Patents by Inventor Naoto Utsumi

Naoto Utsumi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for preparing benzazepine compounds or salts thereof
    Patent number: 8501730
    Abstract: This invention provides a process for preparing benzazepine compounds of the formula (1): wherein X1 is a halogen atom, R1 and R2 are a lower alkyl group, or salts thereof as well as intermediate benzoic acid compounds in high yield and high purity on industrial scale, which are useful as an intermediate for preparing a pharmaceutically active 2,3,4,5-tetrahydro-1H-1-benzazepine compound having vasopressin antagonistic activity.
    Type: Grant
    Filed: May 17, 2012
    Date of Patent: August 6, 2013
    Assignee: Otsuka Pharmaceutical Co., Ltd.
    Inventors: Yasuhiro Torisawa, Kaoru Abe, Yasuaki Muguruma, Shigekazu Fujita, Hidenori Ogawa, Naoto Utsumi, Masahiro Miyake
  • Low hygroscopic aripiprazole drug substance and processes for the preparation thereof
    Patent number: 8399469
    Abstract: The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the anhydrous aripiprazole crystals is stored for an extended period.
    Type: Grant
    Filed: April 26, 2007
    Date of Patent: March 19, 2013
    Assignee: Otsuka Pharmaceutical Co., Ltd.
    Inventors: Takuji Bando, Satoshi Aoki, Junichi Kawasaki, Makoto Ishigami, Youichi Taniguchi, Tsuyoshi Yabuuchi, Kiyoshi Fujimoto, Yoshihiro Nishioka, Noriyuki Kobayashi, Tsutomu Fujimura, Masanori Takahashi, Kaoru Abe, Tomonori Nakagawa, Koichi Shinhama, Naoto Utsumi, Michiaki Tominaga, Yoshihiro Ooi, Shohei Yamada, Kenji Tomikawa
  • Epoxy compound and method for manufacturing the same
    Patent number: 8344148
    Abstract: The present invention provides a novel intermediate for manufacturing a 2,3-dihydroimidazo[2,1-b]oxazole compound with a high yield and a high purity, and a manufacturing method of the intermediate. The present invention provides an epoxy compound represented by the general formula (2): wherein, R1 represents hydrogen or a lower alkyl group; and R2 represents a piperidyl group represented by the general formula (A1): (wherein, R3 represents a phenoxy group having a halogen-substituted lower alkoxy group substituted on a phenyl group, and the like) and the like; and n represents an integer of 1 to 6, a manufacturing method of the epoxy compound, and a manufacturing method of an oxazole compound using the epoxy compound.
    Type: Grant
    Filed: May 7, 2008
    Date of Patent: January 1, 2013
    Assignee: Otsuka Pharmaceutical Co., Ltd.
    Inventors: Hidetsugu Tsubouchi, Yoshikazu Haraguchi, Satoshi Hayakawa, Naoto Utsumi, Shinichi Taira, Yoshihisa Tanada, Nobuhisa Fujita, Koichi Shinhama, Kimiyoshi Annaka, Takuya Furuta
  • LOW HYGROSCOPIC ARIPIPRAZOLE DRUG SUBSTANCE AND PROCESSES FOR THE PREPARATION THEREOF
    Publication number: 20120316180
    Abstract: The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the anhydrous Aripiprazole crystals is stored for an extended period.
    Type: Application
    Filed: May 21, 2012
    Publication date: December 13, 2012
    Inventors: Takuji Bando, Satoshi Aoki, Junichi Kawasaki, Makoto Ishigami, Youichi Taniguchi, Tsuyoshi Yabuuchi, Kiyoshi Fujimoto, Yoshihiro Nishioka, Noriyuki Kobayashi, Tsutomu Fujimura, Masanori Takahashi, Kaoru Abe, Tomonori Nakagawa, Koichi Shinhama, Naoto Utsumi, Michiaki Tominaga, Yoshihiro Ooi, Shohei Yamada, Kenji Tomikawa
  • LOW HYGROSCOPIC ARIPIPRAZOLE DRUG SUBSTANCE AND PROCESSES FOR THE PREPARATION THEREOF
    Publication number: 20120316179
    Abstract: The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the anhydrous Aripiprazole crystals is stored for an extended period.
    Type: Application
    Filed: May 21, 2012
    Publication date: December 13, 2012
    Inventors: Takuji Bando, Satoshi Aoki, Junichi Kawasaki, Makoto Ishigami, Youichi Taniguchi, Tsuyoshi Yabuuchi, Kiyoshi Fujimoto, Yoshihiro Nishioka, Noriyuki Kobayashi, Tsutomu Fujimura, Misanori Takahashi, Kaoru Abe, Tomonori Nakagawa, Koichi Shinhama, Naoto Utsumi, Michiaki Tominaga, Yoshihiro Ooi, Shohei Yamada, Kenji Tomikawa
  • LOW HYGROSCOPIC ARIPIPRAZOLE DRUG SUBSTANCE AND PROCESSES FOR THE PREPARATION THEREOF
    Publication number: 20120315302
    Abstract: The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the anhydrous Aripiprazole crystals is stored for an extended period.
    Type: Application
    Filed: January 13, 2012
    Publication date: December 13, 2012
    Inventors: Takuji BANDO, Satoshi AOKI, Junichi KAWASAKI, Makoto ISHIGAMI, Youichi TANIGUCHI, Tsuyoshi YABUUCHI, Kiyoshi FUJIMOTO, Yoshihiro NISHIOKA, Noriyuki KOBAYASHI, Tsutomu FUJIMURA, Masanori TAKAHASHI, Kaoru ABE, Tomonori NAKAGAWA, Koichi SHINHAMA, Naoto UTSUMI, Michiaki TOMINAGA, Yoshihiro OOI, Shohei YAMADA, Kenji TOMIKAWA
  • SYNTHETIC INTERMEDIATE OF OXAZOLE COMPOUND AND METHOD FOR PRODUCING THE SAME
    Publication number: 20120302757
    Abstract: An object of the present invention is to provide a method for producing an oxazole compound in a high yield.
    Type: Application
    Filed: January 28, 2011
    Publication date: November 29, 2012
    Applicant: OTSUKA PHARMACEUTICAL CO., LTD.
    Inventors: Akihiro Yamamoto, Koichi Shinhama, Nobuhisa Fujita, Shinji Aki, Shin Ogasawara, Naoto Utsumi
  • Process for preparing benzazepine compounds or salts thereof
    Patent number: 8273735
    Abstract: This invention provides a process for preparing benzazepine compounds of the formula (1): wherein X1 is a halogen atom, R1 and R2 are a lower alkyl group, or salts thereof as well as intermediate benzoic acid compounds in high yield and high purity on industrial scale, which are useful as an intermediate for preparing a pharmaceutically active 2,3,4,5-tetrahydro-1H-1-benzazepine compound having vasopressin antagonistic activity.
    Type: Grant
    Filed: September 1, 2006
    Date of Patent: September 25, 2012
    Assignee: Otsuka Pharmaceutical Co., Ltd.
    Inventors: Yasuhiro Torisawa, Kaoru Abe, Yasuaki Muguruma, Shigekazu Fujita, Hidenori Ogawa, Naoto Utsumi, Masahiro Miyake
  • PROCESS FOR PREPARING BENZAZEPINE COMPOUNDS OR SALTS THEREOF
    Publication number: 20120226034
    Abstract: This invention provides a process for preparing benzazepine compounds of the formula (1): wherein X1 is a halogen atom, R1 and R2 are a lower alkyl group, or salts thereof as well as intermediate benzoic acid compounds in high yield and high purity on industrial scale, which are useful as an intermediate for preparing a pharmaceutically active 2,3,4,5-tetrahydro-1H-1-benzazepine compound having vasopressin antagonistic activity.
    Type: Application
    Filed: May 17, 2012
    Publication date: September 6, 2012
    Inventors: Yasuhiro Torisawa, Kaoru Abe, Yasuaki Muguruma, Shigekazu Fujita, Hidenori Ogawa, Naoto Utsumi, Masahiro Miyake
  • 1-Substituted-4-Nitroimidazole Compound and Method for Preparing the Same
    Publication number: 20120130082
    Abstract: The present invention relates to a 1-substituted-4-nitroimidazole compound represented by the general formula (1) or a salt thereof, (wherein R is a hydrogen atom, a lower alkoxy group-substituted lower alkyl group, a phenyl-lower alkoxy group-substituted lower alkyl group, a cyano-substituted lower alkyl group, a phenyl-lower alkyl group which may have lower alkoxy groups as the substituents in the phenyl ring or a group of the formula —CH2RA; X is a halogen atom or a group of the formula —S(O)n-R1) and method for preparing the same. The compound of the formula (1) is a useful compound as an intermediate for synthesis of various pharmaceutical and agricultural chemicals, particularly, as intermediates for antitubercular agents.
    Type: Application
    Filed: January 31, 2012
    Publication date: May 24, 2012
    Inventors: Fumitaka GOTO, Noriaki Takemura, Tadaaki Otani, Takeshi Hasegawa, Hidetsugu Tsubouchi, Naoto Utsumi, Shigekazu Fujita, Hideaki Kuroda, Takuya Shitsuta, Hirofumi Sasaki
  • LOW HYGROSCOPIC ARIPIPRAZOLE DRUG SUBSTANCE AND PROCESSES FOR THE PREPARATION THEREOF
    Publication number: 20120077821
    Abstract: The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the aripiprazole anhydride crystals is stored for an extended period.
    Type: Application
    Filed: August 25, 2011
    Publication date: March 29, 2012
    Inventors: Takuji BANDO, Satoshi AOKI, Junichi KAWASAKI, Makoto ISHIGAMI, Youichi TANIGUCHI, Tsuyoshi YABUUCHI, Kiyoshi FUJIMOTO, Yoshihiro NISHIOKA, Noriyuki KOBAYASHI, Tsutomu FUJIMURA, Masanori TAKAHASHI, Kaoru ABE, Tomonori NAKAGAWA, Koichi SHINHAMA, Naoto UTSUMI, Michiaki TOMINAGA, Yoshihiro OOI, Shohei YAMADA, Kenji TOMIKAWA
  • 1-substituted-4-nitroimidazole compound and method for preparing the same
    Patent number: 8129544
    Abstract: The present invention relates to a 1-substituted-4-nitroimidazole compound represented by the general formula (1) or a salt thereof, (wherein R is a hydrogen atom, a lower alkoxy group-substituted lower alkyl group, a phenyl-lower alkoxy group-substituted lower alkyl group, a cyano-substituted lower alkyl group, a phenyl-lower alkyl group which may have lower alkoxy groups as the substituents in the phenyl ring or a group of the formula —CH2RA; X is a halogen atom or a group of the formula —S(O)n-R1) and method for preparing the same. The compound of the formula (1) is a useful compound as an intermediate for synthesis of various pharmaceutical and agricultural chemicals, particularly, as intermediates for antitubercular agents.
    Type: Grant
    Filed: October 1, 2007
    Date of Patent: March 6, 2012
    Assignee: Otsuka Pharmaceutical Co., Ltd.
    Inventors: Fumitaka Goto, Noriaki Takemura, Tadaaki Otani, Takeshi Hasegawa, Hidetsugu Tsubouchi, Naoto Utsumi, Shigekazu Fujita, Hideaki Kuroda, Takuya Shitsuta, Hirofumi Sasaki
  • Low hygroscopic aripiprazole drug substance and processes for the preparation thereof
    Publication number: 20120016123
    Abstract: The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the anhydrous Aripiprazole crystals is stored for an extended period.
    Type: Application
    Filed: June 23, 2011
    Publication date: January 19, 2012
    Inventors: Takuji Bando, Satoshi Aoki, Junichi Kawasaki, Makoto Ishigami, Youichi Taniguchi, Tsuyoshi Yabuuchi, Kiyoshi Fujimoto, Yoshihiro Nishioka, Noriyuki Kobayashi, Tsutomu Fujimura, Masanori Takahashi, Kaoru Abe, Tomonori Nakagawa, Koichi Shinhama, Naoto Utsumi, Michiaki Tominaga, Yoshihiro Ooi, Shohei Yamada, Kenji Tomikawa
  • Low hygroscopic aripiprazole drug substance and processes for the preparation thereof
    Publication number: 20120000998
    Abstract: The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the anhydrous Aripiprazole crystals is stored for an extended period.
    Type: Application
    Filed: June 29, 2011
    Publication date: January 5, 2012
    Inventors: Takuji Bando, Satoshi Aoki, Junichi Kawasaki, Makoto Ishigami, Youichi Taniguchi, Tsuyoshi Yabuuchi, Kiyoshi Fujimoto, Yoshihiro Nishioka, Noriyuki Kobayashi, Tsutomu Fujimura, Masanori Takahashi, Kaoru Abe, Tomonori Nakagawa, Koichi Shinhama, Naoto Utsumi, Michiaki Tominaga, Yoshihiro Ooi, Shohei Yamada, Kenji Tomikawa
  • Low hygroscopic aripiprazole drug substance and processes for the preparation thereof
    Patent number: 8017615
    Abstract: The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the anhydrous aripiprazole crystals is stored for an extended period.
    Type: Grant
    Filed: April 26, 2007
    Date of Patent: September 13, 2011
    Assignee: Otsuka Pharmaceutical Co., Ltd.
    Inventors: Takuji Bando, Satoshi Aoki, Junichi Kawasaki, Makoto Ishigami, Youichi Taniguchi, Tsuyoshi Yabuuchi, Kiyoshi Fujimoto, Yoshihiro Nishioka, Noriyuki Kobayashi, Tsutomu Fujimura, Masanori Takahashi, Kaoru Abe, Tomonori Nakagawa, Koichi Shinhama, Naoto Utsumi, Michiaki Tominaga, Yoshihiro Ooi, Shohei Yamada, Kenji Tomikawa
  • Low hygroscopic aripiprazole drug substance and processes for the preparation thereof
    Patent number: 7910589
    Abstract: The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the anhydrous aripiprazole crystals is stored for an extended period.
    Type: Grant
    Filed: April 26, 2007
    Date of Patent: March 22, 2011
    Assignee: Otsuka Pharmaceutical Co., Ltd.
    Inventors: Takuji Bando, Satoshi Aoki, Junichi Kawasaki, Makoto Ishigami, Youichi Taniguchi, Tsuyoshi Yabuuchi, Kiyoshi Fujimoto, Yoshihiro Nishioka, Noriyuki Kobayashi, Tsutomu Fujimura, Masanori Takahashi, Kaoru Abe, Tomonori Nakagawa, Koichi Shinhama, Naoto Utsumi, Michiaki Tominaga, Yoshihiro Ooi, Shohei Yamada, Kenji Tomikawa
  • 1-substituted-4-nitroimidazole compound and method for preparing the same
    Patent number: 7807843
    Abstract: The present invention relates to a 1-substituted-4-nitroimidazole compound represented by the general formula (1) or a salt thereof, (wherein R is a hydrogen atom, a lower alkoxy group-substituted lower alkyl group, a phenyl-lower alkoxy group-substituted lower alkyl group, a cyano-substituted lower alkyl group, a phenyl-lower alkyl group which may have lower alkoxy groups as the substituents in the phenyl ring or a group of the formula —CH2RA; X is a halogen atom or a group of the formula —S(O)n-R1) and method for preparing the same. The compound of the formula (1) is a useful compound as an intermediate for synthesis of various pharmaceutical and agricultural chemicals, particularly, as intermediates for antitubercular agents.
    Type: Grant
    Filed: January 15, 2008
    Date of Patent: October 5, 2010
    Assignee: Otsuka Pharmaceutical Co., Ltd.
    Inventors: Fumitaka Goto, Noriaki Takemura, Tadaaki Otani, Takeshi Hasegawa, Hidetsugu Tsubouchi, Naoto Utsumi, Shigekazu Fujita, Hideaki Kuroda, Takuya Shitsuta, Hirofumi Sasaki
  • EPOXY COMPOUND AND METHOD FOR MANUFACTURING THE SAME
    Publication number: 20100217005
    Abstract: The present invention provides a novel intermediate for manufacturing a 2,3-dihydroimidazo[2,1-b]oxazole compound with a high yield and a high purity, and a manufacturing method of the intermediate. The present invention provides an epoxy compound represented by the general formula (2): wherein, R1 represents hydrogen or a lower alkyl group; and R2 represents a piperidyl group represented by the general formula (A1): (wherein, R3 represents a phenoxy group having a halogen-substituted lower alkoxy group substituted on a phenyl group, and the like) and the like; and n represents an integer of 1 to 6, a manufacturing method of the epoxy compound, and a manufacturing method of an oxazole compound using the epoxy compound.
    Type: Application
    Filed: May 7, 2008
    Publication date: August 26, 2010
    Inventors: Hidetsugu Tsubouchi, Yoshikazu Haraguchi, Satoshi Hayakawa, Naoto Utsumi, Shinichi Taira, Yoshihisa Tanada, Nobuhisa Fujita, Koichi Shinhama, Kimiyoshi Annaka, Takuya Furuta
  • PROCESS FOR PREPARING BENZAZEPINE COMPOUNDS OR SALTS THEREOF
    Publication number: 20090306369
    Abstract: This invention provides a process for preparing benzazepine compounds of the formula (1): wherein X1 is a halogen atom, R1 and R2 are a lower alkyl group, or salts thereof as well as intermediate benzoic acid compounds in high yield and high purity on industrial scale, which are useful as an intermediate for preparing a pharmaceutically active 2,3,4,5-tetrahydro-1H-1-benzazepine compound having vasopressin antagonistic activity.
    Type: Application
    Filed: September 1, 2006
    Publication date: December 10, 2009
    Inventors: Yasuhiro Torisawa, Kaoru Abe, Yasuaki Muguruma, Shigekazu Fujita, Hidenori Ogawa, Naoto Utsumi, Masahiro Miyake
  • 1-Substituted-4-nitroimidazole compound and method for preparing the same
    Publication number: 20080200689
    Abstract: The present invention relates to a 1-substituted-4-nitroimidazole compound represented by the general formula (1) or a salt thereof, (wherein R is a hydrogen atom, a lower alkoxy group-substituted lower alkyl group, a phenyl-lower alkoxy group-substituted lower alkyl group, a cyano-substituted lower alkyl group, a phenyl-lower alkyl group which may have lower alkoxy groups as the substituents in the phenyl ring or a group of the formula —CH2RA; X is a halogen atom or a group of the formula —S(O)n-R1) and method for preparing the same. The compound of the formula (1) is a useful compound as an intermediate for synthesis of various pharmaceutical and agricultural chemicals, particularly, as intermediates for antitubercular agents.
    Type: Application
    Filed: January 15, 2008
    Publication date: August 21, 2008
    Inventors: Fumitaka Goto, Noriaki Takemura, Tadaaki Otani, Takeshi Hasegawa, Hidetsugu Tsubouchi, Naoto Utsumi, Shigekazu Fujita, Hideaki Kuroda, Takuya Shitsuta, Hirofumi Sasaki