Patents by Inventor Niels Johannes Maria BOSCH

Niels Johannes Maria BOSCH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240312756
    Abstract: Disclosed herein is a platform for a charged particle apparatus, the platform comprising: a base frame; a chamber arranged to comprise a substrate; a metrology frame arranged to support a charged particle beam generator for irradiating a substrate in the chamber with a charged particle beam; and a bellow arranged between the metrology frame and the chamber; wherein: the chamber is rigidly connected to the base frame; the bellow comprises a flexible material such that the metrology frame is substantially isolated from any vibrations that are generated in the chamber; and the bellow is air tight so that a substantial vacuum may be established in the chamber.
    Type: Application
    Filed: May 24, 2024
    Publication date: September 19, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Jasper Hendrik GRASMAN, Niels Johannes Maria BOSCH, Patrick Peter Hubert Helena PHILIPS, Peter Paul HEMPENIUS, Joan SANS MERCADER, Gerardus Wilhelmus SARS, Hans BUTLER, Willem Henk URBANUS
  • Publication number: 20240288389
    Abstract: The embodiments of the present disclosure provide a charged particle assessment system for projecting a beam of charged particles towards a sample. The system comprises a sample holder configured to hold a sample; a charged particle optical system configured to project a beam of charged particles from a charged particle source downbeam towards the sample and comprising a cleaning target; and a cleaning device. The cleaning device is configured to supply cleaning medium in a cleaning flow towards the cleaning target incident on the cleaning target so that the cleaning flow approaches the cleaning target from downbeam of the cleaning target, and to stimulate the cleaning medium at or near the cleaning target such that the cleaning medium cleans at least a portion of the surface of the cleaning target.
    Type: Application
    Filed: May 9, 2024
    Publication date: August 29, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marco Jan-Jaco WIELAND, Erwin SLOT, Peter Paul HEMPENIUS, Niels Johannes Maria BOSCH
  • Publication number: 20240071713
    Abstract: There is provided a charged particle apparatus comprising: a particle beam generator, optics, a first and a second positioning device, both configured for positioning the substrate relative to the particle beam generator along its optical axis, and a controller configured for switching between a first operational mode and a second operational mode. The apparatus is configured, when operating in the first operational mode, for irradiating the substrate by the particle beam at a first landing energy of the particle beam and, when operating in the second operational mode, for irradiating the substrate at a second, different landing energy. When operating in the first operational mode, the second positioning device is configured to position the substrate relative to the particle beam generator at a first focus position of the particle beam and in the second operational mode, to position the substrate at a second, different focus position.
    Type: Application
    Filed: December 9, 2021
    Publication date: February 29, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Niels Johannes Maria BOSCH, Xu WANG, Peter Paul HEMPENIUS, Yongqiang WANG, Hans BUTLER, Youjin WANG, Jasper Hendrik GRASMAN, Jianzi SUI, Tianming CHEN, Aimin WU
  • Patent number: 11621142
    Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.
    Type: Grant
    Filed: August 12, 2020
    Date of Patent: April 4, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Marcel Koenraad Marie Baggen, Peter Paul Hempenius, Maarten Frans Janus Kremers, Robertus Jacobus Theodorus Van Kempen, Sven Antoin Johan Hol, Henricus Martinus Johannes Van De Groes, Johannes Hubertus Antonius Van De Rijdt, Niels Johannes Maria Bosch, Maarten Hartger Kimman
  • Patent number: 11315752
    Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.
    Type: Grant
    Filed: December 10, 2020
    Date of Patent: April 26, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Paul Hempenius, Sven Antoin Johan Hol, Maarten Frans Janus Kremers, Henricus Martinus Johannes Van De Groes, Niels Johannes Maria Bosch, Marcel Koenraad Marie Baggen
  • Patent number: 11302512
    Abstract: An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.
    Type: Grant
    Filed: March 4, 2020
    Date of Patent: April 12, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Marcel Koenraad Marie Baggen, Antonius Henricus Arends, Lucas Kuindersma, Johannes Hubertus Antonius Van De Rijdt, Peter Paul Hempenius, Robertus Jacobus Theodorus Van Kempen, Niels Johannes Maria Bosch, Henricus Martinus Johannes Van De Groes, Kuo-Feng Tseng, Hans Butler, Michael Johannes Christiaan Ronde
  • Publication number: 20220084781
    Abstract: Systems directed to a stage apparatus in an electron beam inspection tool to inspect a sample are disclosed. The stage apparatus comprises a short stroke stage; a long stroke stage; a first sensor configured to measure a position of the short stroke stage with respect to a measurement reference; one or more roller bearings configured to support the long stroke stage; and a controller having circuitry and configured to control a motion of the long stroke stage and a motion of the short stroke stage for following movement of the reference at least partly based on measurement from the first sensor, wherein the controller is operable such that control of the long stroke stage is decoupled from the movement of the reference in at least a part of operation of the stage apparatus for reducing debris generation of the one or more roller bearings.
    Type: Application
    Filed: November 24, 2021
    Publication date: March 17, 2022
    Applicant: ASML Netherlands B.V.
    Inventors: Mark Henricus Wilhelmus VAN GERVEN, Johannes Hubertus Antonius VAN DE RIJDT, Michaël Johannes Christiaan RONDE, Niels Johannes Maria BOSCH
  • Publication number: 20210151282
    Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.
    Type: Application
    Filed: December 10, 2020
    Publication date: May 20, 2021
    Inventors: Peter Paul HEMPENIUS, Sven Antoin, Johan HOL, Maarten Frans, Janus KREMERS, Henricus Martinus, Johannes VAN DE GROES, Niels Johannes, Maria BOSCH, Marcel Koenraad, Marie BAGGEN
  • Patent number: 10867770
    Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.
    Type: Grant
    Filed: May 2, 2019
    Date of Patent: December 15, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Peter Paul Hempenius, Sven Antoin Johan Hol, Maarten Frans Janus Kremers, Henricus Martinus Johannes Van De Groes, Niels Johannes Maria Bosch, Marcel Koenraad Marie Baggen
  • Publication number: 20200373118
    Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.
    Type: Application
    Filed: August 12, 2020
    Publication date: November 26, 2020
    Inventors: Marcel Koenraad Marie BAGGEN, Peter Paul HEMPENIUS, Maarten Frans Janus KREMERS, Robertus Jacobus Theodorus VAN KEMPEN, Sven Antoin Johan HOL, Henricus Martinus Johannes VAN DE GROES, Johannes Hubertus Antonius VAN DE RIJDT, Niels Johannes Maria BOSCH, Maarten Hartger KIMMAN
  • Publication number: 20200303158
    Abstract: The invention relates to a particle beam apparatus comprising: a particle beam source configured to generate a particle beam; a magnetic coil configured to emit a magnetic field to manipulate the particle beam; an object table configured to hold a substrate; a positioning device comprising ferromagnetic material, the positioning device further comprising at least one motor configured to position the object table with respect to the particle beam; and a controller configured to provide a control signal to the at least one motor to at least partly compensate for a magnetic force induced by the magnetic field acting on the positioning device.
    Type: Application
    Filed: May 8, 2020
    Publication date: September 24, 2020
    Inventors: Niels Johannes Maria Bosch, Peter Paul Hempenius, Sven Antoin Johan HOL, Marcel Koenrood Marie Baggen
  • Publication number: 20200203118
    Abstract: An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.
    Type: Application
    Filed: March 4, 2020
    Publication date: June 25, 2020
    Inventors: Marcel Koenraad Marie BAGGEN, Antonius Henricus ARENDS, Lucas KUINDERSMA, Johannes Hubertus, Antonius VAN DE RIJDT, Peter Paul HEMPENIUS, Robertus Jacobus, Theodorus VAN KEMPEN, Niels Johannes, Maria BOSCH, Henricus Martinus, Johannes VAN DE GROES, Kuo-Feng TSENG, Hans BUTLER, Michael Johannes, Christiaan RONDE
  • Patent number: 10649347
    Abstract: An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.
    Type: Grant
    Filed: December 13, 2018
    Date of Patent: May 12, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Michael Johannes Christiaan Ronde, Lucas Kuindersma, Niels Johannes Maria Bosch, Hans Butler, Cornelius Adrianus Lambertus De Hoon, Marc Wilhelmus Maria Van Der Wijst, Thijs Verhees, Sander Kerssemakers
  • Publication number: 20190341224
    Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.
    Type: Application
    Filed: May 2, 2019
    Publication date: November 7, 2019
    Inventors: Peter Paul HEMPENIUS, Sven Antoin, Johan HOL, Maarten Frans, Janus KREMERS, Henricus Martinus, Johannes VAN DE GROES, Niels Johannes, Maria BOSCH, Marcel Koenraad, Marie BAGGEN
  • Patent number: 9494869
    Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
    Type: Grant
    Filed: December 5, 2012
    Date of Patent: November 15, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Hans Butler, Arno Jan Bleeker, Pieter Renaat Maria Hennus, Martinus Hendricus Henricus Hoeks, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee, Ruud Antonius Catharina Maria Beerens, Olof Martinus Josephus Fischer, Wilhelmus Henricus Theodorus Maria Aangenent, Niels Johannes Maria Bosch
  • Publication number: 20140340666
    Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.
    Type: Application
    Filed: December 5, 2012
    Publication date: November 20, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Hans Butler, Arno Jan Bleeker, Pieter Renaat Marie Hennus, Martinus Hendricus Henricus Hoeks, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee, Ruud Antonius Catharina Maria Beerens, Olof Martinus Josephus Fischer, Wilhelmus Henricus Theodorus Maria Aangenent, Niels Johannes Maria Bosch
  • Patent number: 8891063
    Abstract: A lithographic apparatus comprises an object table for receiving an object, an actuator for moving the object table and a handler for transferring the object to or from the object table. The apparatus is provided with a controller operable connected with the actuator and/or the handler. The controller is programmed and/or arranged to drive the actuator and the handler so as to provide that the object table and the handler substantially follow each other in a direction perpendicular to a transfer direction during transfer in the transfer direction of the object to or from the object table.
    Type: Grant
    Filed: December 22, 2011
    Date of Patent: November 18, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Marcus Joseph Elisabeth Godfried Breukers, Marcel François Heertjes, Niels Johannes Maria Bosch
  • Publication number: 20120188528
    Abstract: A lithographic apparatus comprises an object table for receiving an object, an actuator for moving the object table and a handler for transferring the object to or from the object table. The apparatus is provided with a controller operable connected with the actuator and/or the handler. The controller is programmed and/or arranged to drive the actuator and the handler so as to provide that the object table and the handler substantially follow each other in a direction perpendicular to a transfer direction during transfer in the transfer direction of the object to or from the object table.
    Type: Application
    Filed: December 22, 2011
    Publication date: July 26, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Marcus Joseph Elisabeth Godfried BREUKERS, Marcel François HEERTJES, Niels Johannes Maria BOSCH