Patents by Inventor Nobuaki Sasaki

Nobuaki Sasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240107413
    Abstract: A connection destination switching control method executed by a communication apparatus, the connection destination switching control method comprising: a data acquisition step of acquiring observed values of received power of signals transmitted from a base station; a prediction processing step of predicting future received power by using the observed values acquired in the data acquisition step as input data into a prediction model; and a connection destination switching processing step of executing control for handover based on the future received power predicted in the prediction processing step.
    Type: Application
    Filed: January 13, 2021
    Publication date: March 28, 2024
    Inventors: Motoharu SASAKI, Nobuaki KUNO, Toshiro NAKAHIRA, Minoru INOMATA, Wataru YAMADA, Takatsune MORIYAMA
  • Patent number: 11724423
    Abstract: Provided is a mold release film capable of transferring a concave-convex structure to the surface of an adhesive film.
    Type: Grant
    Filed: April 11, 2022
    Date of Patent: August 15, 2023
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Nobuaki Sasaki, Yoshihide Sato
  • Patent number: 11673295
    Abstract: Provided is a mold release film capable of transferring a concave-convex structure to the surface of an adhesive film.
    Type: Grant
    Filed: May 26, 2020
    Date of Patent: June 13, 2023
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Nobuaki Sasaki, Yoshihide Sato
  • Publication number: 20220242012
    Abstract: Provided is a mold release film capable of transferring a concave-convex structure to the surface of an adhesive film.
    Type: Application
    Filed: April 11, 2022
    Publication date: August 4, 2022
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Nobuaki Sasaki, Yoshihide Sato
  • Publication number: 20200282605
    Abstract: Provided is a mold release film capable of transferring a concave-convex structure to the surface of an adhesive film.
    Type: Application
    Filed: May 26, 2020
    Publication date: September 10, 2020
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Nobuaki Sasaki, Yoshihide Sato
  • Publication number: 20180024749
    Abstract: An information processing apparatus includes: a first calculator and a second calculator being coupled to each other via a bus, and each making a memory access, designating a logical address; a first memory being coupled to the first calculator; and a second memory being coupled to the second calculator and being accessed from the first calculator via the bus, wherein the first memory determines, based on a time from issue of a request for the memory access to response to the request, whether a memory having a physical address associated with the logical address is the first memory or the second memory. With this configuration, it is possible to specify whether a memory being accessed using a logical address is a local memory or a remote memory.
    Type: Application
    Filed: June 2, 2017
    Publication date: January 25, 2018
    Applicant: FUJITSU LIMITED
    Inventors: Hirokazu OHTA, NOBUAKI SASAKI, Kazunari YONEYA
  • Publication number: 20150180964
    Abstract: An information processing apparatus includes a transmission unit, a reception unit and a processor. The transmission unit transmits a packet. The reception unit receives a packet. The processor measures a load ratio, which is a usage rate of a band between the transmission unit and the reception unit, when the transmission unit is transmitting the packet to the reception unit. Then, the processor sequentially adjusts a plurality of parameters whose changes insetting lead to changes in the load ratio, in descending order of influence on an increase/decrease in the load ratio in such a manner that the measured load ratio becomes closer to a determined load ratio.
    Type: Application
    Filed: March 4, 2015
    Publication date: June 25, 2015
    Applicant: FUJITSU LIMITED
    Inventor: Nobuaki SASAKI
  • Patent number: 7709660
    Abstract: The invention provides novel compounds useful as intermediates for the production of polymethine compounds containing a desired counter ion with high purity and in high yields. Thus provided are polymethine ether compounds of the general formula (I) given below and a method of producing polymethine compounds which comprises bringing those compounds into contact with an acid. In the above formula, R represents an alkyl group, an alkoxyalkyl group or an aryl group which may optionally be substituted, R1 and R2 each independently represents a hydrogen atom, halogen atom, nitro group, alkyl group, alkoxyalkyl group, alkoxy group or alkoxyalkoxy group and R1 and R2 may be bound to each other to form a ring; R3 represents an alkyl group, which may optionally be substituted; L is an alkylene group required for the formation of a ring structure; and X represents a hydrogen atom, halogen atom, alkoxy group, aryloxy group, alkylthio group, arylthio group or substituted amino group.
    Type: Grant
    Filed: June 20, 2008
    Date of Patent: May 4, 2010
    Assignee: Yamamoto Chemicals, Inc.
    Inventors: Nobuaki Sasaki, Keiki Chichiishi, Sayuri Wada, Shigeo Fujita
  • Publication number: 20090012310
    Abstract: The invention provides novel compounds useful as intermediates for the production of polymethine compounds containing a desired counter ion with high purity and in high yields. Thus provided are polymethine ether compounds of the general formula (I) given below and a method of producing polymethine compounds which comprises bringing those compounds into contact with an acid. In the above formula, R represents an alkyl group, an alkoxyalkyl group or an aryl group which may optionally be substituted, R1 and R2 each independently represents a hydrogen atom, halogen atom, nitro group, alkyl group, alkoxyalkyl group, alkoxy group or alkoxyalkoxy group and R1 and R2 may be bound to each other to form a ring; R3 represents an alkyl group, which may optionally be substituted; L is an alkylene group required for the formation of a ring structure; and X represents a hydrogen atom, halogen atom, alkoxy group, aryloxy group, alkylthio group, arylthio group or substituted amino group.
    Type: Application
    Filed: June 20, 2008
    Publication date: January 8, 2009
    Inventors: Nobuaki Sasaki, Keiki Chichiishi, Sayuri Wada, Shigeo Fujita
  • Patent number: 7446212
    Abstract: The invention provides novel compounds useful as intermediates for the production of polymethine compounds containing a desired counter ion with high purity and in high yields. Thus provided are polymethine ether compounds of the general formula (I) given below and a method of producing polymethine compounds which comprises bringing those compounds into contact with an acid. In the above formula, R represents an alkyl group, an alkoxyalkyl group or an aryl group which may optionally be substituted, R1 and R2 each independently represents a hydrogen atom, halogen atom, nitro group, alkyl group, alkoxyalkyl group, alkoxy group or alkoxyalkoxy group and R1 and R2 may be bound to each other to form a ring; R3 represents an alkyl group, which may optionally be substituted; L is an alkylene group required for the formation of a ring structure; and X represents a hydrogen atom, halogen atom, alkoxy group, aryloxy group, alkylthio group, arylthio group or substituted amino group.
    Type: Grant
    Filed: June 16, 2004
    Date of Patent: November 4, 2008
    Assignee: Yamamoto Chemicals, Inc.
    Inventors: Nobuaki Sasaki, Keiki Chichiishi, Sayuri Wada, Shigeo Fujita
  • Publication number: 20060167272
    Abstract: The invention provides novel compounds useful as intermediates for the production of polymethine compounds containing a desired counter ion with high purity and in high yields. Thus provided are polymethine ether compounds of the general formula (I) given below and a method of producing polymethine compounds which comprises bringing those compounds into contact with an acid. In the above formula, R represents an alkyl group, an alkoxyalkyl group or an aryl group which may optionally be substituted, R1 and R2 each independently represents a hydrogen atom, halogen atom, nitro group, alkyl group, alkoxyalkyl group, alkoxy group or alkoxyalkoxy group and R1 and R2 may be bound to each other to form a ring; R3 represents an alkyl group, which may optionally be substituted; L is an alkylene group required for the formation of a ring structure; and X represents a hydrogen atom, halogen atom, alkoxy group, aryloxy group, alkylthio group, arylthio group or substituted amino group.
    Type: Application
    Filed: June 16, 2004
    Publication date: July 27, 2006
    Inventors: Nobuaki Sasaki, Keiki Chichiishi, Sayuri Wada, Shigeo Fujita
  • Patent number: 6716993
    Abstract: The invention provides novel compounds which show high sensitivity to near-infrared rays in the region of 750-950 nm and, when processed to give films and so forth, undergo only slight discoloration and retain high transparency, hence can be used as near-infrared absorbing materials, together with an intermediate thereof. Thus provided are polymethine compounds of the general formula (I): wherein R1 and R2 each independently represents a hydrogen atom, an alkyl group or an alkoxy group, R3 represents an alkyl group, which may optionally be substituted, L represents an alkylene group necessary for the formation of a cyclic structure, X represents a hydrogen atom, a halogen atom or a substituted amino group, and Z represents an acidic residue, as well as near-infrared absorbing materials comprising the same.
    Type: Grant
    Filed: June 4, 2003
    Date of Patent: April 6, 2004
    Assignee: Yamamoto Chemicals, Inc.
    Inventors: Nobuaki Sasaki, Keiki Chichiishi, Shigeo Fujita, Yasuhisa Iwasaki
  • Publication number: 20030232999
    Abstract: The invention provides novel compounds which show high sensitivity to near-infrared rays in the region of 750-950 nm and, when processed to give films and so forth, undergo only slight discoloration and retain high transparency, hence can be used as near-infrared absorbing materials, together with an intermediate thereof.
    Type: Application
    Filed: June 4, 2003
    Publication date: December 18, 2003
    Inventors: Nobuaki Sasaki, Keiki Chichiishi, Shigeo Fujita, Yasuhisa Iwasaki
  • Publication number: 20020051939
    Abstract: The invention provides a near-infrared absorbing material showing a high sensitivity to a YAG laser having an emission wavelength of 900˜1100 nm as well as a high photothermal conversion efficiency, an original plate for direct printing plate making which utilizes the near-infrared absorbing material, and a novel polymethine compound represented by the following general formula (1), of which the above near-infrared absorbing material is comprised.
    Type: Application
    Filed: September 11, 2001
    Publication date: May 2, 2002
    Inventors: Nobuaki Sasaki, Sayuri Wada, Shigeo Fujita, Yasuhisa Iwasaki
  • Patent number: 6342335
    Abstract: The invention provides near infrared absorbing materials showing high light-to-heat conversion efficiency and high sensitivity to lasers whose emission bands are within the range of 750 nm to 900 nm, original plates for direct printing plate making, and novel compounds which can be applied to such absorbing materials and plates. The compounds are polymethine compounds of the general formula (I) A detailed description of general formula (I) may be found in the specification. wherein R1 represents an alkoxy group which may be substituted; R2 represents an alkyl group which may be substituted; R3 and R4 each represents a lower alkyl group or R3 and R4 taken together represent a ring; X represents a hydrogen atom, a halogen atom or a substituted amino group; Y represents an alkoxy group which may be substituted or an alkyl group which may be substituted; Z represents a charge neutralizing ion.
    Type: Grant
    Filed: June 20, 2000
    Date of Patent: January 29, 2002
    Assignee: Yamamoto Chemicals, Inc.
    Inventors: Shigeo Fujita, Nobuaki Sasaki, Keiki Chichiishi, Yasuhisa Iwasaki
  • Patent number: 6261737
    Abstract: The invention provides near infrared absorbers showing high light-to-heat conversion efficiency and high sensitivity to laser beams whose emission region is within the range of 750 nm to 900 nm, plates for direct printing plate making, and novel compounds which can be used in such absorbers or plates. The compounds are polymethine compounds of the general formula (I) shown below and the near infrared absorbers comprise the polymethine compounds.
    Type: Grant
    Filed: November 23, 1999
    Date of Patent: July 17, 2001
    Assignee: Yamamoto Chemicals, Inc.
    Inventors: Shigeo Fujita, Nobuaki Sasaki, Yasuhisa Iwasaki
  • Patent number: 5990353
    Abstract: The arylsulfonylureide compound which is of value as a color developer is provided in high yield and high purity by a simple procedure. The technology of the invention for producing an arylsulfonylureide compound of general formula (1)(Ar.sup.1 --SO.sub.2 NHCONH).sub.n --Ar.sup.2 (1)wherein Ar.sup.1 represents an aromatic residue; Ar.sup.2 represents a bivalent or trivalent aromatic residue; n represents an integer of 2 or 3 comprises reacting an arylsulfonamide alkali metal salt of general formula (2)Ar.sup.1 --SO.sub.2 NH.B (2)wherein B represents an alkali metal with an aromatic isocyanate compound of general formula (3)Ar.sup.2 --(NCO).sub.
    Type: Grant
    Filed: May 19, 1998
    Date of Patent: November 23, 1999
    Assignee: Yamamoto Chemicals, Inc.
    Inventors: Nobuaki Sasaki, Bunji Sawano, Mansuke Matsumoto, Toshihiko Kawabata
  • Patent number: 5710335
    Abstract: A process for preparing a 3-(N,N-disubstituted amino)phenol is herein disclosed which comprises reacting resorcin with a primary amine represented by formula (2):R.sup.1 NH.sub.2 (2)wherein R.sup.1 is an alkyl group, a cycloalkyl group, an alkenyl group, an alkoxyalkyl group, an aryl group or an aralkyl group,terminating the reaction when the conversion of resorcin is 50 mol % or more and when the amount of an N,N'-disubstituted-m-phenylenediamine as a by-product is 2 mol % or less of the amount of used resorcin, adding an alkyl halide represented by formula (3):R.sup.2 X (3)wherein R.sup.2 is an alkyl group or a cycloalkyl group; and X is a halogen atom,to the obtained reaction mixture, adding an aqueous alkaline solution to the resultant reaction mixture to dissolve unreacted resorcin in the aqueous phase, extracting the 3-(N,N-disubstituted amino)phenol with an organic solvent, and then recovering unreacted resorcin from the aqueous phase.
    Type: Grant
    Filed: October 4, 1996
    Date of Patent: January 20, 1998
    Assignees: Mitsui Toatsu Chemicals, Inc., Yamamoto Chemicals, Inc.
    Inventors: Kenichiro Horiuchi, Bunji Sawano, Nobuaki Sasaki, Mansuke Matsumoto
  • Patent number: 5691272
    Abstract: A heat-sensitive recording material which has a support and a heat-sensitive recording layer containing at least one carboxylate represented by the following formula (1) or (2) ##STR1## wherein a ring X is an aromatic residue which may have a substitute; the other substituents are as defined herein. The heat-sensitive recording material exhibits excellent color image stability and can provide an optically character-readable sharp image.
    Type: Grant
    Filed: August 14, 1996
    Date of Patent: November 25, 1997
    Assignees: Mitsui Toatsu Chemicals, Inc., Yamamoto Chemicals, Inc.
    Inventors: Mansuke Matsumoto, Nobuaki Sasaki, Bunji Sawano, Kiyoharu Hasegawa, Kazuyoshi Kikkawa
  • Patent number: RE39105
    Abstract: The invention provides near infrared absorbing materials showing high light-to-heat conversion efficiency and high sensitivity to lasers whose emission bands are within the range of 750 nm to 900 nm, original plates for direct printing plate making, and novel compounds which can be applied to such absorbing materials and plates. The compounds are polymethine compounds of the general formula (I) A detailed description of general formula (I) may be found in the specification. wherein R1 represents an alkoxy group which may be substituted; R2 represents an alkyl group which may be substituted; R3 and R4 each represents a lower alkyl group or R3 and R4 taken together represent a ring; X represents a hydrogen atom, a halogen atom or a substituted amino group; Y represents an alkoxy group which may be substituted or an alkyl group which may be substituted; Z represents a charge neutralizing ion.
    Type: Grant
    Filed: January 23, 2004
    Date of Patent: May 23, 2006
    Assignee: Yamamoto Chemicals, Inc.
    Inventors: Shigeo Fujita, Nobuaki Sasaki, Keiki Chichiishi, Yasuhisa Iwasaki