Patents by Inventor Nobufumi Mori
Nobufumi Mori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7495768Abstract: An analysis chip comprises a thin film layer, which is formed on a dielectric material block and has two different regions. A flow path unit comprising a supply path for supplying a sample onto the thin film layer and a discharging path for discharging the sample is releasably loaded into the analysis chip. A light beam is irradiated to a first interface between one region of the thin film layer and the dielectric material block, and a second interface between the other region of the thin film layer and the dielectric material block, in a parallel manner. Refractive index information with regard to a substance to be analyzed, which is located on the thin film layer, is acquired from intensities of the light beam totally reflected from the first interface and the light beam totally reflected from the second interface.Type: GrantFiled: March 11, 2005Date of Patent: February 24, 2009Assignee: FUJIFILM CorporationInventors: Nobufumi Mori, Katsumi Hayashi
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Patent number: 7194956Abstract: There is prepared a printing plate on which a material being hydrophilic due to light energy at a first temperature and being hydrophobic at a second temperature due to heat energy which is lower than the first temperature is provided. First, the whole surface of the printing plate is forcibly made either one of hydrophobic or hydrophilic. Next, a region having the other nature out of hydrophobic and hydrophilic is formed so as to correspond to an image to be printed. Then, ink is supplied onto the region having hydrophobic nature to conduct offset printing.Type: GrantFiled: September 10, 2004Date of Patent: March 27, 2007Assignee: Fuji Photo Film Co., Ltd.Inventors: Nobufumi Mori, Takao Nakayama, Takashi Nakamura, Koji Kamiyama
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Publication number: 20070015272Abstract: A toxicity testing apparatus for testing toxicity of a sample with respect to a cell stack culture comprises an incubator for incubating at least one cell stack culture, a culture medium exchanger for exchanging a culture medium for the cell stack culture, a sample dispenser for adding the sample to the cell stack culture, and a detector for detecting an effect of the sample with respect to the cell stack culture.Type: ApplicationFiled: July 13, 2006Publication date: January 18, 2007Inventors: Nobuhiko Ogura, Yasuhiro Shimada, Satoru Toda, Nobufumi Mori
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Patent number: 7157210Abstract: A plate-making method is capable of recording a sharp image on a photosensitive plate, and is applicable to a process operation executed in a light room, while adverse influences caused by laser flares can be hardly received. Ultra-short pulse laser light emitted from a Ti:Al2O3 laser light source is modulated by an AOM (acousto-optic modulating element). The modulated laser light is focused by a collective lens onto a high-sensitive photopolymer layer of a photosensitive plate-making material. The focused ultra-short pulse laser light may cause a photopolymerization reaction in a laser-light-irradiated portion of the high-sensitive photopolymer layer by way of a multiple photon absorption phenomenon, so as to form a hardened portion.Type: GrantFiled: June 15, 2004Date of Patent: January 2, 2007Assignee: Fuji Photo Film Co.-, Ltd.Inventors: Akinori Harada, Nobufumi Mori
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Publication number: 20060156941Abstract: In a planographic printing method, an as-per-image distribution of hydrophilic are as and hydrophobic areas is formed by heating the surface of an original plate to a temperature ranging from 40 through 200° C. and irradiation of activation light after uniformly making the layer of a hydrophobic substance on an original printing plate having photo catalyst power. The hydrophobic areas receive ink whereby printing is carried out. An original printing plate having photo catalyst thin film therefor and a printing press therefor are also provided.Type: ApplicationFiled: February 15, 2006Publication date: July 20, 2006Inventors: Nobufumi Mori, Takashi Nakamura
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Patent number: 7075654Abstract: Disclosed herein is a measuring apparatus equipped with a plurality of measuring units. Each measuring unit includes a dielectric block, a thin film layer formed on the dielectric block, and a sample holding mechanism for holding a sample on the thin film layer. The measuring apparatus is further equipped with an optical system for making a light beam enter the dielectric block at an angle of incidence so that a total internal reflection condition is satisfied at an interface between the dielectric block and the thin film layer, and photodetectors for measuring the intensity of the light beam totally reflected at the interface. The optical system is constructed so that light beams simultaneously enter the dielectric blocks of the measuring units. The number of photodetectors corresponds to the number of the light beams.Type: GrantFiled: October 24, 2005Date of Patent: July 11, 2006Assignee: Fuji Photo Film Co., Ltd.Inventors: Takashi Kubo, Katsuaki Muraishi, Toshihito Kimura, Hitoshi Shimizu, Nobufumi Mori
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Patent number: 7064837Abstract: Disclosed herein is a sensor utilizing attenuated total reflection. The sensor is constructed of a measuring chip, an optical system, and a measuring section. The measuring chip is equipped with a dielectric block, a thin film layer formed on the dielectric block, and a liquid-sample holding portion for holding a liquid sample. The optical system is used to make a light beam enter the dielectric block at various angles of incidence so that a total internal reflection condition is satisfied at an interface between the dielectric block and the thin film layer. The measuring section measures the state of attenuated total reflection, based on the intensity of the light beam totally reflected at the interface. The liquid-sample holding portion has an opening at its top surface. The sensor further has a lid supply mechanism for placing a lid on the opening to prevent evaporation of the liquid sample.Type: GrantFiled: April 12, 2002Date of Patent: June 20, 2006Assignee: Fuji Photo Film Co., Ltd.Inventors: Nobufumi Mori, Katsumi Hayashi, Masayuki Naya, Nobuhiko Ogura, Yoshiyuki Kunuki
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Patent number: 7032514Abstract: In a planographic printing method, an as-per-image distribution of hydrophilic areas and hydrophobic areas is formed by heating the surface of an original plate to a temperature ranging from 40 through 200° C. and irradiation of activation light after uniformly making the layer of a hydrophobic substance on an original printing plate having photo catalyst power. The hydrophobic areas receive ink whereby printing is carried out. An original printing plate having photo catalyst thin film therefor and a printing press therefor are also provided.Type: GrantFiled: June 25, 2001Date of Patent: April 25, 2006Assignee: Fuji Photo Film Co., Ltd.Inventors: Nobufumi Mori, Takashi Nakamura
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Patent number: 7034857Abstract: An image-recording apparatus. In a housing of the apparatus are a casing section that encases a light and heat sensitive recording material, an optical recording section that exposes the light and heat sensitive recording material fed from the casing section to record a latent image, a thermal developing section that develops the latent image by heating, an optical fixing section that fixes the developed image by irradiating it with light, and an outlet through which the image-recorded material is taken out.Type: GrantFiled: May 1, 2001Date of Patent: April 25, 2006Assignee: Fuji Photo Film Co., Ltd.Inventors: Nobufumi Mori, Akinori Harada, Shintaro Washizu
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Patent number: 7030988Abstract: Disclosed herein is a measuring apparatus equipped with a plurality of measuring units. Each measuring unit includes a dielectric block, a thin film layer formed on the dielectric block, and a sample holding mechanism for holding a sample on the thin film layer. The measuring apparatus is further equipped with an optical system for making a light beam enter the dielectric block at an angle of incidence so that a total internal reflection condition is satisfied at an interface between the dielectric block and the thin film layer, and photodetectors for measuring the intensity of the light beam totally reflected at the interface. The optical system is constructed so that light beams simultaneously enter the dielectric blocks of the measuring units. The number of photodetectors corresponds to the number of the light beams.Type: GrantFiled: March 21, 2002Date of Patent: April 18, 2006Assignee: Fuji Photo Film Co., Ltd.Inventors: Takashi Kubo, Katsuaki Muraishi, Toshihito Kimura, Hitoshi Shimizu, Nobufumi Mori
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Patent number: 7012693Abstract: A sensor comprising a light source for emitting a light beam, and a measuring chip. The measuring chip includes a dielectric block transparent to the light beam, a thin film layer formed on the dielectric block, and a liquid-sample holding mechanism for holding a liquid sample. The sensor also comprises an optical system for making the light beam enter the dielectric block at an angle of incidence so that a total internal reflection condition is satisfied at an interface between the dielectric block and the thin film layer. The sensor further comprises a photodetector for detecting the intensity of the light beam totally reflected at the interface, and a measuring section for measuring a state of attenuated total reflection, based on the result of detection obtained by the photodetector. The irradiation energy of the light beam at the interface is 100 mJ/mm2 or less.Type: GrantFiled: September 11, 2002Date of Patent: March 14, 2006Assignee: Fuji Photo Film Co., Ltd.Inventors: Nobufumi Mori, Takeharu Tani
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Patent number: 7009706Abstract: A measuring chip comprising a dielectric block and a thin film layer formed on one surface of the dielectric block. The thin film layer is used for placing a sample thereon. The dielectric block is formed as a single block, which includes an entrance surface at which a light beam enters the dielectric block, an exit surface from which the light beam emerges, and the one surface on which the thin film layer is formed. In addition, the dielectric block is integrated with the thin film layer and formed from a resin whose photoelastic coefficient is less than 50×10?12 Pa?1.Type: GrantFiled: December 13, 2002Date of Patent: March 7, 2006Assignee: Fuji Photo Film Co., Ltd.Inventors: Nobufumi Mori, Takeharu Tani, Atsushi Mukai
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Publication number: 20060039003Abstract: Disclosed herein is a measuring apparatus equipped with a plurality of measuring units. Each measuring unit includes a dielectric block, a thin film layer formed on the dielectric block, and a sample holding mechanism for holding a sample on the thin film layer. The measuring apparatus is further equipped with an optical system for making a light beam enter the dielectric block at an angle of incidence so that a total internal reflection condition is satisfied at an interface between the dielectric block and the thin film layer, and photodetectors for measuring the intensity of the light beam totally reflected at the interface. The optical system is constructed so that light beams simultaneously enter the dielectric blocks of the measuring units. The number of photodetectors corresponds to the number of the light beams.Type: ApplicationFiled: October 24, 2005Publication date: February 23, 2006Inventors: Takashi Kubo, Katsuaki Muraishi, Toshihito Kimura, Hitoshi Shimizu, Nobufumi Mori
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Publication number: 20050200853Abstract: An analysis chip comprises a thin film layer, which is formed on a dielectric material block and has two different regions. A flow path unit comprising a supply path for supplying a sample onto the thin film layer and a discharging path for discharging the sample is releasably loaded into the analysis chip. A light beam is irradiated to a first interface between one region of the thin film layer and the dielectric material block, and a second interface between the other region of the thin film layer and the dielectric material block, in a parallel manner. Refractive index information with regard to a substance to be analyzed, which is located on the thin film layer, is acquired from intensities of the light beam totally reflected from the first interface and the light beam totally reflected from the second interface.Type: ApplicationFiled: March 11, 2005Publication date: September 15, 2005Inventors: Nobufumi Mori, Katsumi Hayashi
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Patent number: 6892640Abstract: There is prepared a printing plate on which a material being hydrophilic at a first temperature and being hydrophobic at a second temperature which is lower than the first temperature is provided. First, the whole surface of the printing plate is forcibly made either one of hydrophobic or hydrophilic. Next, a region having the other nature out of hydrophobic and hydrophilic is formed so as to correspond to an image to be printed. Then, ink is supplied onto the region having hydrophobic nature to conduct offset printing.Type: GrantFiled: December 29, 2003Date of Patent: May 17, 2005Assignee: Fuji Photo Film Co., Ltd.Inventors: Nobufumi Mori, Takao Nakayama, Takashi Nakamura, Koji Kamiyama
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Patent number: 6885454Abstract: A measuring apparatus is disclosed which includes a measuring unit equipped with a dielectric block and a thin film layer; an incidence system for making a light beam enter the dielectric block so that a condition for total internal reflection is satisfied at an interface between the dielectric block and the thin film layer; and a photodetector for receiving the light beam totally reflected at the interface. The measuring unit is measured a plurality of times, and a change in the state of attenuated total reflection during the plurality of measurements is detected. The sensor further includes a tilt measurement section for measuring the longitudinal tilt of the interface which changes the incidence angles during the plurality of measurements, and a calculating section for obtaining a measured value in which errors due to the longitudinal tilt have been corrected.Type: GrantFiled: March 28, 2002Date of Patent: April 26, 2005Assignee: Fuji Photo Film Co., Ltd.Inventors: Masayuki Naya, Nobufumi Mori, Toshihito Kimura, Hitoshi Shimizu, Shu Sato
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Patent number: 6864984Abstract: A plurality of measuring units each comprising a dielectric block, a metal film layer which is formed on a surface of the dielectric block and a sample holder are supported on a support. The support is moved by a support drive means to bring in sequence the measuring units to a measuring portion comprising an optical system which projects a light beam emitted from a light source, and a photodetector which detects attenuation in total internal reflection by detecting the intensity of the light beam which is reflected in total internal reflection at the interface between the dielectric block and the metal film layer. In this measuring apparatus, lots of samples can be measured in a short time.Type: GrantFiled: March 14, 2001Date of Patent: March 8, 2005Assignee: Fuji Photo Film Co., Ltd.Inventors: Masayuki Naya, Takashi Kubo, Nobuhiko Ogura, Nobufumi Mori
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Publication number: 20050028698Abstract: There is prepared a printing plate on which a material being hydrophilic at a first temperature and being hydrophobic at a second temperature which is lower than the first temperature is provided. First, the whole surface of the printing plate is forcibly made either one of hydrophobic or hydrophilic. Next, a region having the other nature out of hydrophobic and hydrophilic is formed so as to correspond to an image to be printed. Then, ink is supplied onto the region having hydrophobic nature to conduct offset printing.Type: ApplicationFiled: September 10, 2004Publication date: February 10, 2005Inventors: Nobufumi Mori, Takao Nakayama, Takashi Nakamura, Koji Kamiyama
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Publication number: 20040244620Abstract: A plate-making method is capable of recording a sharp image on a photosensitive plate, and is applicable to a process operation executed in a light room, while adverse influences caused by laser flares can be hardly received. Ultra-short pulse laser light emitted from a Ti:Al2O3 laser light source is modulated by an AOM (acousto-optic modulating element). The modulated laser light is focused by a collective lens onto a high-sensitive photopolymer layer of a photosensitive plate-making material. The focused ultra-short pulse laser light may cause a photopolymerization reaction in a laser-light-irradiated portion of the high-sensitive photopolymer layer by way of a multiple photon absorption phenomenon, so as to form a hardened portion.Type: ApplicationFiled: June 15, 2004Publication date: December 9, 2004Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Akinori Harada, Nobufumi Mori
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Patent number: 6788415Abstract: A measuring apparatus includes a turntable and drive means. The turntable is used for supporting n measuring units at intervals of a predetermined angle with respect to a rotation axis thereof. The drive means is used for rotating the turntable intermittently at intervals of an angle equal to m times the predetermined angle (m is an integer). When the turntable is stopped, k kinds of processes are respectively performed on the measuring units situated at different positions on the turntable. The above-mentioned k is 2≦k≦n, and the above-mentioned m is either 1, a number that is neither the common divisor of 1 and n nor the common multiple, or a sum of 1 and the common multiple of n.Type: GrantFiled: April 2, 2002Date of Patent: September 7, 2004Assignee: Fuji Photo Film Co., Ltd.Inventors: Nobuhiko Ogura, Nobufumi Mori