Patents by Inventor Noboru Shimizu

Noboru Shimizu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4769093
    Abstract: A magnetoresistive device includes a magnetoresistive film made of permalloy alloy. This thin film is formed on a substrate by sputtering or vapor deposition method. Thereafter, the thin film is heated to a temperature between 200.degree. C. and 350.degree. C. by flowing an electric current therethrough or irradiating the thin film with an electron or laser beam. It is desirable that the heat treatment is effected in an alternating magnetic field. The permalloy alloy may contain at least one element including Rh, Ru, Mo, Cr and V.
    Type: Grant
    Filed: June 24, 1987
    Date of Patent: September 6, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Masahiro Kitada, Hideo Tanabe, Noboru Shimizu
  • Patent number: 4737506
    Abstract: This invention relates to a 1,4-dihydropyridine-3,5-dicarboxylate derivative represented by the following general formula (I): ##STR1## wherein R means an imidazolyl or pyridyl group, R.sub.1 denotes a hydrogen or halogen atom or a nitro or trifluoromethyl group, R.sub.2 is a lower alkyl group, X is CH or N, A means a lower alkylene group, ##STR2## B being a lower alkylene or O-lower alkylene group, ##STR3## R.sub.4 being a hydrogen atom or lower alkyl group, or ##STR4## m denotes a number of 1-3, and n stands for 1 or 2. The derivative has vasodilative effects, hyperkinemic effects, platelet aggregation inhibitory effects, thromboxane A.sub.2 formation inhibitory effects and so on, and are hence useful as a pharmaceutical product such as vasodilator, antihypertensive, antithrombotic agent, antiarteriosclerotic agent or the like.
    Type: Grant
    Filed: April 7, 1986
    Date of Patent: April 12, 1988
    Assignee: Kowa Co., Ltd.
    Inventors: Noboru Shimizu, Hiroyuki Ishiwata, Tomio Ohta, Hiroshi Ishihama, Yasumi Uchida
  • Patent number: 4663607
    Abstract: A magnetroresistive element formed by laminating a plurality of metallic magnetoresistance effect films having magnetostriction of different signs on a substrate. The magnetoresistive element can be formed to exhibit zero magnetostriction or to exhibit magnetostriction of any desired value. Further, the magnetoresistive element exhibits magnetostriction that changes little with the change in the film composition. The metallic magnetoresistance effect films preferably have positive and negative magnetostriction with an absolute value not greater than 15.times.10.sup.-6.
    Type: Grant
    Filed: May 28, 1985
    Date of Patent: May 5, 1987
    Assignee: Hitachi, Ltd.
    Inventors: Masahiro Kitada, Hideo Tanabe, Noboru Shimizu, Hiroshi Tsuchiya, Masao Katsumata
  • Patent number: 4596646
    Abstract: A thin-film permanent magnet which is made of a Co - Pt alloy containing 5-35 atomic-% of Pt. This thin-film permanent magnet can be readily produced by a sputtering method in which the ultimate pressure before the introduction of a sputtering gas is made 5.times.10.sup.-7 -1.times.10.sup.-4 Torr. Without any heat treatment, it has a coercivity of 2,000 Oe at the maximum and a remanence of about 8,000-about 18,000 G.
    Type: Grant
    Filed: February 23, 1983
    Date of Patent: June 24, 1986
    Assignee: Hitachi, Ltd.
    Inventors: Masahiro Kitada, Hiroshi Yamamoto, Masahide Suenaga, Noboru Shimizu
  • Patent number: 4544591
    Abstract: In a perpendicular magnetic recording medium comprising a high permeability film and a perpendicular magnetization film which are laminated on a non-magnetic substrate, a perpendicular magnetic recording medium is provided wherein a permanent magnet film is further sandwiched between the non-magnetic substrate and the high permeability film, thereby eliminating a spike noise.
    Type: Grant
    Filed: September 30, 1983
    Date of Patent: October 1, 1985
    Assignees: Hitachi, Ltd, Hitachi Maxell, Ltd.
    Inventors: Yasutaro Uesaka, Sadao Hishiyama, Masahiro Kitada, Noboru Shimizu, Hideo Tanabe, Hideo Fujiwara
  • Patent number: 4482562
    Abstract: A compound represented by the following formula ##STR1## wherein A represents a direct bond or the bond --O--CH.sub.2 --,B represents a C.sub.1 -C.sub.11 alkylene group bonded to a carbon atom of the aromatic ring D either directly or through --O--, --S--, --SO-- or --NH--,W represents a carbon or nitrogen atom,R.sub.1 represents a C.sub.3 -C.sub.7 alkyl group, a hydroxy-C.sub.1 -C.sub.6 alkyl group, or a phenyl- or diphenyl-alkyl group with the alkyl group having 1 to 4 carbon atoms,R.sub.2 represents a member selected from the group consisting of hydrogen, halogen, OH, C.sub.1 -C.sub.4 alkyl, NO.sub.2, C.sub.1 -C.sub.4 alkoxy, acetyl, allyloxy, carbamoyl and sulfamoyl, and when two or more R.sub.2 groups exist, they may be identical or different, andn represents 1, 2 or 3 and m represents 1 or 2, provided that n+m.gtoreq.4;and an acid addition salt thereof; a process for producing the same; and a pharmaceutical composition comprising aforesaid compound.
    Type: Grant
    Filed: September 3, 1982
    Date of Patent: November 13, 1984
    Assignee: Kowa Company, Ltd.
    Inventors: Masami Shiratsuchi, Noboru Shimizu, Hiromichi Shigyo, Yoshinori Kyotani, Hisashi Kunieda, Kiyoshi Kawamura, Seiichi Sato, Toshihiro Akashi, Masahiko Nagakura, Naotoshi Sawada, Yasumi Uchida
  • Patent number: 4462881
    Abstract: A method of forming a multilayer thin film is disclosed in which a second thin conductive film is deposited on a first thin conductive film uninterruptedly after the first thin film has been deposited on a substrate, the first and second films thus formed are processed so as to form a predetermined pattern, the surface of the second thin film is cleaned by ion etching and a third thin conductive film is deposited on the whole surface of the substrate, and then the second and third thin films are processed so as to have a pattern different from the above-mentioned predetermined pattern. In the case where two thin conductive films different in material and pattern from each other are piled on a substrate, the above method can form a perfect interconnection between the two films and can make very small the contact resistance between the two films. Accordingly, the method is fit to form, for example, a barber pole type magnetoresistive element.
    Type: Grant
    Filed: November 18, 1981
    Date of Patent: July 31, 1984
    Assignee: Hitachi, Ltd.
    Inventors: Hiroshi Yamamoto, Noboru Shimizu, Masahide Suenaga, Yukihisa Tsukada, Tooru Takeura
  • Patent number: 4411757
    Abstract: Electrodes for a magnetoresistive sensor can be formed easily by a method wherein a double-layer structure of Mo and Al on a film of a magnetoresistive material such as permalloy is formed to have a predetermined pattern, firstly by exposing an Al layer to a chemical etching solution or subjecting the Al layer to the ion-milling treatment to give said Al layer said pattern and then subjecting a Mo layer to the plasma etching or reactive sputter etching treatment to give said Mo layer said pattern.
    Type: Grant
    Filed: June 8, 1982
    Date of Patent: October 25, 1983
    Assignee: Hitachi, Ltd.
    Inventors: Masahiro Kitada, Masahide Suenaga, Yukihisa Tsukada, Noboru Shimizu, Hiroshi Yamamoto
  • Patent number: 4394382
    Abstract: A benzopyran compound represented by the following ##STR1## wherein A represents a direct bond or the bond --CH.sub.2 --O--,R.sub.1 represents a member selected from the group consisting of a C.sub.3 -C.sub.5 alkyl group, a hydroxy-(C.sub.3 -C.sub.5 alkyl) group, a lower alkylamino-lower alkyl group, a nitrato-(C.sub.3 -C.sub.5 alkyl) group and a phenyl-(C.sub.1 -C.sub.5) alkyl group, provided that the phenyl may be substituted by a lower alkoxy group, R.sub.2 represents a member selected from the group consisting of hydrogen, halogen, OH, NO.sub.2, a carbamoyl group, a lower alkyl group, a lower alkoxy group, a lower alkyleneoxy group and acetyl group,R.sub.3 represents hydrogen or NO.sub.2,B represents a direct bond, a C.sub.1 -C.sub.7 alkylene group, a --O-lower alkylene group or a --CONH-lower alkylene group, andn represents 1 or 2;and an acid addition salt thereof and a pharmaceutical composition comprising aforesaid compound.
    Type: Grant
    Filed: June 9, 1981
    Date of Patent: July 19, 1983
    Assignee: Kowa Company, Ltd.
    Inventors: Masami Shiratsuchi, Noboru Shimizu, Hiromichi Shigyo, Yoshinori Kyotani, Hisashi Kunieda, Kiyoshi Kawamura, Seiichi Sato, Toshihiro Akashi, Masahiko Nagakura, Naotoshi Sawada, Yasumi Uchida
  • Patent number: 4374840
    Abstract: A compound represented by the following formula ##STR1## wherein A represents a direct bond or the bond --0--CH.sub.2--,B represents a C.sub.1 -C.sub.11 alkylene group bonded to a carbon atom of the aromatic ring D either directly or through --O--, --S--, --SO-- or --NH--,W represents a carbon or nitrogen atom,R.sub.1 represents a C.sub.3 -C.sub.7 alkyl group, a hydroxy-C.sub.1 -C.sub.6 alkyl group, or a phenyl- or diphenyl-alkyl group with the alkyl group having 1 to 4 carbon atoms,R.sub.2 represents a member selected from the group consisting of hydrogen, halogen, OH, C.sub.1 -C.sub.4 alkyl, NO.sub.2, C.sub.1 -C.sub.4 alkoxy, acetyl, allyloxy, carbamoyl and sulfamoyl, and when two or more R.sub.2 groups exist, they may be identical or different, andn represents 1, 2 or 3 and m represents 1 or 2, provided that n+m.gtoreq.4;and an acid addition salt thereof; a process for producing the same; and a pharmaceutical composition comprising aforesaid compound.
    Type: Grant
    Filed: February 11, 1981
    Date of Patent: February 22, 1983
    Assignee: Kowa Company, Ltd.
    Inventors: Masami Shiratsuchi, Noboru Shimizu, Hiromichi Shigyo, Yoshinori Kyotani, Hisashi Kunieda, Kiyoshi Kawamura, Seiichi Sato, Toshihiro Akashi, Masahiko Nagakura, Naotoshi Sawada, Yasumi Uchida
  • Patent number: 4365081
    Abstract: In a process for producing a 2-hydroxyalkyl acrylate or methacrylate which comprises esterifying acrylic or methacrylic acid with an alkylene oxide having 2 to 4 carbon atoms in the presence of an esterification catalyst and distilling the resulting reaction mixture in a distillation column, the improvement wherein the vapor of the ester monomer from the distillation column, while being maintained in the superheated state, is introduced into a condenser of the gas-liquid direct contact type whose inner wall corresponding to its gas inlet portion is kept at a temperature below the boiling point of the ester at the operating pressure, to contact it directly with a concurrently flowing spray liquid of the ester-precooled to a temperature below the boiling point of the ester at the operating pressure, whereby said vapor is condensed to a liquid at said temperature below the boiling point of the ester at the operating pressure.
    Type: Grant
    Filed: May 15, 1981
    Date of Patent: December 21, 1982
    Assignee: Nippon Shokubai Kagaku Kogyo Co. Ltd.
    Inventors: Noboru Shimizu, Hiroshi Yoshida, Hiromiki Daigo, Shiyouichi Matumoto, Hiroyoshi Uchino
  • Patent number: 4301353
    Abstract: A method for producing a magnetic head, comprising the step of irradiating peripheral parts other than a track portion and/or a slider portion with a laser beam so as to selectively remove surface parts of the irradiated parts, thereby to form the track portion and/or the slider portion. According to this method, the track portion and/or the slider portion of the magnetic head can be worked at high working rate, at high precision and with low working deformation, with the result that the magnetic head of excellent reproduced output and crosstalk characteristics can be readily manufactured.
    Type: Grant
    Filed: February 28, 1980
    Date of Patent: November 17, 1981
    Assignee: Hitachi, Ltd.
    Inventors: Masahide Suenaga, Noboru Shimizu, Mitsuhiro Kudo, Hiroshi Yamaguchi, Masao Mitani
  • Patent number: 4147885
    Abstract: A process for producing acrylic acid from propylene through acrolein as an intermediate by catalytic vapor phase oxidation, which comprises passing a starting reactant gas mixture containing propylene, a molecular oxygen-containing gas and steam through a first-stage reactor packed with a molybdenum-containing multi-component catalyst, passing the resulting acrolein-containing gas through a second-stage reactor packed with a multi-component catalyst containing vanadium and molybdenum, introducing the resulting acrylic acid-containing gas to an acrylic acid collector thereby to recover acrylic acid in the form of an aqueous solution, and incorporating a part of the exhaust gas from the collector in the starting reactant gas mixture.
    Type: Grant
    Filed: March 7, 1977
    Date of Patent: April 3, 1979
    Assignee: Nippon Shokubai Kagaku Kogyo Co. Ltd.
    Inventors: Noboru Shimizu, Isao Yanagisawa, Masahiro Takata, Takahisa Sato
  • Patent number: 4115398
    Abstract: Isoindoline derivatives of the formula ##STR1## and the pharmaceutically acceptable acid addition salts thereof, wherein R represents a moiety selected from the group consisting of hydrogen, halogen, lower alkyl, lower alkoxy, nitro, hydroxy and hydroxy lower alkyl, and n is a positive number from 1 to 3, which R's may be the same or different when n is 2 or 3, and when n is 2, the two R's may be joined to the carbon atom vicinal to the phenyl ring to which the two R's are joined and may taken together form lower alkylenedioxy and the group ##STR2## and R.sub.1 is a member of the group consisting of hydrogen and lower alkyl.The compounds of this invention can be readily prepared by reacting a compound of the formula ##STR3## wherein R represents, in addition to the above defined, alkoxycarbonyloxy; R.sub.1 and n are as defined above; and X is halogen or the groups --O--SO.sub.2 --Y where Y is either lower alkyl or aryl, with isoindoline of the formula ##STR4## or a minemal acid salt thereof.
    Type: Grant
    Filed: January 5, 1977
    Date of Patent: September 19, 1978
    Assignee: Kowa Company Ltd.
    Inventors: Koji Nakamura, Haruo Otaki, Yutaka Yamamoto, Noboru Shimizu, Kiyoshi Kawamura, Seiichi Sato
  • Patent number: 4021310
    Abstract: A method for inhibiting the polymerization of acrylic acid or acrylic esters during the distillation for separating or purifying the acrylic acid obtained by the vapor phase catalytic oxidation of propylene or acrolein, or the acrylic esters derived from said acrylic acid, said method comprising carrying out the distillation operation in the presence of (A) at least one compound selected from the group consisting of hydroquinone, hydroquinonemonomethyl ether, cresols, phenols, t-butyl catechol, diphenylamine, phenothiazines and methylene blue (B) at least one compound selected from the group consisting of copper dimethyldithiocarbamate, copper diethyldithiocarbamate copper dibutyldithiocarbamate and copper salicylate: and (C) molecular oxygen.
    Type: Grant
    Filed: April 18, 1975
    Date of Patent: May 3, 1977
    Assignee: Nippon Shokubai Kagaku Kogyo Co., Ltd.
    Inventors: Noboru Shimizu, Sadao Yoshida, Kunihiro Kubota, Takashi Ohara
  • Patent number: 3988213
    Abstract: A method of distilling a polymerizable vinyl compound selected from the group consisting of acrolein, methacrolein, acrylic acid, methacrylec acid, hydroxyethyl acrylate, hydroxyethyl methacrylate, hydroxypropyl acrylate, hydroxypropyl methacrylate, glycidyl acrylate and glycidyl methacrylate, the method comprising distilling the polymerizable vinyl compound in the presence of a polymerization inhibitor using a distillation tower having perforated trays without downcomers and wherein the temperature of the inner wall of the tower is maintained at a temperature sufficient to prevent the condensation of the vapor being distilled, whereby the polymerizable vinyl compound is distilled without the formation of polymer.
    Type: Grant
    Filed: October 1, 1974
    Date of Patent: October 26, 1976
    Assignee: Nippon Shokubai Kagaku Kogyo Co., Ltd.
    Inventors: Sadao Yoshida, Kunihiro Kubota, Daizo Kobayashi, Noboru Shimizu, Takashi Ohara