Patents by Inventor Natsuo Fujimori

Natsuo Fujimori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7514187
    Abstract: The color filter of the present invention comprises ink films colored by ink drops 140 inside openings 111 enclosed by banks 112 demarcated and formed on a substrate 110. The banks 112 have a laminar structure comprising a metal film 120 and a photosensitive organic thin film 130 from the substrate 110 side. The inks should contain a solvent having a high boiling point. The bank layer may also be configured so that the peripheral edges of the bottom surface thereof are positioned inside from the peripheral edges of the light blocking layers, so that the light blocking layers have exposed surfaces on the upper surface thereof where the bank layer is not superimposed. Thus color filters can be provided which exhibit outstanding contrast without coloring irregularities.
    Type: Grant
    Filed: May 8, 2006
    Date of Patent: April 7, 2009
    Assignee: Seiko Epson Corporation
    Inventors: Hiroshi Kiguchi, Natsuo Fujimori, Satoru Katagami, Masaharu Shimizu, Keiji Takizawa, Tadaaki Kuno
  • Publication number: 20060216617
    Abstract: The color filter of the present invention comprises ink films colored by ink drops 140 inside openings 111 enclosed by banks 112 demarcated and formed on a substrate 110. The banks 112 have a laminar structure comprising a metal film 120 and a photosensitive organic thin film 130 from the substrate 110 side. The inks should contain a solvent having a high boiling point. The bank layer may also be configured so that the peripheral edges of the bottom surface thereof are positioned inside from the peripheral edges of the light blocking layers, so that the light blocking layers have exposed surfaces on the upper surface thereof where the bank layer is not superimposed. Thus color filters can be provided which exhibit outstanding contrast without coloring irregularities.
    Type: Application
    Filed: May 8, 2006
    Publication date: September 28, 2006
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Hiroshi Kiguchi, Natsuo Fujimori, Satoru Katagami, Masaharu Shimizu, Keiji Takizawa, Tadaaki Kuno
  • Patent number: 7070890
    Abstract: The color filter of the present invention comprises ink films colored by ink drops 140 inside openings 111 enclosed by banks 112 demarcated and formed on a substrate 110. The banks 112 have a laminar structure comprising a metal film 120 and a photosensitive organic thin film 130 from the substrate 110 side. The inks should contain a solvent having a high boiling point. The bank layer may also be configured so that the peripheral edges of the bottom surface thereof are positioned inside from the peripheral edges of the light blocking layers, so that the light blocking layers have exposed surfaces on the upper surface thereof where the bank layer is not superimposed. Thus color filters can be provided which exhibit outstanding contrast without coloring irregularities.
    Type: Grant
    Filed: August 14, 2003
    Date of Patent: July 4, 2006
    Assignee: Seiko Epson Corporation
    Inventors: Hiroshi Kiguchi, Natsuo Fujimori, Satoru Katagami, Masaharu Shimizu, Keiji Takizawa, Tadaaki Kuno
  • Patent number: 6727513
    Abstract: The invention ensures that a liquid is placed in a predetermined region (without being placed in an adjacent region) with a uniform thickness in the region, when a light emitting layer constituting an organic EL element is placed by, for example, ink jet process. Thin SiO2 film pattern having an opening is formed on an ITO electrode. Next, ultrathin organic film pattern having an opening is formed on a thin SiO2 film pattern. The surface of the ultrathin organic film pattern becomes repellent to liquid. Hole transporting layer is formed in the opening of the ultrathin organic film pattern, and then liquid containing a material for the formation of light emitting layer is discharged thereon by ink jet process. Fluid does not remain on the surface of the ultrathin organic film pattern and instead enters the opening of the ultrathin organic film pattern.
    Type: Grant
    Filed: June 20, 2003
    Date of Patent: April 27, 2004
    Assignee: Seiko Epson Corporation
    Inventors: Natsuo Fujimori, Masaya Ishida
  • Publication number: 20040038138
    Abstract: The color filter of the present invention comprises ink films colored by ink drops 140 inside openings 111 enclosed by banks 112 demarcated and formed on a substrate 110. The banks 112 have a laminar structure comprising a metal film 120 and a photosensitive organic thin film 130 from the substrate 110 side. The inks should contain a solvent having a high boiling point. The bank layer may also be configured so that the peripheral edges of the bottom surface thereof are positioned inside from the peripheral edges of the light blocking layers, so that the light blocking layers have exposed surfaces on the upper surface thereof where the bank layer is not superimposed. Thus color filters can be provided which exhibit outstanding contrast without coloring irregularities.
    Type: Application
    Filed: August 14, 2003
    Publication date: February 26, 2004
    Applicant: Seiko Epson Corporation
    Inventors: Hiroshi Kiguchi, Natsuo Fujimori, Satoru Katagami, Masaharu Shimizu, Keiji Takizawa, Tadaaki Kuno
  • Publication number: 20030211643
    Abstract: The invention ensures that a liquid is placed in a predetermined region (without being placed in an adjacent region) with a uniform thickness in the region, when a light emitting layer constituting an organic EL element is placed by, for example, ink jet process. Thin SiO2 film pattern having an opening is formed on an ITO electrode. Next, ultrathin organic film pattern having an opening is formed on a thin SiO2 film pattern. The surface of the ultrathin organic film pattern becomes repellent to liquid. Hole transporting layer is formed in the opening of the ultrathin organic film pattern, and then liquid containing a material for the formation of light emitting layer is discharged thereon by ink jet process. Fluid does not remain on the surface of the ultrathin organic film pattern and instead enters the opening of the ultrathin organic film pattern.
    Type: Application
    Filed: June 20, 2003
    Publication date: November 13, 2003
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Natsuo Fujimori, Masaya Ishida
  • Patent number: 6630274
    Abstract: The color filter of the present invention comprises ink films colored by ink drops 140 inside openings 111 enclosed by banks 112 demarcated and formed on a substrate 110. The banks 112 have a laminar structure comprising a metal film 120 and a photosensitive organic thin film 130 from the substrate 110 side. The inks should contain a solvent having a high boiling point. The bank layer may also be configured so that the peripheral edges of the bottom surface thereof are positioned inside from the peripheral edges of the light blocking layers, so that the light blocking layers have exposed surfaces on the upper surface thereof where the bank layer is not superimposed. Thus color filters can be provided which exhibit outstanding contrast without coloring irregularities.
    Type: Grant
    Filed: August 16, 2000
    Date of Patent: October 7, 2003
    Assignee: Seiko Epson Corporation
    Inventors: Hiroshi Kiguchi, Natsuo Fujimori, Satoru Katagami, Masaharu Shimizu, Keiji Takizawa, Tadaaki Kuno
  • Patent number: 6610552
    Abstract: The invention ensures that a liquid is placed in a predetermined region (without being placed in an adjacent region) with a uniform thickness in the region, when a light emitting layer constituting an organic EL element is placed by, for example, ink jet process. Thin SiO2 film pattern having an opening is formed on an ITO electrode. Next, ultrathin organic film pattern having an opening is formed on a thin SiO2 film pattern. The surface of the ultrathin organic film pattern becomes repellent to liquid. Hole transporting layer is formed in the opening of the ultrathin organic film pattern, and then liquid containing a material for the formation of light emitting layer is discharged thereon by ink jet process. Fluid does not remain on the surface of the ultrathin organic film pattern and instead enters the opening of the ultrathin organic film pattern.
    Type: Grant
    Filed: March 30, 2001
    Date of Patent: August 26, 2003
    Assignee: Seiko Epson Corporation
    Inventors: Natsuo Fujimori, Masaya Ishida
  • Publication number: 20020016031
    Abstract: To ensure that a liquid is placed in a predetermined region (without being placed in an adjacent region) with a uniform thickness in the region, when a light emitting layer constituting an organic EL element is placed by, for example, ink jet process. Thin SiO2 film pattern 3 having opening 3ais formed on ITO electrode 2. Next, ultrathin organic film pattern 41 having opening 4b is formed on thin SiO2 film pattern 3. The surface of ultrathin organic film pattern 41 becomes repellent to liquid. Hole transporting layer 61 is formed in opening 4b, and then liquid 7 containing a material for the formation of light emitting layer is discharged thereon by ink jet process. Fluid 7 does not remain on the surface of ultrathin organic film pattern 41 but enters opening 4b.
    Type: Application
    Filed: March 30, 2001
    Publication date: February 7, 2002
    Applicant: Seiko Epson Corporation
    Inventors: Natsuo Fujimori, Masaya Ishida