Patents by Inventor Nobuaki Sasaki
Nobuaki Sasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240107413Abstract: A connection destination switching control method executed by a communication apparatus, the connection destination switching control method comprising: a data acquisition step of acquiring observed values of received power of signals transmitted from a base station; a prediction processing step of predicting future received power by using the observed values acquired in the data acquisition step as input data into a prediction model; and a connection destination switching processing step of executing control for handover based on the future received power predicted in the prediction processing step.Type: ApplicationFiled: January 13, 2021Publication date: March 28, 2024Inventors: Motoharu SASAKI, Nobuaki KUNO, Toshiro NAKAHIRA, Minoru INOMATA, Wataru YAMADA, Takatsune MORIYAMA
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Patent number: 11724423Abstract: Provided is a mold release film capable of transferring a concave-convex structure to the surface of an adhesive film.Type: GrantFiled: April 11, 2022Date of Patent: August 15, 2023Assignee: Mitsubishi Chemical CorporationInventors: Nobuaki Sasaki, Yoshihide Sato
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Patent number: 11673295Abstract: Provided is a mold release film capable of transferring a concave-convex structure to the surface of an adhesive film.Type: GrantFiled: May 26, 2020Date of Patent: June 13, 2023Assignee: Mitsubishi Chemical CorporationInventors: Nobuaki Sasaki, Yoshihide Sato
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Publication number: 20220242012Abstract: Provided is a mold release film capable of transferring a concave-convex structure to the surface of an adhesive film.Type: ApplicationFiled: April 11, 2022Publication date: August 4, 2022Applicant: Mitsubishi Chemical CorporationInventors: Nobuaki Sasaki, Yoshihide Sato
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Publication number: 20200282605Abstract: Provided is a mold release film capable of transferring a concave-convex structure to the surface of an adhesive film.Type: ApplicationFiled: May 26, 2020Publication date: September 10, 2020Applicant: Mitsubishi Chemical CorporationInventors: Nobuaki Sasaki, Yoshihide Sato
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Publication number: 20180024749Abstract: An information processing apparatus includes: a first calculator and a second calculator being coupled to each other via a bus, and each making a memory access, designating a logical address; a first memory being coupled to the first calculator; and a second memory being coupled to the second calculator and being accessed from the first calculator via the bus, wherein the first memory determines, based on a time from issue of a request for the memory access to response to the request, whether a memory having a physical address associated with the logical address is the first memory or the second memory. With this configuration, it is possible to specify whether a memory being accessed using a logical address is a local memory or a remote memory.Type: ApplicationFiled: June 2, 2017Publication date: January 25, 2018Applicant: FUJITSU LIMITEDInventors: Hirokazu OHTA, NOBUAKI SASAKI, Kazunari YONEYA
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Publication number: 20150180964Abstract: An information processing apparatus includes a transmission unit, a reception unit and a processor. The transmission unit transmits a packet. The reception unit receives a packet. The processor measures a load ratio, which is a usage rate of a band between the transmission unit and the reception unit, when the transmission unit is transmitting the packet to the reception unit. Then, the processor sequentially adjusts a plurality of parameters whose changes insetting lead to changes in the load ratio, in descending order of influence on an increase/decrease in the load ratio in such a manner that the measured load ratio becomes closer to a determined load ratio.Type: ApplicationFiled: March 4, 2015Publication date: June 25, 2015Applicant: FUJITSU LIMITEDInventor: Nobuaki SASAKI
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Patent number: 7709660Abstract: The invention provides novel compounds useful as intermediates for the production of polymethine compounds containing a desired counter ion with high purity and in high yields. Thus provided are polymethine ether compounds of the general formula (I) given below and a method of producing polymethine compounds which comprises bringing those compounds into contact with an acid. In the above formula, R represents an alkyl group, an alkoxyalkyl group or an aryl group which may optionally be substituted, R1 and R2 each independently represents a hydrogen atom, halogen atom, nitro group, alkyl group, alkoxyalkyl group, alkoxy group or alkoxyalkoxy group and R1 and R2 may be bound to each other to form a ring; R3 represents an alkyl group, which may optionally be substituted; L is an alkylene group required for the formation of a ring structure; and X represents a hydrogen atom, halogen atom, alkoxy group, aryloxy group, alkylthio group, arylthio group or substituted amino group.Type: GrantFiled: June 20, 2008Date of Patent: May 4, 2010Assignee: Yamamoto Chemicals, Inc.Inventors: Nobuaki Sasaki, Keiki Chichiishi, Sayuri Wada, Shigeo Fujita
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Publication number: 20090012310Abstract: The invention provides novel compounds useful as intermediates for the production of polymethine compounds containing a desired counter ion with high purity and in high yields. Thus provided are polymethine ether compounds of the general formula (I) given below and a method of producing polymethine compounds which comprises bringing those compounds into contact with an acid. In the above formula, R represents an alkyl group, an alkoxyalkyl group or an aryl group which may optionally be substituted, R1 and R2 each independently represents a hydrogen atom, halogen atom, nitro group, alkyl group, alkoxyalkyl group, alkoxy group or alkoxyalkoxy group and R1 and R2 may be bound to each other to form a ring; R3 represents an alkyl group, which may optionally be substituted; L is an alkylene group required for the formation of a ring structure; and X represents a hydrogen atom, halogen atom, alkoxy group, aryloxy group, alkylthio group, arylthio group or substituted amino group.Type: ApplicationFiled: June 20, 2008Publication date: January 8, 2009Inventors: Nobuaki Sasaki, Keiki Chichiishi, Sayuri Wada, Shigeo Fujita
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Patent number: 7446212Abstract: The invention provides novel compounds useful as intermediates for the production of polymethine compounds containing a desired counter ion with high purity and in high yields. Thus provided are polymethine ether compounds of the general formula (I) given below and a method of producing polymethine compounds which comprises bringing those compounds into contact with an acid. In the above formula, R represents an alkyl group, an alkoxyalkyl group or an aryl group which may optionally be substituted, R1 and R2 each independently represents a hydrogen atom, halogen atom, nitro group, alkyl group, alkoxyalkyl group, alkoxy group or alkoxyalkoxy group and R1 and R2 may be bound to each other to form a ring; R3 represents an alkyl group, which may optionally be substituted; L is an alkylene group required for the formation of a ring structure; and X represents a hydrogen atom, halogen atom, alkoxy group, aryloxy group, alkylthio group, arylthio group or substituted amino group.Type: GrantFiled: June 16, 2004Date of Patent: November 4, 2008Assignee: Yamamoto Chemicals, Inc.Inventors: Nobuaki Sasaki, Keiki Chichiishi, Sayuri Wada, Shigeo Fujita
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Publication number: 20060167272Abstract: The invention provides novel compounds useful as intermediates for the production of polymethine compounds containing a desired counter ion with high purity and in high yields. Thus provided are polymethine ether compounds of the general formula (I) given below and a method of producing polymethine compounds which comprises bringing those compounds into contact with an acid. In the above formula, R represents an alkyl group, an alkoxyalkyl group or an aryl group which may optionally be substituted, R1 and R2 each independently represents a hydrogen atom, halogen atom, nitro group, alkyl group, alkoxyalkyl group, alkoxy group or alkoxyalkoxy group and R1 and R2 may be bound to each other to form a ring; R3 represents an alkyl group, which may optionally be substituted; L is an alkylene group required for the formation of a ring structure; and X represents a hydrogen atom, halogen atom, alkoxy group, aryloxy group, alkylthio group, arylthio group or substituted amino group.Type: ApplicationFiled: June 16, 2004Publication date: July 27, 2006Inventors: Nobuaki Sasaki, Keiki Chichiishi, Sayuri Wada, Shigeo Fujita
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Patent number: 6716993Abstract: The invention provides novel compounds which show high sensitivity to near-infrared rays in the region of 750-950 nm and, when processed to give films and so forth, undergo only slight discoloration and retain high transparency, hence can be used as near-infrared absorbing materials, together with an intermediate thereof. Thus provided are polymethine compounds of the general formula (I): wherein R1 and R2 each independently represents a hydrogen atom, an alkyl group or an alkoxy group, R3 represents an alkyl group, which may optionally be substituted, L represents an alkylene group necessary for the formation of a cyclic structure, X represents a hydrogen atom, a halogen atom or a substituted amino group, and Z represents an acidic residue, as well as near-infrared absorbing materials comprising the same.Type: GrantFiled: June 4, 2003Date of Patent: April 6, 2004Assignee: Yamamoto Chemicals, Inc.Inventors: Nobuaki Sasaki, Keiki Chichiishi, Shigeo Fujita, Yasuhisa Iwasaki
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Publication number: 20030232999Abstract: The invention provides novel compounds which show high sensitivity to near-infrared rays in the region of 750-950 nm and, when processed to give films and so forth, undergo only slight discoloration and retain high transparency, hence can be used as near-infrared absorbing materials, together with an intermediate thereof.Type: ApplicationFiled: June 4, 2003Publication date: December 18, 2003Inventors: Nobuaki Sasaki, Keiki Chichiishi, Shigeo Fujita, Yasuhisa Iwasaki
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Publication number: 20020051939Abstract: The invention provides a near-infrared absorbing material showing a high sensitivity to a YAG laser having an emission wavelength of 900˜1100 nm as well as a high photothermal conversion efficiency, an original plate for direct printing plate making which utilizes the near-infrared absorbing material, and a novel polymethine compound represented by the following general formula (1), of which the above near-infrared absorbing material is comprised.Type: ApplicationFiled: September 11, 2001Publication date: May 2, 2002Inventors: Nobuaki Sasaki, Sayuri Wada, Shigeo Fujita, Yasuhisa Iwasaki
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Patent number: 6342335Abstract: The invention provides near infrared absorbing materials showing high light-to-heat conversion efficiency and high sensitivity to lasers whose emission bands are within the range of 750 nm to 900 nm, original plates for direct printing plate making, and novel compounds which can be applied to such absorbing materials and plates. The compounds are polymethine compounds of the general formula (I) A detailed description of general formula (I) may be found in the specification. wherein R1 represents an alkoxy group which may be substituted; R2 represents an alkyl group which may be substituted; R3 and R4 each represents a lower alkyl group or R3 and R4 taken together represent a ring; X represents a hydrogen atom, a halogen atom or a substituted amino group; Y represents an alkoxy group which may be substituted or an alkyl group which may be substituted; Z represents a charge neutralizing ion.Type: GrantFiled: June 20, 2000Date of Patent: January 29, 2002Assignee: Yamamoto Chemicals, Inc.Inventors: Shigeo Fujita, Nobuaki Sasaki, Keiki Chichiishi, Yasuhisa Iwasaki
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Patent number: 6261737Abstract: The invention provides near infrared absorbers showing high light-to-heat conversion efficiency and high sensitivity to laser beams whose emission region is within the range of 750 nm to 900 nm, plates for direct printing plate making, and novel compounds which can be used in such absorbers or plates. The compounds are polymethine compounds of the general formula (I) shown below and the near infrared absorbers comprise the polymethine compounds.Type: GrantFiled: November 23, 1999Date of Patent: July 17, 2001Assignee: Yamamoto Chemicals, Inc.Inventors: Shigeo Fujita, Nobuaki Sasaki, Yasuhisa Iwasaki
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Patent number: 5990353Abstract: The arylsulfonylureide compound which is of value as a color developer is provided in high yield and high purity by a simple procedure. The technology of the invention for producing an arylsulfonylureide compound of general formula (1)(Ar.sup.1 --SO.sub.2 NHCONH).sub.n --Ar.sup.2 (1)wherein Ar.sup.1 represents an aromatic residue; Ar.sup.2 represents a bivalent or trivalent aromatic residue; n represents an integer of 2 or 3 comprises reacting an arylsulfonamide alkali metal salt of general formula (2)Ar.sup.1 --SO.sub.2 NH.B (2)wherein B represents an alkali metal with an aromatic isocyanate compound of general formula (3)Ar.sup.2 --(NCO).sub.Type: GrantFiled: May 19, 1998Date of Patent: November 23, 1999Assignee: Yamamoto Chemicals, Inc.Inventors: Nobuaki Sasaki, Bunji Sawano, Mansuke Matsumoto, Toshihiko Kawabata
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Patent number: 5710335Abstract: A process for preparing a 3-(N,N-disubstituted amino)phenol is herein disclosed which comprises reacting resorcin with a primary amine represented by formula (2):R.sup.1 NH.sub.2 (2)wherein R.sup.1 is an alkyl group, a cycloalkyl group, an alkenyl group, an alkoxyalkyl group, an aryl group or an aralkyl group,terminating the reaction when the conversion of resorcin is 50 mol % or more and when the amount of an N,N'-disubstituted-m-phenylenediamine as a by-product is 2 mol % or less of the amount of used resorcin, adding an alkyl halide represented by formula (3):R.sup.2 X (3)wherein R.sup.2 is an alkyl group or a cycloalkyl group; and X is a halogen atom,to the obtained reaction mixture, adding an aqueous alkaline solution to the resultant reaction mixture to dissolve unreacted resorcin in the aqueous phase, extracting the 3-(N,N-disubstituted amino)phenol with an organic solvent, and then recovering unreacted resorcin from the aqueous phase.Type: GrantFiled: October 4, 1996Date of Patent: January 20, 1998Assignees: Mitsui Toatsu Chemicals, Inc., Yamamoto Chemicals, Inc.Inventors: Kenichiro Horiuchi, Bunji Sawano, Nobuaki Sasaki, Mansuke Matsumoto
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Patent number: 5691272Abstract: A heat-sensitive recording material which has a support and a heat-sensitive recording layer containing at least one carboxylate represented by the following formula (1) or (2) ##STR1## wherein a ring X is an aromatic residue which may have a substitute; the other substituents are as defined herein. The heat-sensitive recording material exhibits excellent color image stability and can provide an optically character-readable sharp image.Type: GrantFiled: August 14, 1996Date of Patent: November 25, 1997Assignees: Mitsui Toatsu Chemicals, Inc., Yamamoto Chemicals, Inc.Inventors: Mansuke Matsumoto, Nobuaki Sasaki, Bunji Sawano, Kiyoharu Hasegawa, Kazuyoshi Kikkawa
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Patent number: RE39105Abstract: The invention provides near infrared absorbing materials showing high light-to-heat conversion efficiency and high sensitivity to lasers whose emission bands are within the range of 750 nm to 900 nm, original plates for direct printing plate making, and novel compounds which can be applied to such absorbing materials and plates. The compounds are polymethine compounds of the general formula (I) A detailed description of general formula (I) may be found in the specification. wherein R1 represents an alkoxy group which may be substituted; R2 represents an alkyl group which may be substituted; R3 and R4 each represents a lower alkyl group or R3 and R4 taken together represent a ring; X represents a hydrogen atom, a halogen atom or a substituted amino group; Y represents an alkoxy group which may be substituted or an alkyl group which may be substituted; Z represents a charge neutralizing ion.Type: GrantFiled: January 23, 2004Date of Patent: May 23, 2006Assignee: Yamamoto Chemicals, Inc.Inventors: Shigeo Fujita, Nobuaki Sasaki, Keiki Chichiishi, Yasuhisa Iwasaki