Takaoka
  • Patent number: 9644955
    Abstract: A scanning electron beam device having: a deflector (5) for deflecting an electron beam (17) emitted from an electron source (1); an objective lens (7) for causing the electron beam to converge; a retarding electrode; a stage (9) for placing a wafer (16); and a controller (15); wherein the stage can be raised and lowered. In the low acceleration voltage region, the controller performs rough adjustment and fine adjustment of the focus in relation to the variation in the height of the wafer using electromagnetic focusing performed through excitation current adjustment of the objective lens. In the high acceleration voltage region, the controller performs rough adjustment of the focus in relation to the variation in the height of the wafer by mechanical focusing performed through raising and lowering of the stage, and performs fine adjustment by electrostatic focusing performed through adjustment of the retarding voltage.
    Type: Grant
    Filed: November 26, 2012
    Date of Patent: May 9, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tasuku Yano, Yasunari Sohda, Muneyuki Fukuda, Katsunori Onuki, Hajime Kawano, Naomasa Suzuki
  • Publication number: 20160300690
    Abstract: Provided is a charged-particle-beam device capable of simultaneously cancelling out a plurality of aberrations caused by non-uniform distribution of the opening angle and energy of a charged particle beam. The charged-particle-beam device is provided with an aberration generation lens for generating an aberration due to the charged particle beam passing off-axis, and a corrective lens for causing the trajectory of the charged particle beam to converge on the main surface of an objective lens irrespective of the energy of the charged particle beam. The main surface of the corrective lens is disposed at a crossover position at which a plurality of charged particle beams having differing opening angles converge after passing through the aberration generation lens.
    Type: Application
    Filed: November 5, 2014
    Publication date: October 13, 2016
    Inventors: Akira IKEGAMI, Hideto DOHI, Hideyuki KAZUMI, Yoichi OSE, Naomasa SUZUKI, Momoyo ENYAMA, Ryuji NISHI, Akio TAKAOKA
  • Patent number: 9384940
    Abstract: In order to provide a charged particle beam apparatus capable of high resolution measurement of a sample at any inclination angle, a charged particle beam apparatus for detecting secondary charged particles (115) generated by irradiating a sample (114) with a primary charged particle beam (110) is provided with a beam tilt lens (113) having: a yoke magnetic path member (132) and a lens coil (134) to focus the primary charged particle beam (110) on the sample (114); and a solenoid coil (133) configured to arrange the upper end on the side surface of the yoke magnetic path member (132) and arrange the bottom end between the tip end of the pole piece of the yoke magnetic path member (132) and the sample (114) in order to arbitrarily tilt the primary charged particle beam (110) on the sample (114).
    Type: Grant
    Filed: October 21, 2013
    Date of Patent: July 5, 2016
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Muneyuki Fukuda, Naomasa Suzuki, Akira Ikegami, Hideto Dohi, Momoyo Enyama, Tomoyasu Shojo
  • Publication number: 20160148781
    Abstract: A charged particle beam apparatus makes it possible to acquire information in the cross-sectional direction (depth direction) of a sample having an internal structure in a nondestructive manner with reduced damage. Further, the apparatus makes it possible to analyze the depth and/or dimensions in the depth direction of the internal structure. The charged particle beam apparatus includes: a means for providing a time base for control signals; a means for applying a charged particle beam to a sample in synchronization with the time base and controlling an irradiation position; a means for analyzing the emission characteristics of an emission electron from the sample from a detection signal of the emission electron; and a means for analyzing the electrical characteristics or cross-sectional morphological characteristics of the sample based on the emission characteristics.
    Type: Application
    Filed: November 20, 2015
    Publication date: May 26, 2016
    Inventors: Natsuki TSUNO, Naomasa SUZUKI, Hideyuki KAZUMI, Shoji HOTTA, Yoshinobu KIMURA
  • Patent number: 9324540
    Abstract: When a signal electron is detected by energy selection by combining and controlling retarding and boosting for observation of a deep hole, etc., the only way for focus adjustment is to use a change in magnetic field of an objective lens. However, since responsiveness of the change in magnetic field is poor, throughput reduces.
    Type: Grant
    Filed: April 12, 2013
    Date of Patent: April 26, 2016
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Ichiro Tachibana, Naomasa Suzuki