Patents by Inventor NAVEEN G. MENON
NAVEEN G. MENON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11286209Abstract: A method of manufacturing a ceramic matrix composite component may include introducing a gaseous precursor into an inlet portion of a chamber that houses a porous preform and introducing a gaseous mitigation agent into an outlet portion of the chamber that is downstream of the inlet portion of the chamber. The gaseous precursor may include methyltrichlorosilane (MTS) and the gaseous mitigation agent may include hydrogen gas. The introduction of the gaseous precursor may result in densification of the porous preform(s) and the introduction of the gaseous mitigation agent may shift the reaction equilibrium to disfavor the formation of harmful and/or pyrophoric byproduct deposits, which can accumulate in an exhaust conduit 340 of the system.Type: GrantFiled: June 5, 2020Date of Patent: March 29, 2022Assignee: Goodrich CorporationInventors: Ying She, Naveen G. Menon, Zissis A. Dardas, Thomas P. Filburn
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Patent number: 10975467Abstract: A gas distribution plate for a chemical vapor deposition/infiltration system includes a body having a first side and a second side opposite the first side. The body may be hollow and may define an internal cavity. The gas distribution plate may also include a plurality of pass-through tubes extending through the internal cavity, a cavity inlet, and a plurality of cavity outlets. A reaction gas may be configured to flow through the plurality of pass-through tubes and a gaseous mitigation agent may be configured to flow into the internal cavity via the cavity inlet and out of the internal cavity via the plurality of cavity outlets to mix with reaction gas.Type: GrantFiled: October 10, 2019Date of Patent: April 13, 2021Assignee: GOODRICH CORPORATIONInventors: Ying She, Naveen G. Menon, Zissis A. Dardas, Thomas P. Filburn, Xiaodan Cai
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Publication number: 20200300470Abstract: A method of manufacturing a ceramic matrix composite component may include introducing a gaseous precursor into an inlet portion of a chamber that houses a porous preform and introducing a gaseous mitigation agent into an outlet portion of the chamber that is downstream of the inlet portion of the chamber. The gaseous precursor may include methyltrichlorosilane (MTS) and the gaseous mitigation agent may include hydrogen gas. The introduction of the gaseous precursor may result in densification of the porous preform(s) and the introduction of the gaseous mitigation agent may shift the reaction equilibrium to disfavor the formation of harmful and/or pyrophoric byproduct deposits, which can accumulate in an exhaust conduit 340 of the system.Type: ApplicationFiled: June 5, 2020Publication date: September 24, 2020Applicant: GOODRICH CORPORATIONInventors: YING SHE, NAVEEN G. MENON, ZISSIS A. DARDAS, THOMAS P. FILBURN
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Patent number: 10712005Abstract: A method of manufacturing a ceramic matrix composite component may include introducing a gaseous precursor into an inlet portion of a chamber that houses a porous preform and introducing a gaseous mitigation agent into an outlet portion of the chamber that is downstream of the inlet portion of the chamber. The gaseous precursor may include methyltrichlorosilane (MTS) and the gaseous mitigation agent may include hydrogen gas. The introduction of the gaseous precursor may result in densification of the porous preform(s) and the introduction of the gaseous mitigation agent may shift the reaction equilibrium to disfavor the formation of harmful and/or pyrophoric byproduct deposits, which can accumulate in an exhaust conduit 340 of the system.Type: GrantFiled: July 14, 2017Date of Patent: July 14, 2020Assignee: GOODRICH CORPORATIONInventors: Ying She, Naveen G. Menon, Zissis A. Dardas, Thomas P. Filburn
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Publication number: 20200040447Abstract: A gas distribution plate for a chemical vapor deposition/infiltration system includes a body having a first side and a second side opposite the first side. The body may be hollow and may define an internal cavity. The gas distribution plate may also include a plurality of pass-through tubes extending through the internal cavity, a cavity inlet, and a plurality of cavity outlets. A reaction gas may be configured to flow through the plurality of pass-through tubes and a gaseous mitigation agent may be configured to flow into the internal cavity via the cavity inlet and out of the internal cavity via the plurality of cavity outlets to mix with reaction gas.Type: ApplicationFiled: October 10, 2019Publication date: February 6, 2020Applicant: GOODRICH CORPORATIONInventors: Ying She, Naveen G. Menon, Zissis A. Dardas, Thomas P. Filburn, Xiaodan Cai
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Patent number: 10480065Abstract: A gas distribution plate for a chemical vapor deposition/infiltration system includes a body having a first side and a second side opposite the first side. The body may be hollow and may define an internal cavity. The gas distribution plate may also include a plurality of pass-through tubes extending through the internal cavity, a cavity inlet, and a plurality of cavity outlets. A reaction gas may be configured to flow through the plurality of pass-through tubes and a gaseous mitigation agent may be configured to flow into the internal cavity via the cavity inlet and out of the internal cavity via the plurality of cavity outlets to mix with reaction gas.Type: GrantFiled: September 19, 2017Date of Patent: November 19, 2019Assignee: GOODRICH CORPORATIONInventors: Ying She, Naveen G. Menon, Zissis A. Dardas, Thomas P. Filburn, Xiaodan Cai
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Publication number: 20190085446Abstract: A gas distribution plate for a chemical vapor deposition/infiltration system includes a body having a first side and a second side opposite the first side. The body may be hollow and may define an internal cavity. The gas distribution plate may also include a plurality of pass-through tubes extending through the internal cavity, a cavity inlet, and a plurality of cavity outlets. A reaction gas may be configured to flow through the plurality of pass-through tubes and a gaseous mitigation agent may be configured to flow into the internal cavity via the cavity inlet and out of the internal cavity via the plurality of cavity outlets to mix with reaction gas.Type: ApplicationFiled: September 19, 2017Publication date: March 21, 2019Applicant: GOODRICH CORPORATIONInventors: Ying She, Naveen G. Menon, Zissis A. Dardas, Thomas P. Filburn, Xiaodan Cai
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Publication number: 20190017704Abstract: A method of manufacturing a ceramic matrix composite component may include introducing a gaseous precursor into an inlet portion of a chamber that houses a porous preform and introducing a gaseous mitigation agent into an outlet portion of the chamber that is downstream of the inlet portion of the chamber. The gaseous precursor may include methyltrichlorosilane (MTS) and the gaseous mitigation agent may include hydrogen gas. The introduction of the gaseous precursor may result in densification of the porous preform(s) and the introduction of the gaseous mitigation agent may shift the reaction equilibrium to disfavor the formation of harmful and/or pyrophoric byproduct deposits, which can accumulate in an exhaust conduit 340 of the system.Type: ApplicationFiled: July 14, 2017Publication date: January 17, 2019Applicant: GOODRICH CORPORATIONInventors: YING SHE, NAVEEN G. MENON, ZISSIS A. DARDAS, THOMAS P. FILBURN