Abstract: Disclosed are methods for coating a metal substrate with a yttrium-containing coating, including ferrous substrates, such as cold rolled steel and electrogalvanized steel. Also disclosed are coated substrates produced thereby.

Abstract: Disclosed are methods for coating a metal substrate with a yttrium-containing coating, including ferrous substrates, such as cold rolled steel and electrogalvanized steel. Also disclosed are coated substrates produced thereby.

Abstract: The present invention provides electrodepositable compositions that in the absence of a microorganism control agent electrodeposit upon a surface of an electroconductive substrate as a substantially smooth film and which upon the addition of a microorganism control agent mixture of 5-chloro-2-methyl-4-isothiazolin-3-one and 2-methyl-4-isothiazolin-3-one result in an electrodepositable composition that upon electrodeposition onto the surface of the electroconductive substrate produces a comparatively rougher film, wherein all or a portion of the mixture of 5-chloro-2-methyl-4-isothiazolin-3-one and 2-methyl-4-isothiazolin-3-one is replaced with an aliphatic hydrocarbon material selected from halonitroalkanes, halonitroalkenes, hydroxyalkyl substituted nitroalkanes and mixtures thereof resulting in an electrodepositable compositions that upon electrodeposition onto the surface of the electroconductive substrate produce a substantially smooth film.

Abstract: Disclosed is an improved electrodeposition bath composition which is comprised of a resinous phase dispersed in an aqueous medium, the resinous phase comprising an active hydrogen group-containing cationic electrodepositable resin and a curing agent having functional groups reactive with the active hydrogen groups of the resin. The improvement comprises the inclusion in the electrodeposition bath composition of an organic phosphorous-based compound of specific structures. The electrodeposition bath compositions provide excellent corrosion resistance to electrocoated substrates, particularly untreated steel, and reduced corrosivity of the acidic cationic electrodeposition bath to steel equipment and pipes. Also disclosed is a method of electrocoating a conductive substrate using the improved electrodeposition bath compositions of the invention. Metallic substrates coated by this method are also disclosed.

Abstract: The present invention is a positive acting photoresist composition which includes a positive acting photoactive component and a dimethyl aniline component. The positive acting photoactive component includes at least one positive acting photoactive polymeric compound. The photoactive polymeric compound contains groups having the 2,6-dinitro structure ##STR1## or a 2,5-dinitro structure ##STR2## where X and Y may be the same or different member selected from the group consisting of: halogen, --OR, --O--SO.sub.2 R, --SR, --NRR', --OC.dbd.ONHR, --OC.dbd.OOR, --OSiRR'O and --OC.dbd.OR; and where R and R' may be hydrogen or any of a wide variety of organic substituents, including substituted or unsubstituted alkyl, aryl, substitutents. The photoactive component may also include a photoactive monomeric compound which contains groups having the 2,6-dinitro structure (1) and/or the 2,5-dinitro structure (2) set out above. The dimethyl aniline component includes a N,N-dimethyl aniline compound.

Abstract: Disclosed are improved electrodeposition bath compositions comprising a resinous phase dispersed in an aqueous medium, the resinous phase being comprised of an active hydrogen containing ionic electrodepositable resin and a curing agent, where the improvement comprises the addition to a lead-free electrodeposition bath of at least one calcium compound in an amount of about 10 to 10,000 parts per million of total calcium and not more than about 200 parts per million soluble calcium, based on electrodeposition bath weight. The electrodeposition bath compositions are preferably cationic and provide for excellent corrosion resistance over a variety of metal substrates including untreated steel. Also disclosed is a method of electrocoating a conductive substrate using the improved electrodeposition bath compositions of the invention. Metallic substrates which are coated using the method of the invention are also disclosed.

Abstract: Ethylenically unsaturated compounds are provided having the structure: ##STR1## wherein R.sub.1 is hydrogen or methyl, R.sub.2 is a divalent linking group having 2 to 20 carbon atoms such as alkylene groups, and R.sub.3 is hydrogen or lower alkyl having 1 to 4 carbon atoms, and when R.sub.3 is hydrogen and R.sub.2 has two carbon atoms R.sub.2 is methyl methylene.

Abstract: An electrodepositable composition is provided comprising (a) an active hydrogen-containing, cationic salt group-containing resin electrodepositable on a cathode; (b) a capped polyisocyanate curing agent; and (c) bismuth diorganodithiocarbamate. Such compositions may be prepared without the use of conventional lead or tin catalysts and exhibit excellent properties as cured coatings.Also provided is a method of electrocoating an electroconductive substrate using the composition of the present invention.

Abstract: Ethylenically unsaturated compounds are provided having Structure I and from which polymers with a plurality of groups of Structure II are derived. ##STR1## In Structures I and II, R.sub.1 is hydrogen or methyl, and R.sub.3 is hydrogen or lower alkyl having 1 to 4 carbon atoms, and when R.sub.3 is hydrogen and R.sub.2 has two carbon atoms R.sub.2 is methyl methylene. In Structure I, R.sub.2 and in Structure II R'.sub.2 is a divalent linking group having 2 to 20 carbon atoms. When R.sub.3 is hydrogen and R'.sub.2 has two carbon atoms, R'.sub.2 is methyl methylene. The compounds of Structure I may be used as monomers and reacted with other ethylenically unsaturated monomers via addition polymerization to arrive at the polymer with groups of Structure II.

Abstract: Photoreactive compounds are synthesized from 2,5- or 2,6-dinitrobenzyl groups. Also disclosed are methods of synthesizing reactive monomers containing 2,5- or 2,6-dinitrobenzyl groups.

Abstract: Photoreactive compounds are synthesized from 2,5- or 2,6-dintrobenzyl groups. Also disclosed are methods of synthesizing reactive monomers containing 2,5- or 2,6-dintrobenzyl groups.