Patents by Inventor Natsuo Fujimori
Natsuo Fujimori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7514187Abstract: The color filter of the present invention comprises ink films colored by ink drops 140 inside openings 111 enclosed by banks 112 demarcated and formed on a substrate 110. The banks 112 have a laminar structure comprising a metal film 120 and a photosensitive organic thin film 130 from the substrate 110 side. The inks should contain a solvent having a high boiling point. The bank layer may also be configured so that the peripheral edges of the bottom surface thereof are positioned inside from the peripheral edges of the light blocking layers, so that the light blocking layers have exposed surfaces on the upper surface thereof where the bank layer is not superimposed. Thus color filters can be provided which exhibit outstanding contrast without coloring irregularities.Type: GrantFiled: May 8, 2006Date of Patent: April 7, 2009Assignee: Seiko Epson CorporationInventors: Hiroshi Kiguchi, Natsuo Fujimori, Satoru Katagami, Masaharu Shimizu, Keiji Takizawa, Tadaaki Kuno
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Publication number: 20060216617Abstract: The color filter of the present invention comprises ink films colored by ink drops 140 inside openings 111 enclosed by banks 112 demarcated and formed on a substrate 110. The banks 112 have a laminar structure comprising a metal film 120 and a photosensitive organic thin film 130 from the substrate 110 side. The inks should contain a solvent having a high boiling point. The bank layer may also be configured so that the peripheral edges of the bottom surface thereof are positioned inside from the peripheral edges of the light blocking layers, so that the light blocking layers have exposed surfaces on the upper surface thereof where the bank layer is not superimposed. Thus color filters can be provided which exhibit outstanding contrast without coloring irregularities.Type: ApplicationFiled: May 8, 2006Publication date: September 28, 2006Applicant: SEIKO EPSON CORPORATIONInventors: Hiroshi Kiguchi, Natsuo Fujimori, Satoru Katagami, Masaharu Shimizu, Keiji Takizawa, Tadaaki Kuno
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Patent number: 7070890Abstract: The color filter of the present invention comprises ink films colored by ink drops 140 inside openings 111 enclosed by banks 112 demarcated and formed on a substrate 110. The banks 112 have a laminar structure comprising a metal film 120 and a photosensitive organic thin film 130 from the substrate 110 side. The inks should contain a solvent having a high boiling point. The bank layer may also be configured so that the peripheral edges of the bottom surface thereof are positioned inside from the peripheral edges of the light blocking layers, so that the light blocking layers have exposed surfaces on the upper surface thereof where the bank layer is not superimposed. Thus color filters can be provided which exhibit outstanding contrast without coloring irregularities.Type: GrantFiled: August 14, 2003Date of Patent: July 4, 2006Assignee: Seiko Epson CorporationInventors: Hiroshi Kiguchi, Natsuo Fujimori, Satoru Katagami, Masaharu Shimizu, Keiji Takizawa, Tadaaki Kuno
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Patent number: 6727513Abstract: The invention ensures that a liquid is placed in a predetermined region (without being placed in an adjacent region) with a uniform thickness in the region, when a light emitting layer constituting an organic EL element is placed by, for example, ink jet process. Thin SiO2 film pattern having an opening is formed on an ITO electrode. Next, ultrathin organic film pattern having an opening is formed on a thin SiO2 film pattern. The surface of the ultrathin organic film pattern becomes repellent to liquid. Hole transporting layer is formed in the opening of the ultrathin organic film pattern, and then liquid containing a material for the formation of light emitting layer is discharged thereon by ink jet process. Fluid does not remain on the surface of the ultrathin organic film pattern and instead enters the opening of the ultrathin organic film pattern.Type: GrantFiled: June 20, 2003Date of Patent: April 27, 2004Assignee: Seiko Epson CorporationInventors: Natsuo Fujimori, Masaya Ishida
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Publication number: 20040038138Abstract: The color filter of the present invention comprises ink films colored by ink drops 140 inside openings 111 enclosed by banks 112 demarcated and formed on a substrate 110. The banks 112 have a laminar structure comprising a metal film 120 and a photosensitive organic thin film 130 from the substrate 110 side. The inks should contain a solvent having a high boiling point. The bank layer may also be configured so that the peripheral edges of the bottom surface thereof are positioned inside from the peripheral edges of the light blocking layers, so that the light blocking layers have exposed surfaces on the upper surface thereof where the bank layer is not superimposed. Thus color filters can be provided which exhibit outstanding contrast without coloring irregularities.Type: ApplicationFiled: August 14, 2003Publication date: February 26, 2004Applicant: Seiko Epson CorporationInventors: Hiroshi Kiguchi, Natsuo Fujimori, Satoru Katagami, Masaharu Shimizu, Keiji Takizawa, Tadaaki Kuno
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Publication number: 20030211643Abstract: The invention ensures that a liquid is placed in a predetermined region (without being placed in an adjacent region) with a uniform thickness in the region, when a light emitting layer constituting an organic EL element is placed by, for example, ink jet process. Thin SiO2 film pattern having an opening is formed on an ITO electrode. Next, ultrathin organic film pattern having an opening is formed on a thin SiO2 film pattern. The surface of the ultrathin organic film pattern becomes repellent to liquid. Hole transporting layer is formed in the opening of the ultrathin organic film pattern, and then liquid containing a material for the formation of light emitting layer is discharged thereon by ink jet process. Fluid does not remain on the surface of the ultrathin organic film pattern and instead enters the opening of the ultrathin organic film pattern.Type: ApplicationFiled: June 20, 2003Publication date: November 13, 2003Applicant: SEIKO EPSON CORPORATIONInventors: Natsuo Fujimori, Masaya Ishida
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Patent number: 6630274Abstract: The color filter of the present invention comprises ink films colored by ink drops 140 inside openings 111 enclosed by banks 112 demarcated and formed on a substrate 110. The banks 112 have a laminar structure comprising a metal film 120 and a photosensitive organic thin film 130 from the substrate 110 side. The inks should contain a solvent having a high boiling point. The bank layer may also be configured so that the peripheral edges of the bottom surface thereof are positioned inside from the peripheral edges of the light blocking layers, so that the light blocking layers have exposed surfaces on the upper surface thereof where the bank layer is not superimposed. Thus color filters can be provided which exhibit outstanding contrast without coloring irregularities.Type: GrantFiled: August 16, 2000Date of Patent: October 7, 2003Assignee: Seiko Epson CorporationInventors: Hiroshi Kiguchi, Natsuo Fujimori, Satoru Katagami, Masaharu Shimizu, Keiji Takizawa, Tadaaki Kuno
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Patent number: 6610552Abstract: The invention ensures that a liquid is placed in a predetermined region (without being placed in an adjacent region) with a uniform thickness in the region, when a light emitting layer constituting an organic EL element is placed by, for example, ink jet process. Thin SiO2 film pattern having an opening is formed on an ITO electrode. Next, ultrathin organic film pattern having an opening is formed on a thin SiO2 film pattern. The surface of the ultrathin organic film pattern becomes repellent to liquid. Hole transporting layer is formed in the opening of the ultrathin organic film pattern, and then liquid containing a material for the formation of light emitting layer is discharged thereon by ink jet process. Fluid does not remain on the surface of the ultrathin organic film pattern and instead enters the opening of the ultrathin organic film pattern.Type: GrantFiled: March 30, 2001Date of Patent: August 26, 2003Assignee: Seiko Epson CorporationInventors: Natsuo Fujimori, Masaya Ishida
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Publication number: 20020016031Abstract: To ensure that a liquid is placed in a predetermined region (without being placed in an adjacent region) with a uniform thickness in the region, when a light emitting layer constituting an organic EL element is placed by, for example, ink jet process. Thin SiO2 film pattern 3 having opening 3ais formed on ITO electrode 2. Next, ultrathin organic film pattern 41 having opening 4b is formed on thin SiO2 film pattern 3. The surface of ultrathin organic film pattern 41 becomes repellent to liquid. Hole transporting layer 61 is formed in opening 4b, and then liquid 7 containing a material for the formation of light emitting layer is discharged thereon by ink jet process. Fluid 7 does not remain on the surface of ultrathin organic film pattern 41 but enters opening 4b.Type: ApplicationFiled: March 30, 2001Publication date: February 7, 2002Applicant: Seiko Epson CorporationInventors: Natsuo Fujimori, Masaya Ishida